DE2536707A1 - Projektionskopiervorrichtung fuer schaltungsmuster - Google Patents

Projektionskopiervorrichtung fuer schaltungsmuster

Info

Publication number
DE2536707A1
DE2536707A1 DE19752536707 DE2536707A DE2536707A1 DE 2536707 A1 DE2536707 A1 DE 2536707A1 DE 19752536707 DE19752536707 DE 19752536707 DE 2536707 A DE2536707 A DE 2536707A DE 2536707 A1 DE2536707 A1 DE 2536707A1
Authority
DE
Germany
Prior art keywords
plate
beam splitter
radiant energy
polarizing beam
visible
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
DE19752536707
Other languages
German (de)
English (en)
Inventor
Michael John Buzawa
Charles Ray Munnerlyn
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tropel Inc
Original Assignee
Tropel Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tropel Inc filed Critical Tropel Inc
Publication of DE2536707A1 publication Critical patent/DE2536707A1/de
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7065—Production of alignment light, e.g. light source, control of coherence, polarization, pulse length, wavelength
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
DE19752536707 1974-10-02 1975-08-18 Projektionskopiervorrichtung fuer schaltungsmuster Withdrawn DE2536707A1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US511219A US3917399A (en) 1974-10-02 1974-10-02 Catadioptric projection printer

Publications (1)

Publication Number Publication Date
DE2536707A1 true DE2536707A1 (de) 1976-04-08

Family

ID=24033961

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19752536707 Withdrawn DE2536707A1 (de) 1974-10-02 1975-08-18 Projektionskopiervorrichtung fuer schaltungsmuster

Country Status (4)

Country Link
US (1) US3917399A (enExample)
DE (1) DE2536707A1 (enExample)
FR (1) FR2287053A1 (enExample)
GB (1) GB1484788A (enExample)

Families Citing this family (43)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5467443A (en) * 1977-11-09 1979-05-30 Canon Inc Observer
FR2450470A1 (fr) * 1979-02-27 1980-09-26 Thomson Csf Systeme optique de projection en photorepetition
US4473293A (en) * 1979-04-03 1984-09-25 Optimetrix Corporation Step-and-repeat projection alignment and exposure system
US4573791A (en) * 1979-04-03 1986-03-04 Optimetrix Corporation Step-and-repeat projection alignment and exposure system
US4414749A (en) * 1979-07-02 1983-11-15 Optimetrix Corporation Alignment and exposure system with an indicium of an axis of motion of the system
US4452526A (en) * 1980-02-29 1984-06-05 Optimetrix Corporation Step-and-repeat projection alignment and exposure system with auxiliary optical unit
US4597664A (en) * 1980-02-29 1986-07-01 Optimetrix Corporation Step-and-repeat projection alignment and exposure system with auxiliary optical unit
JPS56130707A (en) * 1980-03-18 1981-10-13 Canon Inc Photo-printing device
GB2148017B (en) * 1981-05-15 1986-04-09 Gen Signal Corp Apparatus for projecting a series of images onto dies of a semiconductor wafer
US4391494A (en) * 1981-05-15 1983-07-05 General Signal Corporation Apparatus for projecting a series of images onto dies of a semiconductor wafer
US4425037A (en) 1981-05-15 1984-01-10 General Signal Corporation Apparatus for projecting a series of images onto dies of a semiconductor wafer
GB2121552B (en) * 1981-05-15 1985-12-18 Gen Signal Corp Apparatus for projecting a series of images onto dies of a semiconductor wafer
US4444492A (en) * 1982-05-15 1984-04-24 General Signal Corporation Apparatus for projecting a series of images onto dies of a semiconductor wafer
US4577958A (en) * 1982-06-18 1986-03-25 Eaton Optimetrix, Inc. Bore-sighted step-and-repeat projection alignment and exposure system
US4577957A (en) * 1983-01-07 1986-03-25 Eaton-Optimetrix, Inc. Bore-sighted step-and-repeat projection alignment and exposure system
US4585337A (en) * 1985-01-14 1986-04-29 Phillips Edward H Step-and-repeat alignment and exposure system
US4742376A (en) * 1985-01-14 1988-05-03 Phillips Edward H Step-and-repeat alignment and exposure system
US4669866A (en) * 1985-01-28 1987-06-02 Phillips Edward H Step-and-repeat alignment and exposure system and method therefore
US4964705A (en) * 1988-11-07 1990-10-23 General Signal Corporation Unit magnification optical system
US5040882A (en) * 1988-11-07 1991-08-20 General Signal Corporation Unit magnification optical system with improved reflective reticle
US5267061A (en) * 1990-02-20 1993-11-30 Hughes Aircraft Company Non-interfering viewing systems for use in catadioptric projection systems
TW198748B (enExample) * 1990-02-20 1993-01-21 Hughes Aircraft Co
DE4203464B4 (de) * 1991-02-08 2007-02-01 Carl Zeiss Smt Ag Katadioptrisches Reduktionsobjektiv
JP3235077B2 (ja) * 1991-09-28 2001-12-04 株式会社ニコン 露光装置、該装置を用いた露光方法、及び該装置を用いた半導体素子製造方法
US5459000A (en) * 1992-10-14 1995-10-17 Canon Kabushiki Kaisha Image projection method and device manufacturing method using the image projection method
JP2750062B2 (ja) * 1992-12-14 1998-05-13 キヤノン株式会社 反射屈折型光学系及び該光学系を備える投影露光装置
JP2698521B2 (ja) 1992-12-14 1998-01-19 キヤノン株式会社 反射屈折型光学系及び該光学系を備える投影露光装置
US5537260A (en) * 1993-01-26 1996-07-16 Svg Lithography Systems, Inc. Catadioptric optical reduction system with high numerical aperture
JP3747951B2 (ja) * 1994-11-07 2006-02-22 株式会社ニコン 反射屈折光学系
US5729331A (en) * 1993-06-30 1998-03-17 Nikon Corporation Exposure apparatus, optical projection apparatus and a method for adjusting the optical projection apparatus
JPH088177A (ja) * 1994-04-22 1996-01-12 Canon Inc 投影露光装置及びそれを用いたデバイスの製造方法
JPH08179216A (ja) * 1994-12-27 1996-07-12 Nikon Corp 反射屈折光学系
JP3812051B2 (ja) * 1997-04-30 2006-08-23 株式会社ニコン 反射屈折投影光学系
DE19807120A1 (de) * 1998-02-20 1999-08-26 Zeiss Carl Fa Optisches System mit Polarisationskompensator
JP3985346B2 (ja) * 1998-06-12 2007-10-03 株式会社ニコン 投影露光装置、投影露光装置の調整方法、及び投影露光方法
US6680798B2 (en) * 2000-04-25 2004-01-20 Asml Holding N.V. Optical reduction system with control of illumination polarization
US6486940B1 (en) 2000-07-21 2002-11-26 Svg Lithography Systems, Inc. High numerical aperture catadioptric lens
US7090964B2 (en) * 2003-02-21 2006-08-15 Asml Holding N.V. Lithographic printing with polarized light
US7271874B2 (en) * 2004-11-02 2007-09-18 Asml Holding N.V. Method and apparatus for variable polarization control in a lithography system
DE102005061834B4 (de) * 2005-12-23 2007-11-08 Ioss Intelligente Optische Sensoren & Systeme Gmbh Vorrichtung und Verfahren zum optischen Prüfen einer Oberfläche
CN105242495B (zh) * 2014-05-26 2017-08-25 上海微电子装备（集团）股份有限公司 光刻曝光装置
CN107167905B (zh) * 2017-07-21 2019-06-14 安徽庆宇光电科技有限公司 利用折光棱镜与复合次镜的同轴卡塞-格林折叠腔光路系统
CN109991171B (zh) * 2019-04-09 2021-07-20 山东师范大学 一种单击定量双折射显微成像装置和方法

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1919991C3 (de) * 1969-04-19 1973-11-29 Licentia Patent-Verwaltungs-Gmbh, 6000 Frankfurt Anordnung zur automatischen Aus richtung von zwei aufeinander einzu justierenden Objekten
US3695758A (en) * 1969-06-30 1972-10-03 Nippon Kogaku Kk Illumination device for projector type ic printer
FR2082213A5 (enExample) * 1970-03-06 1971-12-10 Delmas Jean Raymond
JPS5411704B1 (enExample) * 1971-03-22 1979-05-17
US3718396A (en) * 1971-12-28 1973-02-27 Licentia Gmbh System for photographic production of semiconductor micro structures
US3853398A (en) * 1972-07-05 1974-12-10 Canon Kk Mask pattern printing device
US3819265A (en) * 1972-08-02 1974-06-25 Bell Telephone Labor Inc Scanning projection printer apparatus and method
US3865483A (en) * 1974-03-21 1975-02-11 Ibm Alignment illumination system

Also Published As

Publication number Publication date
US3917399A (en) 1975-11-04
GB1484788A (en) 1977-09-08
FR2287053B3 (enExample) 1978-04-07
FR2287053A1 (fr) 1976-04-30

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Legal Events

Date Code Title Description
8141 Disposal/no request for examination