DE112013000168A5 - Mehrfachbeschichtungseinrichtung für Bandsubstrate und Bandsubstrat-Vakuumbeschichtungsanlage - Google Patents

Mehrfachbeschichtungseinrichtung für Bandsubstrate und Bandsubstrat-Vakuumbeschichtungsanlage Download PDF

Info

Publication number
DE112013000168A5
DE112013000168A5 DE112013000168.3T DE112013000168T DE112013000168A5 DE 112013000168 A5 DE112013000168 A5 DE 112013000168A5 DE 112013000168 T DE112013000168 T DE 112013000168T DE 112013000168 A5 DE112013000168 A5 DE 112013000168A5
Authority
DE
Germany
Prior art keywords
tape
substrates
substrate vacuum
coating device
coating equipment
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
DE112013000168.3T
Other languages
English (en)
Inventor
Johannes Strümpfel
Wolfgang Fukarek
Michael Hentschel
Falk Otto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Von Ardenne Asset GmbH and Co KG
Original Assignee
Von Ardenne GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Von Ardenne GmbH filed Critical Von Ardenne GmbH
Publication of DE112013000168A5 publication Critical patent/DE112013000168A5/de
Withdrawn legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/568—Transferring the substrates through a series of coating stations
DE112013000168.3T 2012-10-16 2013-10-16 Mehrfachbeschichtungseinrichtung für Bandsubstrate und Bandsubstrat-Vakuumbeschichtungsanlage Withdrawn DE112013000168A5 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102012109836.0 2012-10-16
DE102012109836 2012-10-16
PCT/EP2013/071613 WO2014060468A1 (de) 2012-10-16 2013-10-16 Mehrfachbeschichtungseinrichtung für bandsubstrate und bandsubstrat-vakuumbeschichtungsanlage

Publications (1)

Publication Number Publication Date
DE112013000168A5 true DE112013000168A5 (de) 2014-08-07

Family

ID=49486461

Family Applications (1)

Application Number Title Priority Date Filing Date
DE112013000168.3T Withdrawn DE112013000168A5 (de) 2012-10-16 2013-10-16 Mehrfachbeschichtungseinrichtung für Bandsubstrate und Bandsubstrat-Vakuumbeschichtungsanlage

Country Status (5)

Country Link
JP (1) JP5768194B2 (de)
KR (1) KR101500926B1 (de)
CN (1) CN103998647B (de)
DE (1) DE112013000168A5 (de)
WO (1) WO2014060468A1 (de)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102013209033B4 (de) 2013-05-15 2021-11-11 VON ARDENNE Asset GmbH & Co. KG Verfahren zur Prozessstabilisierung und Bandsubstratbehandlungsanlage
DE102013107690B4 (de) 2013-06-21 2017-12-28 Von Ardenne Gmbh Bandsubstratbehandlungsanlage
DE102014112536A1 (de) 2014-09-01 2016-03-03 Von Ardenne Gmbh Substratbehandlungsanlage und Heizeinrichtung
DE102015104039B4 (de) * 2015-03-18 2018-06-21 Von Ardenne Gmbh Bandsubstratbeschichtungsanlage mit einer Magnetronanordnung
KR20160117236A (ko) * 2015-03-31 2016-10-10 가부시키가이샤 고베 세이코쇼 성막 장치 및 성막 장치에 있어서의 격벽 구조체
DE102016107985A1 (de) * 2016-04-29 2017-11-02 Von Ardenne Gmbh Vakuumprozesskammer und Verfahren zum Herstellen einer Kammerwand einer Vakuumprozesskammer
DE102016114640B4 (de) * 2016-08-08 2021-09-23 VON ARDENNE Asset GmbH & Co. KG Vakuum-Gehäuseanordnung, Kammerkörper und Kammerdeckel

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3858437B2 (ja) * 1998-04-13 2006-12-13 ソニー株式会社 真空薄膜形成装置
JPH11350136A (ja) * 1998-06-11 1999-12-21 Sony Corp 真空成膜装置
DE10147708C5 (de) * 2001-09-27 2005-03-24 Von Ardenne Anlagentechnik Gmbh Targetanordnung
DE10352144B8 (de) * 2003-11-04 2008-11-13 Von Ardenne Anlagentechnik Gmbh Vakuumbeschichtungsanlage zum Beschichten von längserstreckten Substraten
WO2007059749A1 (de) * 2005-11-21 2007-05-31 Von Ardenne Anlagentechnik Gmbh Trenneinrichtung für prozesskammern von vakuumbeschichtungsanlagen und vakuumbeschichtungsanlage
WO2008104169A1 (de) * 2007-02-28 2008-09-04 Von Ardenne Anlagentechnik Gmbh Verfahren und vorrichtung zur behandlung bandförmige substrates in einer vakuumbeschichtungsanlage
KR100855068B1 (ko) * 2008-02-28 2008-08-29 주식회사 와이투스틸 수직형 다층막 형성 장치
JP5542488B2 (ja) * 2010-03-18 2014-07-09 富士フイルム株式会社 成膜装置
JP2012136724A (ja) * 2010-12-24 2012-07-19 Kobe Steel Ltd 巻取り式連続成膜装置

Also Published As

Publication number Publication date
KR20140120298A (ko) 2014-10-13
KR101500926B1 (ko) 2015-03-10
JP2015508127A (ja) 2015-03-16
WO2014060468A1 (de) 2014-04-24
CN103998647B (zh) 2016-01-13
CN103998647A (zh) 2014-08-20
JP5768194B2 (ja) 2015-08-26

Similar Documents

Publication Publication Date Title
DE112013000168A5 (de) Mehrfachbeschichtungseinrichtung für Bandsubstrate und Bandsubstrat-Vakuumbeschichtungsanlage
HK1213838A1 (zh) 用於塗覆基材的方法和組合物
BR112014013594A8 (pt) composição e substrato revestido
EP2756123A4 (de) Beschichtungsvorrichtung zum beschichten eines länglichen substrats
SG2013083654A (en) Methods for depositing films on sensitive substrates
BR112013031668A2 (pt) composição de revestimento e substrato
EP2921538A4 (de) Fäulnisverhindernde beschichtungszusammensetzung, fäulnisverhindernder beschichtungsfilm, fäulnisverhindernde substrat und verfahren zur erhöhung der lagerstabilität der fäulnisverhindernden beschichtungszusammensetzung
EP2922089A4 (de) Herstellungsverfahren und substratstruktur für eine flexible anzeige
HK1200408A1 (en) Antifouling layer, antifouling substrate, display device, and input device
EP2943289A4 (de) Abdeckung von substraten zum auftragen von schutzschichten
FI20125962A (fi) Menetelmä farmaseuttisten substraattien päällystämiseksi
EP2990449A4 (de) Fäulnisverhindernde anstrichzusammensetzung, fäulnisverhindernde farbschicht, fäulnisverhinderndes substrat und verfahren zur herstellung des fäulnisverhindernden substrats
GB2510468B (en) Substrates for semiconductor devices
TWI560314B (en) Film deposition apparatus and substrate processing apparatus
HK1211612A1 (en) Heat sensitive substrates coated with waterbourne coating compositions
HK1210986A1 (en) Methods and compositions for coating substrates
BR112015006244A2 (pt) substrato revestido
FI20125986A (fi) Menetelmä funktionaalisten kerrosten muodostamiseksi piisubstraateille
EP2925089A4 (de) Substrat für flexible vorrichtungen und verfahren zur herstellung davon
EP2794280A4 (de) Beschichtetes mediensubstrat
FI20135707A (fi) Menetelmä ja laitteisto substraatin pinnan pinnoittamiseksi
EP3022267A4 (de) Substratbeschichtungszusammensetzungen und -verfahren
EP2914672A4 (de) Verfahren zur beschichtung von substraten und damit hergestellte substrate
SG11201504054WA (en) Coating method using particle alignment and particle coated substrate manufactured thereby
GB2497664B (en) Substrates for semiconductor devices

Legal Events

Date Code Title Description
R012 Request for examination validly filed
R016 Response to examination communication
R081 Change of applicant/patentee

Owner name: VON ARDENNE ASSET GMBH & CO. KG, DE

Free format text: FORMER OWNER: VON ARDENNE GMBH, 01324 DRESDEN, DE

R082 Change of representative

Representative=s name: LIPPERT STACHOW PATENTANWAELTE RECHTSANWAELTE , DE

R119 Application deemed withdrawn, or ip right lapsed, due to non-payment of renewal fee