FR2082213A5 - - Google Patents

Info

Publication number
FR2082213A5
FR2082213A5 FR7008153A FR7008153A FR2082213A5 FR 2082213 A5 FR2082213 A5 FR 2082213A5 FR 7008153 A FR7008153 A FR 7008153A FR 7008153 A FR7008153 A FR 7008153A FR 2082213 A5 FR2082213 A5 FR 2082213A5
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR7008153A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Priority to FR7008153A priority Critical patent/FR2082213A5/fr
Priority to US122630A priority patent/US3698808A/en
Priority to DE2110073A priority patent/DE2110073C3/de
Priority to SU1635143A priority patent/SU564830A3/ru
Priority to JP46012142A priority patent/JPS5127116B1/ja
Priority to GB1290996D priority patent/GB1290996A/en
Application granted granted Critical
Publication of FR2082213A5 publication Critical patent/FR2082213A5/fr
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
FR7008153A 1970-03-06 1970-03-06 Expired FR2082213A5 (fr)

Priority Applications (6)

Application Number Priority Date Filing Date Title
FR7008153A FR2082213A5 (fr) 1970-03-06 1970-03-06
US122630A US3698808A (en) 1970-03-06 1971-03-01 Optical masking device
DE2110073A DE2110073C3 (de) 1970-03-06 1971-03-03 Vorrichtung zur Projektionsmaskierung einer lichtempfindlichen Schicht
SU1635143A SU564830A3 (ru) 1970-03-06 1971-03-05 Оптическа система устройства проекционной фотолитографии
JP46012142A JPS5127116B1 (fr) 1970-03-06 1971-03-06
GB1290996D GB1290996A (fr) 1970-03-06 1971-04-19

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR7008153A FR2082213A5 (fr) 1970-03-06 1970-03-06

Publications (1)

Publication Number Publication Date
FR2082213A5 true FR2082213A5 (fr) 1971-12-10

Family

ID=9051847

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7008153A Expired FR2082213A5 (fr) 1970-03-06 1970-03-06

Country Status (6)

Country Link
US (1) US3698808A (fr)
JP (1) JPS5127116B1 (fr)
DE (1) DE2110073C3 (fr)
FR (1) FR2082213A5 (fr)
GB (1) GB1290996A (fr)
SU (1) SU564830A3 (fr)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0017759A2 (fr) * 1979-04-03 1980-10-29 Eaton-Optimetrix Inc. Système amélioré d'alignement et d'exposition par projection pas à pas
US4452526A (en) * 1980-02-29 1984-06-05 Optimetrix Corporation Step-and-repeat projection alignment and exposure system with auxiliary optical unit
US4473293A (en) * 1979-04-03 1984-09-25 Optimetrix Corporation Step-and-repeat projection alignment and exposure system
FR2560397A1 (fr) * 1984-02-28 1985-08-30 Commissariat Energie Atomique Appareil de microlithographie optique a systeme d'alignement local
US4573791A (en) * 1979-04-03 1986-03-04 Optimetrix Corporation Step-and-repeat projection alignment and exposure system
US4577957A (en) * 1983-01-07 1986-03-25 Eaton-Optimetrix, Inc. Bore-sighted step-and-repeat projection alignment and exposure system
US4577958A (en) * 1982-06-18 1986-03-25 Eaton Optimetrix, Inc. Bore-sighted step-and-repeat projection alignment and exposure system
US4597664A (en) * 1980-02-29 1986-07-01 Optimetrix Corporation Step-and-repeat projection alignment and exposure system with auxiliary optical unit

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3853398A (en) * 1972-07-05 1974-12-10 Canon Kk Mask pattern printing device
US4011011A (en) * 1973-03-09 1977-03-08 The Perkin-Elmer Corporation Optical projection apparatus
US3865483A (en) * 1974-03-21 1975-02-11 Ibm Alignment illumination system
DE2413551C2 (de) * 1974-03-21 1985-03-21 Western Electric Co., Inc., New York, N.Y. Einrichtung zum Korrigieren der Lage einer lichtempfindlichen Fläche in einer Masken-Projektionsvorrichtung
US3917399A (en) * 1974-10-02 1975-11-04 Tropel Catadioptric projection printer
US4272187A (en) * 1979-12-17 1981-06-09 International Business Machines Corporation Automatic alignment of optical elements in an electrophotographic apparatus
JPS57192929A (en) * 1981-05-25 1982-11-27 Hitachi Ltd Projector provided with automatic focusing function
US5052789A (en) * 1988-09-30 1991-10-01 Storz Instrument Company Multi-user microscope with orientation adjustment and method
US5220454A (en) * 1990-03-30 1993-06-15 Nikon Corporation Cata-dioptric reduction projection optical system
USRE36740E (en) * 1990-03-30 2000-06-20 Nikon Corporation Cata-dioptric reduction projection optical system
US5402267A (en) * 1991-02-08 1995-03-28 Carl-Zeiss-Stiftung Catadioptric reduction objective
DE4203464B4 (de) * 1991-02-08 2007-02-01 Carl Zeiss Smt Ag Katadioptrisches Reduktionsobjektiv
JP3085481B2 (ja) * 1991-09-28 2000-09-11 株式会社ニコン 反射屈折縮小投影光学系、及び該光学系を備えた露光装置
JP3235077B2 (ja) * 1991-09-28 2001-12-04 株式会社ニコン 露光装置、該装置を用いた露光方法、及び該装置を用いた半導体素子製造方法
US5251070A (en) * 1991-09-28 1993-10-05 Nikon Corporation Catadioptric reduction projection optical system
US5212593A (en) * 1992-02-06 1993-05-18 Svg Lithography Systems, Inc. Broad band optical reduction system using matched multiple refractive element materials
JP2750062B2 (ja) * 1992-12-14 1998-05-13 キヤノン株式会社 反射屈折型光学系及び該光学系を備える投影露光装置
JP2698521B2 (ja) 1992-12-14 1998-01-19 キヤノン株式会社 反射屈折型光学系及び該光学系を備える投影露光装置

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0017759A2 (fr) * 1979-04-03 1980-10-29 Eaton-Optimetrix Inc. Système amélioré d'alignement et d'exposition par projection pas à pas
EP0017759A3 (en) * 1979-04-03 1981-01-14 Optimetrix Corporation Improved step-and-repeat projection alignment and exposure system
EP0111661A2 (fr) * 1979-04-03 1984-06-27 Eaton-Optimetrix Inc. Appareil d'impression photométrique
US4473293A (en) * 1979-04-03 1984-09-25 Optimetrix Corporation Step-and-repeat projection alignment and exposure system
EP0111661A3 (fr) * 1979-04-03 1984-09-26 Eaton-Optimetrix Inc. Appareil d'impression photométrique
US4573791A (en) * 1979-04-03 1986-03-04 Optimetrix Corporation Step-and-repeat projection alignment and exposure system
US4452526A (en) * 1980-02-29 1984-06-05 Optimetrix Corporation Step-and-repeat projection alignment and exposure system with auxiliary optical unit
US4597664A (en) * 1980-02-29 1986-07-01 Optimetrix Corporation Step-and-repeat projection alignment and exposure system with auxiliary optical unit
US4577958A (en) * 1982-06-18 1986-03-25 Eaton Optimetrix, Inc. Bore-sighted step-and-repeat projection alignment and exposure system
US4577957A (en) * 1983-01-07 1986-03-25 Eaton-Optimetrix, Inc. Bore-sighted step-and-repeat projection alignment and exposure system
FR2560397A1 (fr) * 1984-02-28 1985-08-30 Commissariat Energie Atomique Appareil de microlithographie optique a systeme d'alignement local
EP0156683A1 (fr) * 1984-02-28 1985-10-02 Commissariat A L'energie Atomique Appareil de microlithographie optique à système d'alignement local

Also Published As

Publication number Publication date
SU564830A3 (ru) 1977-07-05
DE2110073B2 (de) 1975-01-02
GB1290996A (fr) 1972-09-27
JPS5127116B1 (fr) 1976-08-10
DE2110073C3 (de) 1975-08-28
DE2110073A1 (de) 1971-09-16
US3698808A (en) 1972-10-17

Similar Documents

Publication Publication Date Title
FR2082213A5 (fr)
AR204384A1 (fr)
ATA96471A (fr)
AU1146470A (fr)
AU1473870A (fr)
AU1326870A (fr)
AU2017870A (fr)
AU2085370A (fr)
AU1833270A (fr)
AU1716970A (fr)
AU1517670A (fr)
AU1336970A (fr)
AU1591370A (fr)
AU1872870A (fr)
AU2144270A (fr)
AU1247570A (fr)
AU1328670A (fr)
AU1235770A (fr)
AU1343870A (fr)
AU1189670A (fr)
AU2131570A (fr)
AU2130770A (fr)
AU1581370A (fr)
AU1969370A (fr)
AU1603270A (fr)

Legal Events

Date Code Title Description
ST Notification of lapse