DE102011103788A1 - Vorrichtung zur Oberflächenbehandlung mit einem Prozessdampf - Google Patents

Vorrichtung zur Oberflächenbehandlung mit einem Prozessdampf Download PDF

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Publication number
DE102011103788A1
DE102011103788A1 DE201110103788 DE102011103788A DE102011103788A1 DE 102011103788 A1 DE102011103788 A1 DE 102011103788A1 DE 201110103788 DE201110103788 DE 201110103788 DE 102011103788 A DE102011103788 A DE 102011103788A DE 102011103788 A1 DE102011103788 A1 DE 102011103788A1
Authority
DE
Germany
Prior art keywords
contraption
baffle
vapor
inner container
steam
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
DE201110103788
Other languages
German (de)
English (en)
Inventor
Stefan Henkel
Jörg Duggen
Emmerich Manfred Novak
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Buehler Alzenau GmbH
Original Assignee
Leybold Optics GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Leybold Optics GmbH filed Critical Leybold Optics GmbH
Priority to DE201110103788 priority Critical patent/DE102011103788A1/de
Priority to PCT/EP2012/002329 priority patent/WO2012163540A1/fr
Publication of DE102011103788A1 publication Critical patent/DE102011103788A1/de
Ceased legal-status Critical Current

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4412—Details relating to the exhausts, e.g. pumps, filters, scrubbers, particle traps
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D45/00—Separating dispersed particles from gases or vapours by gravity, inertia, or centrifugal forces
    • B01D45/04—Separating dispersed particles from gases or vapours by gravity, inertia, or centrifugal forces by utilising inertia
    • B01D45/06—Separating dispersed particles from gases or vapours by gravity, inertia, or centrifugal forces by utilising inertia by reversal of direction of flow
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D45/00—Separating dispersed particles from gases or vapours by gravity, inertia, or centrifugal forces
    • B01D45/04—Separating dispersed particles from gases or vapours by gravity, inertia, or centrifugal forces by utilising inertia
    • B01D45/08—Separating dispersed particles from gases or vapours by gravity, inertia, or centrifugal forces by utilising inertia by impingement against baffle separators
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/002—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by condensation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0623—Sulfides, selenides or tellurides
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2258/00—Sources of waste gases
    • B01D2258/02—Other waste gases
    • B01D2258/0216—Other waste gases from CVD treatment or semi-conductor manufacturing

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Analytical Chemistry (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Physical Vapour Deposition (AREA)
DE201110103788 2011-06-01 2011-06-01 Vorrichtung zur Oberflächenbehandlung mit einem Prozessdampf Ceased DE102011103788A1 (de)

Priority Applications (2)

Application Number Priority Date Filing Date Title
DE201110103788 DE102011103788A1 (de) 2011-06-01 2011-06-01 Vorrichtung zur Oberflächenbehandlung mit einem Prozessdampf
PCT/EP2012/002329 WO2012163540A1 (fr) 2011-06-01 2012-06-01 Dispositif destiné au traitement de surfaces au moyen d'une vapeur à usage industriel

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE201110103788 DE102011103788A1 (de) 2011-06-01 2011-06-01 Vorrichtung zur Oberflächenbehandlung mit einem Prozessdampf

Publications (1)

Publication Number Publication Date
DE102011103788A1 true DE102011103788A1 (de) 2012-12-06

Family

ID=46420047

Family Applications (1)

Application Number Title Priority Date Filing Date
DE201110103788 Ceased DE102011103788A1 (de) 2011-06-01 2011-06-01 Vorrichtung zur Oberflächenbehandlung mit einem Prozessdampf

Country Status (2)

Country Link
DE (1) DE102011103788A1 (fr)
WO (1) WO2012163540A1 (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE202018005256U1 (de) * 2018-11-13 2020-02-14 Leybold Gmbh Abscheidesystem für Gase bei Hochvakuumeinrichtung

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113088891B (zh) * 2021-03-09 2023-03-03 中国电子科技集团公司第十一研究所 铟蒸发舟

Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4488887A (en) * 1983-10-17 1984-12-18 R. J. Reynolds Tobacco Company Cold trap
DE19717565A1 (de) 1996-04-26 1997-11-06 Yazaki Corp Vorrichtung und Verfahren zur Bildung von I-III-VI¶2¶-Dünnfilmschichten
DE19830842C1 (de) * 1998-07-09 1999-10-07 Siemens Ag Vorrichtung zum Abscheiden von Substanzen
DE10006778A1 (de) 2000-02-09 2001-08-23 Cis Solartechnik Gmbh Verfahren zur Wärmebehandlung von flexiblen, bandförmigen CIS-Solarzellen und Wärmebehandlungsofen
US20020134244A1 (en) * 2001-03-23 2002-09-26 Mks Instruments, Inc. Trap apparatus and method for condensable by-products of deposition reactions
DE102004024601A1 (de) * 2004-05-13 2005-12-01 Klaus Dr. Kalberlah Verfahren und Einrichtung zur sequentiellen Bandabscheidung von Selen auf Chalkopyrit-Dünnschicht-Solarzellen
EP1719551A2 (fr) * 1996-05-23 2006-11-08 Ebara Corporation Système d'évacuation
DE202009006288U1 (de) 2009-04-28 2009-07-16 Hsr Ag Schutzvorrichtung für Hochvakuumpumpen, insbesondere Turbomolekularpumpen
DE102010061195A1 (de) * 2009-12-15 2011-06-16 PrimeStar Solar, Inc., Arvada System und Verfahren zur Cadmiumtellurid (CdTe)-Rückgewinnung in einer Dampfphasenabscheidungs-Fördereranordnung

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4551197A (en) * 1984-07-26 1985-11-05 Guilmette Joseph G Method and apparatus for the recovery and recycling of condensable gas reactants
JP3246708B2 (ja) * 1995-05-02 2002-01-15 東京エレクトロン株式会社 トラップ装置及びこれを用いた未反応処理ガス排気機構
US5820641A (en) * 1996-02-09 1998-10-13 Mks Instruments, Inc. Fluid cooled trap
KR100688900B1 (ko) * 1999-12-15 2007-03-08 캐논 아네르바 가부시키가이샤 배출가스 여과장치, 보조여과장치 및 트랩장치
GB0504312D0 (en) * 2005-03-02 2005-04-06 Boc Group Plc Trap device
EP2013897A4 (fr) * 2006-05-04 2012-07-25 Milaebo Co Ltd Dispositif de collecte de sous-produit pour appareil de fabrication de semi-conducteurs

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4488887A (en) * 1983-10-17 1984-12-18 R. J. Reynolds Tobacco Company Cold trap
DE19717565A1 (de) 1996-04-26 1997-11-06 Yazaki Corp Vorrichtung und Verfahren zur Bildung von I-III-VI¶2¶-Dünnfilmschichten
EP1719551A2 (fr) * 1996-05-23 2006-11-08 Ebara Corporation Système d'évacuation
DE19830842C1 (de) * 1998-07-09 1999-10-07 Siemens Ag Vorrichtung zum Abscheiden von Substanzen
DE10006778A1 (de) 2000-02-09 2001-08-23 Cis Solartechnik Gmbh Verfahren zur Wärmebehandlung von flexiblen, bandförmigen CIS-Solarzellen und Wärmebehandlungsofen
US20020134244A1 (en) * 2001-03-23 2002-09-26 Mks Instruments, Inc. Trap apparatus and method for condensable by-products of deposition reactions
DE102004024601A1 (de) * 2004-05-13 2005-12-01 Klaus Dr. Kalberlah Verfahren und Einrichtung zur sequentiellen Bandabscheidung von Selen auf Chalkopyrit-Dünnschicht-Solarzellen
DE202009006288U1 (de) 2009-04-28 2009-07-16 Hsr Ag Schutzvorrichtung für Hochvakuumpumpen, insbesondere Turbomolekularpumpen
DE102010061195A1 (de) * 2009-12-15 2011-06-16 PrimeStar Solar, Inc., Arvada System und Verfahren zur Cadmiumtellurid (CdTe)-Rückgewinnung in einer Dampfphasenabscheidungs-Fördereranordnung

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE202018005256U1 (de) * 2018-11-13 2020-02-14 Leybold Gmbh Abscheidesystem für Gase bei Hochvakuumeinrichtung

Also Published As

Publication number Publication date
WO2012163540A1 (fr) 2012-12-06

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Effective date: 20141111