DE112009000018A5 - Passiv modengekoppeltes Pikosekundenlasergerät - Google Patents

Passiv modengekoppeltes Pikosekundenlasergerät Download PDF

Info

Publication number
DE112009000018A5
DE112009000018A5 DE112009000018T DE112009000018T DE112009000018A5 DE 112009000018 A5 DE112009000018 A5 DE 112009000018A5 DE 112009000018 T DE112009000018 T DE 112009000018T DE 112009000018 T DE112009000018 T DE 112009000018T DE 112009000018 A5 DE112009000018 A5 DE 112009000018A5
Authority
DE
Germany
Prior art keywords
laser device
passive mode
picosecond laser
locked picosecond
locked
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
DE112009000018T
Other languages
English (en)
Other versions
DE112009000018B4 (de
DE112009000018T5 (de
Inventor
Zhongwei Fan
Yunfeng Ma
Gang Niu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Beijing GK Laser Technology Co Ltd
Original Assignee
Beijing GK Laser Technology Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Beijing GK Laser Technology Co Ltd filed Critical Beijing GK Laser Technology Co Ltd
Publication of DE112009000018T5 publication Critical patent/DE112009000018T5/de
Publication of DE112009000018A5 publication Critical patent/DE112009000018A5/de
Application granted granted Critical
Publication of DE112009000018B4 publication Critical patent/DE112009000018B4/de
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/11Mode locking; Q-switching; Other giant-pulse techniques, e.g. cavity dumping
    • H01S3/1106Mode locking
    • H01S3/1112Passive mode locking
    • H01S3/1115Passive mode locking using intracavity saturable absorbers
    • H01S3/1118Semiconductor saturable absorbers, e.g. semiconductor saturable absorber mirrors [SESAMs]; Solid-state saturable absorbers, e.g. carbon nanotube [CNT] based
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/05Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
    • H01S3/06Construction or shape of active medium
    • H01S3/0619Coatings, e.g. AR, HR, passivation layer
    • H01S3/0621Coatings on the end-faces, e.g. input/output surfaces of the laser light
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/05Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
    • H01S3/08Construction or shape of optical resonators or components thereof
    • H01S3/08059Constructional details of the reflector, e.g. shape
    • H01S3/08068Holes; Stepped surface; Special cross-section
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/05Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
    • H01S3/08Construction or shape of optical resonators or components thereof
    • H01S3/081Construction or shape of optical resonators or components thereof comprising three or more reflectors
    • H01S3/0813Configuration of resonator
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/05Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
    • H01S3/08Construction or shape of optical resonators or components thereof
    • H01S3/081Construction or shape of optical resonators or components thereof comprising three or more reflectors
    • H01S3/0813Configuration of resonator
    • H01S3/0817Configuration of resonator having 5 reflectors, e.g. W-shaped resonators
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09Processes or apparatus for excitation, e.g. pumping
    • H01S3/091Processes or apparatus for excitation, e.g. pumping using optical pumping
    • H01S3/094Processes or apparatus for excitation, e.g. pumping using optical pumping by coherent light
    • H01S3/0941Processes or apparatus for excitation, e.g. pumping using optical pumping by coherent light of a laser diode
    • H01S3/09415Processes or apparatus for excitation, e.g. pumping using optical pumping by coherent light of a laser diode the pumping beam being parallel to the lasing mode of the pumped medium, e.g. end-pumping
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/10061Polarization control
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/16Solid materials
    • H01S3/163Solid materials characterised by a crystal matrix
    • H01S3/1671Solid materials characterised by a crystal matrix vanadate, niobate, tantalate

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Nanotechnology (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • Lasers (AREA)
DE112009000018.5T 2009-05-04 2009-08-20 Passiv modengekoppeltes Pikosekundenlasergerät Expired - Fee Related DE112009000018B4 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
CN2009100834318A CN101562310B (zh) 2009-05-04 2009-05-04 被动锁模皮秒激光器
CN200910083431.8 2009-05-04
PCT/CN2009/073378 WO2010127521A1 (zh) 2009-05-04 2009-08-20 被动锁模皮秒激光器

Publications (3)

Publication Number Publication Date
DE112009000018T5 DE112009000018T5 (de) 2011-05-05
DE112009000018A5 true DE112009000018A5 (de) 2012-08-02
DE112009000018B4 DE112009000018B4 (de) 2015-03-19

Family

ID=41220982

Family Applications (1)

Application Number Title Priority Date Filing Date
DE112009000018.5T Expired - Fee Related DE112009000018B4 (de) 2009-05-04 2009-08-20 Passiv modengekoppeltes Pikosekundenlasergerät

Country Status (5)

Country Link
US (1) US8340143B2 (de)
JP (1) JP4984104B2 (de)
CN (1) CN101562310B (de)
DE (1) DE112009000018B4 (de)
WO (1) WO2010127521A1 (de)

Families Citing this family (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2363685B1 (de) * 2010-02-09 2013-11-20 Attocube Systems AG Vorrichtung zur Positionserfassung mit konfokalem Fabry-Perot Interferometer
CN102074883B (zh) * 2010-12-14 2012-10-10 聊城大学 一种皮秒激光振荡源
CN102570258A (zh) * 2011-02-25 2012-07-11 北京国科世纪激光技术有限公司 激光器谐振腔
CN102832534B (zh) * 2012-07-20 2015-01-21 中国科学院光电研究院 全固态被动锁模皮秒激光器
CN102882113A (zh) * 2012-09-24 2013-01-16 中国科学院物理研究所 一种ld端面泵浦的被动锁模激光器
KR101849978B1 (ko) 2012-12-18 2018-04-19 삼성전자 주식회사 극자외선 광 발생 장치 및 방법
FR3019388B1 (fr) * 2014-03-27 2017-06-16 Cilas Cavite laser instable a declencheur passif pourvu d'un absorbant saturable a gradient d'absorption
US11466316B2 (en) 2015-05-20 2022-10-11 Quantum-Si Incorporated Pulsed laser and bioanalytic system
US10605730B2 (en) 2015-05-20 2020-03-31 Quantum-Si Incorporated Optical sources for fluorescent lifetime analysis
KR20180009772A (ko) * 2015-05-20 2018-01-29 퀀텀-에스아이 인코포레이티드 펄스 레이저 및 바이오분석 시스템
CN106025783A (zh) * 2016-06-06 2016-10-12 中国工程物理研究院应用电子学研究所 一种快速切换偏振态的调q脉冲激光器
CN107782714A (zh) * 2016-08-24 2018-03-09 中国科学院光电研究院 一种激光脉宽包括皮秒和纳秒两者规格的激光诱导等离子体光谱分析设备
CN106451050B (zh) * 2016-10-12 2019-05-03 电子科技大学 一种全固态宽带可调谐中红外超短脉冲激光器
KR20220084181A (ko) 2016-12-16 2022-06-21 퀀텀-에스아이 인코포레이티드 콤팩트한 빔 셰이핑 및 스티어링 어셈블리
BR112019012054A2 (pt) 2016-12-16 2020-08-18 Quantum-Si Incorporated módulo de laser em modo travado compacto
CN109212733B (zh) * 2017-07-04 2021-02-05 徐州旭海光电科技有限公司 一种光程折叠器件
CN108173110B (zh) * 2018-02-01 2024-01-09 长春新产业光电技术有限公司 百赫兹百纳秒大能量激光器
MX2020013680A (es) 2018-06-15 2021-03-02 Quantum Si Inc Control y adquisicion de datos para instrumentos analiticos avanzados que tienen fuentes opticas pulsadas.
CN108777429B (zh) * 2018-06-15 2020-05-05 北京交通大学 一种用于各向异性激光介质的锁模激光器
CN108551076A (zh) * 2018-06-22 2018-09-18 深圳烯光科技有限公司 一种重复频率可调双波长纳焦耳皮秒激光器
CN109802288A (zh) * 2019-03-06 2019-05-24 北京赢圣科技有限公司 高功率全固态紧凑皮秒激光器
US11747561B2 (en) 2019-06-14 2023-09-05 Quantum-Si Incorporated Sliced grating coupler with increased beam alignment sensitivity
CN112186489B (zh) * 2019-07-02 2022-07-12 苏州曼德特光电技术有限公司 自动锁模激光器及其控制方法
CN116009249B (zh) * 2023-03-27 2023-06-30 济南量子技术研究院 一种光学频率梳锁模自动调试方法及系统

Family Cites Families (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3991385A (en) * 1975-02-03 1976-11-09 Owens-Illinois, Inc. Gas laser with sputter-resistant cathode
US4653063A (en) * 1985-01-25 1987-03-24 Litton Systems, Inc. Laser apparatus
JP3734560B2 (ja) * 1996-03-25 2006-01-11 浜松ホトニクス株式会社 超短パルスレーザ装置
US5870415A (en) * 1996-06-10 1999-02-09 Biophotonics Information Laboratories Ltd. Lasers
US6212216B1 (en) * 1996-12-17 2001-04-03 Ramadas M. R. Pillai External cavity micro laser apparatus
US6393035B1 (en) * 1999-02-01 2002-05-21 Gigatera Ag High-repetition rate passively mode-locked solid-state laser
US6834064B1 (en) 1999-12-08 2004-12-21 Time-Bandwidth Products Ag Mode-locked thin-disk laser
US6816532B2 (en) * 2001-05-15 2004-11-09 Fuji Photo Film Co., Ltd. Laser-diode-excited laser apparatus, fiber laser apparatus, and fiber laser amplifier in which laser medium doped with one of ho3+, sm3+, eu3+, dy3+, er3+, and tb3+is excited with gan-based compound laser diode
AT411411B (de) * 2002-05-17 2003-12-29 Femtolasers Produktions Gmbh Kurzpuls-laservorrichtung mit vorzugsweise passiver modenverkopplung und mehrfachreflexions-teleskop hiefür
JP4961588B2 (ja) * 2003-01-28 2012-06-27 ハイ キュー レーザー ゲゼルシャフト ミット ベシュレンクテル ハフツング レーザービームガイド用折返し装置
CN1211896C (zh) 2003-04-08 2005-07-20 中国科学院西安光学精密机械研究所 出光时间高稳定度的被动锁模Nd:YAG皮秒激光器
CN2655477Y (zh) 2003-09-19 2004-11-10 中国科学院上海光学精密机械研究所 激光二极管泵浦皮秒主动锁模固体平面波导激光器
WO2005091447A1 (ja) * 2004-03-24 2005-09-29 Japan Science And Technology Agency レーザー装置
CN2754243Y (zh) * 2004-12-17 2006-01-25 北京工业大学 偏振态可调的连续及锁模激光器
CN2765348Y (zh) * 2005-01-13 2006-03-15 北京工业大学 腔倒空全固态皮秒激光器
CN1979978A (zh) * 2005-12-07 2007-06-13 中国科学院半导体研究所 半导体吸收镜被动锁模激光器的准z型腔结构光路
EP1870972A1 (de) * 2006-06-22 2007-12-26 Fujifilm Corporation Modengekoppelte Laservorrichtung
US7864821B2 (en) * 2007-09-28 2011-01-04 Fujifilm Corporation Mode-locked solid-state laser apparatus
JP5319990B2 (ja) * 2007-09-28 2013-10-16 富士フイルム株式会社 モード同期固体レーザ装置
JP5456994B2 (ja) * 2008-06-20 2014-04-02 富士フイルム株式会社 モード同期固体レーザ装置
JP2010103428A (ja) * 2008-10-27 2010-05-06 Fujifilm Corp モード同期レーザ装置、超短パルス光源装置、広帯域光源装置、非線形光学顕微装置、記録装置、及び光コヒーレンストモグラフィ装置

Also Published As

Publication number Publication date
CN101562310A (zh) 2009-10-21
DE112009000018B4 (de) 2015-03-19
DE112009000018T5 (de) 2011-05-05
US20120039345A1 (en) 2012-02-16
JP4984104B2 (ja) 2012-07-25
CN101562310B (zh) 2010-09-01
JP2011518445A (ja) 2011-06-23
WO2010127521A1 (zh) 2010-11-11
US8340143B2 (en) 2012-12-25

Similar Documents

Publication Publication Date Title
DE112009000018A5 (de) Passiv modengekoppeltes Pikosekundenlasergerät
DK3527239T3 (da) Selvinjektionsindretning
DK2506745T3 (da) Patron-ekstraktionsindretning
BR112012004536A2 (pt) dispositivo
BRPI0923955A2 (pt) dispositivo de irradiação
UA19989S (uk) Пристрій гіпертермомасажний
BR112012010974A2 (pt) dispositivo
BRPI0919122A2 (pt) dispositivo emissor-receptor
DE112010004833A5 (de) Dämpfungseinrichtung
DK2450499T3 (da) Løfteanordning
EP2849293A4 (de) Passives güteschalterelement und passive güteschalter-laservorrichtung
BR112012002883A2 (pt) dispositivo
DK2381543T3 (da) Fiberlaserapparat
DK2361075T3 (da) Øjenskylleindretning
DE112010001196A5 (de) Verriegelungsvorrichtung
BRPI1011397A2 (pt) atenuador
DK2493768T3 (da) Etiketfjernelses-indretning
FI20095860A (fi) Elektroniikkalaite
FI20095844A (fi) Elektroniikkalaite
BR112012002889A2 (pt) dispositivo
BR112012007885A2 (pt) dispositivo de retensão
NO20090750L (no) Passiv trykkstepping
BR112012000125A2 (pt) dispositivo
BRPI1011007A2 (pt) dispositivo eletrônico
DE112010000776A5 (de) Hubvorrichtung

Legal Events

Date Code Title Description
OP8 Request for examination as to paragraph 44 patent law
R016 Response to examination communication
R016 Response to examination communication
R016 Response to examination communication
R016 Response to examination communication
R018 Grant decision by examination section/examining division
R020 Patent grant now final
R119 Application deemed withdrawn, or ip right lapsed, due to non-payment of renewal fee