FR2287053A1 - Appareillage optique pour l'impression de circuits imprimes - Google Patents
Appareillage optique pour l'impression de circuits imprimesInfo
- Publication number
- FR2287053A1 FR2287053A1 FR7525534A FR7525534A FR2287053A1 FR 2287053 A1 FR2287053 A1 FR 2287053A1 FR 7525534 A FR7525534 A FR 7525534A FR 7525534 A FR7525534 A FR 7525534A FR 2287053 A1 FR2287053 A1 FR 2287053A1
- Authority
- FR
- France
- Prior art keywords
- printed circuits
- optical equipment
- printing printed
- printing
- optical
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7065—Production of alignment light, e.g. light source, control of coherence, polarization, pulse length, wavelength
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US511219A US3917399A (en) | 1974-10-02 | 1974-10-02 | Catadioptric projection printer |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2287053A1 true FR2287053A1 (fr) | 1976-04-30 |
FR2287053B3 FR2287053B3 (fr) | 1978-04-07 |
Family
ID=24033961
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR7525534A Granted FR2287053A1 (fr) | 1974-10-02 | 1975-08-18 | Appareillage optique pour l'impression de circuits imprimes |
Country Status (4)
Country | Link |
---|---|
US (1) | US3917399A (fr) |
DE (1) | DE2536707A1 (fr) |
FR (1) | FR2287053A1 (fr) |
GB (1) | GB1484788A (fr) |
Families Citing this family (43)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5467443A (en) * | 1977-11-09 | 1979-05-30 | Canon Inc | Observer |
FR2450470A1 (fr) * | 1979-02-27 | 1980-09-26 | Thomson Csf | Systeme optique de projection en photorepetition |
US4473293A (en) * | 1979-04-03 | 1984-09-25 | Optimetrix Corporation | Step-and-repeat projection alignment and exposure system |
US4573791A (en) * | 1979-04-03 | 1986-03-04 | Optimetrix Corporation | Step-and-repeat projection alignment and exposure system |
US4414749A (en) * | 1979-07-02 | 1983-11-15 | Optimetrix Corporation | Alignment and exposure system with an indicium of an axis of motion of the system |
US4597664A (en) * | 1980-02-29 | 1986-07-01 | Optimetrix Corporation | Step-and-repeat projection alignment and exposure system with auxiliary optical unit |
US4452526A (en) * | 1980-02-29 | 1984-06-05 | Optimetrix Corporation | Step-and-repeat projection alignment and exposure system with auxiliary optical unit |
JPS56130707A (en) * | 1980-03-18 | 1981-10-13 | Canon Inc | Photo-printing device |
DE3249686C2 (de) * | 1981-05-15 | 1986-11-13 | General Signal Corp., Stamford, Conn. | Achromatisches, anastigmatisches Einheits-Vergrößerungs- und Projektionssystem |
CA1171555A (fr) | 1981-05-15 | 1984-07-24 | Ronald S. Hershel | Appareil pour projeter une serie d'images sur les pastilles d'une plaquette de semiconducteur |
US4391494A (en) * | 1981-05-15 | 1983-07-05 | General Signal Corporation | Apparatus for projecting a series of images onto dies of a semiconductor wafer |
GB2146454B (en) * | 1981-05-15 | 1986-04-16 | Gen Signal Corp | Apparatus for projecting a series of images onto dies of a semiconductor wafer |
US4444492A (en) * | 1982-05-15 | 1984-04-24 | General Signal Corporation | Apparatus for projecting a series of images onto dies of a semiconductor wafer |
US4577958A (en) * | 1982-06-18 | 1986-03-25 | Eaton Optimetrix, Inc. | Bore-sighted step-and-repeat projection alignment and exposure system |
US4577957A (en) * | 1983-01-07 | 1986-03-25 | Eaton-Optimetrix, Inc. | Bore-sighted step-and-repeat projection alignment and exposure system |
US4742376A (en) * | 1985-01-14 | 1988-05-03 | Phillips Edward H | Step-and-repeat alignment and exposure system |
US4585337A (en) * | 1985-01-14 | 1986-04-29 | Phillips Edward H | Step-and-repeat alignment and exposure system |
US4669866A (en) * | 1985-01-28 | 1987-06-02 | Phillips Edward H | Step-and-repeat alignment and exposure system and method therefore |
US5040882A (en) * | 1988-11-07 | 1991-08-20 | General Signal Corporation | Unit magnification optical system with improved reflective reticle |
US4964705A (en) * | 1988-11-07 | 1990-10-23 | General Signal Corporation | Unit magnification optical system |
TW198748B (fr) * | 1990-02-20 | 1993-01-21 | Hughes Aircraft Co | |
US5267061A (en) * | 1990-02-20 | 1993-11-30 | Hughes Aircraft Company | Non-interfering viewing systems for use in catadioptric projection systems |
DE4203464B4 (de) * | 1991-02-08 | 2007-02-01 | Carl Zeiss Smt Ag | Katadioptrisches Reduktionsobjektiv |
JP3235077B2 (ja) * | 1991-09-28 | 2001-12-04 | 株式会社ニコン | 露光装置、該装置を用いた露光方法、及び該装置を用いた半導体素子製造方法 |
US5459000A (en) * | 1992-10-14 | 1995-10-17 | Canon Kabushiki Kaisha | Image projection method and device manufacturing method using the image projection method |
JP2698521B2 (ja) * | 1992-12-14 | 1998-01-19 | キヤノン株式会社 | 反射屈折型光学系及び該光学系を備える投影露光装置 |
JP2750062B2 (ja) * | 1992-12-14 | 1998-05-13 | キヤノン株式会社 | 反射屈折型光学系及び該光学系を備える投影露光装置 |
US5537260A (en) * | 1993-01-26 | 1996-07-16 | Svg Lithography Systems, Inc. | Catadioptric optical reduction system with high numerical aperture |
JP3747951B2 (ja) * | 1994-11-07 | 2006-02-22 | 株式会社ニコン | 反射屈折光学系 |
US5729331A (en) * | 1993-06-30 | 1998-03-17 | Nikon Corporation | Exposure apparatus, optical projection apparatus and a method for adjusting the optical projection apparatus |
JPH088177A (ja) * | 1994-04-22 | 1996-01-12 | Canon Inc | 投影露光装置及びそれを用いたデバイスの製造方法 |
JPH08179216A (ja) * | 1994-12-27 | 1996-07-12 | Nikon Corp | 反射屈折光学系 |
JP3812051B2 (ja) * | 1997-04-30 | 2006-08-23 | 株式会社ニコン | 反射屈折投影光学系 |
DE19807120A1 (de) * | 1998-02-20 | 1999-08-26 | Zeiss Carl Fa | Optisches System mit Polarisationskompensator |
JP3985346B2 (ja) * | 1998-06-12 | 2007-10-03 | 株式会社ニコン | 投影露光装置、投影露光装置の調整方法、及び投影露光方法 |
AU2001255612A1 (en) * | 2000-04-25 | 2001-11-07 | Silicon Valley Group Inc | Optical reduction system with control of illumination polarization |
US6486940B1 (en) | 2000-07-21 | 2002-11-26 | Svg Lithography Systems, Inc. | High numerical aperture catadioptric lens |
TWI247339B (en) | 2003-02-21 | 2006-01-11 | Asml Holding Nv | Lithographic printing with polarized light |
US7271874B2 (en) * | 2004-11-02 | 2007-09-18 | Asml Holding N.V. | Method and apparatus for variable polarization control in a lithography system |
DE102005061834B4 (de) * | 2005-12-23 | 2007-11-08 | Ioss Intelligente Optische Sensoren & Systeme Gmbh | Vorrichtung und Verfahren zum optischen Prüfen einer Oberfläche |
CN105242495B (zh) * | 2014-05-26 | 2017-08-25 | 上海微电子装备(集团)股份有限公司 | 光刻曝光装置 |
CN107167905B (zh) * | 2017-07-21 | 2019-06-14 | 安徽庆宇光电科技有限公司 | 利用折光棱镜与复合次镜的同轴卡塞-格林折叠腔光路系统 |
CN109991171B (zh) * | 2019-04-09 | 2021-07-20 | 山东师范大学 | 一种单击定量双折射显微成像装置和方法 |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE1919991C3 (de) * | 1969-04-19 | 1973-11-29 | Licentia Patent-Verwaltungs-Gmbh, 6000 Frankfurt | Anordnung zur automatischen Aus richtung von zwei aufeinander einzu justierenden Objekten |
US3695758A (en) * | 1969-06-30 | 1972-10-03 | Nippon Kogaku Kk | Illumination device for projector type ic printer |
FR2082213A5 (fr) * | 1970-03-06 | 1971-12-10 | Delmas Jean Raymond | |
JPS5411704B1 (fr) * | 1971-03-22 | 1979-05-17 | ||
US3718396A (en) * | 1971-12-28 | 1973-02-27 | Licentia Gmbh | System for photographic production of semiconductor micro structures |
US3853398A (en) * | 1972-07-05 | 1974-12-10 | Canon Kk | Mask pattern printing device |
US3819265A (en) * | 1972-08-02 | 1974-06-25 | Bell Telephone Labor Inc | Scanning projection printer apparatus and method |
US3865483A (en) * | 1974-03-21 | 1975-02-11 | Ibm | Alignment illumination system |
-
1974
- 1974-10-02 US US511219A patent/US3917399A/en not_active Expired - Lifetime
-
1975
- 1975-08-18 FR FR7525534A patent/FR2287053A1/fr active Granted
- 1975-08-18 DE DE19752536707 patent/DE2536707A1/de not_active Withdrawn
- 1975-08-27 GB GB35363/75A patent/GB1484788A/en not_active Expired
Also Published As
Publication number | Publication date |
---|---|
US3917399A (en) | 1975-11-04 |
GB1484788A (en) | 1977-09-08 |
FR2287053B3 (fr) | 1978-04-07 |
DE2536707A1 (de) | 1976-04-08 |
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