DE112005003341B4 - Synthetisches Siliziumdioxid mit geringer polarisationsinduzierter Doppelbrechung, Verfahren zur Herstellung selbigen Materials und Lithografiegerät, welches selbiges umfasst - Google Patents

Synthetisches Siliziumdioxid mit geringer polarisationsinduzierter Doppelbrechung, Verfahren zur Herstellung selbigen Materials und Lithografiegerät, welches selbiges umfasst Download PDF

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Publication number
DE112005003341B4
DE112005003341B4 DE112005003341.4T DE112005003341T DE112005003341B4 DE 112005003341 B4 DE112005003341 B4 DE 112005003341B4 DE 112005003341 T DE112005003341 T DE 112005003341T DE 112005003341 B4 DE112005003341 B4 DE 112005003341B4
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Prior art keywords
polarization
glass
less
birefringence
synthetic silica
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DE112005003341.4T
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German (de)
English (en)
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DE112005003341T5 (de
Inventor
Douglas C. Allan
Dana C. Bookbinder
Ulrich Neukirch
Charlene M. Smith
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Corning Inc
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Corning Inc
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Priority claimed from US11/241,075 external-priority patent/US7589039B2/en
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    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
    • C03B19/1453—Thermal after-treatment of the shaped article, e.g. dehydrating, consolidating, sintering
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/07—Impurity concentration specified
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/07—Impurity concentration specified
    • C03B2201/075—Hydroxyl ion (OH)
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/20—Doped silica-based glasses doped with non-metals other than boron or fluorine
    • C03B2201/21—Doped silica-based glasses doped with non-metals other than boron or fluorine doped with molecular hydrogen
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/20—Doped silica-based glasses doped with non-metals other than boron or fluorine
    • C03B2201/23—Doped silica-based glasses doped with non-metals other than boron or fluorine doped with hydroxyl groups
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/06—Doped silica-based glasses
    • C03C2201/20—Doped silica-based glasses containing non-metals other than boron or halide
    • C03C2201/21—Doped silica-based glasses containing non-metals other than boron or halide containing molecular hydrogen
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/06—Doped silica-based glasses
    • C03C2201/20—Doped silica-based glasses containing non-metals other than boron or halide
    • C03C2201/23—Doped silica-based glasses containing non-metals other than boron or halide containing hydroxyl groups
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2203/00—Production processes
    • C03C2203/50—After-treatment
    • C03C2203/52—Heat-treatment
    • C03C2203/54—Heat-treatment in a dopant containing atmosphere

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Thermal Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Glass Compositions (AREA)
  • Glass Melting And Manufacturing (AREA)
DE112005003341.4T 2004-12-30 2005-12-29 Synthetisches Siliziumdioxid mit geringer polarisationsinduzierter Doppelbrechung, Verfahren zur Herstellung selbigen Materials und Lithografiegerät, welches selbiges umfasst Active DE112005003341B4 (de)

Applications Claiming Priority (9)

Application Number Priority Date Filing Date Title
US64069604P 2004-12-30 2004-12-30
US60/640,696 2004-12-30
US64986005P 2005-02-02 2005-02-02
US60/649,860 2005-02-02
US69610605P 2005-06-30 2005-06-30
US60/696,106 2005-06-30
US11/241,075 2005-09-30
US11/241,075 US7589039B2 (en) 2004-12-29 2005-09-30 Synthetic silica having low polarization-induced birefringence, method of making same and lithographic device comprising same
PCT/US2005/047452 WO2006074083A1 (en) 2004-12-30 2005-12-29 Synthetic silica having low polarization-induced birefringence, method of making same and lithographic device comprising same

Publications (2)

Publication Number Publication Date
DE112005003341T5 DE112005003341T5 (de) 2008-02-28
DE112005003341B4 true DE112005003341B4 (de) 2019-01-31

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DE112005003341.4T Active DE112005003341B4 (de) 2004-12-30 2005-12-29 Synthetisches Siliziumdioxid mit geringer polarisationsinduzierter Doppelbrechung, Verfahren zur Herstellung selbigen Materials und Lithografiegerät, welches selbiges umfasst

Country Status (4)

Country Link
JP (1) JP5538679B2 (ja)
DE (1) DE112005003341B4 (ja)
TW (1) TWI312768B (ja)
WO (1) WO2006074083A1 (ja)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7635658B2 (en) * 2005-11-07 2009-12-22 Corning Inc Deuteroxyl-doped silica glass, optical member and lithographic system comprising same and method of making same
JP2013075827A (ja) * 2005-11-07 2013-04-25 Corning Inc デューテロキシルドープ石英ガラス、このガラスを有する光学部材及びリソグラフィシステム並びにこのガラスの作成方法

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5086352A (en) 1989-06-09 1992-02-04 Shin-Etsu Quartz Products Co., Ltd. Optical members and blanks or synthetic silica glass and method for their production
US5325230A (en) 1989-06-09 1994-06-28 Shin-Etsu Quartz Products Co., Ltd. Optical members and blanks of synthetic silica glass and method for their production
US5410428A (en) 1990-10-30 1995-04-25 Shin-Etsu Quartz Products Co. Ltd. Optical member made of high-purity and transparent synthetic silica glass and method for production thereof or blank thereof
EP0737654A1 (en) 1995-04-14 1996-10-16 Corning Incorporated High purity fused silica having high resistance to optical damage
EP1061052A1 (en) 1998-01-30 2000-12-20 Asahi Glass Co., Ltd. Synthetic silica glass optical members and process for the production thereof
US6434106B1 (en) 1998-02-13 2002-08-13 Fujitsu Limited Optical information storage unit and laser power control method
EP1340722A1 (en) 2002-01-31 2003-09-03 Heraeus Quarzglas GmbH & Co. KG Synthetic quartz glass material for ArF aligners
US20030195107A1 (en) 1998-10-28 2003-10-16 Asahi Glass Company Limited Synthetic quartz glass and process for producing it

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0959034A (ja) * 1995-08-22 1997-03-04 Sumitomo Metal Ind Ltd 合成石英ガラス材及びその製造方法
JP3403317B2 (ja) * 1997-05-20 2003-05-06 信越石英株式会社 高出力真空紫外線用合成シリカガラス光学材料およびその製造方法
JP3893816B2 (ja) * 1998-10-28 2007-03-14 旭硝子株式会社 合成石英ガラスおよびその製造方法
JP3069562B1 (ja) * 1999-10-19 2000-07-24 信越石英株式会社 エキシマレ―ザ及びエキシマランプ用のシリカガラス光学材料及びその製造方法
EP1330679A4 (en) * 2000-10-03 2006-09-06 Corning Inc PHOTOLITHOGRAPHIC PROCESSES AND SYSTEMS
DE10159961C2 (de) * 2001-12-06 2003-12-24 Heraeus Quarzglas Quarzglasrohling für ein optisches Bauteil sowie Verfahren zur Herstellung und Verwendung desselben
US7534733B2 (en) * 2004-02-23 2009-05-19 Corning Incorporated Synthetic silica glass optical material having high resistance to laser induced damage
DE102004017031B4 (de) * 2004-04-02 2008-10-23 Heraeus Quarzglas Gmbh & Co. Kg Optisches Bauteil aus Quarzglas, Verfahren zur Herstellung des Bauteils und Verwendung desselben

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5086352A (en) 1989-06-09 1992-02-04 Shin-Etsu Quartz Products Co., Ltd. Optical members and blanks or synthetic silica glass and method for their production
US5325230A (en) 1989-06-09 1994-06-28 Shin-Etsu Quartz Products Co., Ltd. Optical members and blanks of synthetic silica glass and method for their production
US5410428A (en) 1990-10-30 1995-04-25 Shin-Etsu Quartz Products Co. Ltd. Optical member made of high-purity and transparent synthetic silica glass and method for production thereof or blank thereof
EP0737654A1 (en) 1995-04-14 1996-10-16 Corning Incorporated High purity fused silica having high resistance to optical damage
US5616159A (en) 1995-04-14 1997-04-01 Corning Incorporated Method of forming high purity fused silica having high resistance to optical damage
EP1061052A1 (en) 1998-01-30 2000-12-20 Asahi Glass Co., Ltd. Synthetic silica glass optical members and process for the production thereof
US6434106B1 (en) 1998-02-13 2002-08-13 Fujitsu Limited Optical information storage unit and laser power control method
US20030195107A1 (en) 1998-10-28 2003-10-16 Asahi Glass Company Limited Synthetic quartz glass and process for producing it
EP1340722A1 (en) 2002-01-31 2003-09-03 Heraeus Quarzglas GmbH & Co. KG Synthetic quartz glass material for ArF aligners

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
C.K. Van Peski et al. berichten im Journal of Non-Crystalline Solids, 265, 286 (2000)
Shelby, J.E., legt in Strahlungswirkungen in mit Wasserstoff imprägniertem glasigem Siliziumdioxid, J. Applied Physics, Bd. 50, Nr. 5, S. 3702-06 (1979)

Also Published As

Publication number Publication date
DE112005003341T5 (de) 2008-02-28
TWI312768B (en) 2009-08-01
WO2006074083A1 (en) 2006-07-13
TW200704604A (en) 2007-02-01
JP2008526672A (ja) 2008-07-24
JP5538679B2 (ja) 2014-07-02

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