DE102011051260A1 - Verfahren und Vorrichtung zum Abscheiden von OLEDs - Google Patents
Verfahren und Vorrichtung zum Abscheiden von OLEDs Download PDFInfo
- Publication number
- DE102011051260A1 DE102011051260A1 DE102011051260A DE102011051260A DE102011051260A1 DE 102011051260 A1 DE102011051260 A1 DE 102011051260A1 DE 102011051260 A DE102011051260 A DE 102011051260A DE 102011051260 A DE102011051260 A DE 102011051260A DE 102011051260 A1 DE102011051260 A1 DE 102011051260A1
- Authority
- DE
- Germany
- Prior art keywords
- evaporation
- evaporator
- starting material
- evaporation body
- suspended particles
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000034 method Methods 0.000 title claims abstract description 39
- 238000000151 deposition Methods 0.000 title claims abstract description 6
- 238000001704 evaporation Methods 0.000 claims abstract description 139
- 230000008020 evaporation Effects 0.000 claims abstract description 132
- 239000002245 particle Substances 0.000 claims abstract description 51
- 239000007858 starting material Substances 0.000 claims abstract description 45
- 239000000443 aerosol Substances 0.000 claims abstract description 41
- 239000012159 carrier gas Substances 0.000 claims abstract description 35
- 239000000758 substrate Substances 0.000 claims abstract description 22
- 229920006395 saturated elastomer Polymers 0.000 claims abstract description 7
- 239000011368 organic material Substances 0.000 claims abstract description 3
- 239000007789 gas Substances 0.000 claims description 31
- 239000011148 porous material Substances 0.000 claims description 21
- 239000006260 foam Substances 0.000 claims description 20
- 238000003860 storage Methods 0.000 claims description 13
- 238000005137 deposition process Methods 0.000 claims description 7
- 229910052751 metal Inorganic materials 0.000 claims description 6
- 239000002184 metal Substances 0.000 claims description 6
- 229910021397 glassy carbon Inorganic materials 0.000 claims description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 4
- 239000000919 ceramic Substances 0.000 claims description 4
- 239000011521 glass Substances 0.000 claims description 4
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 3
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims description 3
- 239000004020 conductor Substances 0.000 claims description 3
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 3
- 239000010931 gold Substances 0.000 claims description 3
- 229910052737 gold Inorganic materials 0.000 claims description 3
- 229910052750 molybdenum Inorganic materials 0.000 claims description 3
- 239000011733 molybdenum Substances 0.000 claims description 3
- 229910052758 niobium Inorganic materials 0.000 claims description 3
- 239000010955 niobium Substances 0.000 claims description 3
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 claims description 3
- 239000010453 quartz Substances 0.000 claims description 3
- 229910052702 rhenium Inorganic materials 0.000 claims description 3
- WUAPFZMCVAUBPE-UHFFFAOYSA-N rhenium atom Chemical compound [Re] WUAPFZMCVAUBPE-UHFFFAOYSA-N 0.000 claims description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 3
- 229910052715 tantalum Inorganic materials 0.000 claims description 3
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims description 3
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims description 3
- 229910052721 tungsten Inorganic materials 0.000 claims description 3
- 239000010937 tungsten Substances 0.000 claims description 3
- 238000011049 filling Methods 0.000 claims description 2
- 239000001257 hydrogen Substances 0.000 claims description 2
- 229910052739 hydrogen Inorganic materials 0.000 claims description 2
- 229910052757 nitrogen Inorganic materials 0.000 claims description 2
- 229910052756 noble gas Inorganic materials 0.000 claims description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims 2
- 229910052582 BN Inorganic materials 0.000 claims 1
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 claims 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims 1
- 229910052786 argon Inorganic materials 0.000 claims 1
- 230000005611 electricity Effects 0.000 claims 1
- 239000011261 inert gas Substances 0.000 claims 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 claims 1
- 229910010271 silicon carbide Inorganic materials 0.000 claims 1
- 238000000926 separation method Methods 0.000 abstract 2
- 239000007787 solid Substances 0.000 description 11
- 239000000463 material Substances 0.000 description 9
- 239000000843 powder Substances 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 5
- 239000007788 liquid Substances 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 210000002421 cell wall Anatomy 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 238000002488 metal-organic chemical vapour deposition Methods 0.000 description 2
- 230000002123 temporal effect Effects 0.000 description 2
- 230000008016 vaporization Effects 0.000 description 2
- BUHVIAUBTBOHAG-FOYDDCNASA-N (2r,3r,4s,5r)-2-[6-[[2-(3,5-dimethoxyphenyl)-2-(2-methylphenyl)ethyl]amino]purin-9-yl]-5-(hydroxymethyl)oxolane-3,4-diol Chemical compound COC1=CC(OC)=CC(C(CNC=2C=3N=CN(C=3N=CN=2)[C@H]2[C@@H]([C@H](O)[C@@H](CO)O2)O)C=2C(=CC=CC=2)C)=C1 BUHVIAUBTBOHAG-FOYDDCNASA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 229910010293 ceramic material Inorganic materials 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 125000004435 hydrogen atom Chemical class [H]* 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 239000012811 non-conductive material Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 230000000284 resting effect Effects 0.000 description 1
- 230000032258 transport Effects 0.000 description 1
- 238000009834 vaporization Methods 0.000 description 1
- 239000006200 vaporizer Substances 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/12—Organic material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/228—Gas flow assisted PVD deposition
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/246—Replenishment of source material
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Chemical Vapour Deposition (AREA)
- Electroluminescent Light Sources (AREA)
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102011051260A DE102011051260A1 (de) | 2011-06-22 | 2011-06-22 | Verfahren und Vorrichtung zum Abscheiden von OLEDs |
| PCT/EP2012/060239 WO2012175307A1 (de) | 2011-06-22 | 2012-05-31 | Verfahren und vorrichtung zum abscheiden von oled's |
| JP2014516257A JP6085595B2 (ja) | 2011-06-22 | 2012-05-31 | Ｏｌｅｄの堆積方法および装置 |
| KR1020147001643A KR102003527B1 (ko) | 2011-06-22 | 2012-05-31 | Ｏｌｅｄ들을 증착하기 위한 방법 및 그 장치 |
| TW101120868A TWI583809B (zh) | 2011-06-22 | 2012-06-11 | 用以沉積ｏｌｅｄ的方法與裝置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102011051260A DE102011051260A1 (de) | 2011-06-22 | 2011-06-22 | Verfahren und Vorrichtung zum Abscheiden von OLEDs |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE102011051260A1 true DE102011051260A1 (de) | 2012-12-27 |
Family
ID=46245568
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE102011051260A Pending DE102011051260A1 (de) | 2011-06-22 | 2011-06-22 | Verfahren und Vorrichtung zum Abscheiden von OLEDs |
Country Status (5)
| Country | Link |
|---|---|
| JP (1) | JP6085595B2 (zh) |
| KR (1) | KR102003527B1 (zh) |
| DE (1) | DE102011051260A1 (zh) |
| TW (1) | TWI583809B (zh) |
| WO (1) | WO2012175307A1 (zh) |
Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102014102484A1 (de) | 2014-02-26 | 2015-08-27 | Aixtron Se | Verwendung eines QCM-Sensors zur Bestimmung der Dampfkonzentration beim OVPD-Verfahren beziehungsweise in einem OVPD-Beschichtungssystem |
| EP2963147A2 (de) | 2014-07-01 | 2016-01-06 | Aixtron SE | Vorrichtung zum erzeugen eines dampfes aus einem festen oder flüssigen ausgangsstoff für eine cvd- oder pvd-einrichtung |
| DE102014109195A1 (de) | 2014-07-01 | 2016-01-07 | Aixtron Se | Vorrichtung und Verfahren zum Erzeugen eines Dampfes aus mehreren flüssigen oder festen Ausgangsstoffen für eine CVD- oder PVD-Einrichtung |
| DE102014109194A1 (de) | 2014-07-01 | 2016-01-07 | Aixtron Se | Vorrichtung und Verfahren zum Erzeugen eines Dampfes für eine CVD- oder PVD-Einrichtung |
| DE102016100625A1 (de) | 2016-01-15 | 2017-07-20 | Aixtron Se | Vorrichtung zum Bereitstellen eines Prozessgases in einer Beschichtungseinrichtung |
| WO2018224454A1 (de) | 2017-06-08 | 2018-12-13 | Aixtron Se | VERFAHREN ZUM ABSCHEIDEN VON OLEDs |
| DE102017123233A1 (de) * | 2017-10-06 | 2019-04-11 | Aixtron Se | Vorrichtung und Verfahren zur Erzeugung eines in einem Trägergas transportierten Dampfes |
| WO2020244733A1 (en) * | 2019-06-03 | 2020-12-10 | Applied Materials, Inc. | Evaporator arrangement, deposition system, and evaporation method |
| DE102020122800A1 (de) | 2020-09-01 | 2022-03-03 | Apeva Se | Vorrichtung zum Abscheiden von OLED-Schichten mit einer Run-/Vent-Leitung |
| WO2022053319A1 (de) | 2020-09-11 | 2022-03-17 | Apeva Se | Verfahren zum erzeugen eines zeitlich konstanten dampfflusses sowie verfahren zum einstellen eines arbeitspunktes einer vorrichtung zum erzeugen eines dampfes |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102014117492A1 (de) | 2014-11-28 | 2016-06-02 | Aixtron Se | Vorrichtung zum Abscheiden einer Schicht auf einem Substrat |
| US10343186B2 (en) * | 2015-10-09 | 2019-07-09 | Asm Ip Holding B.V. | Vapor phase deposition of organic films |
| US10695794B2 (en) | 2015-10-09 | 2020-06-30 | Asm Ip Holding B.V. | Vapor phase deposition of organic films |
| US10453701B2 (en) | 2016-06-01 | 2019-10-22 | Asm Ip Holding B.V. | Deposition of organic films |
Citations (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4769292A (en) | 1987-03-02 | 1988-09-06 | Eastman Kodak Company | Electroluminescent device with modified thin film luminescent zone |
| US4885211A (en) | 1987-02-11 | 1989-12-05 | Eastman Kodak Company | Electroluminescent device with improved cathode |
| US5204314A (en) | 1990-07-06 | 1993-04-20 | Advanced Technology Materials, Inc. | Method for delivering an involatile reagent in vapor form to a CVD reactor |
| US5820678A (en) | 1997-05-30 | 1998-10-13 | The Regents Of The University Of California | Solid source MOCVD system |
| US6037241A (en) | 1998-02-19 | 2000-03-14 | First Solar, Llc | Apparatus and method for depositing a semiconductor material |
| DE10057491A1 (de) * | 2000-11-20 | 2002-05-23 | Aixtron Ag | Vorrichtung und Verfahren zum Zuführen eines in die Gasform gebrachten flüssigen Ausgangsstoffes in einen CVD-Reaktor |
| US20050227004A1 (en) | 2003-10-14 | 2005-10-13 | Burrows Paul E | Method and apparatus for coating a patterned thin film on a substrate from a fluid source with continuous feed capability |
| US20060115585A1 (en) | 2004-11-19 | 2006-06-01 | Vladimir Bulovic | Method and apparatus for depositing LED organic film |
| US20060169201A1 (en) * | 2005-02-01 | 2006-08-03 | Wan-Goo Hwang | Apparatus for supplying gas and apparatus for forming a layer having the same |
| WO2006100058A2 (de) * | 2005-03-24 | 2006-09-28 | Creaphys Gmbh | Heizeinrichtung, beschichtungsanlage und verfahren zur verdampfung oder sublimation von beschichtungsmaterialien |
| US7238389B2 (en) | 2004-03-22 | 2007-07-03 | Eastman Kodak Company | Vaporizing fluidized organic materials |
| US7288286B2 (en) | 2004-09-21 | 2007-10-30 | Eastman Kodak Company | Delivering organic powder to a vaporization zone |
| US7288285B2 (en) | 2004-09-21 | 2007-10-30 | Eastman Kodak Company | Delivering organic powder to a vaporization zone |
| DE102006026576A1 (de) | 2006-06-06 | 2008-01-10 | Aixtron Ag | Vorrichtung und Verfahren zum Aufdampfen eines pulverförmigen organischen Ausgangsstoffs |
| US20090039175A1 (en) | 2007-08-06 | 2009-02-12 | Michael Long | Vaporization of thermally sensitive materials |
| US20090061090A1 (en) | 2006-05-19 | 2009-03-05 | Ulvac, Inc. | Vapor deposition apparatus for an organic vapor deposition material and a method for producing an organic film |
| US7501152B2 (en) | 2004-09-21 | 2009-03-10 | Eastman Kodak Company | Delivering particulate material to a vaporization zone |
| US20100015324A1 (en) | 2007-03-26 | 2010-01-21 | Ulvac, Inc. | Vapor deposition source, vapor deposition apparatus, and film-forming method |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE10212923A1 (de) * | 2002-03-22 | 2004-01-08 | Aixtron Ag | Verfahren zum Beschichten eines Substrates und Vorrichtung zur Durchführung des Verfahrens |
| KR100659762B1 (ko) * | 2005-01-17 | 2006-12-19 | 삼성에스디아이 주식회사 | 증발원, 증착장치 및 이를 이용한 증착방법 |
| JP2007092149A (ja) * | 2005-09-29 | 2007-04-12 | Tokyo Electron Ltd | 原料供給装置および蒸着装置 |
| JP5063969B2 (ja) * | 2006-09-29 | 2012-10-31 | 東京エレクトロン株式会社 | 蒸着装置、蒸着装置の制御装置、蒸着装置の制御方法および蒸着装置の使用方法 |
| WO2011071064A1 (ja) * | 2009-12-09 | 2011-06-16 | 株式会社アルバック | 有機薄膜の成膜装置および有機材料成膜方法 |
-
2011
- 2011-06-22 DE DE102011051260A patent/DE102011051260A1/de active Pending
-
2012
- 2012-05-31 KR KR1020147001643A patent/KR102003527B1/ko active IP Right Grant
- 2012-05-31 WO PCT/EP2012/060239 patent/WO2012175307A1/de active Application Filing
- 2012-05-31 JP JP2014516257A patent/JP6085595B2/ja active Active
- 2012-06-11 TW TW101120868A patent/TWI583809B/zh active
Patent Citations (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4885211A (en) | 1987-02-11 | 1989-12-05 | Eastman Kodak Company | Electroluminescent device with improved cathode |
| US4769292A (en) | 1987-03-02 | 1988-09-06 | Eastman Kodak Company | Electroluminescent device with modified thin film luminescent zone |
| US5204314A (en) | 1990-07-06 | 1993-04-20 | Advanced Technology Materials, Inc. | Method for delivering an involatile reagent in vapor form to a CVD reactor |
| US5820678A (en) | 1997-05-30 | 1998-10-13 | The Regents Of The University Of California | Solid source MOCVD system |
| US6037241A (en) | 1998-02-19 | 2000-03-14 | First Solar, Llc | Apparatus and method for depositing a semiconductor material |
| DE10057491A1 (de) * | 2000-11-20 | 2002-05-23 | Aixtron Ag | Vorrichtung und Verfahren zum Zuführen eines in die Gasform gebrachten flüssigen Ausgangsstoffes in einen CVD-Reaktor |
| US20050227004A1 (en) | 2003-10-14 | 2005-10-13 | Burrows Paul E | Method and apparatus for coating a patterned thin film on a substrate from a fluid source with continuous feed capability |
| US7238389B2 (en) | 2004-03-22 | 2007-07-03 | Eastman Kodak Company | Vaporizing fluidized organic materials |
| US7288285B2 (en) | 2004-09-21 | 2007-10-30 | Eastman Kodak Company | Delivering organic powder to a vaporization zone |
| US7288286B2 (en) | 2004-09-21 | 2007-10-30 | Eastman Kodak Company | Delivering organic powder to a vaporization zone |
| US7501152B2 (en) | 2004-09-21 | 2009-03-10 | Eastman Kodak Company | Delivering particulate material to a vaporization zone |
| US20060115585A1 (en) | 2004-11-19 | 2006-06-01 | Vladimir Bulovic | Method and apparatus for depositing LED organic film |
| US20060169201A1 (en) * | 2005-02-01 | 2006-08-03 | Wan-Goo Hwang | Apparatus for supplying gas and apparatus for forming a layer having the same |
| WO2006100058A2 (de) * | 2005-03-24 | 2006-09-28 | Creaphys Gmbh | Heizeinrichtung, beschichtungsanlage und verfahren zur verdampfung oder sublimation von beschichtungsmaterialien |
| US20090061090A1 (en) | 2006-05-19 | 2009-03-05 | Ulvac, Inc. | Vapor deposition apparatus for an organic vapor deposition material and a method for producing an organic film |
| DE102006026576A1 (de) | 2006-06-06 | 2008-01-10 | Aixtron Ag | Vorrichtung und Verfahren zum Aufdampfen eines pulverförmigen organischen Ausgangsstoffs |
| US20100015324A1 (en) | 2007-03-26 | 2010-01-21 | Ulvac, Inc. | Vapor deposition source, vapor deposition apparatus, and film-forming method |
| US20090039175A1 (en) | 2007-08-06 | 2009-02-12 | Michael Long | Vaporization of thermally sensitive materials |
Cited By (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102014102484A1 (de) | 2014-02-26 | 2015-08-27 | Aixtron Se | Verwendung eines QCM-Sensors zur Bestimmung der Dampfkonzentration beim OVPD-Verfahren beziehungsweise in einem OVPD-Beschichtungssystem |
| US10267768B2 (en) | 2014-02-26 | 2019-04-23 | Aixtron Se | Device and method for determining the concentration of a vapor by means of an oscillating body sensor |
| WO2016000958A1 (de) | 2014-07-01 | 2016-01-07 | Aixtron Se | Vorrichtung und verfahren zum erzeugen eines dampfes für eine cvd- oder pvd-einrichtung |
| EP2963147A2 (de) | 2014-07-01 | 2016-01-06 | Aixtron SE | Vorrichtung zum erzeugen eines dampfes aus einem festen oder flüssigen ausgangsstoff für eine cvd- oder pvd-einrichtung |
| DE102014109194A1 (de) | 2014-07-01 | 2016-01-07 | Aixtron Se | Vorrichtung und Verfahren zum Erzeugen eines Dampfes für eine CVD- oder PVD-Einrichtung |
| DE102014109195A1 (de) | 2014-07-01 | 2016-01-07 | Aixtron Se | Vorrichtung und Verfahren zum Erzeugen eines Dampfes aus mehreren flüssigen oder festen Ausgangsstoffen für eine CVD- oder PVD-Einrichtung |
| EP2963147A3 (de) * | 2014-07-01 | 2016-05-25 | Aixtron SE | Vorrichtung zum erzeugen eines dampfes aus einem festen oder flüssigen ausgangsstoff für eine cvd- oder pvd-einrichtung |
| US10501847B2 (en) | 2014-07-01 | 2019-12-10 | Aixtron Se | Apparatus and method for generating a vapor for a CVD or PVD device |
| DE102014109196A1 (de) | 2014-07-01 | 2016-01-07 | Aixtron Se | Vorrichtung zum Erzeugen eines Dampfes aus einem festen oder flüssigen Ausgangsstoff für eine CVD- oder PVD-Einrichtung |
| US9942946B2 (en) | 2014-07-01 | 2018-04-10 | Aixtron Se | Device for generating vapor from solid or liquid starting material for CVD or PVD apparatus |
| US20180148836A1 (en) * | 2014-07-01 | 2018-05-31 | Aixtron Se | Apparatus and method for generating a vapor for a cvd or pvd device |
| US10060022B2 (en) | 2014-07-01 | 2018-08-28 | Aixtron Se | Device and method for generating a vapor for a CVD or PVD device from multiple liquid or solid source materials |
| WO2017121704A1 (de) | 2016-01-15 | 2017-07-20 | Aixtron Se | Vorrichtung zum bereitstellen eines prozessgases in einer beschichtungseinrichtung |
| DE102016100625A1 (de) | 2016-01-15 | 2017-07-20 | Aixtron Se | Vorrichtung zum Bereitstellen eines Prozessgases in einer Beschichtungseinrichtung |
| WO2018224454A1 (de) | 2017-06-08 | 2018-12-13 | Aixtron Se | VERFAHREN ZUM ABSCHEIDEN VON OLEDs |
| DE102017112668A1 (de) | 2017-06-08 | 2018-12-13 | Aixtron Se | Verfahren zum Abscheiden von OLEDs |
| DE102017123233A1 (de) * | 2017-10-06 | 2019-04-11 | Aixtron Se | Vorrichtung und Verfahren zur Erzeugung eines in einem Trägergas transportierten Dampfes |
| WO2020244733A1 (en) * | 2019-06-03 | 2020-12-10 | Applied Materials, Inc. | Evaporator arrangement, deposition system, and evaporation method |
| DE102020122800A1 (de) | 2020-09-01 | 2022-03-03 | Apeva Se | Vorrichtung zum Abscheiden von OLED-Schichten mit einer Run-/Vent-Leitung |
| WO2022053319A1 (de) | 2020-09-11 | 2022-03-17 | Apeva Se | Verfahren zum erzeugen eines zeitlich konstanten dampfflusses sowie verfahren zum einstellen eines arbeitspunktes einer vorrichtung zum erzeugen eines dampfes |
Also Published As
| Publication number | Publication date |
|---|---|
| KR20140053972A (ko) | 2014-05-08 |
| WO2012175307A1 (de) | 2012-12-27 |
| JP6085595B2 (ja) | 2017-02-22 |
| JP2014523486A (ja) | 2014-09-11 |
| KR102003527B1 (ko) | 2019-07-24 |
| TWI583809B (zh) | 2017-05-21 |
| TW201305367A (zh) | 2013-02-01 |
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