DE112014005636B4 - Plasmazelle mit freiem Flansch - Google Patents

Plasmazelle mit freiem Flansch Download PDF

Info

Publication number
DE112014005636B4
DE112014005636B4 DE112014005636.7T DE112014005636T DE112014005636B4 DE 112014005636 B4 DE112014005636 B4 DE 112014005636B4 DE 112014005636 T DE112014005636 T DE 112014005636T DE 112014005636 B4 DE112014005636 B4 DE 112014005636B4
Authority
DE
Germany
Prior art keywords
plasma
radiation
transmission element
flanges
plasma cell
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
DE112014005636.7T
Other languages
German (de)
English (en)
Other versions
DE112014005636T5 (de
Inventor
Ilya V. Bezel
Anatoly Shchemelinin
Amir Torkaman
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
KLA Corp
Original Assignee
KLA Tencor Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by KLA Tencor Corp filed Critical KLA Tencor Corp
Publication of DE112014005636T5 publication Critical patent/DE112014005636T5/de
Application granted granted Critical
Publication of DE112014005636B4 publication Critical patent/DE112014005636B4/de
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J61/00—Gas-discharge or vapour-discharge lamps
    • H01J61/02—Details
    • H01J61/30—Vessels; Containers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J61/00—Gas-discharge or vapour-discharge lamps
    • H01J61/02—Details
    • H01J61/52—Cooling arrangements; Heating arrangements; Means for circulating gas or vapour within the discharge space
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J65/00—Lamps without any electrode inside the vessel; Lamps with at least one main electrode outside the vessel
    • H01J65/04—Lamps in which a gas filling is excited to luminesce by an external electromagnetic field or by external corpuscular radiation, e.g. for indicating plasma display panels

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Electromagnetism (AREA)
  • Plasma Technology (AREA)
  • Lenses (AREA)
  • Non-Portable Lighting Devices Or Systems Thereof (AREA)
  • Vessels And Coating Films For Discharge Lamps (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • X-Ray Techniques (AREA)
DE112014005636.7T 2013-12-13 2014-12-12 Plasmazelle mit freiem Flansch Active DE112014005636B4 (de)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US201361916048P 2013-12-13 2013-12-13
US61/916,048 2013-12-13
US14/567,546 US9433070B2 (en) 2013-12-13 2014-12-11 Plasma cell with floating flange
US14/567,546 2014-12-11
PCT/US2014/070063 WO2015089424A1 (en) 2013-12-13 2014-12-12 Plasma cell with floating flange

Publications (2)

Publication Number Publication Date
DE112014005636T5 DE112014005636T5 (de) 2016-09-01
DE112014005636B4 true DE112014005636B4 (de) 2022-10-27

Family

ID=53371876

Family Applications (1)

Application Number Title Priority Date Filing Date
DE112014005636.7T Active DE112014005636B4 (de) 2013-12-13 2014-12-12 Plasmazelle mit freiem Flansch

Country Status (5)

Country Link
US (1) US9433070B2 (https=)
JP (1) JP6437000B2 (https=)
DE (1) DE112014005636B4 (https=)
TW (1) TWI630637B (https=)
WO (1) WO2015089424A1 (https=)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9263238B2 (en) 2014-03-27 2016-02-16 Kla-Tencor Corporation Open plasma lamp for forming a light-sustained plasma
US10887974B2 (en) 2015-06-22 2021-01-05 Kla Corporation High efficiency laser-sustained plasma light source
US10257918B2 (en) 2015-09-28 2019-04-09 Kla-Tencor Corporation System and method for laser-sustained plasma illumination
US9899205B2 (en) * 2016-05-25 2018-02-20 Kla-Tencor Corporation System and method for inhibiting VUV radiative emission of a laser-sustained plasma source
US10109473B1 (en) * 2018-01-26 2018-10-23 Excelitas Technologies Corp. Mechanically sealed tube for laser sustained plasma lamp and production method for same
US11972931B2 (en) * 2020-12-21 2024-04-30 Hamamatsu Photonics K.K. Light emitting sealed body, light emitting unit, and light source device
US11776804B2 (en) * 2021-04-23 2023-10-03 Kla Corporation Laser-sustained plasma light source with reverse vortex flow

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5892328A (en) 1995-02-13 1999-04-06 Applied Komatsu Technology Inc. High-power, plasma-based, reactive species generator
JP2007048516A (ja) 2005-08-08 2007-02-22 Shibaura Mechatronics Corp プラズマ発生装置及びプラズマ処理装置
US20130106275A1 (en) 2011-10-11 2013-05-02 Kla-Tencor Corporation Plasma cell for laser-sustained plasma light source

Family Cites Families (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5008593A (en) 1990-07-13 1991-04-16 The United States Of America As Represented By The Secretary Of The Air Force Coaxial liquid cooling of high power microwave excited plasma UV lamps
US5235251A (en) 1991-08-09 1993-08-10 The United States Of America As Represented By The Secretary Of The Air Force Hydraulic fluid cooling of high power microwave plasma tubes
US5829328A (en) * 1995-08-02 1998-11-03 Chen; Shyong-Chwan Multiple sockets wrench
US6528760B1 (en) 2000-07-14 2003-03-04 Micron Technology, Inc. Apparatus and method using rotational indexing for laser marking IC packages carried in trays
EP1519404A1 (en) * 2002-07-02 2005-03-30 Matsushita Electric Industrial Co., Ltd. Bulb-shaped electrodeless fluorescent lamp and electrodeless discharge lamp lighting device
JP2004079587A (ja) 2002-08-09 2004-03-11 Reitetsukusu:Kk ウエハ回転装置とこれを有する端部傷検査装置
TW200423195A (en) 2002-11-28 2004-11-01 Tokyo Electron Ltd Internal member of a plasma processing vessel
JP2004304035A (ja) 2003-03-31 2004-10-28 Shibaura Mechatronics Corp プラズマ発生装置
JP2005249745A (ja) 2004-03-08 2005-09-15 Ebara Corp 試料表面検査方法および検査装置
US7427571B2 (en) 2004-10-15 2008-09-23 Asm International, N.V. Reactor design for reduced particulate generation
US8789493B2 (en) 2006-02-13 2014-07-29 Lam Research Corporation Sealed elastomer bonded Si electrodes and the like for reduced particle contamination in dielectric etch
US7435982B2 (en) * 2006-03-31 2008-10-14 Energetiq Technology, Inc. Laser-driven light source
JP5055632B2 (ja) 2006-09-01 2012-10-24 株式会社ニコン 放電ランプ、光源装置、露光装置、及び露光装置の製造方法
US7732320B2 (en) 2007-02-05 2010-06-08 Suss Microtec Ag Apparatus and method for semiconductor wafer bumping via injection molded solder
US7824519B2 (en) * 2007-05-18 2010-11-02 Lam Research Corporation Variable volume plasma processing chamber and associated methods
JP5074248B2 (ja) * 2008-03-14 2012-11-14 株式会社オーク製作所 エキシマランプ
US8161906B2 (en) 2008-07-07 2012-04-24 Lam Research Corporation Clamped showerhead electrode assembly
JP5252586B2 (ja) * 2009-04-15 2013-07-31 ウシオ電機株式会社 レーザー駆動光源
GB0918515D0 (en) * 2009-10-21 2009-12-09 Ceravision Ltd Light source
US8927339B2 (en) 2010-11-22 2015-01-06 Bridge Semiconductor Corporation Method of making thermally enhanced semiconductor assembly with bump/base/flange heat spreader and build-up circuitry
US9927094B2 (en) 2012-01-17 2018-03-27 Kla-Tencor Corporation Plasma cell for providing VUV filtering in a laser-sustained plasma light source
US9390902B2 (en) 2013-03-29 2016-07-12 Kla-Tencor Corporation Method and system for controlling convective flow in a light-sustained plasma
US9185788B2 (en) 2013-05-29 2015-11-10 Kla-Tencor Corporation Method and system for controlling convection within a plasma cell

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5892328A (en) 1995-02-13 1999-04-06 Applied Komatsu Technology Inc. High-power, plasma-based, reactive species generator
JP2007048516A (ja) 2005-08-08 2007-02-22 Shibaura Mechatronics Corp プラズマ発生装置及びプラズマ処理装置
US20130106275A1 (en) 2011-10-11 2013-05-02 Kla-Tencor Corporation Plasma cell for laser-sustained plasma light source

Also Published As

Publication number Publication date
TW201532117A (zh) 2015-08-16
US20150201483A1 (en) 2015-07-16
US9433070B2 (en) 2016-08-30
DE112014005636T5 (de) 2016-09-01
WO2015089424A1 (en) 2015-06-18
JP6437000B2 (ja) 2018-12-12
JP2017509098A (ja) 2017-03-30
TWI630637B (zh) 2018-07-21

Similar Documents

Publication Publication Date Title
DE112014005636B4 (de) Plasmazelle mit freiem Flansch
DE112014001493B4 (de) Plasmazelle zur Steuerung von Konvektion sowie Verfahren und System zur Steuerung von Konvektion in einer Plasmazelle
DE112014001747B4 (de) Verfahren und Vorrichtung zur Steuerung einer Konvektionsströmung in einem lichtgestützten Plasma
DE112013007825B4 (de) Plasmazelle einer mittels eines lasers aufrecht erhaltenen plasmalichtquelle mit einer anordnung zur rotation des plasmakolbens und einer flüssigkeit zur filterung von vuv-strahlung
DE112015001355B4 (de) Lichtquelle mit nanostrukturierter antireflexions-schicht
DE112015001623B4 (de) Lasergestützte Plasma-Lichtquelle mit optischen Elementen zum Richten einer Pumpbeleuchtung, so dass eine Vielzahl voneinander räumlich getrennter Plasmen aufrecht erhalten wird und entsprechendes Verfahren für langgestreckte Plasmen
DE69911091T3 (de) Entladungslampe und Verfahren zu deren Herstellung
DE112015002079T5 (de) Breitbandlichtquelle mit transparentem Bereich hohen Hydroxidgehalts
US9775226B1 (en) Method and system for generating a light-sustained plasma in a flanged transmission element
DE112014005524T5 (de) Lichtemittierender, abgedichteter Körper
EP2198492A2 (de) Lasermodul
DE112006000720T5 (de) Lampenanordnung
DE102009035788B4 (de) Optische Anordnung in einem optischen System, insbesondere einer Beleuchtungseinrichtung
DE112012002703T5 (de) Optisches Pumpen zum Erhalt von Plasma
DE112016000310T5 (de) System und verfahren zum inhibieren von strahlungsemission einer lasergestützten plasmaquelle
CH666776A5 (de) Strahlungsquelle fuer optische geraete, insbesondere fuer fotolithografische abbildungssysteme.
DE102011115841A1 (de) Bestrahlungsvorrichtung
DE102005041567A1 (de) EUV-Strahlungsquelle mit hoher Strahlungsleistung auf Basis einer Gasentladung
DE60026614T2 (de) Sealed beam- hochleistungsentladungs- lampensystem für flugzeug
DE112024000201T5 (de) Laser-gestützte VUV-Plasma-Lichtquelle mit Langpassfilterung
DE102009022266B4 (de) Xenonlampe mit leitendem Film auf dem Entladungsgefäss
WO2009095047A2 (de) Röntgenstrahlerzeuger sowie dessen verwendung in einem röntgenuntersuchungs- oder röntgenprüfgerät
DE102015219939A1 (de) Vorrichtung zur Erzeugung eines Reinigungsgases, Projektionsbelichtungsanlage und Verfahren zum Reinigen einer optischen Oberfläche
DE10224943A1 (de) Entladungskolben
DE102007052885A1 (de) Spiegel mit einem Spiegelträger und Projektionsbelichtungsanlage

Legal Events

Date Code Title Description
R012 Request for examination validly filed
R079 Amendment of ipc main class

Free format text: PREVIOUS MAIN CLASS: H05H0001240000

Ipc: H05G0002000000

R016 Response to examination communication
R018 Grant decision by examination section/examining division
R020 Patent grant now final