DE1939667B2 - Verfahren zur kontinuierlichen messung der dicke einer duennschicht - Google Patents

Verfahren zur kontinuierlichen messung der dicke einer duennschicht

Info

Publication number
DE1939667B2
DE1939667B2 DE19691939667 DE1939667A DE1939667B2 DE 1939667 B2 DE1939667 B2 DE 1939667B2 DE 19691939667 DE19691939667 DE 19691939667 DE 1939667 A DE1939667 A DE 1939667A DE 1939667 B2 DE1939667 B2 DE 1939667B2
Authority
DE
Germany
Prior art keywords
thickness
thin film
continuous measurement
measurement
continuous
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
DE19691939667
Other languages
English (en)
Other versions
DE1939667A1 (de
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of DE1939667A1 publication Critical patent/DE1939667A1/de
Publication of DE1939667B2 publication Critical patent/DE1939667B2/de
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
    • G01B11/0675—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating using interferometry
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/542—Controlling the film thickness or evaporation rate
    • C23C14/545—Controlling the film thickness or evaporation rate using measurement on deposited material
    • C23C14/547—Controlling the film thickness or evaporation rate using measurement on deposited material using optical methods
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/52—Controlling or regulating the coating process
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
    • Y10T428/263—Coating layer not in excess of 5 mils thick or equivalent
    • Y10T428/264—Up to 3 mils
    • Y10T428/265—1 mil or less

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Physical Vapour Deposition (AREA)
DE19691939667 1968-08-09 1969-08-05 Verfahren zur kontinuierlichen messung der dicke einer duennschicht Withdrawn DE1939667B2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US75159768A 1968-08-09 1968-08-09

Publications (2)

Publication Number Publication Date
DE1939667A1 DE1939667A1 (de) 1970-02-26
DE1939667B2 true DE1939667B2 (de) 1971-03-04

Family

ID=25022717

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19691939667 Withdrawn DE1939667B2 (de) 1968-08-09 1969-08-05 Verfahren zur kontinuierlichen messung der dicke einer duennschicht

Country Status (7)

Country Link
US (1) US3620814A (de)
BE (1) BE737138A (de)
DE (1) DE1939667B2 (de)
FR (1) FR2015389A1 (de)
GB (1) GB1283111A (de)
NL (1) NL6911919A (de)
SE (1) SE352955B (de)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3804532A (en) * 1972-08-03 1974-04-16 Us Navy Transparent film uniformity gauge
US4203799A (en) * 1975-05-30 1980-05-20 Hitachi, Ltd. Method for monitoring thickness of epitaxial growth layer on substrate
US3987214A (en) * 1975-09-19 1976-10-19 Rca Corporation Method of forming conductive coatings of predetermined thickness by vacuum depositing conductive coating on a measuring body
NL7605234A (nl) * 1976-05-17 1977-11-21 Philips Nv Werkwijze voor het vervaardigen van een halfge- leiderinrichting en halfgeleiderinrichting ver- vaardigd met behulp van de werkwijze.
NL7710164A (nl) * 1977-09-16 1979-03-20 Philips Nv Werkwijze ter behandeling van een eenkristal- lijn lichaam.
US4340617A (en) * 1980-05-19 1982-07-20 Massachusetts Institute Of Technology Method and apparatus for depositing a material on a surface
JPS58115306A (ja) * 1981-12-29 1983-07-09 Chugai Ro Kogyo Kaisha Ltd 塗膜厚連続測定装置
US4615904A (en) * 1982-06-01 1986-10-07 Massachusetts Institute Of Technology Maskless growth of patterned films
EP0110882A1 (de) * 1982-06-01 1984-06-20 Massachusetts Institute Of Technology Maskenlose erzeugung gemusterter schichten
US4542580A (en) * 1983-02-14 1985-09-24 Prime Computer, Inc. Method of fabricating n-type silicon regions and associated contacts
GB8510355D0 (en) * 1985-04-23 1985-05-30 Bicc Plc Testing of electrical cable
DE3805068A1 (de) * 1988-02-18 1989-08-31 Gebhard Birkle Verfahren und vorrichtung zum optischen abtasten einer objektebene zwecks erkennung sich aendernder ueberhoehungen auf dieser ebene
DE4017440C2 (de) * 1990-05-30 1994-02-10 Fraunhofer Ges Forschung Verfahren zur Messung der Schichtdicke und des Brechungsindex einer dünnen Schicht auf einem Substrat und Vorrichtung zur Durchführung des Verfahrens
DE4030801C2 (de) * 1990-09-28 1998-02-05 Siemens Ag Meßanordnung zur berührungslosen Bestimmung der Dicke und/oder thermischen Eigenschaften von Folien und dünnen Oberflächenbeschichtungen
DE69209270T2 (de) * 1991-12-13 1996-08-08 Kawasaki Steel Co Verfahren und Vorrichtung zur Prozesssteuerung eines Strahlung aussendenden Materials
US5843232A (en) * 1995-11-02 1998-12-01 General Electric Company Measuring deposit thickness in composite materials production
US6319732B1 (en) * 1997-01-21 2001-11-20 Sekidenko, Inc. Method for controlling the temperature of a layer growing on a wafer
US6731386B2 (en) * 2001-01-04 2004-05-04 Agere Systems Inc. Measurement technique for ultra-thin oxides
DE102011077567B4 (de) * 2011-06-15 2013-05-29 Leibniz-Institut Für Polymerforschung Dresden E.V. Verfahren und vorrichtung zur ermittlung der oberflächentopografie von beschichteten, reflektierenden oberflächen
CN115491663B (zh) * 2022-11-21 2023-03-24 常州翊迈新材料科技有限公司 燃料电池金属极板涂层厚度在线监控装置

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE607571A (de) * 1960-09-09

Also Published As

Publication number Publication date
DE1939667A1 (de) 1970-02-26
FR2015389A1 (de) 1970-04-24
BE737138A (de) 1970-01-16
NL6911919A (de) 1970-02-11
GB1283111A (en) 1972-07-26
US3620814A (en) 1971-11-16
SE352955B (de) 1973-01-15

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Legal Events

Date Code Title Description
E77 Valid patent as to the heymanns-index 1977
8339 Ceased/non-payment of the annual fee