DE1934328A1 - Vorrichtung zur wahlweisen Zerstaeubung fester Substanzen durch Ionenbeschuss nach der Plasma- oder Ionenstrahlmethode - Google Patents
Vorrichtung zur wahlweisen Zerstaeubung fester Substanzen durch Ionenbeschuss nach der Plasma- oder IonenstrahlmethodeInfo
- Publication number
- DE1934328A1 DE1934328A1 DE19691934328 DE1934328A DE1934328A1 DE 1934328 A1 DE1934328 A1 DE 1934328A1 DE 19691934328 DE19691934328 DE 19691934328 DE 1934328 A DE1934328 A DE 1934328A DE 1934328 A1 DE1934328 A1 DE 1934328A1
- Authority
- DE
- Germany
- Prior art keywords
- atomization
- electrode
- suction
- discharge system
- cathode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000889 atomisation Methods 0.000 title claims description 37
- 238000000034 method Methods 0.000 title claims description 22
- 238000010884 ion-beam technique Methods 0.000 title claims description 17
- 239000000126 substance Substances 0.000 title claims description 8
- 239000007787 solid Substances 0.000 title claims description 5
- 238000010849 ion bombardment Methods 0.000 title claims description 4
- 150000002500 ions Chemical class 0.000 claims description 22
- 229910052751 metal Inorganic materials 0.000 claims description 13
- 239000002184 metal Substances 0.000 claims description 13
- 230000005291 magnetic effect Effects 0.000 claims description 9
- 238000005086 pumping Methods 0.000 claims description 9
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 8
- 230000001681 protective effect Effects 0.000 claims description 7
- 238000001816 cooling Methods 0.000 claims description 6
- 238000002844 melting Methods 0.000 claims description 6
- 239000002826 coolant Substances 0.000 claims description 5
- 239000003302 ferromagnetic material Substances 0.000 claims description 5
- 239000011521 glass Substances 0.000 claims description 5
- 238000010438 heat treatment Methods 0.000 claims description 5
- 229910052742 iron Inorganic materials 0.000 claims description 4
- 229910052715 tantalum Inorganic materials 0.000 claims description 4
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims description 4
- 229920002449 FKM Polymers 0.000 claims description 3
- 230000008018 melting Effects 0.000 claims description 3
- 239000003566 sealing material Substances 0.000 claims description 3
- 238000007789 sealing Methods 0.000 claims description 2
- 238000004891 communication Methods 0.000 claims 1
- 238000004544 sputter deposition Methods 0.000 description 11
- 239000007789 gas Substances 0.000 description 8
- 238000004519 manufacturing process Methods 0.000 description 6
- 230000006978 adaptation Effects 0.000 description 4
- 238000010891 electric arc Methods 0.000 description 4
- 239000002800 charge carrier Substances 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 230000002349 favourable effect Effects 0.000 description 3
- 230000001133 acceleration Effects 0.000 description 2
- 238000000605 extraction Methods 0.000 description 2
- 238000001659 ion-beam spectroscopy Methods 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 238000007792 addition Methods 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 230000003749 cleanliness Effects 0.000 description 1
- 230000000295 complement effect Effects 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005566 electron beam evaporation Methods 0.000 description 1
- 230000003628 erosive effect Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 238000011049 filling Methods 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 238000011835 investigation Methods 0.000 description 1
- 239000000696 magnetic material Substances 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 229910052756 noble gas Inorganic materials 0.000 description 1
- 238000002294 plasma sputter deposition Methods 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 125000006850 spacer group Chemical group 0.000 description 1
- 238000005728 strengthening Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 238000009423 ventilation Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/46—Sputtering by ion beam produced by an external ion source
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23B—TURNING; BORING
- B23B31/00—Chucks; Expansion mandrels; Adaptations thereof for remote control
- B23B31/02—Chucks
- B23B31/10—Chucks characterised by the retaining or gripping devices or their immediate operating means
- B23B31/12—Chucks with simultaneously-acting jaws, whether or not also individually adjustable
- B23B31/16—Chucks with simultaneously-acting jaws, whether or not also individually adjustable moving radially
- B23B31/16158—Jaws movement actuated by coaxial conical surfaces
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23B—TURNING; BORING
- B23B31/00—Chucks; Expansion mandrels; Adaptations thereof for remote control
- B23B31/02—Chucks
- B23B31/10—Chucks characterised by the retaining or gripping devices or their immediate operating means
- B23B31/12—Chucks with simultaneously-acting jaws, whether or not also individually adjustable
- B23B31/16—Chucks with simultaneously-acting jaws, whether or not also individually adjustable moving radially
- B23B31/16233—Jaws movement actuated by oblique surfaces of a coaxial control rod
- B23B31/16254—Jaws movement actuated by oblique surfaces of a coaxial control rod using fluid-pressure means to actuate the gripping means
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23B—TURNING; BORING
- B23B31/00—Chucks; Expansion mandrels; Adaptations thereof for remote control
- B23B31/02—Chucks
- B23B31/10—Chucks characterised by the retaining or gripping devices or their immediate operating means
- B23B31/12—Chucks with simultaneously-acting jaws, whether or not also individually adjustable
- B23B31/20—Longitudinally-split sleeves, e.g. collet chucks
- B23B31/201—Characterized by features relating primarily to remote control of the gripping means
- B23B31/204—Characterized by features relating primarily to remote control of the gripping means using fluid-pressure means to actuate the gripping means
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23B—TURNING; BORING
- B23B31/00—Chucks; Expansion mandrels; Adaptations thereof for remote control
- B23B31/02—Chucks
- B23B31/24—Chucks characterised by features relating primarily to remote control of the gripping means
- B23B31/28—Chucks characterised by features relating primarily to remote control of the gripping means using electric or magnetic means in the chuck
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J27/00—Ion beam tubes
- H01J27/02—Ion sources; Ion guns
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/08—Ion sources; Ion guns
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching
- H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching for evaporating or etching
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23B—TURNING; BORING
- B23B2270/00—Details of turning, boring or drilling machines, processes or tools not otherwise provided for
- B23B2270/38—Using magnetic fields
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Mechanical Engineering (AREA)
- Analytical Chemistry (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Combustion & Propulsion (AREA)
- Physical Vapour Deposition (AREA)
- Gripping On Spindles (AREA)
- Electron Sources, Ion Sources (AREA)
Applications Claiming Priority (6)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DD13543168 | 1968-10-17 | ||
| DD13774469 | 1969-02-10 | ||
| DE19691934320 DE1934320A1 (de) | 1968-10-17 | 1969-07-07 | Kraftspannfutter zum Einspannen von Werkstuecken an Arbeitsmaschinen |
| FR6930469A FR2063256A5 (enExample) | 1968-10-17 | 1969-09-08 | |
| FR6931339A FR2064480A5 (enExample) | 1968-10-17 | 1969-09-15 | |
| GB5503769A GB1294697A (en) | 1968-10-17 | 1969-11-11 | Apparatus for the selective sputtering of solid substances by means of ion bombardment according to the plasma or to the ion-beam process |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE1934328A1 true DE1934328A1 (de) | 1970-04-30 |
Family
ID=27543993
Family Applications (3)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE19691934328 Pending DE1934328A1 (de) | 1968-10-17 | 1969-07-07 | Vorrichtung zur wahlweisen Zerstaeubung fester Substanzen durch Ionenbeschuss nach der Plasma- oder Ionenstrahlmethode |
| DE19691934320 Pending DE1934320A1 (de) | 1968-09-09 | 1969-07-07 | Kraftspannfutter zum Einspannen von Werkstuecken an Arbeitsmaschinen |
| DE19691934326 Pending DE1934326A1 (de) | 1968-10-17 | 1969-07-07 | Mehrstrahl-Ionenzerstaeubungssystem zur Herstellung duenner einheitlicher oder legierter Schichten |
Family Applications After (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE19691934320 Pending DE1934320A1 (de) | 1968-09-09 | 1969-07-07 | Kraftspannfutter zum Einspannen von Werkstuecken an Arbeitsmaschinen |
| DE19691934326 Pending DE1934326A1 (de) | 1968-10-17 | 1969-07-07 | Mehrstrahl-Ionenzerstaeubungssystem zur Herstellung duenner einheitlicher oder legierter Schichten |
Country Status (4)
| Country | Link |
|---|---|
| CH (2) | CH516226A (enExample) |
| DE (3) | DE1934328A1 (enExample) |
| FR (2) | FR2063256A5 (enExample) |
| GB (1) | GB1294697A (enExample) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3998718A (en) * | 1976-02-18 | 1976-12-21 | Bell Telephone Laboratories, Incorporated | Ion milling apparatus |
| FR2410360A1 (fr) * | 1977-11-28 | 1979-06-22 | Anvar | Source d'ions notamment pour implanteur ionique |
| DE2853251C2 (de) * | 1978-12-09 | 1983-07-28 | Willy 5222 Morsbach Klein | Zerlegbare und transportable Materialhütte |
| US4250009A (en) * | 1979-05-18 | 1981-02-10 | International Business Machines Corporation | Energetic particle beam deposition system |
| AU566986B2 (en) * | 1984-09-04 | 1987-11-05 | Standard Oil Company, The | Deposition of passivated amorphous semi-conductor films by sputtering |
| US4785220A (en) * | 1985-01-30 | 1988-11-15 | Brown Ian G | Multi-cathode metal vapor arc ion source |
| DE102010007542A1 (de) | 2010-02-08 | 2011-08-11 | KHS Corpoplast GmbH, 22145 | Verfahren und Vorrichtung zur Blasformung von Behältern |
| CN115188648B (zh) * | 2022-09-08 | 2022-12-23 | 合肥中科离子医学技术装备有限公司 | 内潘宁源结构、回旋加速器 |
-
1969
- 1969-07-07 DE DE19691934328 patent/DE1934328A1/de active Pending
- 1969-07-07 DE DE19691934320 patent/DE1934320A1/de active Pending
- 1969-07-07 DE DE19691934326 patent/DE1934326A1/de active Pending
- 1969-09-08 FR FR6930469A patent/FR2063256A5/fr not_active Expired
- 1969-09-15 FR FR6931339A patent/FR2064480A5/fr not_active Expired
- 1969-10-08 CH CH1512569A patent/CH516226A/de not_active IP Right Cessation
- 1969-10-08 CH CH1512669A patent/CH522951A/de not_active IP Right Cessation
- 1969-11-11 GB GB5503769A patent/GB1294697A/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| FR2064480A5 (enExample) | 1971-07-23 |
| DE1934326A1 (de) | 1970-08-06 |
| CH516226A (de) | 1971-11-30 |
| FR2063256A5 (enExample) | 1971-07-09 |
| DE1934320A1 (de) | 1971-05-13 |
| GB1294697A (en) | 1972-11-01 |
| CH522951A (de) | 1972-05-15 |
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