DE112009000120T5 - Kollektor mit streifendem Einfall für Laser-Erzeuge Plasmaquellen - Google Patents

Kollektor mit streifendem Einfall für Laser-Erzeuge Plasmaquellen Download PDF

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Publication number
DE112009000120T5
DE112009000120T5 DE112009000120T DE112009000120T DE112009000120T5 DE 112009000120 T5 DE112009000120 T5 DE 112009000120T5 DE 112009000120 T DE112009000120 T DE 112009000120T DE 112009000120 T DE112009000120 T DE 112009000120T DE 112009000120 T5 DE112009000120 T5 DE 112009000120T5
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DE
Germany
Prior art keywords
collector
mirrors
source
mirror
generated plasma
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
DE112009000120T
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German (de)
English (en)
Inventor
Ian Wallhead
Fabio Zocchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Media Lario SRL
Original Assignee
Media Lario SRL
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Media Lario SRL filed Critical Media Lario SRL
Publication of DE112009000120T5 publication Critical patent/DE112009000120T5/de
Ceased legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70033—Production of exposure light, i.e. light sources by plasma extreme ultraviolet [EUV] sources
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G03F7/70166—Capillary or channel elements, e.g. nested extreme ultraviolet [EUV] mirrors or shells, optical fibers or light guides
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—HANDLING OF PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
    • G21K1/062—Devices having a multilayer structure
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—HANDLING OF PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
    • G21K1/067—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators using surface reflection, e.g. grazing incidence mirrors, gratings
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—HANDLING OF PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/061—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements characterised by a multilayer structure
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—HANDLING OF PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/064—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements having a curved surface
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—HANDLING OF PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/065—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements provided with cooling means
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—HANDLING OF PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/067—Construction details

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Epidemiology (AREA)
  • Chemical & Material Sciences (AREA)
  • General Engineering & Computer Science (AREA)
  • Nanotechnology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Public Health (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Environmental & Geological Engineering (AREA)
  • Theoretical Computer Science (AREA)
  • Mathematical Physics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Plasma & Fusion (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • X-Ray Techniques (AREA)
DE112009000120T 2008-01-28 2009-01-28 Kollektor mit streifendem Einfall für Laser-Erzeuge Plasmaquellen Ceased DE112009000120T5 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP08001536.5 2008-01-28
EP08001536.5A EP2083328B1 (en) 2008-01-28 2008-01-28 Grazing incidence collector for laser produced plasma sources
PCT/EP2009/000539 WO2009095220A2 (en) 2008-01-28 2009-01-28 Grazing incidence collector for laser produced plasma sources

Publications (1)

Publication Number Publication Date
DE112009000120T5 true DE112009000120T5 (de) 2011-03-17

Family

ID=39766873

Family Applications (1)

Application Number Title Priority Date Filing Date
DE112009000120T Ceased DE112009000120T5 (de) 2008-01-28 2009-01-28 Kollektor mit streifendem Einfall für Laser-Erzeuge Plasmaquellen

Country Status (5)

Country Link
US (1) US8411815B2 (https=)
EP (1) EP2083328B1 (https=)
JP (1) JP5368478B2 (https=)
DE (1) DE112009000120T5 (https=)
WO (1) WO2009095220A2 (https=)

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US8330131B2 (en) 2010-01-11 2012-12-11 Media Lario, S.R.L. Source-collector module with GIC mirror and LPP EUV light source
JP5093267B2 (ja) 2010-03-11 2012-12-12 ウシオ電機株式会社 集光鏡アッセンブリおよびこの集光鏡アッセンブリを用いた極端紫外光光源装置
JP5670174B2 (ja) * 2010-03-18 2015-02-18 ギガフォトン株式会社 チャンバ装置および極端紫外光生成装置
US8587768B2 (en) 2010-04-05 2013-11-19 Media Lario S.R.L. EUV collector system with enhanced EUV radiation collection
US8810775B2 (en) * 2010-04-16 2014-08-19 Media Lario S.R.L. EUV mirror module with a nickel electroformed curved mirror
DE102010028655A1 (de) 2010-05-06 2011-11-10 Carl Zeiss Smt Gmbh EUV-Kollektor
US9057962B2 (en) * 2010-06-18 2015-06-16 Media Lario S.R.L. Source-collector module with GIC mirror and LPP EUV light source
US8686381B2 (en) 2010-06-28 2014-04-01 Media Lario S.R.L. Source-collector module with GIC mirror and tin vapor LPP target system
US20120050707A1 (en) * 2010-08-30 2012-03-01 Media Lario S.R.L Source-collector module with GIC mirror and tin wire EUV LPP target system
US20120050706A1 (en) * 2010-08-30 2012-03-01 Media Lario S.R.L Source-collector module with GIC mirror and xenon ice EUV LPP target system
US8258485B2 (en) * 2010-08-30 2012-09-04 Media Lario Srl Source-collector module with GIC mirror and xenon liquid EUV LPP target system
US8344339B2 (en) * 2010-08-30 2013-01-01 Media Lario S.R.L. Source-collector module with GIC mirror and tin rod EUV LPP target system
DE102010039965B4 (de) 2010-08-31 2019-04-25 Carl Zeiss Smt Gmbh EUV-Kollektor
CN102621815B (zh) * 2011-01-26 2016-12-21 Asml荷兰有限公司 用于光刻设备的反射光学部件及器件制造方法
WO2013041323A1 (en) 2011-09-22 2013-03-28 Asml Netherlands B.V. Radiation source
DE102013002064A1 (de) * 2012-02-11 2013-08-14 Media Lario S.R.L. Quell-kollektor-module für euv-lithographie unter verwendung eines gic-spiegels und einer lpp-quelle
JP2013211517A (ja) * 2012-03-01 2013-10-10 Gigaphoton Inc Ｅｕｖ光集光装置
DE102012220465A1 (de) 2012-11-09 2014-05-15 Carl Zeiss Smt Gmbh EUV-Kollektor
EP2746850B1 (en) 2012-12-20 2015-03-18 USHIO Denki Kabushiki Kaisha Method of manufacturing mirror shells of a nested shells grazing incidence mirror
US8872143B2 (en) * 2013-03-14 2014-10-28 Asml Netherlands B.V. Target for laser produced plasma extreme ultraviolet light source
US9585236B2 (en) 2013-05-03 2017-02-28 Media Lario Srl Sn vapor EUV LLP source system for EUV lithography
DE102014006265B4 (de) 2013-05-03 2017-08-24 Media Lario S.R.L. Sn-dampf-euv-llp-quellsystem für die euv-lithographie
DE102013107192A1 (de) 2013-07-08 2015-01-08 Carl Zeiss Laser Optics Gmbh Reflektives optisches Element für streifenden Einfall im EUV-Wellenlängenbereich
IT202000017086A1 (it) * 2020-07-14 2022-01-14 Istituto Naz Di Astrofisica Procedimento per la realizzazione di elementi ottici per ottiche di telescopi utilizzabili in missioni spaziali

Citations (2)

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WO2001084747A2 (en) 2000-05-03 2001-11-08 Media Lario S.R.L. Telescope mirror for high bandwidth free space optical data transmission
US20050199829A1 (en) 2004-03-10 2005-09-15 Partlo William N. EUV light source

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Patent Citations (2)

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Publication number Priority date Publication date Assignee Title
WO2001084747A2 (en) 2000-05-03 2001-11-08 Media Lario S.R.L. Telescope mirror for high bandwidth free space optical data transmission
US20050199829A1 (en) 2004-03-10 2005-09-15 Partlo William N. EUV light source

Also Published As

Publication number Publication date
WO2009095220A3 (en) 2009-11-26
US8411815B2 (en) 2013-04-02
JP5368478B2 (ja) 2013-12-18
JP2011512647A (ja) 2011-04-21
WO2009095220A2 (en) 2009-08-06
US20100303199A1 (en) 2010-12-02
EP2083328A1 (en) 2009-07-29
EP2083328B1 (en) 2013-06-19

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