DE10196953T1 - Druckbasiertes Massenfluss-Steuersystem - Google Patents
Druckbasiertes Massenfluss-SteuersystemInfo
- Publication number
- DE10196953T1 DE10196953T1 DE10196953T DE10196953T DE10196953T1 DE 10196953 T1 DE10196953 T1 DE 10196953T1 DE 10196953 T DE10196953 T DE 10196953T DE 10196953 T DE10196953 T DE 10196953T DE 10196953 T1 DE10196953 T1 DE 10196953T1
- Authority
- DE
- Germany
- Prior art keywords
- control system
- flow control
- mass flow
- pressure based
- based mass
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
- G05D7/00—Control of flow
- G05D7/06—Control of flow characterised by the use of electric means
- G05D7/0617—Control of flow characterised by the use of electric means specially adapted for fluid materials
- G05D7/0629—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means
- G05D7/0635—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means by action on throttling means
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Automation & Control Theory (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Flow Control (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US09/748,472 US6631334B2 (en) | 2000-12-26 | 2000-12-26 | Pressure-based mass flow controller system |
PCT/US2001/024608 WO2002052363A1 (en) | 2000-12-26 | 2001-08-06 | Pressure-based mass flow controller system |
Publications (1)
Publication Number | Publication Date |
---|---|
DE10196953T1 true DE10196953T1 (de) | 2003-12-11 |
Family
ID=25009590
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE10196953T Withdrawn DE10196953T1 (de) | 2000-12-26 | 2001-08-06 | Druckbasiertes Massenfluss-Steuersystem |
Country Status (6)
Country | Link |
---|---|
US (1) | US6631334B2 (de) |
JP (1) | JP2004517396A (de) |
KR (1) | KR20030074663A (de) |
DE (1) | DE10196953T1 (de) |
GB (1) | GB2386704B (de) |
WO (1) | WO2002052363A1 (de) |
Families Citing this family (49)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
AU2002307547A1 (en) * | 2001-04-24 | 2002-11-05 | Unit Instruments, Inc. | System and method for configuring and asapting a mass flow controller |
CN100403198C (zh) * | 2001-05-24 | 2008-07-16 | 迅捷公司 | 流体流量控制器和定比率控制流体流量的方法和装置 |
US6962090B2 (en) * | 2002-02-28 | 2005-11-08 | Avl North America Inc. | Heated stainless steel emissions canister |
KR20050031109A (ko) * | 2002-07-19 | 2005-04-01 | 셀레리티 그룹 아이엔씨 | 질량 유량 제어기 내의 압력 보상을 위한 방법 및 장치 |
GB2392506A (en) * | 2002-07-23 | 2004-03-03 | Alan Paul Troup | A mass flow meter and controller therefor |
WO2004088415A2 (en) * | 2003-03-28 | 2004-10-14 | Advanced Technology Materials Inc. | Photometrically modulated delivery of reagents |
US7063097B2 (en) | 2003-03-28 | 2006-06-20 | Advanced Technology Materials, Inc. | In-situ gas blending and dilution system for delivery of dilute gas at a predetermined concentration |
JP4224492B2 (ja) * | 2003-06-09 | 2009-02-12 | シーケーディ株式会社 | 圧力制御システム及び流量制御システム |
JP4454964B2 (ja) * | 2003-06-09 | 2010-04-21 | 東京エレクトロン株式会社 | 分圧制御システム及び流量制御システム |
JP2005079141A (ja) * | 2003-08-28 | 2005-03-24 | Asm Japan Kk | プラズマcvd装置 |
US7628861B2 (en) * | 2004-12-17 | 2009-12-08 | Mks Instruments, Inc. | Pulsed mass flow delivery system and method |
US20060060139A1 (en) * | 2004-04-12 | 2006-03-23 | Mks Instruments, Inc. | Precursor gas delivery with carrier gas mixing |
US7628860B2 (en) * | 2004-04-12 | 2009-12-08 | Mks Instruments, Inc. | Pulsed mass flow delivery system and method |
US7216019B2 (en) * | 2004-07-08 | 2007-05-08 | Celerity, Inc. | Method and system for a mass flow controller with reduced pressure sensitivity |
US20060130755A1 (en) * | 2004-12-17 | 2006-06-22 | Clark William R | Pulsed mass flow measurement system and method |
TWI552797B (zh) * | 2005-06-22 | 2016-10-11 | 恩特葛瑞斯股份有限公司 | 整合式氣體混合用之裝置及方法 |
US7680399B2 (en) * | 2006-02-07 | 2010-03-16 | Brooks Instrument, Llc | System and method for producing and delivering vapor |
US8448925B2 (en) * | 2006-10-17 | 2013-05-28 | Mks Instruments, Inc. | Devices, systems, and methods for carbonation of deionized water |
US7706925B2 (en) * | 2007-01-10 | 2010-04-27 | Mks Instruments, Inc. | Integrated pressure and flow ratio control system |
US20080305014A1 (en) * | 2007-06-07 | 2008-12-11 | Hitachi Kokusai Electric Inc. | Substrate processing apparatus |
JP5001757B2 (ja) * | 2007-08-31 | 2012-08-15 | シーケーディ株式会社 | 流体混合システム及び流体混合装置 |
US20100229657A1 (en) * | 2009-03-12 | 2010-09-16 | Weinstein Jason P | Sinter-bonded metal flow restrictor for regulating volumetric gas flow through an aerosol sampler inlet |
US8712665B2 (en) * | 2009-11-30 | 2014-04-29 | General Electric Company | Systems and methods for unchoked control of gas turbine fuel gas control valves |
US9348339B2 (en) | 2010-09-29 | 2016-05-24 | Mks Instruments, Inc. | Method and apparatus for multiple-channel pulse gas delivery system |
US8997686B2 (en) * | 2010-09-29 | 2015-04-07 | Mks Instruments, Inc. | System for and method of fast pulse gas delivery |
US10353408B2 (en) | 2011-02-25 | 2019-07-16 | Mks Instruments, Inc. | System for and method of fast pulse gas delivery |
US10031531B2 (en) | 2011-02-25 | 2018-07-24 | Mks Instruments, Inc. | System for and method of multiple channel fast pulse gas delivery |
US10126760B2 (en) | 2011-02-25 | 2018-11-13 | Mks Instruments, Inc. | System for and method of fast pulse gas delivery |
US9188989B1 (en) | 2011-08-20 | 2015-11-17 | Daniel T. Mudd | Flow node to deliver process gas using a remote pressure measurement device |
US9958302B2 (en) | 2011-08-20 | 2018-05-01 | Reno Technologies, Inc. | Flow control system, method, and apparatus |
NL2009660C2 (en) * | 2012-10-18 | 2014-04-22 | Avantium Technologies B V | Pressure controller. |
US9910448B2 (en) | 2013-03-14 | 2018-03-06 | Christopher Max Horwitz | Pressure-based gas flow controller with dynamic self-calibration |
JP6107327B2 (ja) * | 2013-03-29 | 2017-04-05 | 東京エレクトロン株式会社 | 成膜装置及びガス供給装置並びに成膜方法 |
WO2015012702A1 (en) * | 2013-07-24 | 2015-01-29 | Ikm Production Technology As | Measurement device |
WO2017040100A1 (en) | 2015-08-31 | 2017-03-09 | Mks Instruments, Inc. | Method and apparatus for pressure-based flow measurement in non-critical flow conditions |
US10684159B2 (en) | 2016-06-27 | 2020-06-16 | Applied Materials, Inc. | Methods, systems, and apparatus for mass flow verification based on choked flow |
US10679880B2 (en) | 2016-09-27 | 2020-06-09 | Ichor Systems, Inc. | Method of achieving improved transient response in apparatus for controlling flow and system for accomplishing same |
US10303189B2 (en) | 2016-06-30 | 2019-05-28 | Reno Technologies, Inc. | Flow control system, method, and apparatus |
US11144075B2 (en) | 2016-06-30 | 2021-10-12 | Ichor Systems, Inc. | Flow control system, method, and apparatus |
US10838437B2 (en) | 2018-02-22 | 2020-11-17 | Ichor Systems, Inc. | Apparatus for splitting flow of process gas and method of operating same |
US10663337B2 (en) | 2016-12-30 | 2020-05-26 | Ichor Systems, Inc. | Apparatus for controlling flow and method of calibrating same |
US9890908B1 (en) * | 2017-04-18 | 2018-02-13 | Air Products And Chemicals, Inc. | Control system in a gas pipeline network to increase capacity factor |
JP6913498B2 (ja) * | 2017-04-18 | 2021-08-04 | 東京エレクトロン株式会社 | 流量制御器の出力流量を求める方法及び被処理体を処理する方法 |
CN107894024B (zh) * | 2017-11-22 | 2023-08-18 | 新奥泛能网络科技股份有限公司 | 多源热力管网的控制方法及系统 |
KR20200130473A (ko) * | 2018-04-03 | 2020-11-18 | 램 리써치 코포레이션 | Mems 코리올리 가스 유량 제어기 |
US10698426B2 (en) * | 2018-05-07 | 2020-06-30 | Mks Instruments, Inc. | Methods and apparatus for multiple channel mass flow and ratio control systems |
US11899477B2 (en) | 2021-03-03 | 2024-02-13 | Ichor Systems, Inc. | Fluid flow control system comprising a manifold assembly |
US12000723B2 (en) | 2022-02-18 | 2024-06-04 | Mks Instruments, Inc. | Method and apparatus for pressure based mass flow control |
US20230369072A1 (en) * | 2022-05-13 | 2023-11-16 | Applied Materials, Inc. | Systems and methods to reduce flow accuracy error for liquid & gas mass flow controller devices |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3851526A (en) | 1973-04-09 | 1974-12-03 | Tylan Corp | Fluid flowmeter |
DE3725312A1 (de) | 1987-07-30 | 1989-02-09 | Jiri Hokynar | Steuergeraet fuer fluidfluss |
US5282490A (en) * | 1989-12-18 | 1994-02-01 | Higgs Robert E | Flow metering injection controller |
DE69212129T2 (de) | 1991-12-18 | 1997-01-23 | Pierre Delajoud | Massenströmungsmesser mit einschnürendem Element |
JP3291161B2 (ja) | 1995-06-12 | 2002-06-10 | 株式会社フジキン | 圧力式流量制御装置 |
US5868159A (en) * | 1996-07-12 | 1999-02-09 | Mks Instruments, Inc. | Pressure-based mass flow controller |
US6074691A (en) | 1997-06-24 | 2000-06-13 | Balzers Aktiengesellschaft | Method for monitoring the flow of a gas into a vacuum reactor |
JPH11212653A (ja) | 1998-01-21 | 1999-08-06 | Fujikin Inc | 流体供給装置 |
US6296711B1 (en) * | 1998-04-14 | 2001-10-02 | Cvd Systems, Inc. | Film processing system |
US6454860B2 (en) * | 1998-10-27 | 2002-09-24 | Applied Materials, Inc. | Deposition reactor having vaporizing, mixing and cleaning capabilities |
-
2000
- 2000-12-26 US US09/748,472 patent/US6631334B2/en not_active Expired - Lifetime
-
2001
- 2001-08-06 GB GB0312001A patent/GB2386704B/en not_active Expired - Fee Related
- 2001-08-06 DE DE10196953T patent/DE10196953T1/de not_active Withdrawn
- 2001-08-06 KR KR10-2003-7008071A patent/KR20030074663A/ko not_active Application Discontinuation
- 2001-08-06 WO PCT/US2001/024608 patent/WO2002052363A1/en active Application Filing
- 2001-08-06 JP JP2002553600A patent/JP2004517396A/ja active Pending
Also Published As
Publication number | Publication date |
---|---|
JP2004517396A (ja) | 2004-06-10 |
GB0312001D0 (en) | 2003-07-02 |
US20020082783A1 (en) | 2002-06-27 |
US6631334B2 (en) | 2003-10-07 |
GB2386704B (en) | 2005-05-11 |
GB2386704A (en) | 2003-09-24 |
KR20030074663A (ko) | 2003-09-19 |
WO2002052363A1 (en) | 2002-07-04 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8139 | Disposal/non-payment of the annual fee |