DE2462101A1 - Verfahren zur herstellung strahlungsempfindlicher, loeslicher polymerer verbindungen - Google Patents

Verfahren zur herstellung strahlungsempfindlicher, loeslicher polymerer verbindungen

Info

Publication number
DE2462101A1
DE2462101A1 DE19742462101 DE2462101A DE2462101A1 DE 2462101 A1 DE2462101 A1 DE 2462101A1 DE 19742462101 DE19742462101 DE 19742462101 DE 2462101 A DE2462101 A DE 2462101A DE 2462101 A1 DE2462101 A1 DE 2462101A1
Authority
DE
Germany
Prior art keywords
radiation
groups
sensitive
ester
relief structures
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
DE19742462101
Other languages
German (de)
English (en)
Other versions
DE2462101B2 (cs
DE2462101C3 (cs
Inventor
Wolfgang Dr Kleeberg
Eberhard Kuehn
Roland Dr Rubner
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Siemens Corp
Original Assignee
Siemens Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siemens Corp filed Critical Siemens Corp
Priority to DE19742462101 priority Critical patent/DE2462101A1/de
Publication of DE2462101A1 publication Critical patent/DE2462101A1/de
Publication of DE2462101B2 publication Critical patent/DE2462101B2/de
Application granted granted Critical
Publication of DE2462101C3 publication Critical patent/DE2462101C3/de
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
DE19742462101 1974-08-02 1974-08-02 Verfahren zur herstellung strahlungsempfindlicher, loeslicher polymerer verbindungen Granted DE2462101A1 (de)

Priority Applications (1)

Application Number Priority Date Filing Date Title
DE19742462101 DE2462101A1 (de) 1974-08-02 1974-08-02 Verfahren zur herstellung strahlungsempfindlicher, loeslicher polymerer verbindungen

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19742462101 DE2462101A1 (de) 1974-08-02 1974-08-02 Verfahren zur herstellung strahlungsempfindlicher, loeslicher polymerer verbindungen

Publications (3)

Publication Number Publication Date
DE2462101A1 true DE2462101A1 (de) 1976-04-29
DE2462101B2 DE2462101B2 (cs) 1979-05-23
DE2462101C3 DE2462101C3 (cs) 1980-02-14

Family

ID=5934868

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19742462101 Granted DE2462101A1 (de) 1974-08-02 1974-08-02 Verfahren zur herstellung strahlungsempfindlicher, loeslicher polymerer verbindungen

Country Status (1)

Country Link
DE (1) DE2462101A1 (cs)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0140273A3 (en) * 1983-11-01 1987-06-24 Allied Corporation Positive photoresist compositions having deep uv response, photosensitive elements and thermally stable photochemically imaged systems containing same
EP0187517A3 (en) * 1984-12-28 1987-10-28 Eastman Kodak Company High-temperature resistant, selectively developable resist

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0140273A3 (en) * 1983-11-01 1987-06-24 Allied Corporation Positive photoresist compositions having deep uv response, photosensitive elements and thermally stable photochemically imaged systems containing same
EP0187517A3 (en) * 1984-12-28 1987-10-28 Eastman Kodak Company High-temperature resistant, selectively developable resist

Also Published As

Publication number Publication date
DE2462101B2 (cs) 1979-05-23
DE2462101C3 (cs) 1980-02-14

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Legal Events

Date Code Title Description
C3 Grant after two publication steps (3rd publication)
8340 Patent of addition ceased/non-payment of fee of main patent