AU2001255612A1 - Optical reduction system with control of illumination polarization - Google Patents

Optical reduction system with control of illumination polarization

Info

Publication number
AU2001255612A1
AU2001255612A1 AU2001255612A AU5561201A AU2001255612A1 AU 2001255612 A1 AU2001255612 A1 AU 2001255612A1 AU 2001255612 A AU2001255612 A AU 2001255612A AU 5561201 A AU5561201 A AU 5561201A AU 2001255612 A1 AU2001255612 A1 AU 2001255612A1
Authority
AU
Australia
Prior art keywords
control
reduction system
optical reduction
illumination polarization
polarization
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2001255612A
Inventor
Justin L. Kreuzer
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ASML US Inc
Original Assignee
ASML US Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ASML US Inc filed Critical ASML US Inc
Publication of AU2001255612A1 publication Critical patent/AU2001255612A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0892—Catadioptric systems specially adapted for the UV
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/28—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising
    • G02B27/286—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising for controlling or changing the state of polarisation, e.g. transforming one polarisation state into another
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/30—Polarising elements
    • G02B5/3083—Birefringent or phase retarding elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70566—Polarisation control
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
    • G03F7/70966—Birefringence
AU2001255612A 2000-04-25 2001-04-25 Optical reduction system with control of illumination polarization Abandoned AU2001255612A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US19938100P 2000-04-25 2000-04-25
US60/199,381 2000-04-25
PCT/US2001/013142 WO2001081977A2 (en) 2000-04-25 2001-04-25 Optical reduction system with control of illumination polarization

Publications (1)

Publication Number Publication Date
AU2001255612A1 true AU2001255612A1 (en) 2001-11-07

Family

ID=22737268

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2001255612A Abandoned AU2001255612A1 (en) 2000-04-25 2001-04-25 Optical reduction system with control of illumination polarization

Country Status (7)

Country Link
US (2) US6680798B2 (en)
EP (1) EP1277073B1 (en)
JP (1) JP2003532281A (en)
KR (1) KR100894303B1 (en)
AU (1) AU2001255612A1 (en)
DE (1) DE60124524T2 (en)
WO (1) WO2001081977A2 (en)

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US6680798B2 (en) * 2000-04-25 2004-01-20 Asml Holding N.V. Optical reduction system with control of illumination polarization
KR100783669B1 (en) * 2000-04-25 2007-12-07 에이에스엠엘 유에스, 인크. Optical Reduction System With Elimination of Reticle Diffraction Induced Bias
CN101813802A (en) * 2002-04-26 2010-08-25 爱普生拓优科梦株式会社 Laminate wavelength plate and optical pickup using it
JP4735258B2 (en) 2003-04-09 2011-07-27 株式会社ニコン Exposure method and apparatus, and device manufacturing method
TWI474132B (en) 2003-10-28 2015-02-21 尼康股份有限公司 Optical illumination device, projection exposure device, exposure method and device manufacturing method
TWI612338B (en) 2003-11-20 2018-01-21 尼康股份有限公司 Optical illuminating apparatus, exposure device, exposure method, and device manufacturing method
TWI395068B (en) * 2004-01-27 2013-05-01 尼康股份有限公司 Optical system, exposure device and method of exposure
TWI360837B (en) 2004-02-06 2012-03-21 Nikon Corp Polarization changing device, optical illumination
DE102004010569A1 (en) * 2004-02-26 2005-09-15 Carl Zeiss Smt Ag Illumination system for a microlithography projection exposure apparatus
KR100632677B1 (en) * 2004-05-29 2006-10-12 동부일렉트로닉스 주식회사 Lithography apparatus capable of controlling transmitted light intensity
US7245353B2 (en) * 2004-10-12 2007-07-17 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method
TWI423301B (en) * 2005-01-21 2014-01-11 尼康股份有限公司 Illumination optical device, exposure device, exposure method and fabricating method of device
US7324185B2 (en) 2005-03-04 2008-01-29 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7403267B2 (en) * 2005-03-31 2008-07-22 Asml Netherlands B.V. System and method for providing modified illumination intensity
US20080186466A1 (en) * 2005-04-12 2008-08-07 Sirat Gabriel Y Element for defocusing tm mode for lithography
US8248577B2 (en) 2005-05-03 2012-08-21 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
KR101544336B1 (en) 2005-05-12 2015-08-12 가부시키가이샤 니콘 Projection optical system, exposure apparatus and exposure method
US7382535B2 (en) * 2005-10-04 2008-06-03 The Boeing Company Wave plate and associated method
JP2009510792A (en) * 2005-10-04 2009-03-12 カール・ツァイス・エスエムティー・アーゲー Lithographic apparatus and control method
KR20080066041A (en) * 2005-11-10 2008-07-15 가부시키가이샤 니콘 Lighting optical system, exposure system, and exposure method
US7491928B2 (en) * 2005-12-05 2009-02-17 New York University Extended optical traps by shape-phase holography
JP2007189079A (en) * 2006-01-13 2007-07-26 Canon Inc Illuminating optical system, exposure device having it, and manufacturing method of device
WO2007096250A1 (en) * 2006-02-21 2007-08-30 Carl Zeiss Smt Ag Illumination device of a microlithographic projection exposure apparatus
US7511826B2 (en) * 2006-02-27 2009-03-31 Asml Holding N.V. Symmetrical illumination forming system and method
FR2902523B1 (en) * 2006-06-16 2008-09-05 Inst Nat Polytech Grenoble ELECTRO-OPTICAL SENSOR FOR VECTOR MEASUREMENT OF AN ELECTROMAGNETIC FIELD
FR2902522B1 (en) * 2006-06-16 2008-09-05 Inst Nat Polytech Grenoble ELECTRO-OPTICAL PROBE FOR MEASURING TEMPERATURE AND ELECTROMAGNETIC FIELD
DE102006038398A1 (en) * 2006-08-15 2008-02-21 Carl Zeiss Smt Ag Projection objective for microlithographic projection exposure apparatus, has lens composed of lens elements which are arranged to follow each other along optical axis, where lens has curved lens surfaces put together by elements
JP2008070730A (en) * 2006-09-15 2008-03-27 Sony Corp Mask blanks selection method, calculation method for birefringence index, lithographic method, mask blanks selecting device, birefringence index calculation device and program therefor
US8596783B1 (en) 2006-12-05 2013-12-03 Michael Cain Finley Light control system and associated methods
US7872731B2 (en) * 2007-04-20 2011-01-18 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP2009025553A (en) * 2007-07-19 2009-02-05 Canon Inc Phase shift mask
JP5267029B2 (en) 2007-10-12 2013-08-21 株式会社ニコン Illumination optical apparatus, exposure apparatus, and device manufacturing method
US8379187B2 (en) 2007-10-24 2013-02-19 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
DE102007055567A1 (en) * 2007-11-20 2009-05-28 Carl Zeiss Smt Ag Optical system
WO2010101671A1 (en) 2009-01-16 2010-09-10 New York University Automated real-time particle characterization and three-dimensional velocimetry with holographic video microscopy
US20110037962A1 (en) * 2009-08-17 2011-02-17 Nikon Corporation Polarization converting unit, illumination optical system, exposure apparatus, and device manufacturing method
US20110205519A1 (en) * 2010-02-25 2011-08-25 Nikon Corporation Polarization converting unit, illumination optical system, exposure apparatus, and device manufacturing method
JP6069195B2 (en) 2010-06-29 2017-02-01 アイマックス コーポレイション Optical system including polarization-modifying optical device, projection system, polarization output method, and calibration method for the same
CA2846670A1 (en) * 2011-09-02 2013-03-07 Universite Laval Polarization-maintaining module for making optical systems polarization-independent
DE102012206150B9 (en) 2012-04-16 2014-06-12 Carl Zeiss Smt Gmbh Optical system, in particular a microlithographic projection exposure apparatus
US9075201B2 (en) * 2012-10-04 2015-07-07 Tera Xtal Technology Corporation Polarization conversion mechanism and method thereof
EP3076160A1 (en) * 2015-03-31 2016-10-05 Nederlandse Organisatie voor toegepast- natuurwetenschappelijk onderzoek TNO Spatially resolved aerosol detection
DK3414517T3 (en) 2016-02-08 2021-12-13 Univ New York HOLOGRAPHIC CHARACTERIZATION OF PROTEIN UNITS
JP6441383B2 (en) * 2016-03-21 2018-12-19 シェンゼン ドロドロ ニュー テクノロジー カンパニー リミテッド Short-range optical amplification module, glasses, helmet, and VR system
CN105865749B (en) * 2016-05-10 2018-07-03 中国科学院西安光学精密机械研究所 The object simulation device that a kind of graticle can spin
US11543338B2 (en) 2019-10-25 2023-01-03 New York University Holographic characterization of irregular particles
US11948302B2 (en) 2020-03-09 2024-04-02 New York University Automated holographic video microscopy assay

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US6680798B2 (en) * 2000-04-25 2004-01-20 Asml Holding N.V. Optical reduction system with control of illumination polarization

Also Published As

Publication number Publication date
EP1277073B1 (en) 2006-11-15
EP1277073A2 (en) 2003-01-22
WO2001081977A2 (en) 2001-11-01
DE60124524D1 (en) 2006-12-28
KR100894303B1 (en) 2009-04-24
US7239446B2 (en) 2007-07-03
US6680798B2 (en) 2004-01-20
DE60124524T2 (en) 2007-03-08
KR20020054272A (en) 2002-07-06
US20040120044A1 (en) 2004-06-24
US20020027719A1 (en) 2002-03-07
JP2003532281A (en) 2003-10-28
WO2001081977A3 (en) 2002-08-29

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