DE2706031A1 - Integrierte schaltung mit einem thyristor - Google Patents
Integrierte schaltung mit einem thyristorInfo
- Publication number
- DE2706031A1 DE2706031A1 DE19772706031 DE2706031A DE2706031A1 DE 2706031 A1 DE2706031 A1 DE 2706031A1 DE 19772706031 DE19772706031 DE 19772706031 DE 2706031 A DE2706031 A DE 2706031A DE 2706031 A1 DE2706031 A1 DE 2706031A1
- Authority
- DE
- Germany
- Prior art keywords
- cathode
- anode
- integrated circuit
- thyristor
- zone
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000004065 semiconductor Substances 0.000 claims abstract description 25
- 230000004888 barrier function Effects 0.000 claims abstract description 8
- 239000002800 charge carrier Substances 0.000 claims abstract description 4
- 238000009413 insulation Methods 0.000 claims abstract 2
- 239000011248 coating agent Substances 0.000 claims description 4
- 238000000576 coating method Methods 0.000 claims description 4
- 239000002184 metal Substances 0.000 claims description 4
- 238000002347 injection Methods 0.000 claims description 3
- 239000007924 injection Substances 0.000 claims description 3
- 238000009792 diffusion process Methods 0.000 description 7
- 239000000758 substrate Substances 0.000 description 6
- 238000000926 separation method Methods 0.000 description 3
- DEXFNLNNUZKHNO-UHFFFAOYSA-N 6-[3-[4-[2-(2,3-dihydro-1H-inden-2-ylamino)pyrimidin-5-yl]piperidin-1-yl]-3-oxopropyl]-3H-1,3-benzoxazol-2-one Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)C1CCN(CC1)C(CCC1=CC2=C(NC(O2)=O)C=C1)=O DEXFNLNNUZKHNO-UHFFFAOYSA-N 0.000 description 2
- 238000002955 isolation Methods 0.000 description 2
- 230000002457 bidirectional effect Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000003780 insertion Methods 0.000 description 1
- 230000037431 insertion Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
- H10D84/60—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D10/00 or H10D18/00, e.g. integration of BJTs
- H10D84/676—Combinations of only thyristors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/76—Making of isolation regions between components
- H01L21/761—PN junctions
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D18/00—Thyristors
- H10D18/251—Lateral thyristors
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Thyristors (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19772706031 DE2706031A1 (de) | 1977-02-12 | 1977-02-12 | Integrierte schaltung mit einem thyristor |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19772706031 DE2706031A1 (de) | 1977-02-12 | 1977-02-12 | Integrierte schaltung mit einem thyristor |
Publications (2)
Publication Number | Publication Date |
---|---|
DE2706031A1 true DE2706031A1 (de) | 1978-08-17 |
DE2706031C2 DE2706031C2 (enrdf_load_stackoverflow) | 1988-03-17 |
Family
ID=6001043
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE19772706031 Granted DE2706031A1 (de) | 1977-02-12 | 1977-02-12 | Integrierte schaltung mit einem thyristor |
Country Status (1)
Country | Link |
---|---|
DE (1) | DE2706031A1 (enrdf_load_stackoverflow) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4567500A (en) * | 1981-12-01 | 1986-01-28 | Rca Corporation | Semiconductor structure for protecting integrated circuit devices |
EP0144865A3 (en) * | 1983-12-05 | 1986-12-30 | General Electric Company | Semiconductor wafer with an electrically-isolated semiconductor device |
EP0522670A1 (en) * | 1985-11-27 | 1993-01-13 | Koninklijke Philips Electronics N.V. | Fast switching lateral insulated gate field effect transistor |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3430110A (en) * | 1965-12-02 | 1969-02-25 | Rca Corp | Monolithic integrated circuits with a plurality of isolation zones |
DE2026778A1 (de) * | 1970-06-01 | 1971-12-16 | Siemens Ag | Halbleitervierschichtdiode |
US3725683A (en) * | 1971-02-03 | 1973-04-03 | Wescom | Discrete and integrated-type circuit |
DE2418560A1 (de) * | 1973-04-18 | 1974-11-14 | Sony Corp | Halbleitervorrichtung |
-
1977
- 1977-02-12 DE DE19772706031 patent/DE2706031A1/de active Granted
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3430110A (en) * | 1965-12-02 | 1969-02-25 | Rca Corp | Monolithic integrated circuits with a plurality of isolation zones |
DE2026778A1 (de) * | 1970-06-01 | 1971-12-16 | Siemens Ag | Halbleitervierschichtdiode |
US3725683A (en) * | 1971-02-03 | 1973-04-03 | Wescom | Discrete and integrated-type circuit |
DE2418560A1 (de) * | 1973-04-18 | 1974-11-14 | Sony Corp | Halbleitervorrichtung |
Non-Patent Citations (3)
Title |
---|
J. Wüstehube: "Integrierte Halbleiterschaltungen",Valvo GmbH Hamburg, 1966, S. 19-32 * |
Solid State Electronics, Bd. 11, Nr. 4, 1968, S. 437-444 * |
Solid State Electronics, Bd. 11, Nr. 8, 1968, S. 779-785 * |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4567500A (en) * | 1981-12-01 | 1986-01-28 | Rca Corporation | Semiconductor structure for protecting integrated circuit devices |
EP0144865A3 (en) * | 1983-12-05 | 1986-12-30 | General Electric Company | Semiconductor wafer with an electrically-isolated semiconductor device |
EP0522670A1 (en) * | 1985-11-27 | 1993-01-13 | Koninklijke Philips Electronics N.V. | Fast switching lateral insulated gate field effect transistor |
Also Published As
Publication number | Publication date |
---|---|
DE2706031C2 (enrdf_load_stackoverflow) | 1988-03-17 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
DE1944793C3 (de) | Verfahren zur Herstellung einer integrierten Halbleiteranordnung | |
DE3855603T2 (de) | Integrierter bipolarer Hochspannungsleistungstransistor und Niederspannungs-MOS-Transistorstruktur in Emitterumschaltkonfiguration und Herstellungsverfahren | |
DE2512737A1 (de) | Obenkollektor-halbleiterbauelement und verfahren zu dessen herstellung | |
DE2939193C2 (enrdf_load_stackoverflow) | ||
DE2554612A1 (de) | Integrierte halbleiterschaltung | |
DE1764578C3 (de) | Verfahren zur Herstellung einer Halbleiteranordnung mit einem Feldeffekttransistor | |
DE2706031A1 (de) | Integrierte schaltung mit einem thyristor | |
DE2535864A1 (de) | Halbleiterbauelemente | |
DE1764398B1 (de) | Sperrschichtkondensator | |
DE2915885A1 (de) | Thyristor mit steuerung durch feldeffekttransistor | |
DE68925150T2 (de) | Bipolartransistor und Verfahren zu dessen Herstellung | |
DE2046053A1 (de) | Integrierte Schaltung | |
DE2361171A1 (de) | Halbleitervorrichtung | |
DE2705990A1 (de) | Integrierte schaltung mit einem thyristor e2 | |
DE2922926C2 (de) | Mit zwei Anschlüssen versehener, optisch zündbarer, monolithischer Zweiweg-Thyristor | |
DE19818296C1 (de) | Hochspannungs-Randabschluß für ein Halbleiterbauelement | |
DE1769271C3 (de) | Verfahren zum Herstellen einer Festkörperschaltung | |
DE2732360A1 (de) | Hochspannungs-thyristor | |
DE2053776A1 (de) | Integrierte Halbleiteranordnung | |
DE19520182C2 (de) | Bipolartransistor vom pnp-Typ | |
DE2507404C2 (de) | Festkörper-Schaltelement | |
DE1944688A1 (de) | Integrierte Halbleiteranordnung | |
DE3014488A1 (de) | Halbleiteranordnungen | |
DE1789195C2 (de) | Planartransistor | |
DE2137948C3 (de) | Steuerbarer Halbleitergleichrichter |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
8139 | Disposal/non-payment of the annual fee | ||
8170 | Reinstatement of the former position | ||
8110 | Request for examination paragraph 44 | ||
8125 | Change of the main classification |
Ipc: H01L 29/74 |
|
8127 | New person/name/address of the applicant |
Owner name: SIEMENS AG, 1000 BERLIN UND 8000 MUENCHEN, DE |
|
D2 | Grant after examination | ||
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |