DE102021113131A1 - Verfahren zum Betreiben einer Doppelseitenbearbeitungsmaschine sowie Doppelseitenbearbeitungsmaschine - Google Patents
Verfahren zum Betreiben einer Doppelseitenbearbeitungsmaschine sowie Doppelseitenbearbeitungsmaschine Download PDFInfo
- Publication number
- DE102021113131A1 DE102021113131A1 DE102021113131.6A DE102021113131A DE102021113131A1 DE 102021113131 A1 DE102021113131 A1 DE 102021113131A1 DE 102021113131 A DE102021113131 A DE 102021113131A DE 102021113131 A1 DE102021113131 A1 DE 102021113131A1
- Authority
- DE
- Germany
- Prior art keywords
- working
- heating
- double
- disk
- processing machine
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B7/00—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor
- B24B7/20—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground
- B24B7/22—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain
- B24B7/228—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain for grinding thin, brittle parts, e.g. semiconductors, wafers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B7/00—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor
- B24B7/10—Single-purpose machines or devices
- B24B7/16—Single-purpose machines or devices for grinding end-faces, e.g. of gauges, rollers, nuts, piston rings
- B24B7/17—Single-purpose machines or devices for grinding end-faces, e.g. of gauges, rollers, nuts, piston rings for simultaneously grinding opposite and parallel end faces, e.g. double disc grinders
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B27/00—Other grinding machines or devices
- B24B27/0076—Other grinding machines or devices grinding machines comprising two or more grinding tools
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
- B24B37/07—Lapping machines or devices; Accessories designed for working plane surfaces characterised by the movement of the work or lapping tool
- B24B37/08—Lapping machines or devices; Accessories designed for working plane surfaces characterised by the movement of the work or lapping tool for double side lapping
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B49/00—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
- B24B49/14—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation taking regard of the temperature during grinding
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B55/00—Safety devices for grinding or polishing machines; Accessories fitted to grinding or polishing machines for keeping tools or parts of the machine in good working condition
- B24B55/02—Equipment for cooling the grinding surfaces, e.g. devices for feeding coolant
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Ceramic Engineering (AREA)
- Inorganic Chemistry (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Grinding Of Cylindrical And Plane Surfaces (AREA)
- Constituent Portions Of Griding Lathes, Driving, Sensing And Control (AREA)
- Grinding-Machine Dressing And Accessory Apparatuses (AREA)
Priority Applications (7)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102021113131.6A DE102021113131A1 (de) | 2021-05-20 | 2021-05-20 | Verfahren zum Betreiben einer Doppelseitenbearbeitungsmaschine sowie Doppelseitenbearbeitungsmaschine |
| TW111111387A TW202300276A (zh) | 2021-05-20 | 2022-03-25 | 用於操作雙面加工機之方法及雙面加工機 |
| EP22166751.2A EP4091767B1 (de) | 2021-05-20 | 2022-04-05 | Verfahren zum betreiben einer doppelseitenbearbeitungsmaschine sowie doppelseitenbearbeitungsmaschine |
| JP2022074481A JP2022179370A (ja) | 2021-05-20 | 2022-04-28 | 両面加工機械の運転方法および両面加工機械 |
| CN202210510241.5A CN115365920A (zh) | 2021-05-20 | 2022-05-11 | 用于运行双面加工机的方法以及双面加工机 |
| KR1020220058402A KR20220157305A (ko) | 2021-05-20 | 2022-05-12 | 양면 가공 기계를 작동하는 방법 및 양면 가공 기계 |
| US17/747,575 US20220371154A1 (en) | 2021-05-20 | 2022-05-18 | Method for operating a double-sided processing machine and double-sided processing machine |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102021113131.6A DE102021113131A1 (de) | 2021-05-20 | 2021-05-20 | Verfahren zum Betreiben einer Doppelseitenbearbeitungsmaschine sowie Doppelseitenbearbeitungsmaschine |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE102021113131A1 true DE102021113131A1 (de) | 2022-11-24 |
Family
ID=81325319
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE102021113131.6A Pending DE102021113131A1 (de) | 2021-05-20 | 2021-05-20 | Verfahren zum Betreiben einer Doppelseitenbearbeitungsmaschine sowie Doppelseitenbearbeitungsmaschine |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US20220371154A1 (https=) |
| EP (1) | EP4091767B1 (https=) |
| JP (1) | JP2022179370A (https=) |
| KR (1) | KR20220157305A (https=) |
| CN (1) | CN115365920A (https=) |
| DE (1) | DE102021113131A1 (https=) |
| TW (1) | TW202300276A (https=) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2026042691A1 (ja) * | 2024-08-20 | 2026-02-26 | Agc株式会社 | ワークを研磨する方法、および当該方法を用いて研磨されたワーク |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE10007390A1 (de) | 1999-03-13 | 2000-10-12 | Wolters Peter Werkzeugmasch | Zweischeiben-Poliermaschine, insbesondere zur Bearbeitung von Halbleiterwafern |
| DE102004040429A1 (de) | 2004-08-20 | 2006-02-23 | Peter Wolters Surface Technologies Gmbh & Co. Kg | Doppelseiten-Poliermaschine |
| US7201634B1 (en) | 2005-11-14 | 2007-04-10 | Infineon Technologies Ag | Polishing methods and apparatus |
| JP2011161611A (ja) | 2010-02-15 | 2011-08-25 | Shin Etsu Handotai Co Ltd | キャリア取り付け方法 |
Family Cites Families (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US1257046A (en) * | 1918-01-02 | 1918-02-19 | Edward A Suverkrop | Lapping-machine. |
| JPH11104951A (ja) * | 1997-10-02 | 1999-04-20 | Speedfam Co Ltd | ラッピング加工方法 |
| EP1175964A3 (en) * | 2000-07-27 | 2003-07-23 | Agere Systems Guardian Corporation | Polishing surface temperature conditioning system for a chemical mechanical planarization process |
| US6488571B2 (en) * | 2000-12-22 | 2002-12-03 | Intel Corporation | Apparatus for enhanced rate chemical mechanical polishing with adjustable selectivity |
| US6599175B2 (en) * | 2001-08-06 | 2003-07-29 | Speedfam-Ipeca Corporation | Apparatus for distributing a fluid through a polishing pad |
| JP2003257914A (ja) * | 2002-02-27 | 2003-09-12 | Fujitsu Ltd | 化学機械研磨方法と装置、及び半導体装置の製造方法 |
| DE102006032455A1 (de) * | 2006-07-13 | 2008-04-10 | Siltronic Ag | Verfahren zum gleichzeitigen beidseitigen Schleifen mehrerer Halbleiterscheiben sowie Halbleierscheibe mit hervorragender Ebenheit |
| DE102007011880A1 (de) * | 2007-03-13 | 2008-09-18 | Peter Wolters Gmbh | Bearbeitungsmaschine mit Mitteln zur Erfassung von Bearbeitungsparametern |
| US20100279435A1 (en) * | 2009-04-30 | 2010-11-04 | Applied Materials, Inc. | Temperature control of chemical mechanical polishing |
| CN102782807B (zh) * | 2010-01-22 | 2015-07-08 | 芝浦机械电子装置股份有限公司 | 基板处理装置及基板处理方法 |
| DE102013202488B4 (de) * | 2013-02-15 | 2015-01-22 | Siltronic Ag | Verfahren zum Abrichten von Poliertüchern zur gleichzeitig beidseitigen Politur von Halbleiterscheiben |
| US20150306728A1 (en) * | 2014-04-23 | 2015-10-29 | Silicon Quest International, Incorporated | Systems for, methods of, and apparatus for processing substrate surfaces |
| DE102016102223B4 (de) * | 2016-02-09 | 2025-10-16 | Lapmaster Wolters Gmbh | Doppel- oder Einseiten-Bearbeitungsmaschine und Verfahren zum Betreiben einer Doppel- oder Einseiten-Bearbeitungsmaschine |
| CN110549239A (zh) * | 2018-05-31 | 2019-12-10 | 长鑫存储技术有限公司 | 化学机械研磨装置及研磨垫表面修整方法 |
| CN110707028A (zh) * | 2019-10-18 | 2020-01-17 | 长江存储科技有限责任公司 | 晶圆热处理装置及晶圆热处理方法 |
| CN211193456U (zh) * | 2019-12-11 | 2020-08-07 | 北京微纳精密机械有限公司 | 一种便于控制抛光盘温度的化学机械抛光机 |
| US20210394331A1 (en) * | 2020-06-17 | 2021-12-23 | Globalwafers Co., Ltd. | Semiconductor substrate polishing with polishing pad temperature control |
-
2021
- 2021-05-20 DE DE102021113131.6A patent/DE102021113131A1/de active Pending
-
2022
- 2022-03-25 TW TW111111387A patent/TW202300276A/zh unknown
- 2022-04-05 EP EP22166751.2A patent/EP4091767B1/de active Active
- 2022-04-28 JP JP2022074481A patent/JP2022179370A/ja active Pending
- 2022-05-11 CN CN202210510241.5A patent/CN115365920A/zh active Pending
- 2022-05-12 KR KR1020220058402A patent/KR20220157305A/ko active Pending
- 2022-05-18 US US17/747,575 patent/US20220371154A1/en active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE10007390A1 (de) | 1999-03-13 | 2000-10-12 | Wolters Peter Werkzeugmasch | Zweischeiben-Poliermaschine, insbesondere zur Bearbeitung von Halbleiterwafern |
| DE102004040429A1 (de) | 2004-08-20 | 2006-02-23 | Peter Wolters Surface Technologies Gmbh & Co. Kg | Doppelseiten-Poliermaschine |
| US7201634B1 (en) | 2005-11-14 | 2007-04-10 | Infineon Technologies Ag | Polishing methods and apparatus |
| JP2011161611A (ja) | 2010-02-15 | 2011-08-25 | Shin Etsu Handotai Co Ltd | キャリア取り付け方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| TW202300276A (zh) | 2023-01-01 |
| US20220371154A1 (en) | 2022-11-24 |
| EP4091767A1 (de) | 2022-11-23 |
| EP4091767B1 (de) | 2026-03-04 |
| JP2022179370A (ja) | 2022-12-02 |
| EP4091767C0 (de) | 2026-03-04 |
| CN115365920A (zh) | 2022-11-22 |
| KR20220157305A (ko) | 2022-11-29 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| R012 | Request for examination validly filed | ||
| R016 | Response to examination communication | ||
| R016 | Response to examination communication |