DE2525205C2 - Anordnung zum Konstanthalten der Gesamtstrahlstromstärke eines Ladungsträgerstrahls bei gleichzeitiger Aufrechterhaltung einer symmetrischen Stromdichteverteilung des Ladungsträgerstrahls - Google Patents
Anordnung zum Konstanthalten der Gesamtstrahlstromstärke eines Ladungsträgerstrahls bei gleichzeitiger Aufrechterhaltung einer symmetrischen Stromdichteverteilung des LadungsträgerstrahlsInfo
- Publication number
- DE2525205C2 DE2525205C2 DE2525205A DE2525205A DE2525205C2 DE 2525205 C2 DE2525205 C2 DE 2525205C2 DE 2525205 A DE2525205 A DE 2525205A DE 2525205 A DE2525205 A DE 2525205A DE 2525205 C2 DE2525205 C2 DE 2525205C2
- Authority
- DE
- Germany
- Prior art keywords
- current
- line
- output
- flip
- flop
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000002800 charge carrier Substances 0.000 title claims 10
- 238000012937 correction Methods 0.000 claims description 49
- 238000010438 heat treatment Methods 0.000 claims description 9
- 238000010894 electron beam technology Methods 0.000 claims description 4
- 239000004065 semiconductor Substances 0.000 claims description 3
- 238000010586 diagram Methods 0.000 claims 5
- 230000001276 controlling effect Effects 0.000 claims 2
- 238000000034 method Methods 0.000 claims 2
- 239000000463 material Substances 0.000 claims 1
- 238000012544 monitoring process Methods 0.000 claims 1
- 230000000737 periodic effect Effects 0.000 claims 1
- 230000001105 regulatory effect Effects 0.000 claims 1
- 238000005070 sampling Methods 0.000 description 14
- 230000007423 decrease Effects 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 230000010355 oscillation Effects 0.000 description 2
- 230000005855 radiation Effects 0.000 description 2
- 230000007704 transition Effects 0.000 description 2
- 239000011810 insulating material Substances 0.000 description 1
- 239000010445 mica Substances 0.000 description 1
- 229910052618 mica group Inorganic materials 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
- H01J37/1471—Arrangements for directing or deflecting the discharge along a desired path for centering, aligning or positioning of ray or beam
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electron Beam Exposure (AREA)
- Electron Sources, Ion Sources (AREA)
- Particle Accelerators (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US05/492,096 US4000440A (en) | 1974-07-26 | 1974-07-26 | Method and apparatus for controlling brightness and alignment of a beam of charged particles |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| DE2525205A1 DE2525205A1 (de) | 1976-02-12 |
| DE2525205C2 true DE2525205C2 (de) | 1983-05-19 |
Family
ID=23954926
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE2525205A Expired DE2525205C2 (de) | 1974-07-26 | 1975-06-06 | Anordnung zum Konstanthalten der Gesamtstrahlstromstärke eines Ladungsträgerstrahls bei gleichzeitiger Aufrechterhaltung einer symmetrischen Stromdichteverteilung des Ladungsträgerstrahls |
Country Status (11)
| Country | Link |
|---|---|
| US (1) | US4000440A (enExample) |
| JP (1) | JPS5342675B2 (enExample) |
| BR (1) | BR7504789A (enExample) |
| CA (2) | CA1041178A (enExample) |
| CH (1) | CH587560A5 (enExample) |
| DE (1) | DE2525205C2 (enExample) |
| ES (1) | ES439704A1 (enExample) |
| FR (1) | FR2280134A1 (enExample) |
| IT (1) | IT1039024B (enExample) |
| NL (1) | NL7508942A (enExample) |
| SE (1) | SE401883B (enExample) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL177578C (nl) * | 1976-05-14 | 1985-10-16 | Thomson Csf | Inrichting voor het beschrijven van een voorwerp met een deeltjesbundel. |
| US4126814A (en) * | 1976-12-09 | 1978-11-21 | Rca Corporation | Electron gun control system |
| US4424448A (en) * | 1979-12-26 | 1984-01-03 | Tokyo Shibaura Denki Kabushiki Kaisha | Electron beam apparatus |
| US4376249A (en) * | 1980-11-06 | 1983-03-08 | International Business Machines Corporation | Variable axis electron beam projection system |
| JPS58106747A (ja) * | 1981-12-18 | 1983-06-25 | Hitachi Ltd | 荷電粒子線集束系の自動軸合せ装置 |
| US4475045A (en) * | 1982-05-24 | 1984-10-02 | Varian Associates, Inc. | Rapid pumpdown for high vacuum processing |
| US4568861A (en) * | 1983-06-27 | 1986-02-04 | International Business Machines Corporation | Method and apparatus for controlling alignment and brightness of an electron beam |
| US5466904A (en) * | 1993-12-23 | 1995-11-14 | International Business Machines Corporation | Electron beam lithography system |
| US6456019B1 (en) | 2001-02-03 | 2002-09-24 | Nikon Corporation | Real time measurement of leakage current in high voltage electron guns |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3345529A (en) * | 1966-08-29 | 1967-10-03 | Ibm | Electron beam column with demountable flux-generating assembly and beam-forming elements |
| NL6807439A (enExample) * | 1968-05-27 | 1969-12-01 | ||
| US3644700A (en) * | 1969-12-15 | 1972-02-22 | Ibm | Method and apparatus for controlling an electron beam |
| US3619717A (en) * | 1970-03-02 | 1971-11-09 | Gen Electric | Electron beam current regulator for a light valve |
| JPS5143940B2 (enExample) * | 1972-04-07 | 1976-11-25 |
-
1974
- 1974-07-26 US US05/492,096 patent/US4000440A/en not_active Expired - Lifetime
-
1975
- 1975-06-06 DE DE2525205A patent/DE2525205C2/de not_active Expired
- 1975-06-09 FR FR7518980A patent/FR2280134A1/fr active Granted
- 1975-06-17 IT IT24417/75A patent/IT1039024B/it active
- 1975-06-24 JP JP7712275A patent/JPS5342675B2/ja not_active Expired
- 1975-06-30 CH CH844675A patent/CH587560A5/xx not_active IP Right Cessation
- 1975-07-15 CA CA231,509A patent/CA1041178A/en not_active Expired
- 1975-07-24 SE SE7508426A patent/SE401883B/xx not_active IP Right Cessation
- 1975-07-24 ES ES439704A patent/ES439704A1/es not_active Expired
- 1975-07-25 NL NL7508942A patent/NL7508942A/xx not_active Application Discontinuation
- 1975-07-25 BR BR7504789*A patent/BR7504789A/pt unknown
-
1978
- 1978-03-13 CA CA298796A patent/CA1054682A/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| SE401883B (sv) | 1978-05-29 |
| JPS5342675B2 (enExample) | 1978-11-14 |
| US4000440A (en) | 1976-12-28 |
| CA1054682A (en) | 1979-05-15 |
| DE2525205A1 (de) | 1976-02-12 |
| SE7508426L (sv) | 1976-01-27 |
| CA1041178A (en) | 1978-10-24 |
| CH587560A5 (enExample) | 1977-05-13 |
| FR2280134B1 (enExample) | 1977-12-09 |
| JPS5119977A (enExample) | 1976-02-17 |
| IT1039024B (it) | 1979-12-10 |
| ES439704A1 (es) | 1977-03-01 |
| FR2280134A1 (fr) | 1976-02-20 |
| BR7504789A (pt) | 1976-07-06 |
| NL7508942A (nl) | 1976-01-28 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| D2 | Grant after examination | ||
| 8364 | No opposition during term of opposition | ||
| 8339 | Ceased/non-payment of the annual fee |