CN220796685U - Gantry mechanism for mass transfer device - Google Patents
Gantry mechanism for mass transfer device Download PDFInfo
- Publication number
- CN220796685U CN220796685U CN202322284526.4U CN202322284526U CN220796685U CN 220796685 U CN220796685 U CN 220796685U CN 202322284526 U CN202322284526 U CN 202322284526U CN 220796685 U CN220796685 U CN 220796685U
- Authority
- CN
- China
- Prior art keywords
- slide carriage
- cross beam
- linear motor
- gantry mechanism
- unit
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 239000013078 crystal Substances 0.000 claims abstract description 9
- 230000003993 interaction Effects 0.000 claims abstract description 4
- 238000004080 punching Methods 0.000 abstract description 5
- 238000005299 abrasion Methods 0.000 abstract description 4
- 239000000725 suspension Substances 0.000 abstract description 3
- 238000010586 diagram Methods 0.000 description 7
- 238000000034 method Methods 0.000 description 4
- 230000007547 defect Effects 0.000 description 2
- 238000005188 flotation Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000004579 marble Substances 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
Landscapes
- Machine Tool Units (AREA)
Abstract
The utility model relates to the field of chip transfer equipment, and provides a gantry mechanism for huge amount transfer equipment, which comprises a cross beam, a first transverse unit and a second transverse unit, wherein the cross beam is arranged on the first transverse unit; the first transverse unit comprises a first slide carriage and a first linear motor, the first slide carriage is used for installing the thorn crystal unit, the first linear motor drives the first slide carriage to transversely move along the cross beam, and the first slide carriage is provided with a first air floatation cushion used for forming an air floatation guide rail; the second transverse unit comprises a second slide carriage and a second linear motor, the second slide carriage is used for installing the wafer interaction unit, and the second linear motor drives the second slide carriage to transversely move along the cross beam; the second slide carriage is provided with a second air floatation cushion for forming an air floatation guide rail. The slide carriage forms a non-contact suspension state, and can move at high frequency and high speed under the drive of the linear motor without abrasion; no heat is generated during movement, and the slide carriage does not generate thermal expansion deformation, so that the stability of positioning precision is ensured; the rigidity of the air film can counteract micro vibration, the setting time is shortened, and the crystal-punching frequency is improved.
Description
Technical Field
The utility model relates to the technical field of chip transfer equipment, in particular to a gantry mechanism for huge amount transfer equipment.
Background
The chip mass transfer device is one of important equipment in the field of semiconductor packaging typified by an LED, and is mainly used for realizing transfer of a semiconductor chip from a die to a substrate. With the progress of chip manufacturing process, the existing chip mass transfer equipment has hardly met the requirements of the latest Mini/Micro LED mass transfer in terms of precision and production efficiency.
The current mature method is die bonding and spining, and the die bonding is used as a traditional transfer method, and the transfer efficiency cannot be improved due to the limitation of the aperture of a suction nozzle and other reasons. The thorn crystal is a scheme of combining flip chip and ejector pins, a wafer with a chip turned upside down is positioned with a bonding pad quickly, and the chip is transferred onto the bonding pad in a way of downwards thorn by the ejector pins.
The guide and support among the above-mentioned scheme all adopt linear guide as motion, all need frequent extremely short distance reciprocal location, bring three problems: 1. local abrasion of the linear guide rail; 2. the long-time operation is carried out, the temperature rise causes micro deformation of the slide carriage, and finally the positioning precision micro drift is caused; 3. the tiny vibration caused by high-frequency spining and high-acceleration positioning leads to lengthening of the setting time of the control system, and further leads to reduction of spining frequency.
In view of the three problems, the defects existing in the prior art are overcome, and the problems to be solved in the technical field are urgent.
Disclosure of Invention
The utility model aims to overcome the defects of the prior art and provides a gantry mechanism for huge transfer equipment, which adopts an air floatation guide rail and magnet adsorption to replace a traditional linear guide rail and replace the traditional single-beam or double-beam movement.
The utility model adopts the following technical scheme:
a gantry mechanism for a mass transfer device comprises a cross beam, a first transverse unit and a second transverse unit,
the first transverse unit comprises a first slide carriage and a first linear motor, the first slide carriage is used for installing the thorn crystal unit, and the first linear motor is used for driving the first slide carriage to move along the transverse direction of the cross beam; the first slide carriage is provided with a first air floatation cushion, the first air floatation cushion is used for forming an air floatation guide rail, the first linear motor comprises a first stator and a first rotor, the first stator comprises a first permanent magnet arranged on the first side face of the cross beam, and the first rotor is arranged on the first slide carriage;
the second transverse unit comprises a second slide carriage and a second linear motor, the second slide carriage is used for installing the wafer interaction unit, and the second linear motor is used for driving the second slide carriage to move along the transverse direction of the cross beam; the second sliding plate is provided with a second air floatation pad, the second air floatation pad is used for forming an air floatation guide rail, the second linear motor comprises a second stator and a second rotor, the second stator comprises a second permanent magnet arranged on the lower side of the cross beam, and the second rotor is arranged on the second sliding plate.
In any one of the possible implementations described above, there is further provided an implementation, in which the first side surface of the beam is formed with a first recess, the first recess is provided with a first inclined surface, and the first permanent magnet is disposed on the first inclined surface.
In any one of the possible implementations described above, there is further provided an implementation, the first slide carriage includes a top plate and a first side plate, the first air bearing pad is plural, a portion of the first air bearing pad is disposed between the top plate and the top surface of the cross beam, and another portion of the first air bearing pad is disposed between the first side plate and the first side surface of the cross beam.
In any of the possible implementations described above, there is further provided an implementation, where the first side plate is provided with a first mounting slope, and the first mover is mounted on the first mounting slope.
Any one of the possible implementation manners described above further provides an implementation manner, wherein a first limiting block is arranged at one end of the top plate opposite to the first side plate, a first protruding portion is arranged on the top surface of the cross beam, and the first limiting block is matched with the first protruding portion to limit the first slide carriage.
In any one of the possible implementations described above, there is further provided an implementation in which the bottom side of the cross member is formed with a second recess, the second recess is provided with a second inclined surface, and the second permanent magnet is disposed on the second inclined surface.
In any one of the possible implementation manners described above, there is further provided an implementation manner, the second slide carriage includes a bottom plate and a second side plate, the second air-floating pad is plural, a part of the second air-floating pad is disposed between the bottom plate and the bottom surface of the beam, and another part of the second air-floating pad is disposed between the second side plate and the second side surface of the beam.
In any of the possible implementations described above, there is further provided an implementation, wherein the base plate is provided with a second mounting slope, and the second mover is mounted on the second mounting slope.
Any one of the possible implementation manners described above further provides an implementation manner, wherein a second limiting block is arranged at one end of the second side plate opposite to the bottom plate, a second protruding portion is arranged on a second side face of the cross beam, and the second limiting block is matched with the second protruding portion to limit the second slide carriage.
Any one of the possible implementation manners described above further provides an implementation manner, wherein a third limiting block is arranged at one end of the bottom plate opposite to the second side plate, a third protruding portion is arranged on the first side surface of the cross beam, and the third limiting block is matched with the third protruding portion to limit the second slide carriage.
The beneficial effects of the utility model are as follows:
according to the utility model, the first air floatation cushion and the second air floatation cushion are arranged, so that the first slide carriage and the second slide carriage form a non-contact suspension state; because no friction force exists, the first slide carriage and the second slide carriage can move at high frequency and high speed under the drive of the first linear motor and the second linear motor respectively without abrasion; and no heat is generated in the moving process, so that the slide carriage cannot generate thermal expansion deformation due to heating, and finally, the stability of positioning accuracy is ensured. When the high-frequency crystal punching and high-acceleration positioning are performed, part of micro vibration can be counteracted by the air film rigidity of the air floatation, so that the setting time of the control system is shortened, and the crystal punching frequency is further improved. The utility model well solves the technical problems brought by the traditional linear guide rail.
Drawings
Fig. 1 is a schematic structural diagram of a composite linkage gantry mechanism attracted by an air-float guide rail and a magnet according to an embodiment of the present utility model.
Fig. 2 is a schematic diagram showing the assembly relationship of the cross beam, the upright, the first transverse unit and the second transverse unit in the embodiment.
Fig. 3 is a schematic cross-sectional view of a cross-beam in an embodiment.
Fig. 4 shows a schematic view of the mounting position of the first transverse unit according to an embodiment.
Fig. 5 shows a schematic view of the mounting position of the second transverse unit according to an embodiment.
Fig. 6 is a schematic diagram (front side) of a first lateral unit and a first air bearing pad according to an embodiment.
Fig. 7 is a schematic diagram (rear side) of a first lateral unit and a first air bearing pad according to an embodiment.
Fig. 8 is a schematic diagram of a second lateral unit and a second air bearing pad (side one) according to an embodiment.
Fig. 9 is a schematic diagram of a second cross unit and a second air bearing pad (side two) in the embodiment.
Fig. 10 is a schematic diagram illustrating the cooperation between the stopper and the protrusion in the embodiment.
In the figure: 1-a cross beam; 2-stand columns; 3-a first recess; 4-a second recess; 5-a first incline; 6-a second inclined plane; 7-a first permanent magnet; 8-a second permanent magnet; 9-a first air bearing pad; 10-a second air bearing pad; 11-a first side; 12-a second side; 13-a first transverse unit; 14-a second transverse unit; 15-a first linear motor; 16-a second linear motor; 17-a first air bearing pad guide surface; 18-a second air bearing pad guide surface; 19-a first slide carriage; 20-a second slide carriage; 21-a first mover; 22-a second mover; a 23-camera unit; 24-spining unit; 25-a wafer exchange unit; 26-a first limiting block; 27-a first boss; 28-a second limiting block; 29-a second boss; 30-a third limiting block; 31-a third boss; 191-top plate; 192-a first side plate; 201-a bottom plate; 202-a second side plate.
Detailed Description
Specific embodiments of the present utility model will be described in detail below with reference to the accompanying drawings. It should be noted that the technical features or combinations of technical features described in the following embodiments should not be regarded as being isolated, and they may be combined with each other to achieve a better technical effect.
As shown in fig. 1 to 9, a gantry mechanism for a mass transfer apparatus according to an embodiment of the present utility model includes a cross beam 1, a first lateral unit 13 and a second lateral unit 14,
the first transverse unit 13 comprises a first slide carriage 19 and a first linear motor 15, the first slide carriage 19 is used for installing a thorn crystal unit 24, and the first linear motor 15 is used for driving the first slide carriage 19 to move transversely along the transverse beam 1; the first slide carriage 19 is provided with a first air floatation cushion 9, the first air floatation cushion 9 is used for forming an air floatation guide rail, the first linear motor 15 comprises a first stator and a first rotor 21, the first stator comprises a first permanent magnet 7 arranged on the first side face 11 of the cross beam 1, and the first rotor 21 is arranged on the first slide carriage 19;
the second transverse unit 14 comprises a second slide carriage 20 and a second linear motor 16, the second slide carriage 20 is used for installing a wafer interaction unit 25, and the second linear motor 16 is used for driving the second slide carriage 20 to move along the transverse direction of the transverse beam 1; the second air floatation cushion 10 is arranged on the second slide carriage 20, the second air floatation cushion 10 is used for forming an air floatation guide rail, the second linear motor 16 comprises a second stator and a second rotor, the second stator comprises a second permanent magnet 8 arranged on the lower side of the cross beam 1, and the second rotor is arranged on the second slide carriage 20.
In a particular embodiment, the cross beam 1 is supported by two uprights 2 at both ends thereof.
In one embodiment, the cross beam 1 and the upright 2 are both made of marble.
In a specific embodiment, the first side 11 of the beam 1 is formed with a first recess 3, the first recess 3 is provided with a first inclined surface 5, and the first permanent magnet 7 is disposed on the first inclined surface 5;
the bottom side of the beam 1 is formed with a second concave portion 4, the second concave portion 4 is provided with a second inclined surface 6, and the second permanent magnet 8 is disposed on the second inclined surface 6.
In one embodiment, the first slide carriage 19 includes a top plate 191 and a first side plate 192, and the first air bearing pads 9 are plural, a part of the first air bearing pads 9 are disposed between the top plate 191 and the top surface of the cross beam 1, and another part of the first air bearing pads 9 are disposed between the first side plate 192 and the first side surface 11 of the cross beam 1, as shown in fig. 2 and 3.
In a specific embodiment, the cross beam 1 is provided with a first air bearing surface 17 corresponding to the first air bearing 9, and a second air bearing surface 18 corresponding to the second air bearing 10, as shown in fig. 3-5.
In one embodiment, the first air bearing guide surface 17 and the second air bearing guide surface 18 are both abrasive surfaces.
In a specific embodiment, when the first transverse unit 13 and the second transverse unit 14 are in operation, the thickness of the air film between the first air bearing pad 9 and the first air bearing pad guide surface 17, and the thickness of the air film between the second air bearing pad 10 and the second air bearing pad guide surface 18 are all 8 μm.
In a specific embodiment, the first side plate 192 is provided with a first mounting inclined surface, as shown in fig. 6, on which the first mover 21 is mounted.
In a specific embodiment, a first limiting block 26 is disposed at an end of the top plate 191 opposite to the first side plate 192, a first protruding portion 27 is disposed on the top surface of the beam 1, and the first limiting block 26 cooperates with the first protruding portion 27 to limit the first slide carriage 19, as shown in fig. 10.
In a specific embodiment, a second recess 4 is formed on the bottom side of the beam 1, the second recess 4 is provided with a second inclined surface 6, and the second permanent magnet 8 is disposed on the second inclined surface 6, as shown in fig. 2 and 3.
In a specific embodiment, the second slide carriage 20 includes a bottom plate 201 and a second side plate 202, where a plurality of second air-floating mats 10 are provided, a part of the second air-floating mats 10 are disposed between the bottom plate 201 and the bottom surface of the cross beam 1, and another part of the second air-floating mats 10 are disposed between the second side plate 202 and the second side surface 6 of the cross beam 1, as shown in fig. 8 and 9.
In a specific embodiment, the bottom plate 201 is provided with a second mounting slope, and the second mover 22 is mounted on the second mounting slope, as shown in fig. 8.
In a specific embodiment, a second limiting block 28 is disposed at an end of the second side plate 202 opposite to the bottom plate 201, and the second side 6 of the cross beam 1 is provided with a second protruding portion 29, and the second limiting block 28 cooperates with the second protruding portion 29 to limit the second slide carriage 20, as shown in fig. 10.
In a specific embodiment, a third limiting block 30 is disposed at an end of the bottom plate 201 opposite to the second side plate 202, a third protruding portion 31 is disposed on the first side 11 of the beam 1, and the third limiting block 30 cooperates with the third protruding portion 31 to limit the second slide carriage 20, as shown in fig. 10.
In a specific embodiment, the gantry mechanism further comprises a camera unit 23, the camera unit 23 and the spining unit 24 are both arranged on the first transverse unit 13; the camera unit 23 and the spining unit 24 each have a separate lifting mechanism. The camera unit 23 and the die-piercing unit 24 may be conventional.
In a specific embodiment, the lifting of the camera unit 23 and the spining unit 24 are driven by a linear motor.
In one embodiment, the wafer exchange unit 25 has a telescopic mechanism, and the telescopic direction is perpendicular to the length direction of the beam 1. The wafer exchange unit 25 may be a conventional wafer exchange unit.
In one embodiment, as shown in fig. 1, the first transverse unit 13 drives the camera unit 23 and the spining unit 24 to move transversely along the X2 axis; meanwhile, the camera unit 23 is along the Z2 axis, and the spining unit 24 is independently lifted and lowered along the Z1 axis. The wafer exchange unit 25 is movable in both the Y1 and X1 directions. The five shafts can all independently move at the same time to form multi-shaft compound linkage.
In the embodiment, the linear guide rails with the largest loads and the longest movement distance of the X1 axis and the X2 axis are replaced by the air floatation guide rail, so that the requirements of high frequency, high speed and high stability are met.
The first air flotation cushion 9 and the second air flotation cushion 10 are arranged, the first linear motor 15 and the second linear motor 16 are arranged at a certain inclination angle, and the force balance is achieved by utilizing the decomposition and the synthesis of the force, so that the first slide carriage 19 and the second slide carriage 20 form a non-contact suspension state; because no friction force exists, the first slide carriage 19 and the second slide carriage 20 can move at high frequency and high speed under the drive of the first linear motor 15 and the second linear motor 16 respectively without abrasion; and no heat is generated in the moving process, so that the first slide carriage 19 and the second slide carriage 20 cannot generate thermal expansion deformation due to heat, and finally, the stability of positioning accuracy is ensured. When the high-frequency crystal punching and high-acceleration positioning are performed, the air film rigidity of the first air cushion 9 and the second air cushion 10 can offset a part of micro vibration, so that the setting time of the control system is shortened, and the crystal punching frequency is further improved. The utility model well solves the problems brought by the traditional linear guide rail.
Although a few embodiments of the present utility model have been described herein, those skilled in the art will appreciate that changes can be made to the embodiments herein without departing from the spirit of the utility model. The above-described embodiments are exemplary only, and should not be taken as limiting the scope of the claims herein.
Claims (10)
1. A gantry mechanism for a mass transfer apparatus, characterized in that the gantry mechanism comprises a cross beam, a first transverse unit and a second transverse unit,
the first transverse unit comprises a first slide carriage and a first linear motor, the first slide carriage is used for installing the thorn crystal unit, and the first linear motor is used for driving the first slide carriage to move along the transverse direction of the cross beam; the first slide carriage is provided with a first air floatation cushion, the first air floatation cushion is used for forming an air floatation guide rail, the first linear motor comprises a first stator and a first rotor, the first stator comprises a first permanent magnet arranged on the first side face of the cross beam, and the first rotor is arranged on the first slide carriage;
the second transverse unit comprises a second slide carriage and a second linear motor, the second slide carriage is used for installing the wafer interaction unit, and the second linear motor is used for driving the second slide carriage to move along the transverse direction of the cross beam; the second sliding plate is provided with a second air floatation pad, the second air floatation pad is used for forming an air floatation guide rail, the second linear motor comprises a second stator and a second rotor, the second stator comprises a second permanent magnet arranged on the lower side of the cross beam, and the second rotor is arranged on the second sliding plate.
2. The gantry mechanism of claim 1, wherein the first side of the beam is formed with a first recess, the first recess being provided with a first bevel, the first permanent magnet being disposed on the first bevel.
3. The gantry mechanism of claim 2, wherein the first slide includes a top plate and a first side plate, the first air bearing pad is plural, a portion of the first air bearing pad is disposed between the top plate and the top surface of the cross beam, and another portion of the first air bearing pad is disposed between the first side plate and the first side surface of the cross beam.
4. A gantry mechanism according to claim 3, wherein the first side plate is provided with a first mounting ramp, the first mover being mounted on the first mounting ramp.
5. A gantry mechanism according to claim 3, wherein a first stop block is provided at an end of the top plate opposite the first side plate, a first boss is provided on a top surface of the cross beam, and the first stop block cooperates with the first boss to stop the first carriage.
6. The gantry mechanism of claim 1, wherein the bottom side of the cross beam is formed with a second recess, the second recess being provided with a second bevel, the second permanent magnet being disposed on the second bevel.
7. The gantry mechanism of claim 6, wherein the second carriage includes a bottom plate and a second side plate, the second air bearing pads being plural, a portion of the second air bearing pads being disposed between the bottom plate and the bottom surface of the cross beam, and another portion of the second air bearing pads being disposed between the second side plate and the second side surface of the cross beam.
8. The gantry mechanism of claim 7, wherein the base plate is provided with a second mounting ramp, the second mover being mounted on the second mounting ramp.
9. The gantry mechanism of claim 7, wherein a second stop block is disposed at an end of the second side plate opposite the bottom plate, a second boss is disposed on a second side of the cross beam, and the second stop block cooperates with the second boss to stop the second carriage.
10. The gantry mechanism of claim 9, wherein a third stop is provided at an end of the bottom plate opposite the second side plate, a third boss is provided on the first side of the cross beam, and the third stop cooperates with the third boss to stop the second carriage.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202322284526.4U CN220796685U (en) | 2023-08-24 | 2023-08-24 | Gantry mechanism for mass transfer device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202322284526.4U CN220796685U (en) | 2023-08-24 | 2023-08-24 | Gantry mechanism for mass transfer device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN220796685U true CN220796685U (en) | 2024-04-16 |
Family
ID=90658697
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202322284526.4U Active CN220796685U (en) | 2023-08-24 | 2023-08-24 | Gantry mechanism for mass transfer device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN220796685U (en) |
-
2023
- 2023-08-24 CN CN202322284526.4U patent/CN220796685U/en active Active
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN113572337A (en) | Air floatation platform for wafer cutting machine | |
| CN101963763B (en) | Double-driving double-bridge table changing station-based double-workpiece table high-accuracy exchange device | |
| CN102097371B (en) | Substrate dividing device | |
| CN108502543B (en) | Substrate transmission device and method | |
| CN220796685U (en) | Gantry mechanism for mass transfer device | |
| CN111038946A (en) | Top plate conveying device of chip mounter | |
| CN101792066B (en) | Full-automatic battery slice transporting and baiting device | |
| CN116995001B (en) | Substrate transfer device | |
| CN201660306U (en) | Full-automatic battery plate transporting and blanking device | |
| CN102419517B (en) | Exchange apparatus and method for double-workpiece stage based on double-guide rail double-drive step scanning | |
| CN109774038B (en) | Automatic stamping device in keyboard glue product production | |
| CN107958859B (en) | Swinging device | |
| CN102566292A (en) | Switching structure and switching method for double workpiece tables | |
| KR101550361B1 (en) | Method for controlling dispenser having stage | |
| CN213504822U (en) | Diode handling device | |
| CN214109846U (en) | Flat glass surface polishing machine | |
| CN211811883U (en) | Top plate conveying device of chip mounter | |
| CN1323765C (en) | Working table device for table type applicator | |
| CN220186320U (en) | Exercise device | |
| CN210418282U (en) | Conveying device and battery assembling system | |
| CN113015426A (en) | LCD chip mounter platform lift module | |
| CN215923585U (en) | Implantation machine | |
| CN220886127U (en) | Automatic tray discharging device | |
| CN219030990U (en) | Accurate weighing device of ink | |
| CN221041089U (en) | Two-dimensional mobile platform |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| GR01 | Patent grant | ||
| GR01 | Patent grant |