DE102012208064A1 - Beleuchtungsoptik für die EUV-Projektionslithographie - Google Patents
Beleuchtungsoptik für die EUV-Projektionslithographie Download PDFInfo
- Publication number
- DE102012208064A1 DE102012208064A1 DE102012208064A DE102012208064A DE102012208064A1 DE 102012208064 A1 DE102012208064 A1 DE 102012208064A1 DE 102012208064 A DE102012208064 A DE 102012208064A DE 102012208064 A DE102012208064 A DE 102012208064A DE 102012208064 A1 DE102012208064 A1 DE 102012208064A1
- Authority
- DE
- Germany
- Prior art keywords
- mirror
- individual
- illumination
- facet
- groups
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
- 238000005286 illumination Methods 0.000 title claims abstract description 108
- 238000001459 lithography Methods 0.000 title claims abstract description 8
- 238000006073 displacement reaction Methods 0.000 claims description 14
- 238000004519 manufacturing process Methods 0.000 claims description 4
- 238000000034 method Methods 0.000 claims 2
- 238000013507 mapping Methods 0.000 claims 1
- 238000003384 imaging method Methods 0.000 abstract description 8
- 210000001747 pupil Anatomy 0.000 description 30
- 230000005855 radiation Effects 0.000 description 14
- 235000012431 wafers Nutrition 0.000 description 9
- 238000009826 distribution Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 3
- 238000012876 topography Methods 0.000 description 3
- 230000005540 biological transmission Effects 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 230000001360 synchronised effect Effects 0.000 description 2
- BUHVIAUBTBOHAG-FOYDDCNASA-N (2r,3r,4s,5r)-2-[6-[[2-(3,5-dimethoxyphenyl)-2-(2-methylphenyl)ethyl]amino]purin-9-yl]-5-(hydroxymethyl)oxolane-3,4-diol Chemical compound COC1=CC(OC)=CC(C(CNC=2C=3N=CN(C=3N=CN=2)[C@H]2[C@@H]([C@H](O)[C@@H](CO)O2)O)C=2C(=CC=CC=2)C)=C1 BUHVIAUBTBOHAG-FOYDDCNASA-N 0.000 description 1
- 238000003491 array Methods 0.000 description 1
- 230000000295 complement effect Effects 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 239000003574 free electron Substances 0.000 description 1
- 238000001393 microlithography Methods 0.000 description 1
- 238000009304 pastoral farming Methods 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
- G03F7/70116—Off-axis setting using a programmable means, e.g. liquid crystal display [LCD], digital micromirror device [DMD] or pupil facets
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
- G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
- G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/08—Mirrors
- G02B5/0891—Ultraviolet [UV] mirrors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70083—Non-homogeneous intensity distribution in the mask plane
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Lenses (AREA)
- Optical Elements Other Than Lenses (AREA)
- Microscoopes, Condenser (AREA)
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102012208064A DE102012208064A1 (de) | 2012-05-15 | 2012-05-15 | Beleuchtungsoptik für die EUV-Projektionslithographie |
| PCT/EP2013/059016 WO2013171071A1 (en) | 2012-05-15 | 2013-04-30 | Illumination optical unit for euv projection lithography |
| JP2015511982A JP6332758B2 (ja) | 2012-05-15 | 2013-04-30 | Ｅｕｖ投影リソグラフィのための照明光学ユニット |
| US14/517,139 US10126658B2 (en) | 2012-05-15 | 2014-10-17 | Illumination optical unit for EUV projection lithography |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102012208064A DE102012208064A1 (de) | 2012-05-15 | 2012-05-15 | Beleuchtungsoptik für die EUV-Projektionslithographie |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE102012208064A1 true DE102012208064A1 (de) | 2013-11-21 |
Family
ID=49510925
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE102012208064A Ceased DE102012208064A1 (de) | 2012-05-15 | 2012-05-15 | Beleuchtungsoptik für die EUV-Projektionslithographie |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US10126658B2 (enExample) |
| JP (1) | JP6332758B2 (enExample) |
| DE (1) | DE102012208064A1 (enExample) |
| WO (1) | WO2013171071A1 (enExample) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102014217611A1 (de) * | 2014-09-03 | 2016-03-03 | Carl Zeiss Smt Gmbh | Beleuchtungsoptik für die Projektionslithografie |
| WO2016078819A1 (en) * | 2014-11-18 | 2016-05-26 | Carl Zeiss Smt Gmbh | Illumination optical unit for euv projection lithography |
| DE102017217266A1 (de) * | 2017-09-28 | 2019-03-28 | Carl Zeiss Smt Gmbh | Verfahren zur Bestimmung von Eigenschaften einer EUV-Quelle |
| DE102021202768A1 (de) * | 2021-03-22 | 2022-09-22 | Carl Zeiss Smt Gmbh | Facettensystem und lithographieanlage |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1225481A2 (de) | 2001-01-23 | 2002-07-24 | Carl Zeiss Semiconductor Manufacturing Technologies Ag | Kollektor für Beleuchtungssysteme mit einer Wellenlänge 193 nm |
| US6438199B1 (en) | 1998-05-05 | 2002-08-20 | Carl-Zeiss-Stiftung | Illumination system particularly for microlithography |
| US6658084B2 (en) | 2000-10-27 | 2003-12-02 | Carl Zeiss Smt Ag | Illumination system with variable adjustment of the illumination |
| US6859515B2 (en) | 1998-05-05 | 2005-02-22 | Carl-Zeiss-Stiftung Trading | Illumination system, particularly for EUV lithography |
| WO2009100856A1 (en) | 2008-02-15 | 2009-08-20 | Carl Zeiss Smt Ag | Facet mirror for use in a projection exposure apparatus for microlithography |
| DE102008009600A1 (de) * | 2008-02-15 | 2009-08-20 | Carl Zeiss Smt Ag | Facettenspiegel zum Einsatz in einer Projektionsbelichtungsanlage für die Mikro-Lithographie |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6771352B2 (en) * | 2002-03-18 | 2004-08-03 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| DE102006020734A1 (de) | 2006-05-04 | 2007-11-15 | Carl Zeiss Smt Ag | Beleuchtungssystem für die EUV-Lithographie sowie erstes und zweites optisches Element zum Einsatz in einem derartigen Beleuchtungssystem |
| WO2007138805A1 (ja) * | 2006-05-25 | 2007-12-06 | Nikon Corporation | 照明光学装置、露光装置、およびデバイス製造方法 |
| DE102008049586A1 (de) | 2008-09-30 | 2010-04-08 | Carl Zeiss Smt Ag | Feldfacettenspiegel zum Einsatz in einer Beleuchtungsoptik einer Projektionsbelichtungsanlage für die EUV-Mikrolithographie |
| DE102009030501A1 (de) * | 2009-06-24 | 2011-01-05 | Carl Zeiss Smt Ag | Abbildende Optik zur Abbildung eines Objektfeldes in ein Bildfeld sowie Beleuchtungsoptik zur Ausleuchtung eines Objektfeldes |
| DE102011004615A1 (de) * | 2010-03-17 | 2011-09-22 | Carl Zeiss Smt Gmbh | Beleuchtungsoptik für die Projektionslithografie |
| DE102011076145B4 (de) * | 2011-05-19 | 2013-04-11 | Carl Zeiss Smt Gmbh | Verfahren zum Zuordnen einer Pupillenfacette eines Pupillenfacettenspiegels einer Beleuchtungsoptik einer Projektionsbelichtungsanlage zu einer Feldfacette eines Feldfacettenspiegels der Beleuchtungsoptik |
-
2012
- 2012-05-15 DE DE102012208064A patent/DE102012208064A1/de not_active Ceased
-
2013
- 2013-04-30 JP JP2015511982A patent/JP6332758B2/ja active Active
- 2013-04-30 WO PCT/EP2013/059016 patent/WO2013171071A1/en not_active Ceased
-
2014
- 2014-10-17 US US14/517,139 patent/US10126658B2/en active Active
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6438199B1 (en) | 1998-05-05 | 2002-08-20 | Carl-Zeiss-Stiftung | Illumination system particularly for microlithography |
| US6859515B2 (en) | 1998-05-05 | 2005-02-22 | Carl-Zeiss-Stiftung Trading | Illumination system, particularly for EUV lithography |
| US6658084B2 (en) | 2000-10-27 | 2003-12-02 | Carl Zeiss Smt Ag | Illumination system with variable adjustment of the illumination |
| EP1225481A2 (de) | 2001-01-23 | 2002-07-24 | Carl Zeiss Semiconductor Manufacturing Technologies Ag | Kollektor für Beleuchtungssysteme mit einer Wellenlänge 193 nm |
| WO2009100856A1 (en) | 2008-02-15 | 2009-08-20 | Carl Zeiss Smt Ag | Facet mirror for use in a projection exposure apparatus for microlithography |
| DE102008009600A1 (de) * | 2008-02-15 | 2009-08-20 | Carl Zeiss Smt Ag | Facettenspiegel zum Einsatz in einer Projektionsbelichtungsanlage für die Mikro-Lithographie |
| US20110001947A1 (en) | 2008-02-15 | 2011-01-06 | Carl Zeiss Smt Ag | Facet mirror for use in a projection exposure apparatus for microlithography |
Also Published As
| Publication number | Publication date |
|---|---|
| US10126658B2 (en) | 2018-11-13 |
| JP6332758B2 (ja) | 2018-05-30 |
| JP2015517733A (ja) | 2015-06-22 |
| WO2013171071A1 (en) | 2013-11-21 |
| US20150036115A1 (en) | 2015-02-05 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| R012 | Request for examination validly filed | ||
| R002 | Refusal decision in examination/registration proceedings | ||
| R003 | Refusal decision now final |