DE2130283A1 - Vinylpolymere,Verfahren zur Herstellung derselben und diese Polymeren enthaltende photosensitive Zusammensetzungen - Google Patents

Vinylpolymere,Verfahren zur Herstellung derselben und diese Polymeren enthaltende photosensitive Zusammensetzungen

Info

Publication number
DE2130283A1
DE2130283A1 DE19712130283 DE2130283A DE2130283A1 DE 2130283 A1 DE2130283 A1 DE 2130283A1 DE 19712130283 DE19712130283 DE 19712130283 DE 2130283 A DE2130283 A DE 2130283A DE 2130283 A1 DE2130283 A1 DE 2130283A1
Authority
DE
Germany
Prior art keywords
alkali
group
soluble
vinyl polymers
photosensitive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
DE19712130283
Other languages
German (de)
English (en)
Inventor
Takateru Asano
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fuji Chemical Industries Co Ltd
Original Assignee
Fuji Chemical Industries Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Chemical Industries Co Ltd filed Critical Fuji Chemical Industries Co Ltd
Publication of DE2130283A1 publication Critical patent/DE2130283A1/de
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00—Chemical modification by after-treatment

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Physics & Mathematics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Phenolic Resins Or Amino Resins (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
DE19712130283 1970-06-19 1971-06-18 Vinylpolymere,Verfahren zur Herstellung derselben und diese Polymeren enthaltende photosensitive Zusammensetzungen Pending DE2130283A1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5384770A JPS508658B1 (enrdf_load_stackoverflow) 1970-06-19 1970-06-19

Publications (1)

Publication Number Publication Date
DE2130283A1 true DE2130283A1 (de) 1971-12-23

Family

ID=12954149

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19712130283 Pending DE2130283A1 (de) 1970-06-19 1971-06-18 Vinylpolymere,Verfahren zur Herstellung derselben und diese Polymeren enthaltende photosensitive Zusammensetzungen

Country Status (2)

Country Link
JP (1) JPS508658B1 (enrdf_load_stackoverflow)
DE (1) DE2130283A1 (enrdf_load_stackoverflow)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2322230A1 (de) * 1972-05-05 1973-11-22 Oce Van Der Grinten Nv Lichtempfindliche praeparate
FR2483638A1 (fr) * 1980-04-17 1981-12-04 Agency Ind Science Techn Matieres resineuses photosensibles
EP0077057A1 (en) * 1981-10-09 1983-04-20 Dai Nippon Insatsu Kabushiki Kaisha Negative-type resist sensitive to ionizing radiation
US4536465A (en) * 1982-01-08 1985-08-20 Konishiroku Photo Industry Co., Ltd. Positive-working photosensitive composition with o-quinone diazide and admixture of resins
US5264319A (en) * 1985-05-10 1993-11-23 Hitachi, Ltd. Photosensitive resin composition having high resistance to oxygen plasma, containing alkali-soluble organosilicon polymer and photosensitive dissolution inhibitor
EP0594026A3 (de) * 1992-10-19 1994-10-26 Hoechst Ag Polyvinylacetale, die emulgatorfreie wässrige Dispersionen und redispergierbare trockene Pulver bilden können, Verfahren zu ihrer Herstellung und ihre Verwendung.
WO2010080102A3 (en) * 2008-12-19 2010-10-07 Eastman Kodak Company Radiation- sensitive compositions and elements containing poly(vinyl hydroxyaryl carboxylic acid esters)
WO2011031508A1 (en) * 2009-09-08 2011-03-17 Eastman Kodak Company Positive-working radiation-sensitive imageable elements

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2322230A1 (de) * 1972-05-05 1973-11-22 Oce Van Der Grinten Nv Lichtempfindliche praeparate
FR2483638A1 (fr) * 1980-04-17 1981-12-04 Agency Ind Science Techn Matieres resineuses photosensibles
EP0077057A1 (en) * 1981-10-09 1983-04-20 Dai Nippon Insatsu Kabushiki Kaisha Negative-type resist sensitive to ionizing radiation
US4536465A (en) * 1982-01-08 1985-08-20 Konishiroku Photo Industry Co., Ltd. Positive-working photosensitive composition with o-quinone diazide and admixture of resins
US5264319A (en) * 1985-05-10 1993-11-23 Hitachi, Ltd. Photosensitive resin composition having high resistance to oxygen plasma, containing alkali-soluble organosilicon polymer and photosensitive dissolution inhibitor
EP0594026A3 (de) * 1992-10-19 1994-10-26 Hoechst Ag Polyvinylacetale, die emulgatorfreie wässrige Dispersionen und redispergierbare trockene Pulver bilden können, Verfahren zu ihrer Herstellung und ihre Verwendung.
WO2010080102A3 (en) * 2008-12-19 2010-10-07 Eastman Kodak Company Radiation- sensitive compositions and elements containing poly(vinyl hydroxyaryl carboxylic acid esters)
US8048609B2 (en) 2008-12-19 2011-11-01 Eastman Kodak Company Radiation-sensitive compositions and elements containing poly(vinyl hydroxyaryl carboxylic acid ester)s
CN102256792B (zh) * 2008-12-19 2014-08-20 伊斯曼柯达公司 阳图制版可成像元件及其制造方法
WO2011031508A1 (en) * 2009-09-08 2011-03-17 Eastman Kodak Company Positive-working radiation-sensitive imageable elements
US8298750B2 (en) 2009-09-08 2012-10-30 Eastman Kodak Company Positive-working radiation-sensitive imageable elements

Also Published As

Publication number Publication date
JPS508658B1 (enrdf_load_stackoverflow) 1975-04-05

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