DE10105239A1 - Selbstausrichtendes Interszintillatorreflektorröntgenschutzschild und dessen Herstellungsverfahren - Google Patents
Selbstausrichtendes Interszintillatorreflektorröntgenschutzschild und dessen HerstellungsverfahrenInfo
- Publication number
- DE10105239A1 DE10105239A1 DE10105239A DE10105239A DE10105239A1 DE 10105239 A1 DE10105239 A1 DE 10105239A1 DE 10105239 A DE10105239 A DE 10105239A DE 10105239 A DE10105239 A DE 10105239A DE 10105239 A1 DE10105239 A1 DE 10105239A1
- Authority
- DE
- Germany
- Prior art keywords
- scintillator
- areas
- layer
- interscintillator
- ray absorption
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 238000010521 absorption reaction Methods 0.000 title claims abstract description 121
- 238000002591 computed tomography Methods 0.000 title claims description 13
- 238000003384 imaging method Methods 0.000 title abstract description 6
- 239000000463 material Substances 0.000 claims abstract description 129
- 238000000034 method Methods 0.000 claims abstract description 84
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims abstract description 24
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims abstract description 22
- 229910052721 tungsten Inorganic materials 0.000 claims abstract description 22
- 239000010937 tungsten Substances 0.000 claims abstract description 22
- 230000008569 process Effects 0.000 claims abstract description 17
- 239000011133 lead Substances 0.000 claims abstract description 14
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims abstract description 13
- 229910052737 gold Inorganic materials 0.000 claims abstract description 13
- 239000010931 gold Substances 0.000 claims abstract description 13
- 229910052697 platinum Inorganic materials 0.000 claims abstract description 12
- 229910045601 alloy Inorganic materials 0.000 claims abstract description 11
- 239000000956 alloy Substances 0.000 claims abstract description 11
- 229910052735 hafnium Inorganic materials 0.000 claims abstract description 11
- VBJZVLUMGGDVMO-UHFFFAOYSA-N hafnium atom Chemical compound [Hf] VBJZVLUMGGDVMO-UHFFFAOYSA-N 0.000 claims abstract description 11
- 229910052702 rhenium Inorganic materials 0.000 claims abstract description 11
- WUAPFZMCVAUBPE-UHFFFAOYSA-N rhenium atom Chemical compound [Re] WUAPFZMCVAUBPE-UHFFFAOYSA-N 0.000 claims abstract description 11
- 229910052715 tantalum Inorganic materials 0.000 claims abstract description 11
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims abstract description 11
- 239000010410 layer Substances 0.000 claims description 222
- 230000005855 radiation Effects 0.000 claims description 65
- 239000002243 precursor Substances 0.000 claims description 52
- 229920002120 photoresistant polymer Polymers 0.000 claims description 44
- 239000004593 Epoxy Substances 0.000 claims description 34
- 238000012549 training Methods 0.000 claims description 30
- 230000015572 biosynthetic process Effects 0.000 claims description 22
- 238000001514 detection method Methods 0.000 claims description 16
- 239000002245 particle Substances 0.000 claims description 15
- 238000007747 plating Methods 0.000 claims description 14
- 230000001681 protective effect Effects 0.000 claims description 11
- 229910052751 metal Inorganic materials 0.000 claims description 10
- 239000002184 metal Substances 0.000 claims description 10
- 238000005229 chemical vapour deposition Methods 0.000 claims description 8
- 229910000449 hafnium oxide Inorganic materials 0.000 claims description 8
- WIHZLLGSGQNAGK-UHFFFAOYSA-N hafnium(4+);oxygen(2-) Chemical compound [O-2].[O-2].[Hf+4] WIHZLLGSGQNAGK-UHFFFAOYSA-N 0.000 claims description 8
- QGLKJKCYBOYXKC-UHFFFAOYSA-N nonaoxidotritungsten Chemical compound O=[W]1(=O)O[W](=O)(=O)O[W](=O)(=O)O1 QGLKJKCYBOYXKC-UHFFFAOYSA-N 0.000 claims description 8
- 238000004544 sputter deposition Methods 0.000 claims description 8
- 229910001930 tungsten oxide Inorganic materials 0.000 claims description 8
- 238000001704 evaporation Methods 0.000 claims description 7
- 230000008020 evaporation Effects 0.000 claims description 7
- 238000012216 screening Methods 0.000 claims description 6
- 239000007787 solid Substances 0.000 claims description 6
- 238000000151 deposition Methods 0.000 claims description 3
- 239000011241 protective layer Substances 0.000 claims description 3
- 238000005476 soldering Methods 0.000 claims description 3
- 239000011343 solid material Substances 0.000 claims description 3
- 238000010438 heat treatment Methods 0.000 claims description 2
- 229910000464 lead oxide Inorganic materials 0.000 claims 4
- YEXPOXQUZXUXJW-UHFFFAOYSA-N oxolead Chemical compound [Pb]=O YEXPOXQUZXUXJW-UHFFFAOYSA-N 0.000 claims 4
- 229910052684 Cerium Inorganic materials 0.000 claims 1
- GWXLDORMOJMVQZ-UHFFFAOYSA-N cerium Chemical compound [Ce] GWXLDORMOJMVQZ-UHFFFAOYSA-N 0.000 claims 1
- 230000008021 deposition Effects 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 abstract description 9
- 150000002118 epoxides Chemical class 0.000 abstract 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 9
- 238000001465 metallisation Methods 0.000 description 8
- 150000002739 metals Chemical class 0.000 description 8
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 6
- 239000000203 mixture Substances 0.000 description 6
- 150000001875 compounds Chemical class 0.000 description 4
- 239000002223 garnet Substances 0.000 description 4
- 230000006911 nucleation Effects 0.000 description 4
- 238000010899 nucleation Methods 0.000 description 4
- 238000003860 storage Methods 0.000 description 4
- 239000004408 titanium dioxide Substances 0.000 description 4
- 238000005516 engineering process Methods 0.000 description 3
- 238000005530 etching Methods 0.000 description 3
- 230000035515 penetration Effects 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- 238000005406 washing Methods 0.000 description 3
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 2
- 229910052765 Lutetium Inorganic materials 0.000 description 2
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- 238000010276 construction Methods 0.000 description 2
- 125000003700 epoxy group Chemical group 0.000 description 2
- -1 gadolinium scandium aluminum Chemical compound 0.000 description 2
- 229910052733 gallium Inorganic materials 0.000 description 2
- OHSVLFRHMCKCQY-UHFFFAOYSA-N lutetium atom Chemical compound [Lu] OHSVLFRHMCKCQY-UHFFFAOYSA-N 0.000 description 2
- 239000011159 matrix material Substances 0.000 description 2
- 229920000647 polyepoxide Polymers 0.000 description 2
- 230000035945 sensitivity Effects 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- 239000004332 silver Substances 0.000 description 2
- 239000002344 surface layer Substances 0.000 description 2
- 229910052727 yttrium Inorganic materials 0.000 description 2
- 229910052688 Gadolinium Inorganic materials 0.000 description 1
- 239000004820 Pressure-sensitive adhesive Substances 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- TVFHPXMGPBXBAE-UHFFFAOYSA-N [Sc].[Gd] Chemical compound [Sc].[Gd] TVFHPXMGPBXBAE-UHFFFAOYSA-N 0.000 description 1
- 231100000987 absorbed dose Toxicity 0.000 description 1
- 230000002745 absorbent Effects 0.000 description 1
- 239000002250 absorbent Substances 0.000 description 1
- 239000011358 absorbing material Substances 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000003486 chemical etching Methods 0.000 description 1
- 238000013170 computed tomography imaging Methods 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- VPYVGHGNVQXIEY-UHFFFAOYSA-N gadolinium(3+);oxygen(2-);yttrium(3+) Chemical compound [O-2].[O-2].[O-2].[Y+3].[Gd+3] VPYVGHGNVQXIEY-UHFFFAOYSA-N 0.000 description 1
- ZPDRQAVGXHVGTB-UHFFFAOYSA-N gallium;gadolinium(3+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Ga+3].[Gd+3] ZPDRQAVGXHVGTB-UHFFFAOYSA-N 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- BOYZAERJCXIRAX-UHFFFAOYSA-N lutetium(3+);trisilicate Chemical compound [Lu+3].[Lu+3].[Lu+3].[Lu+3].[O-][Si]([O-])([O-])[O-].[O-][Si]([O-])([O-])[O-].[O-][Si]([O-])([O-])[O-] BOYZAERJCXIRAX-UHFFFAOYSA-N 0.000 description 1
- 239000002923 metal particle Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000013307 optical fiber Substances 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 238000005289 physical deposition Methods 0.000 description 1
- 238000001020 plasma etching Methods 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000002310 reflectometry Methods 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 238000003631 wet chemical etching Methods 0.000 description 1
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01T—MEASUREMENT OF NUCLEAR OR X-RADIATION
- G01T1/00—Measuring X-radiation, gamma radiation, corpuscular radiation, or cosmic radiation
- G01T1/16—Measuring radiation intensity
- G01T1/20—Measuring radiation intensity with scintillation detectors
- G01T1/2002—Optical details, e.g. reflecting or diffusing layers
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01T—MEASUREMENT OF NUCLEAR OR X-RADIATION
- G01T1/00—Measuring X-radiation, gamma radiation, corpuscular radiation, or cosmic radiation
- G01T1/16—Measuring radiation intensity
- G01T1/20—Measuring radiation intensity with scintillation detectors
- G01T1/202—Measuring radiation intensity with scintillation detectors the detector being a crystal
Landscapes
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Physics & Mathematics (AREA)
- High Energy & Nuclear Physics (AREA)
- Molecular Biology (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Measurement Of Radiation (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US09/499,323 US6298113B1 (en) | 2000-02-07 | 2000-02-07 | Self aligning inter-scintillator reflector x-ray damage shield and method of manufacture |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE10105239A1 true DE10105239A1 (de) | 2001-09-13 |
Family
ID=23984819
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE10105239A Withdrawn DE10105239A1 (de) | 2000-02-07 | 2001-02-06 | Selbstausrichtendes Interszintillatorreflektorröntgenschutzschild und dessen Herstellungsverfahren |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US6298113B1 (enExample) |
| JP (1) | JP4898008B2 (enExample) |
| DE (1) | DE10105239A1 (enExample) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CZ302205B6 (cs) * | 2009-02-18 | 2010-12-15 | Fyzikální ústav AV CR, v.v.i. | Anorganický scintilátor |
| DE102009052914A1 (de) * | 2009-11-12 | 2011-05-19 | Siemens Aktiengesellschaft | Verfahren zur Herstellung einer Strahlenwandlerschicht sowie Strahlenwandlerschicht und Strahlendetektormodul |
| DE102019208888A1 (de) * | 2019-06-19 | 2020-12-24 | Friedrich-Alexander-Universität Erlangen-Nürnberg | Verfahren zur Herstellung eines Streustrahlkollimators, Streustrahlkollimator und Röntgengerät mit Streustrahlkollimator |
Families Citing this family (52)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002071816A (ja) * | 2000-08-29 | 2002-03-12 | Japan Atom Energy Res Inst | ２次元放射線および中性子イメージ検出器 |
| JP4298177B2 (ja) * | 2001-02-07 | 2009-07-15 | キヤノン株式会社 | シンチレータパネル、放射線検出装置及びシステム |
| US6519313B2 (en) * | 2001-05-30 | 2003-02-11 | General Electric Company | High-Z cast reflector compositions and method of manufacture |
| WO2004061478A1 (en) * | 2003-01-06 | 2004-07-22 | Koninklijke Philips Electronics N.V. | Radiation detector with shielded electronics for computed tomography |
| US6933504B2 (en) * | 2003-03-12 | 2005-08-23 | General Electric Company | CT detector having a segmented optical coupler and method of manufacturing same |
| US7054408B2 (en) * | 2003-04-30 | 2006-05-30 | General Electric Company | CT detector array having non pixelated scintillator array |
| US7655915B2 (en) * | 2003-05-13 | 2010-02-02 | General Electric Company | Collimator assembly for computed tomography system |
| JP2006528017A (ja) * | 2003-07-22 | 2006-12-14 | コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ | ２次元ｃｔ検出器用放射線マスク |
| US7099429B2 (en) * | 2003-10-06 | 2006-08-29 | Ge Medical Systems Global Technology Company, Llc | Scintillator arrays for radiation detectors and methods of manufacture |
| US7576329B2 (en) * | 2003-10-17 | 2009-08-18 | General Electric Company | Scintillator compositions, and related processes and articles of manufacture |
| US6898265B1 (en) * | 2003-11-20 | 2005-05-24 | Ge Medical Systems Global Technology Company, Llc | Scintillator arrays for radiation detectors and methods of manufacture |
| JP4305241B2 (ja) * | 2004-03-26 | 2009-07-29 | 株式会社島津製作所 | 放射線検出器 |
| US7145986B2 (en) * | 2004-05-04 | 2006-12-05 | General Electric Company | Solid state X-ray detector with improved spatial resolution |
| EP1645891A1 (en) * | 2004-10-08 | 2006-04-12 | Services Petroliers Schlumberger | Covering of a scintillation detector with a reflective coating |
| US8907268B2 (en) | 2004-10-08 | 2014-12-09 | Schlumberger Technology Corporation | Electron focusing systems and techniques integrated with a scintillation detector covered with a reflective coating |
| FR2876808B1 (fr) * | 2004-10-19 | 2008-09-05 | Commissariat Energie Atomique | Structure de masque pour lithographie |
| US7847260B2 (en) | 2005-02-04 | 2010-12-07 | Dan Inbar | Nuclear threat detection |
| US7820977B2 (en) | 2005-02-04 | 2010-10-26 | Steve Beer | Methods and apparatus for improved gamma spectra generation |
| US8173970B2 (en) | 2005-02-04 | 2012-05-08 | Dan Inbar | Detection of nuclear materials |
| US7625502B2 (en) * | 2007-03-26 | 2009-12-01 | General Electric Company | Nano-scale metal halide scintillation materials and methods for making same |
| US7608829B2 (en) * | 2007-03-26 | 2009-10-27 | General Electric Company | Polymeric composite scintillators and method for making same |
| US7708968B2 (en) * | 2007-03-26 | 2010-05-04 | General Electric Company | Nano-scale metal oxide, oxyhalide and oxysulfide scintillation materials and methods for making same |
| US7605374B2 (en) * | 2007-03-27 | 2009-10-20 | General Electric Company | X-ray detector fabrication methods and apparatus therefrom |
| JP5242080B2 (ja) * | 2007-05-31 | 2013-07-24 | ジーイー・メディカル・システムズ・グローバル・テクノロジー・カンパニー・エルエルシー | Ｘ線検出器およびｘ線ｃｔ装置 |
| JP2008304349A (ja) * | 2007-06-08 | 2008-12-18 | Ge Medical Systems Global Technology Co Llc | シンチレータ部材およびｘ線ｃｔ装置 |
| US8294108B2 (en) * | 2008-02-04 | 2012-10-23 | Shimadzu Corporation | Radiation detector and tomography equipment provided with the same |
| WO2009101677A1 (ja) * | 2008-02-13 | 2009-08-20 | Shimadzu Corporation | 放射線検出器、およびそれを備えた断層撮影装置 |
| JP5443736B2 (ja) * | 2008-11-25 | 2014-03-19 | 株式会社東芝 | 放射線検出器、及びｘ線ｃｔ装置 |
| CN102484934A (zh) | 2009-04-16 | 2012-05-30 | 埃里克·H·西尔弗 | 单色x-射线方法和装置 |
| WO2011028459A2 (en) | 2009-08-24 | 2011-03-10 | Saint-Gobain Ceramics & Plastics, Inc. | Scintillation detector assembly |
| US8761333B2 (en) * | 2011-08-12 | 2014-06-24 | General Electric Company | Low resolution scintillating array for CT imaging and method of implementing same |
| WO2013033389A1 (en) * | 2011-08-30 | 2013-03-07 | Saint-Gobain Ceramics & Plastics, Inc. | System, method and apparatus for deep slot, thin kerf pixelation |
| US9599728B2 (en) * | 2011-11-29 | 2017-03-21 | Koninklijke Philips N.V. | Scintillator pack comprising an X-ray absorbing encapsulation and X-ray detector array comprising such scintillator pack |
| US8748831B2 (en) * | 2011-12-12 | 2014-06-10 | Varian Medical Systems, Inc. | Flat panel imagers with pixel separation and method of manufacturing the same |
| KR101334669B1 (ko) * | 2012-03-19 | 2013-11-29 | 명지대학교 산학협력단 | 감마선 영상장치용 저산란 섬광체 배열 구조 |
| JP6041594B2 (ja) * | 2012-09-14 | 2016-12-14 | 浜松ホトニクス株式会社 | シンチレータパネル、及び、放射線検出器 |
| US9182503B2 (en) * | 2012-09-30 | 2015-11-10 | Saint-Gobain Ceramics & Plastics, Inc. | Scintillation pixel array, radiation sensing apparatus including the scintillation pixel array and a method of forming a scintillation pixel array |
| US20150316659A1 (en) * | 2012-11-01 | 2015-11-05 | Toray Industries, Inc. | Radiation detection device and method for manufacturing the same |
| JP2014240769A (ja) * | 2013-06-11 | 2014-12-25 | ソニー株式会社 | 放射線撮像装置および放射線撮像表示システム |
| JP6223179B2 (ja) * | 2013-12-27 | 2017-11-01 | キヤノン株式会社 | シンチレータプレートおよび放射線検出器 |
| US20150369758A1 (en) | 2014-06-24 | 2015-12-24 | Eric H. Silver | Methods and apparatus for determining information regarding chemical composition using x-ray radiation |
| KR102197808B1 (ko) * | 2016-04-27 | 2021-01-04 | 도레이 카부시키가이샤 | 신틸레이터 패널 및 그 제조 방법, 및 방사선 검출 장치 |
| CN111225613B (zh) | 2017-05-19 | 2024-08-02 | 想像科学有限公司 | 单色x射线成像系统及方法 |
| US10818467B2 (en) * | 2018-02-09 | 2020-10-27 | Imagine Scientific, Inc. | Monochromatic x-ray imaging systems and methods |
| CA3129632A1 (en) * | 2018-02-09 | 2019-08-15 | Imagine Scientific, Inc. | Monochromatic x-ray imaging systems and methods |
| WO2020056281A1 (en) | 2018-09-14 | 2020-03-19 | Imagine Scientific, Inc. | Monochromatic x-ray component systems and methods |
| CN109459782B (zh) * | 2018-12-29 | 2020-06-16 | 厦门中烁光电科技有限公司 | 闪烁晶体封装方法、闪烁晶体封装结构及其应用 |
| CN115427840B (zh) * | 2020-03-04 | 2025-11-14 | 通用电气精准医疗有限责任公司 | 具有降低动态失准灵敏度的间隙填充材料的侧面朝向x射线检测器 |
| US11086032B1 (en) | 2020-03-04 | 2021-08-10 | Prismatic Sensors Ab | Edge-on X-ray detector |
| DE102020208094A1 (de) | 2020-06-30 | 2021-12-30 | Siemens Healthcare Gmbh | Verfahren zur Herstellung eines gitterförmigen Kollimatorelements und gitterförmiges Kollimatorelement für einen Streustrahlenkollimator |
| US12405392B1 (en) * | 2022-05-03 | 2025-09-02 | Triad National Security, Llc | Electroplated materials and array design for scintillators |
| WO2024044925A1 (en) * | 2022-08-30 | 2024-03-07 | Shenzhen Xpectvision Technology Co., Ltd. | Side incidence image sensors with protruding integrated circuit chips |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6385484A (ja) * | 1986-09-30 | 1988-04-15 | Toshiba Corp | 放射線検出器 |
| JPS63308593A (ja) * | 1987-06-11 | 1988-12-15 | Toshiba Corp | 放射線検出器 |
| US5127030A (en) | 1989-02-28 | 1992-06-30 | American Science And Engineering, Inc. | Tomographic imaging with improved collimator |
| DE3909449A1 (de) * | 1989-03-22 | 1990-11-22 | Kernforschungsz Karlsruhe | Verfahren zur herstellung von leuchtschirmen, verstaerkungs- oder speicherfolien fuer die roentgendiagnostik |
| US5187369A (en) * | 1990-10-01 | 1993-02-16 | General Electric Company | High sensitivity, high resolution, solid state x-ray imaging device with barrier layer |
| JPH04273087A (ja) * | 1991-02-28 | 1992-09-29 | Shimadzu Corp | 放射線検出器およびその製造方法 |
| DE4334594C1 (de) * | 1993-10-11 | 1994-09-29 | Siemens Ag | Detektor für energiereiche Strahlung |
| JPH095444A (ja) * | 1995-06-15 | 1997-01-10 | Ge Yokogawa Medical Syst Ltd | Ｘ線検出器およびその製造方法 |
| US5712483A (en) * | 1996-06-28 | 1998-01-27 | The Regents Of The University Of California | X-ray grid-detector apparatus |
| US5956382A (en) * | 1997-09-25 | 1999-09-21 | Eliezer Wiener-Avnear, Doing Business As Laser Electro Optic Application Technology Comp. | X-ray imaging array detector and laser micro-milling method for fabricating array |
| JPH11166976A (ja) * | 1997-12-04 | 1999-06-22 | Hitachi Medical Corp | Ｘ線検出器及びｘ線ｃｔ装置 |
| JP2001046364A (ja) * | 1999-08-09 | 2001-02-20 | Hitachi Medical Corp | Ｘ線検出器及びこれを用いたｘ線ｃｔ装置 |
-
2000
- 2000-02-07 US US09/499,323 patent/US6298113B1/en not_active Expired - Lifetime
-
2001
- 2001-02-06 JP JP2001028934A patent/JP4898008B2/ja not_active Expired - Fee Related
- 2001-02-06 DE DE10105239A patent/DE10105239A1/de not_active Withdrawn
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CZ302205B6 (cs) * | 2009-02-18 | 2010-12-15 | Fyzikální ústav AV CR, v.v.i. | Anorganický scintilátor |
| DE102009052914A1 (de) * | 2009-11-12 | 2011-05-19 | Siemens Aktiengesellschaft | Verfahren zur Herstellung einer Strahlenwandlerschicht sowie Strahlenwandlerschicht und Strahlendetektormodul |
| DE102019208888A1 (de) * | 2019-06-19 | 2020-12-24 | Friedrich-Alexander-Universität Erlangen-Nürnberg | Verfahren zur Herstellung eines Streustrahlkollimators, Streustrahlkollimator und Röntgengerät mit Streustrahlkollimator |
| US11443867B2 (en) | 2019-06-19 | 2022-09-13 | Siemens Healthcare Gmbh | Method for producing a scattered beam collimator, scattered beam collimator and x-ray device with scattered beam collimator |
Also Published As
| Publication number | Publication date |
|---|---|
| JP4898008B2 (ja) | 2012-03-14 |
| US6298113B1 (en) | 2001-10-02 |
| JP2001296364A (ja) | 2001-10-26 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| DE10105239A1 (de) | Selbstausrichtendes Interszintillatorreflektorröntgenschutzschild und dessen Herstellungsverfahren | |
| DE2900465C2 (de) | Szintillationsdetektor | |
| DE69803344T2 (de) | Vorrichtung zum nachweis von strahlung und verfahren zu ihrer herstellung | |
| DE69803438T2 (de) | Strahlungsdetektor und verfahren zu seiner herstellung | |
| DE102010011581A1 (de) | Verfahren zur Herstellung eines 2D-Kollimatorelements für einen Strahlendetektor sowie 2D-Kollimatorelement | |
| DE102004059794A1 (de) | Multischichtreflektor für CT-Detektor | |
| DE4101645A1 (de) | Zweidimensionaler mosaikartiger szintillationsdetektor | |
| DE10058810A1 (de) | Röntgendetektormodul | |
| EP1107022A2 (de) | Röntgendetektor mit einer Sensormatrix und einer Szintillatoranordnung | |
| DE102004009990A1 (de) | CT-Detektor mit integriertem Luftspalt | |
| DE102010020610A1 (de) | Strahlendetektor und Verfahren zur Herstellung eines Strahlendetektors | |
| DE10241423A1 (de) | Verfahren zur Herstellung und Aufbringung eines Streustrahlenrasters oder Kollimators auf einen Röntgen- oder Gammadetektor | |
| DE102011050963A1 (de) | Anti-Streu-Röntgengittervorrichtung und Verfahren zur Herstellung derselben | |
| DE3141755A1 (de) | Strahlungsdetektor | |
| DE2923324A1 (de) | Strahlungsabtastgeraet | |
| DE112013001689B4 (de) | Verfahren zur Herstellung einer dualen Szintillatoranordnung | |
| DE10121018A1 (de) | Hybride zweidimensionale Szintillatoranordnung | |
| DE102006038969B4 (de) | Röntgenkonverterelement und Verfahren zu dessen Herstellung | |
| DE102009009051B4 (de) | Szintillatoranordnung zur Erfassung einer Röntgenstrahlung sowie Röntgendetektor mit einer solchen Szintillatoranordnung | |
| WO2002048739A2 (de) | Speicherschicht und wandlungsschicht sowie vorrichtung zum auslesen von röntgeninformationen und röntgenkassette | |
| EP2240801B1 (de) | Vorrichtung und verfahren zum erfassen eines bildes | |
| DE102008007595B4 (de) | Vorrichtung und Verfahren zum Erfassen eines Bildes | |
| DE19962773A1 (de) | Vorrichtung zum Auslesen von in einer Speicherschicht abgespeicherten Informationen sowie Röntgenkassette und Röntgentisch | |
| DE19842947A1 (de) | Verfahren zum Herstellen eines Strahlendetektors und ein somit hergestellter Strahlendetektor eines Computertomographen | |
| DE60013738T2 (de) | Leuchtstoffträger mit verbessertem Leuchtwirkungsgrad |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| 8110 | Request for examination paragraph 44 | ||
| 8125 | Change of the main classification |
Ipc: G21K 4/00 AFI20051017BHDE |
|
| R119 | Application deemed withdrawn, or ip right lapsed, due to non-payment of renewal fee | ||
| R119 | Application deemed withdrawn, or ip right lapsed, due to non-payment of renewal fee |
Effective date: 20140902 |