CS240416B1 - Method of coating application on electrically insulation substrates by means of ions and device for performance of this method - Google Patents
Method of coating application on electrically insulation substrates by means of ions and device for performance of this method Download PDFInfo
- Publication number
- CS240416B1 CS240416B1 CS817535A CS753581A CS240416B1 CS 240416 B1 CS240416 B1 CS 240416B1 CS 817535 A CS817535 A CS 817535A CS 753581 A CS753581 A CS 753581A CS 240416 B1 CS240416 B1 CS 240416B1
- Authority
- CS
- Czechoslovakia
- Prior art keywords
- ions
- anode
- performance
- voltage
- coating application
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3435—Applying energy to the substrate during sputtering
- C23C14/345—Applying energy to the substrate during sputtering using substrate bias
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/26—Deposition of carbon only
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- C23C16/505—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges
- C23C16/509—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges using internal electrodes
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Physical Vapour Deposition (AREA)
- Chemical Vapour Deposition (AREA)
- Securing Of Glass Panes Or The Like (AREA)
- Heat Sensitive Colour Forming Recording (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DD80225718A DD161137A3 (de) | 1980-12-04 | 1980-12-04 | Verfahren und einrichtung zur ionengestuetzten beschichtung elektrisch isolierender substrate |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CS240416B1 true CS240416B1 (en) | 1986-02-13 |
Family
ID=5527616
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CS817535A CS240416B1 (en) | 1980-12-04 | 1981-10-14 | Method of coating application on electrically insulation substrates by means of ions and device for performance of this method |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US4419380A (it) |
| JP (1) | JPS6014100B2 (it) |
| AT (1) | AT375408B (it) |
| CH (1) | CH648356A5 (it) |
| CS (1) | CS240416B1 (it) |
| DD (1) | DD161137A3 (it) |
| DE (1) | DE3142900A1 (it) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB8713986D0 (en) * | 1987-06-16 | 1987-07-22 | Shell Int Research | Apparatus for plasma surface treating |
| CH689767A5 (de) | 1992-03-24 | 1999-10-15 | Balzers Hochvakuum | Verfahren zur Werkstueckbehandlung in einer Vakuumatmosphaere und Vakuumbehandlungsanlage. |
| DE4412906C1 (de) * | 1994-04-14 | 1995-07-13 | Fraunhofer Ges Forschung | Verfahren und Einrichtung für die ionengestützte Vakuumbeschichtung |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3010314C2 (de) * | 1980-03-18 | 1982-01-07 | Beerwald, Hans, Dr.Rer.Nat., 5370 Kall | Verfahren zur innenbeschichtung von elektrisch nicht leitfähigen Rohren mittels Gasentladungen |
-
1980
- 1980-12-04 DD DD80225718A patent/DD161137A3/de not_active IP Right Cessation
-
1981
- 1981-09-08 AT AT0388581A patent/AT375408B/de not_active IP Right Cessation
- 1981-10-14 CS CS817535A patent/CS240416B1/cs unknown
- 1981-10-29 DE DE19813142900 patent/DE3142900A1/de active Granted
- 1981-11-03 US US06/317,817 patent/US4419380A/en not_active Expired - Fee Related
- 1981-12-03 CH CH7745/81A patent/CH648356A5/de not_active IP Right Cessation
- 1981-12-04 JP JP56194626A patent/JPS6014100B2/ja not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| AT375408B (de) | 1984-08-10 |
| JPS6014100B2 (ja) | 1985-04-11 |
| DE3142900A1 (de) | 1982-08-05 |
| DD161137A3 (de) | 1985-02-20 |
| US4419380A (en) | 1983-12-06 |
| ATA388581A (de) | 1983-12-15 |
| CH648356A5 (de) | 1985-03-15 |
| JPS57120666A (en) | 1982-07-27 |
| DE3142900C2 (it) | 1987-10-01 |
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