DE10196214T1 - Höhenabtast-Interferometer zum Bestimmen der Absolutposition und des Oberflächenprofils eines Objekts im Hinblick auf ein Datum - Google Patents

Höhenabtast-Interferometer zum Bestimmen der Absolutposition und des Oberflächenprofils eines Objekts im Hinblick auf ein Datum

Info

Publication number
DE10196214T1
DE10196214T1 DE10196214T DE10196214T DE10196214T1 DE 10196214 T1 DE10196214 T1 DE 10196214T1 DE 10196214 T DE10196214 T DE 10196214T DE 10196214 T DE10196214 T DE 10196214T DE 10196214 T1 DE10196214 T1 DE 10196214T1
Authority
DE
Germany
Prior art keywords
date
height
determining
respect
absolute position
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
DE10196214T
Other languages
English (en)
Other versions
DE10196214B4 (de
Inventor
Peter De Groot
Xavier Colonnia De Lega
Leslie L Deck
James W Kramer
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Zygo Corp
Original Assignee
Zygo Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Zygo Corp filed Critical Zygo Corp
Publication of DE10196214T1 publication Critical patent/DE10196214T1/de
Application granted granted Critical
Publication of DE10196214B4 publication Critical patent/DE10196214B4/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
    • G01B11/2441—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures using interferometry
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
    • G01B11/245—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures using a plurality of fixed, simultaneously operating transducers
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02055—Reduction or prevention of errors; Testing; Calibration
    • G01B9/02056—Passive reduction of errors
    • G01B9/02058—Passive reduction of errors by particular optical compensation or alignment elements, e.g. dispersion compensation
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02055—Reduction or prevention of errors; Testing; Calibration
    • G01B9/02075—Reduction or prevention of errors; Testing; Calibration of particular errors
    • G01B9/02078—Caused by ambiguity
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02083—Interferometers characterised by particular signal processing and presentation
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/0209—Low-coherence interferometers

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Dispersion Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Signal Processing (AREA)
  • Instruments For Measurement Of Length By Optical Means (AREA)
  • Length Measuring Devices By Optical Means (AREA)
DE10196214T 2000-05-19 2001-01-25 Höhenabtast-Interferometer zum Bestimmen der Absolutposition und des Oberflächenprofils eines Objekts im Hinblick auf ein Datum Expired - Lifetime DE10196214B4 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US20573600P 2000-05-19 2000-05-19
US60/205,736 2000-05-19
PCT/US2001/002470 WO2001090685A2 (en) 2000-05-19 2001-01-25 Height scanning interferometer for determining the absolute position and surface profile of an object with respect to a datum

Publications (2)

Publication Number Publication Date
DE10196214T1 true DE10196214T1 (de) 2003-05-15
DE10196214B4 DE10196214B4 (de) 2010-01-28

Family

ID=22763431

Family Applications (1)

Application Number Title Priority Date Filing Date
DE10196214T Expired - Lifetime DE10196214B4 (de) 2000-05-19 2001-01-25 Höhenabtast-Interferometer zum Bestimmen der Absolutposition und des Oberflächenprofils eines Objekts im Hinblick auf ein Datum

Country Status (4)

Country Link
JP (1) JP4597467B2 (de)
AU (1) AU2001241427A1 (de)
DE (1) DE10196214B4 (de)
WO (1) WO2001090685A2 (de)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2004079295A2 (en) 2003-03-06 2004-09-16 Zygo Corporation Profiling complex surface structures using scanning interferometry
JP4203831B2 (ja) * 2006-11-30 2009-01-07 独立行政法人産業技術総合研究所 光学材料の群屈折率精密計測方法
EP2327956B1 (de) * 2009-11-20 2014-01-22 Mitutoyo Corporation Verfahren und Vorrichtung zur Höhenbestimmung bei einer Reihe von räumlichen Positionen auf einer Probe
KR101622538B1 (ko) * 2013-05-20 2016-05-19 주식회사 고영테크놀러지 주파수 주사 간섭계를 이용한 형상 측정장치
CN108917641B (zh) * 2018-05-15 2020-08-04 广东工业大学 基于激光器波数合成的样件内部轮廓检测方法及系统

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5042949A (en) * 1989-03-17 1991-08-27 Greenberg Jeffrey S Optical profiler for films and substrates
US5218424A (en) * 1991-03-19 1993-06-08 Zygo Corporation Flying height and topography measuring interferometer
US5173746A (en) * 1991-05-21 1992-12-22 Wyko Corporation Method for rapid, accurate measurement of step heights between dissimilar materials
WO1993024805A1 (en) * 1992-06-03 1993-12-09 Zygo Corporation Interferometric method and apparatus to measure surface topography
US5390023A (en) * 1992-06-03 1995-02-14 Zygo Corporation Interferometric method and apparatus to measure surface topography
US5398113A (en) * 1993-02-08 1995-03-14 Zygo Corporation Method and apparatus for surface topography measurement by spatial-frequency analysis of interferograms
US5471303A (en) * 1994-04-29 1995-11-28 Wyko Corporation Combination of white-light scanning and phase-shifting interferometry for surface profile measurements
US5555471A (en) * 1995-05-24 1996-09-10 Wyko Corporation Method for measuring thin-film thickness and step height on the surface of thin-film/substrate test samples by phase-shifting interferometry
US5602643A (en) * 1996-02-07 1997-02-11 Wyko Corporation Method and apparatus for correcting surface profiles determined by phase-shifting interferometry according to optical parameters of test surface
JP2000121317A (ja) * 1998-10-12 2000-04-28 Hitachi Electronics Eng Co Ltd 光干渉計の干渉位相検出方式

Also Published As

Publication number Publication date
JP2003534540A (ja) 2003-11-18
JP4597467B2 (ja) 2010-12-15
WO2001090685A3 (en) 2002-03-28
DE10196214B4 (de) 2010-01-28
WO2001090685A2 (en) 2001-11-29
AU2001241427A1 (en) 2001-12-03

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Legal Events

Date Code Title Description
8128 New person/name/address of the agent

Representative=s name: EPPING HERMANN FISCHER, PATENTANWALTSGESELLSCHAFT

8110 Request for examination paragraph 44
8381 Inventor (new situation)

Inventor name: GROOT, PETER DE, MIDDLETOWN, CONN., US

Inventor name: COLONNA DE LEGA, XAVIER, MIDDLETOWN, CONN., US

Inventor name: DECK, LESLIE L., MIDDLETOWN, CONN., US

Inventor name: KRAMER, JAMES W., WATERFORD, CONN., US

8364 No opposition during term of opposition
R071 Expiry of right