DE102013022563A1 - - Google Patents
Info
- Publication number
- DE102013022563A1 DE102013022563A1 DE201310022563 DE102013022563A DE102013022563A1 DE 102013022563 A1 DE102013022563 A1 DE 102013022563A1 DE 201310022563 DE201310022563 DE 201310022563 DE 102013022563 A DE102013022563 A DE 102013022563A DE 102013022563 A1 DE102013022563 A1 DE 102013022563A1
- Authority
- DE
- Germany
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C39/00—Shaping by casting, i.e. introducing the moulding material into a mould or between confining surfaces without significant moulding pressure; Apparatus therefor
- B29C39/22—Component parts, details or accessories; Auxiliary operations
- B29C39/24—Feeding the material into the mould
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C43/00—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor
- B29C43/02—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor of articles of definite length, i.e. discrete articles
- B29C43/021—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor of articles of definite length, i.e. discrete articles characterised by the shape of the surface
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0017—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor for the production of embossing, cutting or similar devices; for the production of casting means
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
- B29C59/02—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
- B29C59/022—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing characterised by the disposition or the configuration, e.g. dimensions, of the embossments or the shaping tools therefor
- B29C2059/023—Microembossing
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Shaping Of Tube Ends By Bending Or Straightening (AREA)
- Micromachines (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102013113241.3A DE102013113241B4 (de) | 2013-11-29 | 2013-11-29 | Verfahren zum Prägen von Strukturen |
| PCT/EP2014/072638 WO2015078637A1 (de) | 2013-11-29 | 2014-10-22 | Verfahren und vorrichtung zum prägen von strukturen |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE102013022563A1 true DE102013022563A1 (https=) | 2015-06-03 |
Family
ID=51845390
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE102013113241.3A Revoked DE102013113241B4 (de) | 2013-11-29 | 2013-11-29 | Verfahren zum Prägen von Strukturen |
| DE201310022563 Granted DE102013022563A1 (https=) | 2013-11-29 | 2013-11-29 |
Family Applications Before (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE102013113241.3A Revoked DE102013113241B4 (de) | 2013-11-29 | 2013-11-29 | Verfahren zum Prägen von Strukturen |
Country Status (9)
| Country | Link |
|---|---|
| US (1) | US10088746B2 (https=) |
| JP (1) | JP6559130B2 (https=) |
| KR (2) | KR102361175B1 (https=) |
| CN (1) | CN105745575B (https=) |
| AT (2) | AT526564B1 (https=) |
| DE (2) | DE102013113241B4 (https=) |
| SG (1) | SG11201604314VA (https=) |
| TW (2) | TWI688467B (https=) |
| WO (1) | WO2015078637A1 (https=) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20170023816A (ko) | 2014-06-26 | 2017-03-06 | 에베 그룹 에. 탈너 게엠베하 | 기질들을 서로 모이게 하여 연결 재료를 분포시키는 동안 기질들을 결합시키기 위한 방법 |
| TWI707766B (zh) * | 2018-07-16 | 2020-10-21 | 奇景光電股份有限公司 | 壓印系統、供膠裝置及壓印方法 |
| WO2021098953A1 (de) * | 2019-11-19 | 2021-05-27 | Ev Group E. Thallner Gmbh | Vorrichtung und verfahren zum prägen von mikro- und/oder nanostrukturen |
| CN116954019A (zh) * | 2023-06-21 | 2023-10-27 | 湖北大学 | 一种基于液态镓的冷冻离心纳米压印方法 |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6916584B2 (en) | 2002-08-01 | 2005-07-12 | Molecular Imprints, Inc. | Alignment methods for imprint lithography |
| WO2004086471A1 (en) | 2003-03-27 | 2004-10-07 | Korea Institute Of Machinery & Materials | Uv nanoimprint lithography process using elementwise embossed stamp and selectively additive pressurization |
| US20050276919A1 (en) | 2004-06-01 | 2005-12-15 | Molecular Imprints, Inc. | Method for dispensing a fluid on a substrate |
| US7281919B2 (en) | 2004-12-07 | 2007-10-16 | Molecular Imprints, Inc. | System for controlling a volume of material on a mold |
| US20070228608A1 (en) | 2006-04-03 | 2007-10-04 | Molecular Imprints, Inc. | Preserving Filled Features when Vacuum Wiping |
| JP5443103B2 (ja) | 2009-09-10 | 2014-03-19 | 株式会社東芝 | パターン形成方法 |
| WO2012160769A1 (ja) | 2011-05-24 | 2012-11-29 | コニカミノルタアドバンストレイヤー株式会社 | 樹脂成形品の製造方法 |
| WO2012169120A1 (ja) | 2011-06-07 | 2012-12-13 | コニカミノルタアドバンストレイヤー株式会社 | 複合体の製造方法および複合体 |
-
2013
- 2013-11-29 DE DE102013113241.3A patent/DE102013113241B4/de not_active Revoked
- 2013-11-29 DE DE201310022563 patent/DE102013022563A1/de active Granted
-
2014
- 2014-10-22 AT ATA9445/2014A patent/AT526564B1/de active
- 2014-10-22 KR KR1020217013477A patent/KR102361175B1/ko active Active
- 2014-10-22 SG SG11201604314VA patent/SG11201604314VA/en unknown
- 2014-10-22 JP JP2016534902A patent/JP6559130B2/ja active Active
- 2014-10-22 US US15/038,761 patent/US10088746B2/en active Active
- 2014-10-22 KR KR1020167013828A patent/KR102250979B1/ko active Active
- 2014-10-22 AT ATA139/2023A patent/AT526465A1/de unknown
- 2014-10-22 CN CN201480065137.3A patent/CN105745575B/zh active Active
- 2014-10-22 WO PCT/EP2014/072638 patent/WO2015078637A1/de not_active Ceased
- 2014-10-30 TW TW103137651A patent/TWI688467B/zh active
- 2014-10-30 TW TW108116265A patent/TWI705884B/zh active
Also Published As
| Publication number | Publication date |
|---|---|
| AT526564B1 (de) | 2024-05-15 |
| JP6559130B2 (ja) | 2019-08-14 |
| TWI705884B (zh) | 2020-10-01 |
| CN105745575B (zh) | 2019-12-17 |
| JP2017500738A (ja) | 2017-01-05 |
| US10088746B2 (en) | 2018-10-02 |
| DE102013113241A1 (de) | 2015-06-03 |
| TW201932279A (zh) | 2019-08-16 |
| WO2015078637A1 (de) | 2015-06-04 |
| KR102250979B1 (ko) | 2021-05-12 |
| US20170031242A1 (en) | 2017-02-02 |
| KR20160091333A (ko) | 2016-08-02 |
| TWI688467B (zh) | 2020-03-21 |
| TW201532784A (zh) | 2015-09-01 |
| AT526564A5 (de) | 2024-05-15 |
| CN105745575A (zh) | 2016-07-06 |
| KR102361175B1 (ko) | 2022-02-10 |
| AT526465A1 (de) | 2024-02-15 |
| KR20210054597A (ko) | 2021-05-13 |
| SG11201604314VA (en) | 2016-07-28 |
| DE102013113241B4 (de) | 2019-02-21 |
Similar Documents
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| R012 | Request for examination validly filed | ||
| R129 | Divisional application from |
Ref document number: 102013113241 Country of ref document: DE |
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| R016 | Response to examination communication | ||
| R016 | Response to examination communication | ||
| R016 | Response to examination communication | ||
| R016 | Response to examination communication | ||
| R018 | Grant decision by examination section/examining division |