DE10193433T1 - Maskeninspektionsgerät - Google Patents

Maskeninspektionsgerät

Info

Publication number
DE10193433T1
DE10193433T1 DE10193433T DE10193433T DE10193433T1 DE 10193433 T1 DE10193433 T1 DE 10193433T1 DE 10193433 T DE10193433 T DE 10193433T DE 10193433 T DE10193433 T DE 10193433T DE 10193433 T1 DE10193433 T1 DE 10193433T1
Authority
DE
Germany
Prior art keywords
inspection device
mask inspection
mask
inspection
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
DE10193433T
Other languages
English (en)
Inventor
Minoru Ito
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Holon Co Ltd
Original Assignee
Holon Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2000281685A external-priority patent/JP2002093359A/ja
Priority claimed from JP2000360924A external-priority patent/JP2001227932A/ja
Application filed by Holon Co Ltd filed Critical Holon Co Ltd
Publication of DE10193433T1 publication Critical patent/DE10193433T1/de
Ceased legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/244—Detectors; Associated components or circuits therefor
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/02—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by transmitting the radiation through the material
    • G01N23/04—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by transmitting the radiation through the material and forming images of the material
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
    • G03F1/84—Inspecting
    • G03F1/86—Inspecting by charged particle beam [CPB]
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/2446—Position sensitive detectors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/28—Scanning microscopes
    • H01J2237/2813—Scanning microscopes characterised by the application
    • H01J2237/2817—Pattern inspection

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
DE10193433T 2000-09-18 2001-02-13 Maskeninspektionsgerät Ceased DE10193433T1 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2000281685A JP2002093359A (ja) 2000-09-18 2000-09-18 電子ビーム画像生成装置
JP2000360924A JP2001227932A (ja) 1999-11-30 2000-11-28 マスク検査装置
PCT/JP2001/000979 WO2002023581A1 (fr) 2000-09-18 2001-02-13 Appareil pour inspection de masque

Publications (1)

Publication Number Publication Date
DE10193433T1 true DE10193433T1 (de) 2002-10-31

Family

ID=26600110

Family Applications (1)

Application Number Title Priority Date Filing Date
DE10193433T Ceased DE10193433T1 (de) 2000-09-18 2001-02-13 Maskeninspektionsgerät

Country Status (3)

Country Link
US (1) US6686591B2 (de)
DE (1) DE10193433T1 (de)
WO (1) WO2002023581A1 (de)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102006059432B4 (de) 2006-12-15 2022-08-25 Carl Zeiss Smt Gmbh Vorrichtung und Verfahren zur Vermessung von Lithographiemasken

Families Citing this family (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8396328B2 (en) 2001-05-04 2013-03-12 Legend3D, Inc. Minimal artifact image sequence depth enhancement system and method
US7907793B1 (en) 2001-05-04 2011-03-15 Legend Films Inc. Image sequence depth enhancement system and method
US8897596B1 (en) 2001-05-04 2014-11-25 Legend3D, Inc. System and method for rapid image sequence depth enhancement with translucent elements
US8401336B2 (en) * 2001-05-04 2013-03-19 Legend3D, Inc. System and method for rapid image sequence depth enhancement with augmented computer-generated elements
US7181081B2 (en) * 2001-05-04 2007-02-20 Legend Films Inc. Image sequence enhancement system and method
US9031383B2 (en) 2001-05-04 2015-05-12 Legend3D, Inc. Motion picture project management system
US9286941B2 (en) 2001-05-04 2016-03-15 Legend3D, Inc. Image sequence enhancement and motion picture project management system
US6885000B1 (en) * 2003-06-02 2005-04-26 Kla-Tencor Technologies Corporation Method and apparatus to correct for stage motion in E-beam inspection
DE102007036814A1 (de) * 2007-08-03 2009-02-12 Vistec Semiconductor Systems Gmbh Koordinaten-Messmaschine zum Vermessen von Strukturen auf einem Substrat
US7864415B2 (en) * 2007-09-17 2011-01-04 U Chicago Argonne, Llc Use of a focusing vortex lens as the objective in spiral phase contrast microscopy
NL2003678A (en) * 2008-12-17 2010-06-21 Asml Holding Nv Euv mask inspection system.
NL2003658A (en) * 2008-12-31 2010-07-01 Asml Holding Nv Euv mask inspection.
JP5065516B2 (ja) 2010-08-04 2012-11-07 エフ イー アイ カンパニ 薄い電子検出器における後方散乱の減少
EP2463888B1 (de) * 2010-08-04 2013-02-13 Fei Company Verringerung von Rückstreuereignissen in dünnen Elektronendetektoren
US8730232B2 (en) 2011-02-01 2014-05-20 Legend3D, Inc. Director-style based 2D to 3D movie conversion system and method
US9113130B2 (en) 2012-02-06 2015-08-18 Legend3D, Inc. Multi-stage production pipeline system
US9288476B2 (en) 2011-02-17 2016-03-15 Legend3D, Inc. System and method for real-time depth modification of stereo images of a virtual reality environment
US9241147B2 (en) 2013-05-01 2016-01-19 Legend3D, Inc. External depth map transformation method for conversion of two-dimensional images to stereoscopic images
US9282321B2 (en) 2011-02-17 2016-03-08 Legend3D, Inc. 3D model multi-reviewer system
US9407904B2 (en) 2013-05-01 2016-08-02 Legend3D, Inc. Method for creating 3D virtual reality from 2D images
EP2509097A1 (de) * 2011-04-07 2012-10-10 FEI Company Verfahren zum Schutz eines Strahlungsdetektors in einem Ladungsteilcheninstrument
US9007365B2 (en) 2012-11-27 2015-04-14 Legend3D, Inc. Line depth augmentation system and method for conversion of 2D images to 3D images
US9547937B2 (en) 2012-11-30 2017-01-17 Legend3D, Inc. Three-dimensional annotation system and method
US9007404B2 (en) 2013-03-15 2015-04-14 Legend3D, Inc. Tilt-based look around effect image enhancement method
US9438878B2 (en) 2013-05-01 2016-09-06 Legend3D, Inc. Method of converting 2D video to 3D video using 3D object models
US9609307B1 (en) 2015-09-17 2017-03-28 Legend3D, Inc. Method of converting 2D video to 3D video using machine learning
EP3396309B1 (de) * 2015-12-22 2019-09-25 Mitsubishi Electric Corporation Taumelerkennungsvorrichtung
US10345714B2 (en) * 2016-07-12 2019-07-09 Cymer, Llc Lithography optics adjustment and monitoring

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3148353B2 (ja) * 1991-05-30 2001-03-19 ケーエルエー・インストルメンツ・コーポレーション 電子ビーム検査方法とそのシステム
JP3490597B2 (ja) * 1997-01-07 2004-01-26 株式会社東芝 マスク検査装置
JPH10255709A (ja) * 1997-01-08 1998-09-25 Nikon Corp 画像検査装置
JP4042185B2 (ja) * 1997-08-29 2008-02-06 株式会社ニコン パターン検査装置
JPH11345585A (ja) * 1998-06-03 1999-12-14 Nikon Corp 電子ビームによる検査装置および検査方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102006059432B4 (de) 2006-12-15 2022-08-25 Carl Zeiss Smt Gmbh Vorrichtung und Verfahren zur Vermessung von Lithographiemasken

Also Published As

Publication number Publication date
US6686591B2 (en) 2004-02-03
US20030151002A1 (en) 2003-08-14
WO2002023581A1 (fr) 2002-03-21

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Legal Events

Date Code Title Description
OP8 Request for examination as to paragraph 44 patent law
8131 Rejection