DE2421834B2 - Verfahren zur herstellung einer von einem substrat getragenen gemusterten schicht - Google Patents

Verfahren zur herstellung einer von einem substrat getragenen gemusterten schicht

Info

Publication number
DE2421834B2
DE2421834B2 DE19742421834 DE2421834A DE2421834B2 DE 2421834 B2 DE2421834 B2 DE 2421834B2 DE 19742421834 DE19742421834 DE 19742421834 DE 2421834 A DE2421834 A DE 2421834A DE 2421834 B2 DE2421834 B2 DE 2421834B2
Authority
DE
Germany
Prior art keywords
layer
energy
pattern
wave energy
electromagnetic wave
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
DE19742421834
Other languages
German (de)
English (en)
Other versions
DE2421834A1 (de
Inventor
Guenther William Watchung; Rousseau Denis Lawrence; Sinclair William Robert; Summit; NJ. Kammlott (V.St.A.)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AT&T Inc
Original Assignee
Western Electric Co Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US00358729A external-priority patent/US3833396A/en
Priority claimed from US00358727A external-priority patent/US3837855A/en
Application filed by Western Electric Co Inc filed Critical Western Electric Co Inc
Publication of DE2421834A1 publication Critical patent/DE2421834A1/de
Publication of DE2421834B2 publication Critical patent/DE2421834B2/de
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2037—Exposure with X-ray radiation or corpuscular radiation, through a mask with a pattern opaque to that radiation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0042—Photosensitive materials with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists
    • G03F7/0043—Chalcogenides; Silicon, germanium, arsenic or derivatives thereof; Metals, oxides or alloys thereof
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0002—Apparatus or processes for manufacturing printed circuits for manufacturing artworks for printed circuits
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/05—Patterning and lithography; Masks; Details of resist
    • H05K2203/0548—Masks
    • H05K2203/056—Using an artwork, i.e. a photomask for exposing photosensitive layers

Landscapes

  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Metallurgy (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Thermal Transfer Or Thermal Recording In General (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Laminated Bodies (AREA)
DE19742421834 1973-05-09 1974-05-06 Verfahren zur herstellung einer von einem substrat getragenen gemusterten schicht Pending DE2421834B2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US00358729A US3833396A (en) 1973-05-09 1973-05-09 Pattern delineation method and product so produced
US00358727A US3837855A (en) 1973-05-09 1973-05-09 Pattern delineation method and product so produced

Publications (2)

Publication Number Publication Date
DE2421834A1 DE2421834A1 (de) 1974-12-05
DE2421834B2 true DE2421834B2 (de) 1976-01-22

Family

ID=27000166

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19742421834 Pending DE2421834B2 (de) 1973-05-09 1974-05-06 Verfahren zur herstellung einer von einem substrat getragenen gemusterten schicht

Country Status (4)

Country Link
JP (1) JPS5019427A (enExample)
DE (1) DE2421834B2 (enExample)
FR (1) FR2229142A1 (enExample)
NL (1) NL7406178A (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59146954A (ja) * 1982-12-28 1984-08-23 Seiko Epson Corp シ−スル−マスク
JPS6068992A (ja) * 1983-09-27 1985-04-19 Mitsui Toatsu Chem Inc 画像形成方法
KR102352740B1 (ko) * 2015-04-30 2022-01-18 삼성디스플레이 주식회사 마스크의 제조 방법 및 표시 장치의 제조 방법

Also Published As

Publication number Publication date
DE2421834A1 (de) 1974-12-05
JPS5019427A (enExample) 1975-02-28
NL7406178A (enExample) 1974-11-12
FR2229142A1 (enExample) 1974-12-06

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