DE102006037433B4 - Verfahren zur Herstellung eines Mehrschichtkörpers sowie Mehrschichtkörper - Google Patents

Verfahren zur Herstellung eines Mehrschichtkörpers sowie Mehrschichtkörper Download PDF

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Publication number
DE102006037433B4
DE102006037433B4 DE102006037433A DE102006037433A DE102006037433B4 DE 102006037433 B4 DE102006037433 B4 DE 102006037433B4 DE 102006037433 A DE102006037433 A DE 102006037433A DE 102006037433 A DE102006037433 A DE 102006037433A DE 102006037433 B4 DE102006037433 B4 DE 102006037433B4
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DE
Germany
Prior art keywords
layer
functional layer
carrier substrate
area
exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE102006037433A
Other languages
German (de)
English (en)
Other versions
DE102006037433A1 (de
Inventor
Gernot Schneider
René Staub
Wayne Robert Dr. Tompkin
Achim Dr. Hansen
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
OVD Kinegram AG
Original Assignee
OVD Kinegram AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to DE102006037433A priority Critical patent/DE102006037433B4/de
Application filed by OVD Kinegram AG filed Critical OVD Kinegram AG
Priority to US12/309,908 priority patent/US8129217B2/en
Priority to DK07801506.2T priority patent/DK2050150T3/da
Priority to EP07801506.2A priority patent/EP2050150B1/de
Priority to JP2009523184A priority patent/JP4944200B2/ja
Priority to PCT/EP2007/006884 priority patent/WO2008017426A1/de
Publication of DE102006037433A1 publication Critical patent/DE102006037433A1/de
Application granted granted Critical
Publication of DE102006037433B4 publication Critical patent/DE102006037433B4/de
Priority to US13/358,007 priority patent/US8502213B2/en
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/20—Changing the shape of the active layer in the devices, e.g. patterning
    • H10K71/231—Changing the shape of the active layer in the devices, e.g. patterning by etching of existing layers
    • H10K71/233—Changing the shape of the active layer in the devices, e.g. patterning by etching of existing layers by photolithographic etching
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K10/00—Organic devices specially adapted for rectifying, amplifying, oscillating or switching; Organic capacitors or resistors having potential barriers
    • H10K10/40—Organic transistors
    • H10K10/46—Field-effect transistors, e.g. organic thin-film transistors [OTFT]
    • H10K10/462—Insulated gate field-effect transistors [IGFETs]
    • H10K10/464—Lateral top-gate IGFETs comprising only a single gate
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy
    • Y02E10/549—Organic PV cells
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24479—Structurally defined web or sheet [e.g., overall dimension, etc.] including variation in thickness
    • Y10T428/24612—Composite web or sheet
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Electroluminescent Light Sources (AREA)
DE102006037433A 2006-08-09 2006-08-09 Verfahren zur Herstellung eines Mehrschichtkörpers sowie Mehrschichtkörper Expired - Fee Related DE102006037433B4 (de)

Priority Applications (7)

Application Number Priority Date Filing Date Title
DE102006037433A DE102006037433B4 (de) 2006-08-09 2006-08-09 Verfahren zur Herstellung eines Mehrschichtkörpers sowie Mehrschichtkörper
DK07801506.2T DK2050150T3 (da) 2006-08-09 2007-08-03 Fremgangsmåde til fremstilling af mindst én flerlagsgenstand samt flerlagsgenstand
EP07801506.2A EP2050150B1 (de) 2006-08-09 2007-08-03 Verfahren zur herstellung mindestens eines mehrschichtkörpers sowie mehrschichtkörper
JP2009523184A JP4944200B2 (ja) 2006-08-09 2007-08-03 少なくとも一つの多層体の製造プロセスと多層体
US12/309,908 US8129217B2 (en) 2006-08-09 2007-08-03 Method for producing at least one multilayer body, and multilayer body
PCT/EP2007/006884 WO2008017426A1 (de) 2006-08-09 2007-08-03 Verfahren zur herstellung mindestens eines mehrschichtkörpers sowie mehrschichtkörper
US13/358,007 US8502213B2 (en) 2006-08-09 2012-01-25 Method for producing at least one multilayer body, and multilayer body

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE102006037433A DE102006037433B4 (de) 2006-08-09 2006-08-09 Verfahren zur Herstellung eines Mehrschichtkörpers sowie Mehrschichtkörper

Publications (2)

Publication Number Publication Date
DE102006037433A1 DE102006037433A1 (de) 2008-02-28
DE102006037433B4 true DE102006037433B4 (de) 2010-08-19

Family

ID=38608712

Family Applications (1)

Application Number Title Priority Date Filing Date
DE102006037433A Expired - Fee Related DE102006037433B4 (de) 2006-08-09 2006-08-09 Verfahren zur Herstellung eines Mehrschichtkörpers sowie Mehrschichtkörper

Country Status (6)

Country Link
US (2) US8129217B2 (enExample)
EP (1) EP2050150B1 (enExample)
JP (1) JP4944200B2 (enExample)
DE (1) DE102006037433B4 (enExample)
DK (1) DK2050150T3 (enExample)
WO (1) WO2008017426A1 (enExample)

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EP2650907B1 (en) 2004-06-04 2024-10-23 The Board Of Trustees Of The University Of Illinois Methods and devices for fabricating and assembling printable semiconductor elements
US7799699B2 (en) 2004-06-04 2010-09-21 The Board Of Trustees Of The University Of Illinois Printable semiconductor structures and related methods of making and assembling
WO2008036837A2 (en) * 2006-09-20 2008-03-27 The Board Of Trustees Of The University Of Illinois Release strategies for making transferable semiconductor structures, devices and device components
MY149292A (en) 2007-01-17 2013-08-30 Univ Illinois Optical systems fabricated by printing-based assembly
EP2349440B1 (en) 2008-10-07 2019-08-21 Mc10, Inc. Catheter balloon having stretchable integrated circuitry and sensor array
US8886334B2 (en) 2008-10-07 2014-11-11 Mc10, Inc. Systems, methods, and devices using stretchable or flexible electronics for medical applications
US8389862B2 (en) 2008-10-07 2013-03-05 Mc10, Inc. Extremely stretchable electronics
US8097926B2 (en) 2008-10-07 2012-01-17 Mc10, Inc. Systems, methods, and devices having stretchable integrated circuitry for sensing and delivering therapy
US8372726B2 (en) 2008-10-07 2013-02-12 Mc10, Inc. Methods and applications of non-planar imaging arrays
WO2010111798A1 (en) 2009-03-30 2010-10-07 Boegli-Gravures S.A. Method and device for structuring a solid body surface with a hard coating with a first laser with pulses in the nanosecond field and a second laser with pulses in the pico- or femtosecond field
ES2541834T3 (es) * 2009-03-30 2015-07-27 Boegli-Gravures S.A. Procedimiento y dispositivo para estructurar una superficie de cuerpo sólido con un revestimiento duro con un láser que utilizan máscara y diafragma
WO2010132552A1 (en) 2009-05-12 2010-11-18 The Board Of Trustees Of The University Of Illinois Printed assemblies of ultrathin, microscale inorganic light emitting diodes for deformable and semitransparent displays
WO2011041727A1 (en) 2009-10-01 2011-04-07 Mc10, Inc. Protective cases with integrated electronics
US9936574B2 (en) 2009-12-16 2018-04-03 The Board Of Trustees Of The University Of Illinois Waterproof stretchable optoelectronics
EP2513953B1 (en) 2009-12-16 2017-10-18 The Board of Trustees of the University of Illionis Electrophysiology using conformal electronics
US10441185B2 (en) 2009-12-16 2019-10-15 The Board Of Trustees Of The University Of Illinois Flexible and stretchable electronic systems for epidermal electronics
JP5751728B2 (ja) 2010-03-17 2015-07-22 ザ ボード オブ トラスティーズ オブ ザ ユニヴァーシティー オブ イリノイ 生体吸収性基板上の埋め込み型バイオメディカルデバイス
US9442285B2 (en) 2011-01-14 2016-09-13 The Board Of Trustees Of The University Of Illinois Optical component array having adjustable curvature
CN103348503A (zh) * 2011-03-03 2013-10-09 正交公司 薄膜器件的材料图案化工艺
US9765934B2 (en) 2011-05-16 2017-09-19 The Board Of Trustees Of The University Of Illinois Thermally managed LED arrays assembled by printing
KR102000302B1 (ko) 2011-05-27 2019-07-15 엠씨10, 인크 전자, 광학, 및/또는 기계 장치 및 시스템, 그리고 이를 제조하기 위한 방법
US8934965B2 (en) 2011-06-03 2015-01-13 The Board Of Trustees Of The University Of Illinois Conformable actively multiplexed high-density surface electrode array for brain interfacing
CN104472023B (zh) 2011-12-01 2018-03-27 伊利诺伊大学评议会 经设计以经历可编程转变的瞬态器件
CN105283122B (zh) 2012-03-30 2020-02-18 伊利诺伊大学评议会 可共形于表面的可安装于附肢的电子器件
DE102012108170B4 (de) * 2012-09-03 2015-01-22 Bundesdruckerei Gmbh Sicherheitselement und Verfahren zur Herstellung eines Sicherheitselements
US9171794B2 (en) 2012-10-09 2015-10-27 Mc10, Inc. Embedding thin chips in polymer
KR20180034342A (ko) 2015-06-01 2018-04-04 더 보드 오브 트러스티즈 오브 더 유니버시티 오브 일리노이 대안적인 자외선 감지방법
EP3304430A4 (en) 2015-06-01 2019-03-06 The Board of Trustees of the University of Illionis MINIATURIZED ELECTRONIC SYSTEMS WITH WIRELESS AND CLOSE COMMUNICATION CAPABILITIES
US10925543B2 (en) 2015-11-11 2021-02-23 The Board Of Trustees Of The University Of Illinois Bioresorbable silicon electronics for transient implants
EP3985715A4 (en) * 2020-06-01 2022-11-09 Changxin Memory Technologies, Inc. Design method for wafer layout and lithography machine exposure system

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US5932397A (en) * 1996-05-28 1999-08-03 Rvm Scientific, Inc. Multicolor lithography for control of three dimensional refractive index gradient processing
US6133933A (en) * 1997-01-13 2000-10-17 Xerox Corporation Color Xerographic printing system with multicolor printbar
WO2001040836A1 (en) * 1999-12-02 2001-06-07 Gemfire Corporation Photodefinition of optical devices
US20040009413A1 (en) * 2002-07-11 2004-01-15 Lizotte Todd E Gray level imaging masks, optical imaging apparatus for gray level imaging masks and methods for encoding and using gray level imaging masks
WO2004079833A1 (en) * 2003-03-07 2004-09-16 Koninklijke Philips Electronics N.V. Method of manufacturing an electronic arrangement
EP1624338A2 (en) * 2003-06-24 2006-02-08 Matsushita Electric Industrial Co., Ltd. Photomask, pattern formation method using photomask and mask data creation method for photomask
DE102004059467A1 (de) * 2004-12-10 2006-07-20 Polyic Gmbh & Co. Kg Gatter aus organischen Feldeffekttransistoren

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US4374911A (en) * 1978-04-28 1983-02-22 International Business Machines Corporation Photo method of making tri-level density photomask
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US6255130B1 (en) * 1998-11-19 2001-07-03 Samsung Electronics Co., Ltd. Thin film transistor array panel and a method for manufacturing the same
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US20020195928A1 (en) * 2001-06-25 2002-12-26 Grace Anthony J. Electroluminescent display device and method of making
DE10349963A1 (de) * 2003-10-24 2005-06-02 Leonhard Kurz Gmbh & Co. Kg Verfahren zur Herstellung einer Folie
DE102004059798A1 (de) * 2004-12-10 2006-06-29 Ovd Kinegram Ag Optisch variables Element mit elektrisch aktiver Schicht
JP4769544B2 (ja) * 2005-10-28 2011-09-07 Ｈｏｙａ株式会社 二次鋳型の製造方法
US8906490B2 (en) * 2006-05-19 2014-12-09 Eastman Kodak Company Multicolor mask

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5932397A (en) * 1996-05-28 1999-08-03 Rvm Scientific, Inc. Multicolor lithography for control of three dimensional refractive index gradient processing
US6133933A (en) * 1997-01-13 2000-10-17 Xerox Corporation Color Xerographic printing system with multicolor printbar
WO2001040836A1 (en) * 1999-12-02 2001-06-07 Gemfire Corporation Photodefinition of optical devices
US20040009413A1 (en) * 2002-07-11 2004-01-15 Lizotte Todd E Gray level imaging masks, optical imaging apparatus for gray level imaging masks and methods for encoding and using gray level imaging masks
WO2004079833A1 (en) * 2003-03-07 2004-09-16 Koninklijke Philips Electronics N.V. Method of manufacturing an electronic arrangement
EP1624338A2 (en) * 2003-06-24 2006-02-08 Matsushita Electric Industrial Co., Ltd. Photomask, pattern formation method using photomask and mask data creation method for photomask
DE102004059467A1 (de) * 2004-12-10 2006-07-20 Polyic Gmbh & Co. Kg Gatter aus organischen Feldeffekttransistoren

Also Published As

Publication number Publication date
US8502213B2 (en) 2013-08-06
US20090289246A1 (en) 2009-11-26
EP2050150B1 (de) 2013-04-24
JP2010500606A (ja) 2010-01-07
DE102006037433A1 (de) 2008-02-28
US8129217B2 (en) 2012-03-06
US20120164391A1 (en) 2012-06-28
WO2008017426A1 (de) 2008-02-14
JP4944200B2 (ja) 2012-05-30
DK2050150T3 (da) 2013-07-22
EP2050150A1 (de) 2009-04-22

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Legal Events

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OP8 Request for examination as to paragraph 44 patent law
8364 No opposition during term of opposition
R119 Application deemed withdrawn, or ip right lapsed, due to non-payment of renewal fee
R079 Amendment of ipc main class

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Ipc: H01L0051050000

R079 Amendment of ipc main class

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Effective date: 20150416

R119 Application deemed withdrawn, or ip right lapsed, due to non-payment of renewal fee

Effective date: 20150303