CN2921039Y - Fast air extraction device for large vacuum equipment - Google Patents
Fast air extraction device for large vacuum equipment Download PDFInfo
- Publication number
- CN2921039Y CN2921039Y CN 200520045016 CN200520045016U CN2921039Y CN 2921039 Y CN2921039 Y CN 2921039Y CN 200520045016 CN200520045016 CN 200520045016 CN 200520045016 U CN200520045016 U CN 200520045016U CN 2921039 Y CN2921039 Y CN 2921039Y
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- vacuum
- flushing
- gas
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Abstract
The utility model discloses a fast speed flushing and pumping device equipped with large sized vacuum equipment, which comprises a vacuum chamber, a prepump, a vacuum valve and a vacuum gauge, The vacuum equipment is also composed of a set of flushing vacuum machines, a flushing gas source and a flushing gas filler box. The utility model fast reduces the partial pressure of the active gas in the vacuum container by leveraging non active gas filling, active gas flushing in the vacuum equipment, as well as repeating flushing and pumping, or consecutive flushing. The utility model is characterized by a simple structure, short pumping time, low energy consumption, high productivity and quality vacuum product provision, the utility model can also reduce the pumping speed of the high vacuum pump, and is especially applied to application fields such as active gas sensitive plasma applications (magnetron sputtering, ion plating, PCVD, etc.) and various large sized vacuum furnace smelter hearths and heat treatment furnaces.
Description
Technical field
The utility model relates to a kind of quick air extractor of large-scale vacuum equipment, particularly a kind of large vacuum coating equipment and large vacuum furnace get air extractor express developed.
Background technology
Utilize to inject non-active gas, the reactive gas in the flushing vacuum apparatus, and to repeat to bleed be the effective way that reduces reactive gas partial pressure in the vacuum vessel fast.At present, in packaged vacuum unit and exhaust station fields such as (for example fluorescent lamp and energy-saving lamp exhaustings), obtained widespread use.Yet, in large-scale vacuum equipment is bled, lack and get the necessary flushing vacuum pump of device express developed, do not see the precedent that success is arranged so far.
Summary of the invention
The utility model is intended to address the above problem and a kind of vacuum apparatus fast, that energy consumption is low, oil vapour pollutes less, the reactive gas partial pressure is low of bleeding is provided.
For achieving the above object, the technical solution adopted in the utility model is: in existing vacuum-pumping equipment, the flushing vacuum pump unit that vacuum chamber is formed through vacuum valve and the forepump that is connected in series successively, vacuum valve, vacuumometer, molecular is connected; Vacuum chamber also is connected with the rinsing gas high-purity argon gas; High-purity argon gas to the gas inlet of vacuum chamber be arranged on the upstream of vacuum chamber pumping airflow, away from the position of bleeding point.According to technique scheme, the utility model provides a kind of air extractor of getting express developed of vacuum apparatus, and it comprises vacuum chamber, vacuum valve, forepump, vacuumometer, and the flushing vacuum pump unit (hereinafter referred flushing unit) with following performance:
1) energy non-stop run in 1～hundreds of Pa pressure range has enough pumping speed, for example tens～several hectolitres/second;
2) in the high vacuum scope bigger pumping speed is arranged, for example hundreds of～several kilolitres/second;
3) highest attainable vacuum is better than 10
-3Pa;
4) vacuum chamber is not produced additional the pollution, perhaps additional pollution can be ignored.
Also comprise purge gas body source (for example Ar, N in the utility model
2, or other non-active gas) and the inlet of rinsing gas, the inlet of rinsing gas will be arranged on the upstream of vacuum chamber pumping airflow, away from the position of bleeding point.
According to user's needs, the flushing air extractor that the utility model provides can increase discharge degasifying device and bakeout degassing device, quickens the release of adsorbed gas.Can also increase the partial pressure monitoring device, for example mass spectrograph, spectrometer etc. are monitored in real time to the reactive gas partial pressure.
The said flushing unit of preamble is meant the vacuum pump unit that can satisfy aforementioned 4 performances.For example:
Multiple molecular drag/the topping-up pump of first kind of following structure of the flushing optional usefulness of unit (be the described vacuum pump of patent No. ZL92101300.0, and other vacuum pump that grows up thus)+forepump (common available sliding vane rotary pump and slide valve pump).Multiple molecular drag/topping-up pump is made up of driving wheel, dynamic seal, rotating shaft and pump case, the unit of bleeding that has at least the one-level groove of bleeding along the circumferential direction to constitute on the driving wheel, bleeding has a plurality of dynamic seals in the groove, dynamic seal and bleed and leave the working clearance between the groove inboard, the both sides of dynamic seal are respectively equipped with inlet mouth and venting port, are provided with the dynamic seal venting port between the adjacent dynamic seal.The plural face that drags is arranged in this groove of bleeding, and the cross section of the groove of bleeding can be a rectangle, and the opening of this groove of bleeding can be on the side of circumference, perhaps on cross section.
Second kind of flushing unit can adopt double-heading molecular (be the described vacuum pump of patent No. ZL87101116.6, and other vacuum pump that grows up the thus)+forepump (common available sliding vane rotary pump and slide valve pump) of following structure.The double-heading molecular is made up of driving wheel, stationary blade wheel, dynamic seal, rotating shaft and pump case, inlet mouth and venting port, and driving wheel is fixed in the rotating shaft, and stationary blade wheel and dynamic seal are fixed on the pump case.The unit of bleeding substantially that has at least one-level to form in the impeller combination that this driving wheel, stationary blade wheel constitute by some two grooves of bleeding that drag face, this unit of bleeding substantially comprises:
A. two driving wheels that flat disk constitutes have at least a dish being provided with pore near rotating shaft place in two disks, constitute gas passage, and dynamic seal is established in this disk outside;
B. stationary blade wheel is made up of some spiral blades and stationary installation, stationary blade wheel is installed in the middle of two driving wheels, space on the stationary blade wheel between the driving wheel of two adjacent blades and two sides constitutes one and has two grooves of bleeding that drag face, between driving wheel and the stationary blade wheel radially with axially leave the working clearance, radius clearance double as gas passage;
C. dynamic seal is installed in the outside of the driving wheel that is provided with pore, between dynamic seal and the driving wheel at radial and axial working clearance, the radius clearance double as gas passage of leaving.
Beneficial effect:
Compared with prior art, the utility model has following major advantage:
1. because the flushing unit has two kinds of pump performances of middle and high vacuum concurrently, in large-scale vacuum equipment, can replace high-vacuum pump and intermediate pump, simplified construction simultaneously;
2. the high vacuum pumping speed of flushing unit can be reduced to 1/2 of traditional vacuum equipment high-vacuum pump;
3. if the high vacuum pumping speed of flushing unit does not reduce, it is about 50% then can to shorten the time of bleeding, and enhances productivity;
4. air exhaust energy consumption reduces significantly, compares with the diffusion pump air-bleed system, and energy consumption reduces more than 80%, and system compares with molecular pump, and energy consumption reduces by 50%;
Description of drawings
Fig. 1 is the utility model first embodiment magnetron sputtering film device flushing air extractor synoptic diagram.
Fig. 2 is the flushing air extractor synoptic diagram of the utility model second embodiment vacuum melting furnace
Embodiment
Below in conjunction with accompanying drawing the utility model is described in further detail.
Consult Fig. 1, the vacuum apparatus of the utility model first embodiment is by vacuum film coating chamber 1, vacuum valve 2, double-heading molecular 3, vacuum valve 4 and 5, vacuumometer 6,7 and 8, discharge degasification electrode 9, discharge power supply 10, high-purity argon gas 11, forepump 12, forepump 13, partial pressure gauge 14, substrate 15, magnetic controlling target 16, magnetic charging power supply 17, well heater 18, heater power source 19 and shielding gas 20 (N
2, or composition such as dry gas) form.
The flushing unit of magnetron sputtering film device of the present utility model adopts double-heading molecular (for example described vacuum pump of Chinese patent ZL87101116.6) the 3+ forepump 13 (sliding vane rotary pump) in the preamble.
The present embodiment coating process is summarized as follows:
A. open coating chamber 1, substrate 15 is put into coating chamber 1;
B. close coating chamber 1 and vacuum valve 2, open vacuum valve 4, start forepump 12, coating chamber 1 is bled;
C. open vacuum valve 5, start forevacuum pump 13 and molecular 3, allow flushing unit (double-heading molecular 3+ forepump 13) be ready;
When d. coating chamber 1 pressure drop is to 150Pa, close vacuum valve 4 and forepump 12, open vacuum valve 2, coating chamber 1 switches to the flushing machine assembly air-exhausting;
E. close discharge power supply 10 and heater power source 19 carry out degasification to coating chamber 1 and substrate 15;
When f. the pressure of coating chamber 1 reaches 1Pa, close vacuum valve 2, by the high-purity argon gas of high-purity argon gas 11 injection 150Pa, coating chamber 1 is proceeded degasification 1-2 minute;
G. open vacuum valve 2 then, coating chamber 1 is pumped to 1Pa by the flushing unit once more;
H. repeating step f, g repeatedly (are generally 2-3 time);
I. reactive gas differential pressure drop to 10 in the coating chamber
-2During Pa, close degasification discharge power supply 10 and heating power supply 19, inject high-purity argon gas to coating chamber 1 by high-purity argon gas 11;
J. the reactive gas dividing potential drop reaches magnetron sputtering plating and requires by force (to be generally 10 in the coating chamber 1
-3-10
-4Pa) after, substrate 15 is carried out magnetron sputtering plating;
K. after substrate 15 plated films are finished, close magnetic charging power supply 17, high-purity argon gas 11, vacuum valve 2, molecular 3, vacuum valve 5 and forepump 13 successively;
Consult Fig. 2, the flushing air extractor of second embodiment of the present utility model is a vacuum melting furnace.This device is by vacuum melting chamber 1 ', crucible 2 ', discharge degasification electrode 3 ', discharge power supply 4 ', partial pressure gauge 5 ', vacuumometer 6 ' and 7 ', double-heading molecular 8 ', forepump 9 ', forepump 10 ', vacuum valve 11 ', 12 ' and 13 ', rinsing gas source of the gas 14 ', die cavity 15 ' and shielding gas (N
2, or dry air etc.) 16 ' composition.
Crucible 2 ', discharge degasification electrode 3 ', die cavity 15 ' are positioned at working chamber 1 ', discharge power supply 4 ', partial pressure gauge 5 ', vacuumometer 6 ', vacuum valve 11 '～12 ', rinsing gas source of the gas 14 ' and shielding gas (N
2Or dry air etc.) 16 ' is connected with working chamber 1 ' respectively, and vacuum valve 12 ' also is connected with forepump 9 ', and the inlet mouth of molecular 8 ' is connected with vacuum valve 11 ', venting port is connected with vacuum valve 13 ' with vacuumometer 7 ', and forevacuum pump 10 ' is connected with vacuum valve 13 '.Molecular 8 ' and forevacuum pump 10 ' are formed the flushing unit.
Flushing unit of the present utility model adopts multiple molecular drag/topping-up pump 8 ' (for example described vacuum pump of Chinese patent ZL92101300.0) and the forepump 10 ' in the preamble to form the flushing unit, replaces the oil diffusion pump+lobe pump of traditional vacuum smelting furnace.
The fusion process of present embodiment is summarized as follows:
A. open working chamber 1 ', furnace charge is put into crucible 2 ', close working chamber 1 ';
B. close vacuum valve 11 ', open vacuum valve 13 ', start the flushing unit, be ready;
C. open vacuum valve 12 ', start forepump 9 ';
When d. working chamber's 1 ' pressure drop is to the high workload pressure following (being generally 150Pa) of multiple molecular drag/topping-up pump 8 ', close vacuum valve 12 ' and forepump 9 ', open vacuum valve 11 ', working chamber 1 ' switches to the flushing machine assembly air-exhausting;
E. the discharge power supply 4 ' that closes is to working chamber's degasification of discharging;
When f. working chamber 1 ' reaches lower pressure (being generally 10Pa), close high vacuum valve 11 ', inject rinsing gas (Ar) to higher pressure (for example 150Pa) by purge gas body source 14 ', working chamber 1 ' proceeds to discharge degasification 1-2 minute;
G. open vacuum valve 11 ', the working chamber is once more by the flushing machine assembly air-exhausting, and adjusting rinsing gas (Ar) flow, makes working chamber 1 ' maintain higher flushing pressure, and for example 50Pa washes continuously, and proceeds the degasification of discharging;
H. when the reactive gas partial pressure of working chamber 1 ' dropped to fritting and requires (being generally 1Pa), furnace charge began fritting, and with partial pressure gauge 5 ' the reactive gas partial pressure of working chamber 1 ' is monitored in real time;
I. when the reactive gas partial pressure of working chamber 1 ' surpasses the fritting requirement, should suspend fritting, when partial pressure drops to the fritting requirement, proceed fritting again.Because the extraction flow of multiple molecular drag/topping-up pump 8 ' is big, the fritting process can once be finished usually, does not need gradation to carry out;
J. after fritting finished, flushing was bled and is proceeded the some time (being generally 2-3 minute), when the reactive gas dividing potential drop of working chamber 1 ' for (for example being 10 than low value
-1Pa) time, close discharge power supply 4 ', stop the degasification of discharging;
K. the partial pressure of working as the reactive gas of working chamber 1 ' drops to melting and requires (to be generally 10
-2Pa) time, close vacuum valve 11 ', stop to wash unit, inject high-purity argon gas and (be generally 10 working chamber 1 '
4Pa), carry out melting by traditional technology;
The working chamber of this vacuum melting furnace and flushing can also be set up the fly-ash separator with the vacuum compatibility between the unit, and for example electrostatic precipitator can reduce the dust in the fusion process significantly, prolong the maintenance intervals of molecular.
Application
The Quick air exhaust device of the utility model large-scale vacuum equipment is mainly used in requiring the active gases partial pressure low, but to vacuum Spend less demanding various application, such as: various plasma application (magnetron sputtering, ion plating, PCVD etc.), Vacuum melting furnace and heat-treatment furnace etc.
Claims (2)
1. the quick air extractor of a large-scale vacuum equipment comprising vacuum chamber (1), vacuum valve (4), forepump (12), vacuumometer (6), (7), is characterized in that:
1) vacuum chamber of this quick air extractor (1) through vacuum valve (2) and successively the flushing vacuum pump unit formed of the forepump (13), vacuum valve (5) vacuumometer (8), molecular (3) of serial connection be connected;
2) vacuum chamber of this quick air extractor (1) is connected with rinsing gas high-purity argon gas (11);
3) high-purity argon gas (11) to the gas inlet of vacuum chamber (1) be arranged on the upstream of vacuum chamber (1) pumping airflow, away from the position of bleeding point.
2. quick air extractor according to claim 1 is characterized in that: this vacuum installation (1) is installed partial pressure gauge (14), and in quick pumping process, partial pressure gauge (14) is monitored in real time to the reactive gas partial pressure of vacuum chamber (1).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 200520045016 CN2921039Y (en) | 2005-09-14 | 2005-09-14 | Fast air extraction device for large vacuum equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 200520045016 CN2921039Y (en) | 2005-09-14 | 2005-09-14 | Fast air extraction device for large vacuum equipment |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN2921039Y true CN2921039Y (en) | 2007-07-11 |
Family
ID=38253517
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 200520045016 Expired - Fee Related CN2921039Y (en) | 2005-09-14 | 2005-09-14 | Fast air extraction device for large vacuum equipment |
Country Status (1)
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|---|---|
| CN (1) | CN2921039Y (en) |
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101660135B (en) * | 2009-09-22 | 2011-05-25 | 菏泽天宇科技开发有限责任公司 | Pre-evacuating treatment apparatus for flexible strip by vacuum sputtering |
| CN103079333A (en) * | 2012-12-26 | 2013-05-01 | 江苏达胜加速器制造有限公司 | Vacuum exhauster for electron irradiation accelerator |
| CN104291284A (en) * | 2014-10-09 | 2015-01-21 | 昆明物理研究所 | Ultrapure argon online purification system and method |
| CN107620099A (en) * | 2017-10-31 | 2018-01-23 | 东阳市艾克思科技有限公司 | Protective atmosphere ionic liquid treatment before plating equipment |
| CN108301027A (en) * | 2018-01-31 | 2018-07-20 | 东莞市希锐自动化科技股份有限公司 | A kind of ionic liquid electrodeposition electroplanting device and its method |
| CN108817379A (en) * | 2018-05-23 | 2018-11-16 | 航天材料及工艺研究所 | A kind of powder metallurgy superalloy properties of product stability of improving fills out powder device |
| CN110938809A (en) * | 2019-11-29 | 2020-03-31 | 湖南旭昱新能源科技有限公司 | Vacuum coating device for amorphous silicon solar wafer |
| US20200248305A1 (en) * | 2019-02-04 | 2020-08-06 | Tokyo Electron Limited | Exhaust device, processing system, and processing method |
-
2005
- 2005-09-14 CN CN 200520045016 patent/CN2921039Y/en not_active Expired - Fee Related
Cited By (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101660135B (en) * | 2009-09-22 | 2011-05-25 | 菏泽天宇科技开发有限责任公司 | Pre-evacuating treatment apparatus for flexible strip by vacuum sputtering |
| CN103079333A (en) * | 2012-12-26 | 2013-05-01 | 江苏达胜加速器制造有限公司 | Vacuum exhauster for electron irradiation accelerator |
| CN104291284A (en) * | 2014-10-09 | 2015-01-21 | 昆明物理研究所 | Ultrapure argon online purification system and method |
| CN104291284B (en) * | 2014-10-09 | 2016-06-22 | 昆明物理研究所 | A kind of ultrapure argon in-line purification system and method |
| CN107620099A (en) * | 2017-10-31 | 2018-01-23 | 东阳市艾克思科技有限公司 | Protective atmosphere ionic liquid treatment before plating equipment |
| CN108301027A (en) * | 2018-01-31 | 2018-07-20 | 东莞市希锐自动化科技股份有限公司 | A kind of ionic liquid electrodeposition electroplanting device and its method |
| CN108817379A (en) * | 2018-05-23 | 2018-11-16 | 航天材料及工艺研究所 | A kind of powder metallurgy superalloy properties of product stability of improving fills out powder device |
| US20200248305A1 (en) * | 2019-02-04 | 2020-08-06 | Tokyo Electron Limited | Exhaust device, processing system, and processing method |
| CN111519167A (en) * | 2019-02-04 | 2020-08-11 | 东京毅力科创株式会社 | Exhaust apparatus, treatment system, and treatment method |
| US11807938B2 (en) * | 2019-02-04 | 2023-11-07 | Tokyo Electron Limited | Exhaust device, processing system, and processing method |
| CN110938809A (en) * | 2019-11-29 | 2020-03-31 | 湖南旭昱新能源科技有限公司 | Vacuum coating device for amorphous silicon solar wafer |
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Legal Events
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| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| C19 | Lapse of patent right due to non-payment of the annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |