DE112018006202A5 - Verfahren zur Herstellung eines strahlungsemittierenden Bauteils und strahlungsemittierendes Bauteil - Google Patents

Verfahren zur Herstellung eines strahlungsemittierenden Bauteils und strahlungsemittierendes Bauteil Download PDF

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Publication number
DE112018006202A5
DE112018006202A5 DE112018006202.3T DE112018006202T DE112018006202A5 DE 112018006202 A5 DE112018006202 A5 DE 112018006202A5 DE 112018006202 T DE112018006202 T DE 112018006202T DE 112018006202 A5 DE112018006202 A5 DE 112018006202A5
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Prior art keywords
radiation
emitting component
producing
emitting
component
Prior art date
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Granted
Application number
DE112018006202.3T
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English (en)
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DE112018006202B4 (de
Inventor
Alexander SCHLEHAHN
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Osram Oled GmbH
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Osram Oled GmbH
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Publication date
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Publication of DE112018006202A5 publication Critical patent/DE112018006202A5/de
Application granted granted Critical
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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/02—Structural details or components not essential to laser action
    • H01S5/026—Monolithically integrated components, e.g. waveguides, monitoring photo-detectors, drivers
    • H01S5/0267—Integrated focusing lens
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29D—PRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FROM SUBSTANCES IN A PLASTIC STATE
    • B29D11/00—Producing optical elements, e.g. lenses or prisms
    • B29D11/00009—Production of simple or compound lenses
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29D—PRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FROM SUBSTANCES IN A PLASTIC STATE
    • B29D11/00—Producing optical elements, e.g. lenses or prisms
    • B29D11/00009—Production of simple or compound lenses
    • B29D11/00365—Production of microlenses
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29D—PRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FROM SUBSTANCES IN A PLASTIC STATE
    • B29D11/00—Producing optical elements, e.g. lenses or prisms
    • B29D11/00009—Production of simple or compound lenses
    • B29D11/00403—Producing compound lenses
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B33—ADDITIVE MANUFACTURING TECHNOLOGY
    • B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
    • B33Y10/00—Processes of additive manufacturing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B33—ADDITIVE MANUFACTURING TECHNOLOGY
    • B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
    • B33Y80/00—Products made by additive manufacturing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0037—Production of three-dimensional images
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
    • G03F7/2053—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C64/00—Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
    • B29C64/10—Processes of additive manufacturing
    • B29C64/106—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material
    • B29C64/124—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified
    • B29C64/129—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified characterised by the energy source therefor, e.g. by global irradiation combined with a mask
    • B29C64/135—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified characterised by the energy source therefor, e.g. by global irradiation combined with a mask the energy source being concentrated, e.g. scanning lasers or focused light sources
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
    • H01S5/22—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Optics & Photonics (AREA)
  • Mechanical Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Ophthalmology & Optometry (AREA)
  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Electromagnetism (AREA)
  • Semiconductor Lasers (AREA)
DE112018006202.3T 2017-12-05 2018-11-29 Verfahren zur Herstellung eines strahlungsemittierenden Bauteils und strahlungsemittierendes Bauteil Active DE112018006202B4 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102017128824.4 2017-12-05
DE102017128824.4A DE102017128824A1 (de) 2017-12-05 2017-12-05 Verfahren zur Herstellung eines strahlungsemittierenden Bauteils und strahlungsemittierendes Bauteil
PCT/EP2018/083029 WO2019110419A1 (de) 2017-12-05 2018-11-29 Verfahren zur herstellung eines strahlungsemittierenden bauteils und strahlungsemittierendes bauteil

Publications (2)

Publication Number Publication Date
DE112018006202A5 true DE112018006202A5 (de) 2020-09-03
DE112018006202B4 DE112018006202B4 (de) 2022-12-01

Family

ID=64572351

Family Applications (2)

Application Number Title Priority Date Filing Date
DE102017128824.4A Withdrawn DE102017128824A1 (de) 2017-12-05 2017-12-05 Verfahren zur Herstellung eines strahlungsemittierenden Bauteils und strahlungsemittierendes Bauteil
DE112018006202.3T Active DE112018006202B4 (de) 2017-12-05 2018-11-29 Verfahren zur Herstellung eines strahlungsemittierenden Bauteils und strahlungsemittierendes Bauteil

Family Applications Before (1)

Application Number Title Priority Date Filing Date
DE102017128824.4A Withdrawn DE102017128824A1 (de) 2017-12-05 2017-12-05 Verfahren zur Herstellung eines strahlungsemittierenden Bauteils und strahlungsemittierendes Bauteil

Country Status (3)

Country Link
US (1) US11686999B2 (de)
DE (2) DE102017128824A1 (de)
WO (1) WO2019110419A1 (de)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102022122987B3 (de) 2022-09-09 2023-12-07 Universität Stuttgart, Körperschaft Des Öffentlichen Rechts Verfahren zur Herstellung einer Mikrooptik

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3932184A (en) * 1973-05-29 1976-01-13 Bell Telephone Laboratories, Incorporated Fabrication of microlenses
JPS58219748A (ja) * 1982-06-15 1983-12-21 Toshiba Corp 半導体装置
CA1294470C (en) * 1986-07-26 1992-01-21 Toshihiro Suzuki Process for the production of optical elements
JP2586536B2 (ja) * 1987-12-17 1997-03-05 ソニー株式会社 半導体レーザ装置の製造方法
CA2071598C (en) * 1991-06-21 1999-01-19 Akira Eda Optical device and method of manufacturing the same
US5912913A (en) * 1995-12-27 1999-06-15 Hitachi, Ltd. Vertical cavity surface emitting laser, optical transmitter-receiver module using the laser, and parallel processing system using the laser
JPH09243869A (ja) * 1996-03-14 1997-09-19 Hitachi Ltd 光モジュールの製造方法
US6121983A (en) * 1998-11-19 2000-09-19 Xerox Corporation Method and apparatus for a solid state laser scanning architecture
WO2001096915A2 (en) * 2000-06-15 2001-12-20 3M Innovative Properties Company Microfabrication of organic optical elements
JP2004072004A (ja) * 2002-08-09 2004-03-04 Keiji Tanaka マイクロレンズ付発光素子およびその形成方法
JP2004118918A (ja) * 2002-09-25 2004-04-15 Fuji Xerox Co Ltd 光ヘッドおよびその製造方法
JP2007008004A (ja) * 2005-06-30 2007-01-18 Jsr Corp 光学部品、光学部品の製造方法及び光学部品用型の製造方法
US8968987B2 (en) * 2012-01-11 2015-03-03 International Business Machines Corporation Implementing enhanced optical mirror coupling and alignment utilizing two-photon resist
GB2502313A (en) * 2012-05-24 2013-11-27 Ibm Manufacturing three dimensional photonic device by two photon absorption polymerization
EP2916151B1 (de) * 2014-03-05 2020-01-01 Corning Optical Communications LLC Verfahren zur Herstellung einer Faserkopplungsvorrichtung
US20160072585A1 (en) * 2014-09-08 2016-03-10 Helios Lightworks, LLC Method Of Creating An Optical Link Among Devices
DE102015012980B4 (de) * 2015-10-07 2018-08-16 Baden-Württemberg Stiftung Ggmbh Verfahren zur Herstellung von Mikrostrukturen auf optischen Fasern
DE102016214606B3 (de) * 2016-08-05 2017-08-31 Karlsruher Institut für Technologie Verfahren und Vorrichtung zur lithographischen Erzeugung einer Zielstruktur an einer nicht-planaren Ausgangsstruktur
DE102016221464A1 (de) 2016-11-02 2018-05-03 Karlsruher Institut für Technologie Verfahren zur Herstellung eines optischen Systems und optisches System

Also Published As

Publication number Publication date
US20200371434A1 (en) 2020-11-26
DE112018006202B4 (de) 2022-12-01
DE102017128824A1 (de) 2019-06-06
WO2019110419A1 (de) 2019-06-13
US11686999B2 (en) 2023-06-27

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