CN220907640U

CN220907640U - MPCVD device for improving purity of diamond

Info

Publication number: CN220907640U
Application number: CN202322648480.XU
Authority: CN
Inventors: 袁稳; 郑怡; 侯淅燕; 郑华
Original assignee: Chengdu Wenzheng Technology Co ltd
Current assignee: Chengdu Wenzheng Technology Co ltd
Priority date: 2023-09-28
Filing date: 2023-09-28
Publication date: 2024-05-07
Anticipated expiration: 2033-09-28

Abstract

The utility model belongs to the technical field of microwave plasma assisted chemical vapor deposition, in particular to an MPCVD device for improving the purity of diamond, which comprises a base and a lifting cylinder; the four corners of the top of the base are provided with upright posts, the top of each upright post is provided with a workbench, a vapor deposition furnace is arranged in the middle of the top of each workbench, the top of each vapor deposition furnace is provided with a sealing cover, and two sides of the top of each sealing cover are respectively provided with an air inlet pipe and a liquid inlet pipe; the lifting cylinder is arranged in the middle of the top of the base, a servo motor is arranged at the top of the lifting cylinder, a rotating rod is arranged at the top output end of the servo motor, and a stirring rod is arranged in the middle of the inner cavity of the vapor deposition furnace; the novel diamond pickling device is reasonable in structure, and in the using process, the substrate at the bottom is convenient to fully contact with the pickling solution, the contact frequency and the contact area of the substrate and the pickling solution are increased, and the purity of the diamond is improved.

Description

MPCVD device for improving purity of diamond

Technical Field

The utility model relates to the technical field of microwave plasma assisted chemical vapor deposition, in particular to an MPCVD device for improving the purity of diamond.

Background

The microwave plasma assisted chemical vapor deposition (MPCVD) method is currently the most popular and also the most promising method for large-size high-quality diamond single crystal epitaxial growth. The method is that microwaves generated by a microwave generator are guided into a specially designed reaction cavity through a waveguide tube to generate resonance, and an electromagnetic field with frequency and intensity distribution is generated, so that gas raw materials (usually H2 and CH4 mixed gas) in the reaction cavity are excited, and uniform and stable plasmas are generated on a sample stage. The ionized gas molecules are deposited on the substrate material, so that epitaxial growth of diamond is realized.

In the prior art, the application number is CN202111000448.X, the application name is MPCVD device for diamond single crystal growth, and in the recorded technical scheme, the multimode plasma resonant cavity is optimized to the greatest extent, the deposition area is effectively increased, and the power density and the deposition rate are improved.

However, there are still some disadvantages in the actual process, such as that the substrate is deposited at the bottom of the pickling solution under normal conditions, the contact area between the substrate and the pickling solution is reduced due to the deposition of the substrate, and the substrate is deposited at the bottom position of the pickling solution, and the frequency of the contact between the pickling solution at the upper layer and the substrate at the bottom layer is greatly reduced, so that the pickling effect of the substrate is reduced due to the deposition, and based on the above problems, we propose a novel MPCVD device for improving the purity of diamond.

Disclosure of utility model

This section is intended to outline some aspects of embodiments of the utility model and to briefly introduce some preferred embodiments. Some simplifications or omissions may be made in this section as well as in the description of the utility model and in the title of the utility model, which may not be used to limit the scope of the utility model.

The present utility model has been made in view of the problems occurring in the prior art.

Accordingly, an object of the present utility model is to provide an MPCVD apparatus for improving the purity of diamond, which facilitates sufficient contact between a base material at the bottom and a pickling solution during use, increases the frequency and area of contact between the base material and the pickling solution, and contributes to the improvement of the purity of diamond.

In order to solve the technical problems, according to one aspect of the present utility model, the following technical solutions are provided:

An MPCVD device for improving the purity of diamond comprises a base and a lifting cylinder;

Wherein,

The four corners of the top of the base are provided with upright posts, the top of each upright post is provided with a workbench, a vapor deposition furnace is arranged in the middle of the top of each workbench, the top of each vapor deposition furnace is provided with a sealing cover, and two sides of the top of each sealing cover are respectively provided with an air inlet pipe and a liquid inlet pipe;

The lifting cylinder is arranged in the middle of the top of the base, a servo motor is arranged at the top of the lifting cylinder, a rotating rod is arranged at the top output end of the servo motor, a stirring rod is arranged in the middle of the inner cavity of the vapor deposition furnace, the bottom of the stirring rod is connected with the rotating rod, and stirring blades are arranged on the surface of the stirring rod.

As a preferable embodiment of the MPCVD apparatus for improving purity of diamond according to the present utility model, wherein: the front surface of vapor deposition stove is provided with the control box, the front surface of control box is provided with the display element, and the top of sealed lid is provided with temperature sensor and pressure sensor respectively, and temperature sensor and pressure sensor's probe extends to the inside of vapor deposition stove, temperature sensor and pressure sensor and display element electric connection.

As a preferable embodiment of the MPCVD apparatus for improving purity of diamond according to the present utility model, wherein: the bottom four corners of base are provided with the support foot rest, the bottom of support foot rest is provided with anti-skidding gasket.

As a preferable embodiment of the MPCVD apparatus for improving purity of diamond according to the present utility model, wherein: and a cylinder seat matched with the lifting cylinder is arranged in the middle of the top of the base.

As a preferable embodiment of the MPCVD apparatus for improving purity of diamond according to the present utility model, wherein: one end of the air inlet pipe and one end of the liquid inlet pipe are provided with connecting ports, and the air inlet pipe and the liquid inlet pipe are provided with one-way valves.

As a preferable embodiment of the MPCVD apparatus for improving purity of diamond according to the present utility model, wherein: the bottom of the vapor deposition furnace is provided with a sealing shaft sleeve matched with the rotating rod.

Compared with the prior art, the utility model has the beneficial effects that: the lifting cylinder is arranged at the top of the base, the servo motor is driven to move up and down through the lifting cylinder, the rotating rod is driven to rotate through the servo motor, the stirring rod and the stirring She Zhuaipan are driven by the rotating rod, in the use process, the substrate at the bottom is conveniently and fully contacted with the pickling solution, the contact frequency and the contact area of the substrate and the pickling solution are increased, and the purity of diamond is improved; in addition, through being provided with temperature sensor and pressure sensor, the convenience carries out real-time supervision to temperature and pressure in the reaction process, and the security is higher.

Drawings

In order to more clearly illustrate the technical solutions of the embodiments of the present utility model, the following detailed description of the embodiments of the present utility model will be given with reference to the accompanying drawings, which are to be understood as merely some embodiments of the present utility model, and from which other drawings can be obtained by those skilled in the art without inventive faculty. Wherein:

FIG. 1 is a schematic diagram of the structure of the present utility model;

FIG. 2 is a schematic view of the structure of the lifting cylinder of the utility model;

FIG. 3 is a schematic diagram of the internal structure of the vapor deposition furnace according to the present utility model.

In the figure; 100 bases, 110 supporting foot frames, 120 upright posts, 130 working tables, 140 vapor deposition furnaces, 150 sealing covers, 160 air inlet pipes, 170 liquid inlet pipes, 200 lifting cylinders, 210 servo motors, 220 rotating rods, 230 stirring rods, 240 stirring blades, 300 control boxes, 310 display units, 320 temperature sensors and 330 pressure sensors.

Detailed Description

In order that the above objects, features and advantages of the utility model will be readily understood, a more particular description of the utility model will be rendered by reference to the appended drawings.

In the following description, numerous specific details are set forth in order to provide a thorough understanding of the present utility model, but the present utility model may be practiced in other ways other than those described herein, and persons skilled in the art will readily appreciate that the present utility model is not limited to the specific embodiments disclosed below.

Next, the present utility model will be described in detail with reference to the drawings, wherein the sectional view of the device structure is not partially enlarged to general scale for the convenience of description, and the drawings are only examples, which should not limit the scope of the present utility model. In addition, the three-dimensional dimensions of length, width and depth should be included in actual fabrication.

For the purpose of making the objects, technical solutions and advantages of the present utility model more apparent, embodiments of the present utility model will be described in further detail below with reference to the accompanying drawings.

The utility model provides the following technical scheme: in the using process, the MPCVD device for improving the purity of the diamond is convenient for the substrate at the bottom to be fully contacted with the pickling solution, and increases the contact frequency and the contact area of the substrate and the pickling solution, thereby being beneficial to improving the purity of the diamond;

FIGS. 1 to 3 are schematic views showing the construction of an embodiment of an MPCVD apparatus for improving the purity of diamond according to the present utility model, the main body of which includes a base 100, a lifting cylinder 200 and a control box 300;

Please refer again to fig. 1-3: the bottom four corners of the base 100 are welded with a supporting foot stool 110, the bottom of the supporting foot stool 110 is adhered with an anti-slip gasket, the top four corners of the base 100 are welded with a stand column 120, the top of the stand column 120 is welded with a workbench 130, the middle of the top of the workbench 130 is in threaded connection with a vapor deposition furnace 140, the top of the vapor deposition furnace 140 is in threaded connection with a sealing cover 150, two sides of the top of the sealing cover 150 are respectively inserted with an air inlet pipe 160 and a liquid inlet pipe 170, one ends of the air inlet pipe 160 and the liquid inlet pipe 170 are in threaded connection with connecting ports, the air inlet pipe 160 and the liquid inlet pipe 170 are both in threaded connection with one-way valves, further, the base 100 and the supporting foot stool 110 are used for bearing the stand column 120, the stand column 120 is used for bearing the workbench 130, the workbench 130 is used for bearing the vapor deposition furnace 140, the vapor deposition furnace 140 is used for reaction processing, and the air inlet pipe 160 and the liquid inlet pipe 170 are used for entering;

Please refer again to fig. 1-3: the lifting cylinder 200 is in the middle of the top of the base 100, a cylinder seat matched with the lifting cylinder 200 is welded in the middle of the top of the base 100, the top of the lifting cylinder 200 is in threaded connection with the servo motor 210, the top output end of the servo motor 210 is in threaded connection with the rotating rod 220, the stirring rod 230 is in threaded connection with the middle of the inner cavity of the vapor deposition furnace 140, the bottom of the stirring rod 230 is connected with the rotating rod 220, a sealing shaft sleeve matched with the rotating rod 220 is installed at the bottom of the vapor deposition furnace 140, stirring blades 240 are welded on the surface of the stirring rod 230, the lifting cylinder 200 is used for driving the servo motor 210 to move up and down, the servo motor 210 is used for driving the rotating rod 220 to rotate, the rotating rod 220 is used for driving the stirring rod 230 to rotate, and the stirring rod 230 and the stirring blades 240 are used for stirring and overturning the substrate.

Please refer again to fig. 1-3: the front surface spiro union of vapor deposition stove 140 has control box 300, the front surface spiro union of control box 300 has display element 310, the top of sealed lid 150 spiro union has temperature sensor 320 and pressure sensor 330 respectively, and temperature sensor 320 and pressure sensor 330's probe extends to the inside of vapor deposition stove 140, temperature sensor 320 and pressure sensor 330 and display element 310 electric connection, the inner chamber spiro union of control box 300 has independent power, display element 310 includes display screen and speaker, further, control box 300 is used for from bearing display element 310, display element 310 is used for data display, temperature sensor 320 and pressure sensor 330 are used for temperature and pressure detection.

Working principle: in the using process of the utility model, the lifting cylinder 200 is arranged at the top of the base 100, the servo motor 210 is driven to move up and down by the lifting cylinder 200, the rotating rod 220 is driven to rotate by the servo motor 210, the stirring rod 230 and the stirring She Zhuaipan are driven by the rotating rod 220, in the using process, the substrate at the bottom is convenient to fully contact with the pickling solution, the contact frequency and the contact area of the substrate and the pickling solution are increased, and the purity of diamond is improved; in addition, through being provided with temperature sensor 320 and pressure sensor 330, the temperature and the pressure of conveniently carrying out real-time supervision to the reaction in-process, the security is higher.

Although the utility model has been described hereinabove with reference to embodiments, various modifications thereof may be made and equivalents may be substituted for elements thereof without departing from the scope of the utility model. In particular, the features of the disclosed embodiments may be combined with each other in any manner as long as there is no structural conflict, and the exhaustive description of these combinations is not given in this specification merely for the sake of omitting the descriptions and saving resources. Therefore, it is intended that the utility model not be limited to the particular embodiment disclosed, but that the utility model will include all embodiments falling within the scope of the appended claims.

Claims

1. An MPCVD apparatus for improving the purity of diamond, characterized in that: comprises a base (100) and a lifting cylinder (200);

Wherein,

Upright posts (120) are arranged at four corners of the top of the base (100), a workbench (130) is arranged at the top of the upright posts (120), a vapor deposition furnace (140) is arranged in the middle of the top of the workbench (130), a sealing cover (150) is arranged at the top of the vapor deposition furnace (140), and an air inlet pipe (160) and a liquid inlet pipe (170) are respectively arranged at two sides of the top of the sealing cover (150);

The lifting cylinder (200) is arranged in the middle of the top of the base (100), a servo motor (210) is arranged at the top of the lifting cylinder (200), a rotating rod (220) is arranged at the top output end of the servo motor (210), a stirring rod (230) is arranged in the middle of an inner cavity of the vapor deposition furnace (140), the bottom of the stirring rod (230) is connected with the rotating rod (220), and stirring blades (240) are arranged on the surface of the stirring rod (230).

2. An MPCVD apparatus for improving purity of diamond according to claim 1, wherein: the front surface of vapor deposition stove (140) is provided with control box (300), the front surface of control box (300) is provided with display element (310), and the top of sealed lid (150) is provided with temperature sensor (320) and pressure sensor (330) respectively, and temperature sensor (320) and pressure sensor (330)'s probe extends to the inside of vapor deposition stove (140), temperature sensor (320) and pressure sensor (330) and display element (310) electric connection.

3. An MPCVD apparatus for improving purity of diamond according to claim 2, wherein: an independent power supply is arranged in the inner cavity of the control box (300), and the display unit (310) comprises a display screen and a loudspeaker.

4. An MPCVD apparatus for improving purity of diamond according to claim 1, wherein: the anti-slip support is characterized in that support foot frames (110) are arranged at four corners of the bottom of the base (100), and anti-slip gaskets are arranged at the bottoms of the support foot frames (110).

5. An MPCVD apparatus for improving purity of diamond according to claim 1, wherein: and a cylinder seat matched with the lifting cylinder (200) is arranged in the middle of the top of the base (100).

6. An MPCVD apparatus for improving purity of diamond according to claim 1, wherein: one end of the air inlet pipe (160) and one end of the liquid inlet pipe (170) are provided with connecting ports, and one-way valves are arranged on the air inlet pipe (160) and the liquid inlet pipe (170).

7. An MPCVD apparatus for improving purity of diamond according to claim 1, wherein: the bottom of the vapor deposition furnace (140) is provided with a sealing shaft sleeve matched with the rotating rod (220).