DE10196953T1 - Druckbasiertes Massenfluss-Steuersystem - Google Patents

Druckbasiertes Massenfluss-Steuersystem

Info

Publication number
DE10196953T1
DE10196953T1 DE10196953T DE10196953T DE10196953T1 DE 10196953 T1 DE10196953 T1 DE 10196953T1 DE 10196953 T DE10196953 T DE 10196953T DE 10196953 T DE10196953 T DE 10196953T DE 10196953 T1 DE10196953 T1 DE 10196953T1
Authority
DE
Germany
Prior art keywords
control system
flow control
mass flow
pressure based
based mass
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
DE10196953T
Other languages
English (en)
Inventor
Paul Francis Grosshart
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
MKS Instruments Inc
Original Assignee
MKS Instruments Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by MKS Instruments Inc filed Critical MKS Instruments Inc
Publication of DE10196953T1 publication Critical patent/DE10196953T1/de
Withdrawn legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
    • G05D7/00—Control of flow
    • G05D7/06—Control of flow characterised by the use of electric means
    • G05D7/0617—Control of flow characterised by the use of electric means specially adapted for fluid materials
    • G05D7/0629—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means
    • G05D7/0635—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means by action on throttling means

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Automation & Control Theory (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Flow Control (AREA)
DE10196953T 2000-12-26 2001-08-06 Druckbasiertes Massenfluss-Steuersystem Withdrawn DE10196953T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/748,472 US6631334B2 (en) 2000-12-26 2000-12-26 Pressure-based mass flow controller system
PCT/US2001/024608 WO2002052363A1 (en) 2000-12-26 2001-08-06 Pressure-based mass flow controller system

Publications (1)

Publication Number Publication Date
DE10196953T1 true DE10196953T1 (de) 2003-12-11

Family

ID=25009590

Family Applications (1)

Application Number Title Priority Date Filing Date
DE10196953T Withdrawn DE10196953T1 (de) 2000-12-26 2001-08-06 Druckbasiertes Massenfluss-Steuersystem

Country Status (6)

Country Link
US (1) US6631334B2 (de)
JP (1) JP2004517396A (de)
KR (1) KR20030074663A (de)
DE (1) DE10196953T1 (de)
GB (1) GB2386704B (de)
WO (1) WO2002052363A1 (de)

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JP4864280B2 (ja) 2001-04-24 2012-02-01 ブルックス・インストルメント・エルエルシー 質量流量コントローラのシステムおよび方法
JP4209688B2 (ja) 2001-05-24 2009-01-14 セレリティ・インコーポレーテッド 決定された比率のプロセス流体を供給する方法および装置
US6962090B2 (en) * 2002-02-28 2005-11-08 Avl North America Inc. Heated stainless steel emissions canister
AU2003253991A1 (en) * 2002-07-19 2004-02-09 Celerity Group, Inc. Methods and apparatus for pressure compensation in a mass flow controller
GB2392506A (en) * 2002-07-23 2004-03-03 Alan Paul Troup A mass flow meter and controller therefor
WO2004088415A2 (en) * 2003-03-28 2004-10-14 Advanced Technology Materials Inc. Photometrically modulated delivery of reagents
US7063097B2 (en) * 2003-03-28 2006-06-20 Advanced Technology Materials, Inc. In-situ gas blending and dilution system for delivery of dilute gas at a predetermined concentration
JP4454964B2 (ja) * 2003-06-09 2010-04-21 東京エレクトロン株式会社 分圧制御システム及び流量制御システム
WO2004109420A1 (ja) * 2003-06-09 2004-12-16 Ckd Corporation 相対的圧力制御システム及び相対的流量制御システム
JP2005079141A (ja) * 2003-08-28 2005-03-24 Asm Japan Kk プラズマｃｖｄ装置
US20060060139A1 (en) * 2004-04-12 2006-03-23 Mks Instruments, Inc. Precursor gas delivery with carrier gas mixing
US7628861B2 (en) * 2004-12-17 2009-12-08 Mks Instruments, Inc. Pulsed mass flow delivery system and method
US7628860B2 (en) 2004-04-12 2009-12-08 Mks Instruments, Inc. Pulsed mass flow delivery system and method
US7216019B2 (en) * 2004-07-08 2007-05-08 Celerity, Inc. Method and system for a mass flow controller with reduced pressure sensitivity
US20060130755A1 (en) * 2004-12-17 2006-06-22 Clark William R Pulsed mass flow measurement system and method
KR101241922B1 (ko) 2005-06-22 2013-03-11 어드밴스드 테크놀러지 머티리얼즈, 인코포레이티드 통합 가스 배합 장치 및 방법
US7680399B2 (en) * 2006-02-07 2010-03-16 Brooks Instrument, Llc System and method for producing and delivering vapor
US8448925B2 (en) 2006-10-17 2013-05-28 Mks Instruments, Inc. Devices, systems, and methods for carbonation of deionized water
US7706925B2 (en) * 2007-01-10 2010-04-27 Mks Instruments, Inc. Integrated pressure and flow ratio control system
US20080305014A1 (en) * 2007-06-07 2008-12-11 Hitachi Kokusai Electric Inc. Substrate processing apparatus
JP5001757B2 (ja) * 2007-08-31 2012-08-15 シーケーディ株式会社 流体混合システム及び流体混合装置
US20100229657A1 (en) * 2009-03-12 2010-09-16 Weinstein Jason P Sinter-bonded metal flow restrictor for regulating volumetric gas flow through an aerosol sampler inlet
US8712665B2 (en) * 2009-11-30 2014-04-29 General Electric Company Systems and methods for unchoked control of gas turbine fuel gas control valves
US9348339B2 (en) 2010-09-29 2016-05-24 Mks Instruments, Inc. Method and apparatus for multiple-channel pulse gas delivery system
US8997686B2 (en) * 2010-09-29 2015-04-07 Mks Instruments, Inc. System for and method of fast pulse gas delivery
US10353408B2 (en) 2011-02-25 2019-07-16 Mks Instruments, Inc. System for and method of fast pulse gas delivery
US10031531B2 (en) 2011-02-25 2018-07-24 Mks Instruments, Inc. System for and method of multiple channel fast pulse gas delivery
US10126760B2 (en) 2011-02-25 2018-11-13 Mks Instruments, Inc. System for and method of fast pulse gas delivery
US9958302B2 (en) 2011-08-20 2018-05-01 Reno Technologies, Inc. Flow control system, method, and apparatus
US9188989B1 (en) 2011-08-20 2015-11-17 Daniel T. Mudd Flow node to deliver process gas using a remote pressure measurement device
NL2009660C2 (en) * 2012-10-18 2014-04-22 Avantium Technologies B V Pressure controller.
US9910448B2 (en) 2013-03-14 2018-03-06 Christopher Max Horwitz Pressure-based gas flow controller with dynamic self-calibration
JP6107327B2 (ja) * 2013-03-29 2017-04-05 東京エレクトロン株式会社 成膜装置及びガス供給装置並びに成膜方法
WO2015012702A1 (en) * 2013-07-24 2015-01-29 Ikm Production Technology As Measurement device
WO2017040100A1 (en) 2015-08-31 2017-03-09 Mks Instruments, Inc. Method and apparatus for pressure-based flow measurement in non-critical flow conditions
US10684159B2 (en) * 2016-06-27 2020-06-16 Applied Materials, Inc. Methods, systems, and apparatus for mass flow verification based on choked flow
US11144075B2 (en) 2016-06-30 2021-10-12 Ichor Systems, Inc. Flow control system, method, and apparatus
US10679880B2 (en) 2016-09-27 2020-06-09 Ichor Systems, Inc. Method of achieving improved transient response in apparatus for controlling flow and system for accomplishing same
US10303189B2 (en) 2016-06-30 2019-05-28 Reno Technologies, Inc. Flow control system, method, and apparatus
US10838437B2 (en) 2018-02-22 2020-11-17 Ichor Systems, Inc. Apparatus for splitting flow of process gas and method of operating same
US10663337B2 (en) 2016-12-30 2020-05-26 Ichor Systems, Inc. Apparatus for controlling flow and method of calibrating same
JP6913498B2 (ja) * 2017-04-18 2021-08-04 東京エレクトロン株式会社 流量制御器の出力流量を求める方法及び被処理体を処理する方法
US9890908B1 (en) * 2017-04-18 2018-02-13 Air Products And Chemicals, Inc. Control system in a gas pipeline network to increase capacity factor
CN107894024B (zh) * 2017-11-22 2023-08-18 新奥泛能网络科技股份有限公司 多源热力管网的控制方法及系统
JP2021520544A (ja) * 2018-04-03 2021-08-19 ラム リサーチ コーポレーションＬａｍ Ｒｅｓｅａｒｃｈ Ｃｏｒｐｏｒａｔｉｏｎ Ｍｅｍｓコリオリ・ガス流量制御器
US10698426B2 (en) * 2018-05-07 2020-06-30 Mks Instruments, Inc. Methods and apparatus for multiple channel mass flow and ratio control systems
US10705543B2 (en) * 2018-08-29 2020-07-07 Illinois Tool Works, Inc. Mass flow controller and controller algorithm
JP2024512898A (ja) 2021-03-03 2024-03-21 アイコール・システムズ・インク マニホールドアセンブリを備える流体流れ制御システム
US12000723B2 (en) 2022-02-18 2024-06-04 Mks Instruments, Inc. Method and apparatus for pressure based mass flow control
US20230369072A1 (en) * 2022-05-13 2023-11-16 Applied Materials, Inc. Systems and methods to reduce flow accuracy error for liquid & gas mass flow controller devices

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3851526A (en) 1973-04-09 1974-12-03 Tylan Corp Fluid flowmeter
DE3725312A1 (de) 1987-07-30 1989-02-09 Jiri Hokynar Steuergeraet fuer fluidfluss
US5282490A (en) * 1989-12-18 1994-02-01 Higgs Robert E Flow metering injection controller
EP0547617B1 (de) 1991-12-18 1996-07-10 Pierre Delajoud Massenströmungsmesser mit einschnürendem Element
JP3291161B2 (ja) 1995-06-12 2002-06-10 株式会社フジキン 圧力式流量制御装置
US5868159A (en) * 1996-07-12 1999-02-09 Mks Instruments, Inc. Pressure-based mass flow controller
US6074691A (en) 1997-06-24 2000-06-13 Balzers Aktiengesellschaft Method for monitoring the flow of a gas into a vacuum reactor
JPH11212653A (ja) 1998-01-21 1999-08-06 Fujikin Inc 流体供給装置
US6296711B1 (en) * 1998-04-14 2001-10-02 Cvd Systems, Inc. Film processing system
US6454860B2 (en) * 1998-10-27 2002-09-24 Applied Materials, Inc. Deposition reactor having vaporizing, mixing and cleaning capabilities

Also Published As

Publication number Publication date
GB2386704A (en) 2003-09-24
US6631334B2 (en) 2003-10-07
KR20030074663A (ko) 2003-09-19
GB0312001D0 (en) 2003-07-02
JP2004517396A (ja) 2004-06-10
US20020082783A1 (en) 2002-06-27
WO2002052363A1 (en) 2002-07-04
GB2386704B (en) 2005-05-11

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Legal Events

Date Code Title Description
8139 Disposal/non-payment of the annual fee