DE102015225509A1 - Reflektives optisches Element - Google Patents

Reflektives optisches Element Download PDF

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Publication number
DE102015225509A1
DE102015225509A1 DE102015225509.3A DE102015225509A DE102015225509A1 DE 102015225509 A1 DE102015225509 A1 DE 102015225509A1 DE 102015225509 A DE102015225509 A DE 102015225509A DE 102015225509 A1 DE102015225509 A1 DE 102015225509A1
Authority
DE
Germany
Prior art keywords
optical element
layer
reflective
reflective optical
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
DE102015225509.3A
Other languages
German (de)
English (en)
Inventor
Peter Huber
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Carl Zeiss SMT GmbH
Original Assignee
Carl Zeiss SMT GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Carl Zeiss SMT GmbH filed Critical Carl Zeiss SMT GmbH
Priority to DE102015225509.3A priority Critical patent/DE102015225509A1/de
Priority to PCT/EP2016/078343 priority patent/WO2017102256A1/de
Priority to JP2018531591A priority patent/JP6814216B2/ja
Publication of DE102015225509A1 publication Critical patent/DE102015225509A1/de
Priority to US16/011,019 priority patent/US10338476B2/en
Ceased legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof
    • G03F1/24—Reflection masks; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
    • G03F1/84—Inspecting
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70316—Details of optical elements, e.g. of Bragg reflectors, extreme ultraviolet [EUV] multilayer or bilayer mirrors or diffractive optical elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
    • G03F7/70891—Temperature
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—HANDLING OF PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
    • G21K1/062—Devices having a multilayer structure
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—HANDLING OF PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/065—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements provided with cooling means

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Engineering & Computer Science (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Optical Elements Other Than Lenses (AREA)
DE102015225509.3A 2015-12-16 2015-12-16 Reflektives optisches Element Ceased DE102015225509A1 (de)

Priority Applications (4)

Application Number Priority Date Filing Date Title
DE102015225509.3A DE102015225509A1 (de) 2015-12-16 2015-12-16 Reflektives optisches Element
PCT/EP2016/078343 WO2017102256A1 (de) 2015-12-16 2016-11-21 Reflektives optisches element
JP2018531591A JP6814216B2 (ja) 2015-12-16 2016-11-21 反射光学素子
US16/011,019 US10338476B2 (en) 2015-12-16 2018-06-18 Reflective optical element

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE102015225509.3A DE102015225509A1 (de) 2015-12-16 2015-12-16 Reflektives optisches Element

Publications (1)

Publication Number Publication Date
DE102015225509A1 true DE102015225509A1 (de) 2017-06-22

Family

ID=57389426

Family Applications (1)

Application Number Title Priority Date Filing Date
DE102015225509.3A Ceased DE102015225509A1 (de) 2015-12-16 2015-12-16 Reflektives optisches Element

Country Status (4)

Country Link
US (1) US10338476B2 (https=)
JP (1) JP6814216B2 (https=)
DE (1) DE102015225509A1 (https=)
WO (1) WO2017102256A1 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112713499A (zh) * 2020-12-30 2021-04-27 武汉光谷航天三江激光产业技术研究院有限公司 光学元件散热装置及方法

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102004060184A1 (de) * 2004-12-14 2006-07-06 Carl Zeiss Smt Ag EUV-Spiegelanordnung
US20070259275A1 (en) * 2006-05-05 2007-11-08 Asml Netherlands B.V. Anti-reflection coating for an EUV mask
DE102009044462A1 (de) * 2009-11-06 2011-01-05 Carl Zeiss Smt Ag Optisches Element, Beleuchtungssystem und Projektionsbelichtungsanlage
US20110297852A1 (en) * 2010-03-25 2011-12-08 Hidenobu Kameda Mirror and extreme ultraviolet light generation system
DE102010039930A1 (de) 2010-08-30 2012-03-01 Carl Zeiss Smt Gmbh Projektionsbelichtungsanlage
DE102011080052A1 (de) * 2011-07-28 2013-01-31 Carl Zeiss Smt Gmbh Spiegel, optisches System mit Spiegel und Verfahren zur Herstellung eines Spiegels
DE102014222534A1 (de) * 2014-11-05 2015-11-12 Carl Zeiss Smt Gmbh Verfahren zum Herstellen eines reflektiven optischen Elements, sowie reflektives optisches Element

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7424729B2 (en) * 2000-04-17 2008-09-09 Lg Electronics Inc. Differentiated PSIP table update interval technology
DE10040998A1 (de) * 2000-08-22 2002-03-14 Zeiss Carl Projektionsbelichtungsanlage
US6806006B2 (en) * 2002-07-15 2004-10-19 International Business Machines Corporation Integrated cooling substrate for extreme ultraviolet reticle
EP1526550A1 (en) * 2003-10-20 2005-04-27 ASML Netherlands B.V. Mirror for use in a lithographic apparatus, lithographic apparatus comprising such a mirror and device manufacturing method
US7332416B2 (en) * 2005-03-28 2008-02-19 Intel Corporation Methods to manufacture contaminant-gettering materials in the surface of EUV optics
WO2009152959A1 (en) * 2008-06-17 2009-12-23 Carl Zeiss Smt Ag Projection exposure apparatus for semiconductor lithography comprising a device for the thermal manipulation of an optical element
JP5511818B2 (ja) * 2008-08-06 2014-06-04 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置用の光学素子、かかる光学素子を含むリソグラフィ装置、およびかかる光学素子を製造する方法
DE102009054869B4 (de) * 2009-04-09 2022-02-17 Carl Zeiss Smt Gmbh Spiegel zur Führung eines Strahlungsbündels, Vorrichtungen mit einem derartigen Spiegel sowie Verfahren zur Herstellung mikro- oder nanostrukturierter Bauelemente
WO2012013751A1 (en) * 2010-07-30 2012-02-02 Carl Zeiss Smt Gmbh Euv exposure apparatus
DE102012212898A1 (de) * 2012-07-24 2014-01-30 Carl Zeiss Smt Gmbh Spiegelanordnung für eine EUV-Projektionsbelichtungsanlage, Verfahren zum Betreiben derselben, sowie EUV-Projektionsbelichtungsanlage
US20150219874A1 (en) * 2012-11-29 2015-08-06 Carl Zeiss Smt Gmbh Cooling system for at least one system component of an optical system for euv applications and system component of this type and optical system of this type
DE102013204427A1 (de) 2013-03-14 2014-09-18 Carl Zeiss Smt Gmbh Anordnung zur thermischen Aktuierung eines Spiegels, insbesondere in einer mikrolithographischen Projektionsbelichtungsanlage
DE102013102670A1 (de) * 2013-03-15 2014-10-02 Asml Netherlands B.V. Optisches Element und optisches System für die EUV-Lithographie sowie Verfahren zur Behandlung eines solchen optischen Elements
DE102014219755A1 (de) 2013-10-30 2015-04-30 Carl Zeiss Smt Gmbh Reflektives optisches Element
DE102014204171A1 (de) * 2014-03-06 2015-09-24 Carl Zeiss Smt Gmbh Optisches Element und optische Anordnung damit
DE102014206765A1 (de) * 2014-04-08 2015-10-08 Carl Zeiss Smt Gmbh Spiegelanordnung, Projektionsobjektiv und EUV-Lithographieanlage
DE102014216240A1 (de) 2014-08-15 2016-02-18 Carl Zeiss Smt Gmbh Reflektives optisches Element

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102004060184A1 (de) * 2004-12-14 2006-07-06 Carl Zeiss Smt Ag EUV-Spiegelanordnung
US20070259275A1 (en) * 2006-05-05 2007-11-08 Asml Netherlands B.V. Anti-reflection coating for an EUV mask
DE102009044462A1 (de) * 2009-11-06 2011-01-05 Carl Zeiss Smt Ag Optisches Element, Beleuchtungssystem und Projektionsbelichtungsanlage
US20110297852A1 (en) * 2010-03-25 2011-12-08 Hidenobu Kameda Mirror and extreme ultraviolet light generation system
DE102010039930A1 (de) 2010-08-30 2012-03-01 Carl Zeiss Smt Gmbh Projektionsbelichtungsanlage
DE102011080052A1 (de) * 2011-07-28 2013-01-31 Carl Zeiss Smt Gmbh Spiegel, optisches System mit Spiegel und Verfahren zur Herstellung eines Spiegels
DE102014222534A1 (de) * 2014-11-05 2015-11-12 Carl Zeiss Smt Gmbh Verfahren zum Herstellen eines reflektiven optischen Elements, sowie reflektives optisches Element

Also Published As

Publication number Publication date
WO2017102256A1 (de) 2017-06-22
JP2019500652A (ja) 2019-01-10
JP6814216B2 (ja) 2021-01-13
US10338476B2 (en) 2019-07-02
US20180307142A1 (en) 2018-10-25

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