DE102011005731B4 - Einrichtung zur Probenanalyse mittels Röntgenspektroskopie - Google Patents

Einrichtung zur Probenanalyse mittels Röntgenspektroskopie Download PDF

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Publication number
DE102011005731B4
DE102011005731B4 DE201110005731 DE102011005731A DE102011005731B4 DE 102011005731 B4 DE102011005731 B4 DE 102011005731B4 DE 201110005731 DE201110005731 DE 201110005731 DE 102011005731 A DE102011005731 A DE 102011005731A DE 102011005731 B4 DE102011005731 B4 DE 102011005731B4
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DE
Germany
Prior art keywords
sample
electron beam
analysis module
microscope objective
electron
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE201110005731
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German (de)
English (en)
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DE102011005731A1 (de
Inventor
Dr. Papastathopoulos Evangelos
Holger Wegendt
Dr. Stefan Lucian
Dr. Thomas Christian
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Carl Zeiss Microscopy GmbH
Original Assignee
Carl Zeiss Microscopy GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Carl Zeiss Microscopy GmbH filed Critical Carl Zeiss Microscopy GmbH
Priority to DE201110005731 priority Critical patent/DE102011005731B4/de
Priority to PCT/EP2012/052756 priority patent/WO2012123217A1/fr
Publication of DE102011005731A1 publication Critical patent/DE102011005731A1/de
Application granted granted Critical
Publication of DE102011005731B4 publication Critical patent/DE102011005731B4/de
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00—Microscopes
    • G02B21/0004—Microscopes specially adapted for specific applications
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
    • G01N23/225—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion
    • G01N23/2251—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion using incident electron beams, e.g. scanning electron microscopy [SEM]
    • G01N23/2252—Measuring emitted X-rays, e.g. electron probe microanalysis [EPMA]
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/16—Vessels; Containers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/244—Detectors; Associated components or circuits therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/252—Tubes for spot-analysing by electron or ion beams; Microanalysers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/2445—Photon detectors for X-rays, light, e.g. photomultipliers

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  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Optics & Photonics (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
DE201110005731 2011-03-17 2011-03-17 Einrichtung zur Probenanalyse mittels Röntgenspektroskopie Expired - Fee Related DE102011005731B4 (de)

Priority Applications (2)

Application Number Priority Date Filing Date Title
DE201110005731 DE102011005731B4 (de) 2011-03-17 2011-03-17 Einrichtung zur Probenanalyse mittels Röntgenspektroskopie
PCT/EP2012/052756 WO2012123217A1 (fr) 2011-03-17 2012-02-17 Dispositif d'analyse d'échantillon par spectroscopie de rayons x

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE201110005731 DE102011005731B4 (de) 2011-03-17 2011-03-17 Einrichtung zur Probenanalyse mittels Röntgenspektroskopie

Publications (2)

Publication Number Publication Date
DE102011005731A1 DE102011005731A1 (de) 2012-09-20
DE102011005731B4 true DE102011005731B4 (de) 2013-08-14

Family

ID=45808781

Family Applications (1)

Application Number Title Priority Date Filing Date
DE201110005731 Expired - Fee Related DE102011005731B4 (de) 2011-03-17 2011-03-17 Einrichtung zur Probenanalyse mittels Röntgenspektroskopie

Country Status (2)

Country Link
DE (1) DE102011005731B4 (fr)
WO (1) WO2012123217A1 (fr)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB201622206D0 (en) 2016-12-23 2017-02-08 Univ Of Dundee See Pulcea Ltd Univ Of Huddersfield Mobile material analyser
CN109596656B (zh) * 2019-01-14 2023-04-14 东华理工大学 一种激光辅助全反射x荧光铀矿痕量元素分析装置
DE102020105823A1 (de) * 2020-03-04 2021-09-09 Webasto SE Verdeck für ein Cabriolet-Fahrzeug, umfassend Frontspriegel und Innenhimmel

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0849765A2 (fr) * 1996-12-19 1998-06-24 Schlumberger Technologies, Inc. Dispositif à faisceau de particules chargées comportant un microscope optique
US20020053634A1 (en) * 1997-08-11 2002-05-09 Masahiro Watanabe Electron beam exposure or system inspection or measurement apparatus and its method and height detection apparatus
DE10007650C2 (de) * 2000-02-19 2003-04-10 Leica Microsystems Lichtoptisches Mikroskop mit Elektronenstrahl-Einrichtung
US20080185509A1 (en) * 2007-02-06 2008-08-07 Fei Company Particle-optical apparatus for simultaneous observing a sample with particles and photons
DE102009041993A1 (de) * 2009-09-18 2011-03-31 Carl Zeiss Ag Beobachtungs- und Analysegerät

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6452177B1 (en) 1998-09-04 2002-09-17 California Institute Of Technology Atmospheric electron x-ray spectrometer
JP4650330B2 (ja) 2006-04-21 2011-03-16 株式会社島津製作所 光学顕微鏡とｘ線分析装置の複合装置

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0849765A2 (fr) * 1996-12-19 1998-06-24 Schlumberger Technologies, Inc. Dispositif à faisceau de particules chargées comportant un microscope optique
US20020053634A1 (en) * 1997-08-11 2002-05-09 Masahiro Watanabe Electron beam exposure or system inspection or measurement apparatus and its method and height detection apparatus
DE10007650C2 (de) * 2000-02-19 2003-04-10 Leica Microsystems Lichtoptisches Mikroskop mit Elektronenstrahl-Einrichtung
US20080185509A1 (en) * 2007-02-06 2008-08-07 Fei Company Particle-optical apparatus for simultaneous observing a sample with particles and photons
DE102009041993A1 (de) * 2009-09-18 2011-03-31 Carl Zeiss Ag Beobachtungs- und Analysegerät

Also Published As

Publication number Publication date
DE102011005731A1 (de) 2012-09-20
WO2012123217A1 (fr) 2012-09-20

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R012 Request for examination validly filed
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R016 Response to examination communication
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Owner name: CARL ZEISS MICROSCOPY GMBH, DE

Free format text: FORMER OWNER: CARL ZEISS AG, 73447 OBERKOCHEN, DE

Effective date: 20120308

Owner name: CARL ZEISS MICROSCOPY GMBH, DE

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Effective date: 20130204

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Representative=s name: GLEIM PETRI OEHMKE PATENT- UND RECHTSANWALTSPA, DE

R119 Application deemed withdrawn, or ip right lapsed, due to non-payment of renewal fee
R079 Amendment of ipc main class

Free format text: PREVIOUS MAIN CLASS: G01N0023225000

Ipc: G01N0023225200