CN218642814U - Tail end returning type double-sided vertical film coating equipment - Google Patents

Abstract

A tail end return type double-sided vertical coating device comprises a first row of vacuum chambers, a second row of vacuum chambers, a transfer vacuum chamber and a return area. The first row of vacuum chambers is arranged on one side of the reference line and comprises a first vacuum chamber, a second vacuum chamber and a third vacuum chamber. The second row of vacuum chambers is arranged on the other side of the reference line and comprises a fourth vacuum chamber, a fifth vacuum chamber and a sixth vacuum chamber. The cavity doors of the first row of vacuum cavities and the second row of vacuum cavities, which are arranged on one side adjacent to the reference line, are staggered with each other. The carrier is movable along a circulation path formed by the first row of vacuum chambers, the transfer vacuum chambers, the second row of vacuum chambers and the reflow region. The utility model discloses can save equipment area, and the chamber door of each vacuum cavity staggers mutually and does not interfere, convenient maintenance or troubleshooting.

Description

Tail end returning type double-sided vertical film coating equipment

Technical Field

The utility model relates to a coating equipment especially relates to a terminal two-sided vertical coating equipment of return type of carrying out the coating film to the two-sided coating film of article.

Background

Referring to fig. 1, a conventional continuous sputter coating apparatus includes a body 11 extending in a front-rear direction, a sheet feeding stage 12 located in front of the body 11, a sheet discharging stage 13 located in rear of the body 11, and a returning mechanism 14 located above the body 11 and connecting the sheet discharging stage 13 and the sheet feeding stage 12. The machine body 11 is provided with a plurality of vacuum chambers, namely a pre-pumping chamber 111, a front transition chamber 112, three sputtering chambers 113, a rear transition chamber 114 and a decompression chamber 115 from front to back in sequence, a plurality of workpiece holders 16 can be sequentially transmitted in each vacuum chamber through a friction type workpiece transmission device 15, and the workpiece holders 16 transmitted to the workpiece outlet table 13 can flow back to the workpiece inlet table 12 one by one through the return mechanism 14, so that a ring-shaped transmission line capable of continuously transmitting the workpiece holders 16 is formed.

A plurality of substrates 17 to be sputtered are vertically arranged on the workpiece frame 16, and after the workpiece frame 16 sequentially passes through each vacuum chamber, a multilayer film can be sputtered on the two sides of the substrates 17, thereby achieving the effect of continuous production.

However, the continuous sputtering coating equipment is long in length and large in occupied area, and is not beneficial to the configuration of factory space. In addition, the long length of the return mechanism 14 also requires a large number of the work racks 16 to maintain continuous production, resulting in increased production costs.

Disclosure of Invention

The utility model aims to provide a terminal returning type double-sided vertical coating equipment which can reduce the floor area of the equipment and is convenient for maintenance.

The utility model discloses a two-sided vertical filming equipment of terminal recoverable formula is applicable to the two-sided multilayer film that plates of at least one waiting to plate the thing that the carrier carried, wait to plate the thing and extend and have along the first face and the second face that the long direction extends along upper and lower direction, first face with the second face sets up on the transverse direction is opposite, the transverse direction the upper and lower direction with the long direction is mutually perpendicular in essence, two-sided vertical filming equipment of terminal recoverable formula contains first row of vacuum cavity, second row vacuum cavity, transfer vacuum cavity, and recirculation zone.

The first row of vacuum chambers are arranged on one side of a reference line parallel to the long direction, and the first row of vacuum chambers are used for the carrier to enter and comprise a first vacuum chamber, a second vacuum chamber and a third vacuum chamber which are sequentially connected along the long direction. The second row of vacuum chambers are arranged on the other side of the reference line and separated from the first row of vacuum chambers by a channel, and the second row of vacuum chambers are used for the carrier to enter and comprise a fourth vacuum chamber, a fifth vacuum chamber and a sixth vacuum chamber which are sequentially connected. The fourth vacuum chamber and the third vacuum chamber are opposite to each other at intervals in the transverse direction, and the sixth vacuum chamber and the first vacuum chamber are opposite to each other at intervals in the transverse direction. The cavity door of one part of the vacuum cavity is arranged on the side close to the reference line, and the cavity door of the other part of the vacuum cavity is arranged on the side far from the reference line. And the cavity doors of the first row of vacuum cavities and the second row of vacuum cavities, which are arranged on one side adjacent to the reference line, are staggered, and the cavity doors of the second vacuum cavities and the cavity doors of the fifth vacuum cavities are arranged in the same direction.

The transfer vacuum chambers are connected to one ends of the first row of vacuum chambers and the second row of vacuum chambers along the transverse direction. The reflow region is connected to the other ends of the first row of vacuum chambers and the second row of vacuum chambers along the transverse direction, thereby enabling the carrier to move along a circulation path formed by the first row of vacuum chambers, the transfer vacuum chambers, the second row of vacuum chambers and the reflow region.

The utility model discloses a two-sided vertical filming equipment of terminal recoverable formula, it has two to be adjacent to respectively to shift the vacuum cavity first row of vacuum cavity with the second row of vacuum cavity is used for making the carrier is followed the conveyer that the long direction removed, and is used for making the carrier is followed the device is carried in moving that the transverse direction removed.

The utility model discloses a two-sided vertical filming equipment of terminal recoverable formula, the backward flow district is atmospheric environment and has two and be adjacent to respectively first row vacuum cavity with the second row vacuum cavity is used for making the carrier is followed the conveyer that the long direction removed, and is used for making the carrier is followed the device is carried in moving of horizontal direction removal.

The utility model discloses a two-sided vertical filming equipment of terminal recoverable formula, first row of vacuum cavity is still including being located the backward flow district with pan feeding chamber between the first vacuum cavity, the vacuum cavity is arranged to the second is still including being located the backward flow district with between the sixth vacuum cavity and with the relative play material chamber in pan feeding chamber interval.

The utility model discloses a two-sided vertical filming equipment of terminal recoverable formula, first row of vacuum cavity is still including connecting first vacuum cavity with the preparation chamber in feeding chamber, it is used for heating to prepare the chamber treat that the plating is with the degasification, second row of vacuum cavity is still including connecting sixth vacuum cavity with the cushion chamber in unloading chamber, prepare the chamber with the cushion chamber interval is relative.

The utility model discloses a two-sided vertical filming equipment of terminal recoverable formula, the chamber door of first vacuum cavity with the chamber door of second vacuum cavity is followed the opposite setting of transverse direction, the chamber door setting of third vacuum cavity is keeping away from one side of datum line, the chamber door setting of fourth vacuum cavity is keeping away from one side of datum line, the chamber door of fifth vacuum cavity with the chamber door of sixth vacuum cavity is followed the opposite setting of transverse direction.

The utility model discloses a two-sided vertical filming equipment of terminal recoverable formula, first vacuum cavity is used for right the first face of waiting to plate the thing is handled and is carried out the pretreatment, the second vacuum cavity is used for right the second face of waiting to plate the thing is handled and is handled, the third vacuum cavity is used for right the first face of waiting to plate the thing reaches one of them person of second face carries out first coating film, the fourth vacuum cavity is used for right the first face of waiting to plate the thing reaches another person of second face carries out first coating film, the fifth vacuum cavity is used for right the first face of waiting to plate the thing reaches one of them person of second face carries out second coating film, sixth vacuum cavity is used for right the first face of waiting to plate the thing reaches another person of second face carries out second coating film.

The utility model discloses a two-sided vertical filming equipment of terminal recoverable formula, the third vacuum cavity is used for right the first face of waiting to plate the thing carries out first way coating film, the fourth vacuum cavity is used for right the second face of waiting to plate the thing carries out first way coating film, the fifth vacuum cavity is used for right the second face of waiting to plate the thing carries out second way coating film, the sixth vacuum cavity is used for right the first face of waiting to plate the thing carries out second way coating film.

The utility model discloses a two-sided vertical filming equipment of terminal recoverable formula, the third vacuum cavity with the fourth vacuum cavity is used for titanizing, the fifth vacuum cavity with sixth vacuum cavity is used for the copper-plating.

The utility model discloses a two-sided vertical filming equipment of terminal recoverable formula, the rete quantity of the multilayer film of waiting to plate the thing is n, and sets up and is being close to the quantity of one side of datum line preceding aforesaid chamber door is not more than n +1.

The beneficial effects of the utility model reside in that: through first row vacuum cavity with the double design of second row vacuum cavity can be right wait to plate the thing and carry out two-sided coating film and reduce the length of long direction to reduce equipment area. Meanwhile, the design of a circulating path for connecting the first row of vacuum chambers and the second row of vacuum chambers in series through the backflow area and the transfer vacuum chambers can shorten the backflow stroke, reduce the number of carriers and reduce the production cost. In addition, the cavity doors of one part of the vacuum cavities are arranged on one side close to the reference line, and the cavity doors of the other part of the vacuum cavities are arranged on one side far away from the reference line, so that the cavity doors of the vacuum cavities can be staggered, and can be opened without interference, thereby facilitating maintenance or troubleshooting.

Drawings

Other features and advantages of the present invention will become apparent from the following description of the embodiments with reference to the accompanying drawings, in which:

FIG. 1 is a schematic view of a conventional continuous sputter coating apparatus;

FIG. 2 is a schematic top view illustrating a first row of vacuum chambers, a second row of vacuum chambers, a transfer vacuum chamber and a reflow region of a first embodiment of the end-returning double-sided vertical plating apparatus of the present invention;

FIG. 3 is a schematic front view illustrating a plurality of carriers sequentially entering the first row of vacuum chambers;

FIG. 4 is a schematic top view illustrating the position of the door of each vacuum chamber of the first embodiment;

fig. 5 is a schematic top view of a second embodiment of the invention;

fig. 6 is a schematic top view of a third embodiment of the present invention;

fig. 7 is a schematic top view of a fourth embodiment of the present invention.

Detailed Description

Before the present invention is described in detail, it should be noted that in the following description, like elements are represented by like reference numerals.

Referring to fig. 2 to 4, the first embodiment of the end-returning double-sided vertical coating apparatus of the present invention is suitable for sputtering a multi-layer film on both sides of at least one object 92 to be coated carried by a carrier 91, wherein the object 92 to be coated may be a glass sheet, a substrate, a wafer or a wafer-level package. As shown in fig. 3, the carrier 91 carries one object 92 and the object 92 is upright, but in other variations, the carrier 91 can be designed to carry a plurality of objects 92. The object to be plated 92 is a vertical plate, and extends along an up-down direction Z, and has a first surface 921 and a second surface 922 extending along a long direction L, where the first surface 921 and the second surface 922 are disposed opposite to each other in a horizontal direction W, and the horizontal direction W, the up-down direction Z, and the long direction L are substantially perpendicular to each other, and the long direction L of the first embodiment is a left-right direction, and the horizontal direction W is a front-back direction, so that the first surface 921 of the object to be plated 92 faces forward, and the second surface 922 of the object to be plated 92 faces backward. In practice, a plurality of carriers 91 are placed in the first embodiment to achieve the purpose of continuous production. The end returning type double-sided vertical coating equipment comprises a first row of elevated vacuum cavities 200, a second row of elevated vacuum cavities 300, a transfer vacuum cavity 4 and a reflow area 5.

The first row of vacuum chambers 200 is disposed at a rear side of a reference line C parallel to the longitudinal direction L, the first row of vacuum chambers 200 is provided for the carrier 91 to enter one by one and includes a plurality of vacuum chambers connected along the longitudinal direction L, and the vacuum chambers are arranged in order from left to right as a loading chamber 201, a preparation chamber 202, a first vacuum chamber 203, a second vacuum chamber 204, and a third vacuum chamber 205. Vacuum valves G are provided on both left and right sides of each vacuum chamber to ensure the degree of vacuum in the chamber. Specifically, the feed chamber 201 is a low vacuum chamber, and the preliminary chamber 202, the first vacuum chamber 203, the second vacuum chamber 204, and the third vacuum chamber 205 are high vacuum chambers.

The feeding chamber 201 is used for feeding the carrier 91. The preparation chamber 202 can be used for heating and baking the object 92 to be plated to remove moisture (degas), or as a buffer area for the low vacuum chamber and the high vacuum chamber. The first vacuum chamber 203 is used for pre-processing the first surface 921 of the object 92, such as but not limited to plasma cleaning, plasma activation and surface modification, and plasma etching, which is helpful for improving the bonding property of the subsequent coating and reducing the contact resistance (contact resistance). The second vacuum chamber 204 is used for pre-processing the second side 922 of the object 92 to be plated. The third vacuum chamber 205 is installed with a titanium target (not shown) and is used for performing a first plating (titanizing) on the first surface 921 of the object to be plated 92.

The second row of vacuum chambers 300 is disposed in front of the reference line C and separated from the first row of vacuum chambers 200 by a channel 31, and the channel 31 has a space size at least capable of accommodating an operator to repair equipment or replace consumables. The second row of vacuum chambers 300 is provided for one entry of the carrier 91 and includes a plurality of vacuum chambers connected along the longitudinal direction L, each vacuum chamber being arranged in order from right to left as a fourth vacuum chamber 301, a fifth vacuum chamber 302, a sixth vacuum chamber 303, a buffer chamber 304, and a discharge chamber 305. Specifically, the discharge chamber 305 is a low vacuum chamber, and the fourth vacuum chamber 301, the fifth vacuum chamber 302, the sixth vacuum chamber 303 and the buffer chamber 304 are high vacuum chambers.

The fourth vacuum chamber 301 and the third vacuum chamber 205 are opposed to each other at a spacing in the lateral direction W, the fifth vacuum chamber 302 and the second vacuum chamber 204 are opposed to each other at a spacing in the lateral direction W, the sixth vacuum chamber 303 and the first vacuum chamber 203 are opposed to each other at a spacing in the lateral direction W, the buffer chamber 304 and the preliminary chamber 202 are opposed to each other at a spacing in the lateral direction W, and the discharge chamber 305 and the inlet chamber 201 are opposed to each other at a spacing in the lateral direction W.

The fourth vacuum chamber 301 is installed with a titanium target (not shown) and is used for performing a first coating (Ti coating) on the second surface 922 of the object to be coated 92. A copper target (not shown) is installed in the fifth vacuum chamber 302 and is used for performing a second plating (copper Cu plating) on the second surface 922 of the object to be plated 92. A copper target (not shown) is installed in the sixth vacuum chamber 303 and is used for performing a second plating (copper plating) on the first surface 921 of the object to be plated 92.

Further, the chamber door 61 of one of the first row of vacuum chambers 200 and the second row of vacuum chambers 300 is disposed at a side adjacent to the reference line C, that is, the door opening direction of the chamber door 61 is toward the passage 31, and the chamber door 62 of the other vacuum chamber is disposed at a side away from the reference line C, so that the chamber doors 61 of the first row of vacuum chambers 200 and the second row of vacuum chambers 300 adjacent to the reference line are staggered from each other, thereby facilitating an operator to open the chamber doors 61 and 62 for maintenance, troubleshooting or consumable replacement. Since the cavity doors 61 on the side adjacent to the reference line C are opened only by entering the passage 31 from below, the number of the cavity doors 61 disposed on the side adjacent to the reference line C is reduced as much as possible to facilitate maintenance, and in the case of the first embodiment, the number of the multi-layered film of the object 92 is 2, and the number of the cavity doors 61 disposed on the side adjacent to the reference line C is 2, so that when the number of the multi-layered film of the object 92 is n, it is preferable to satisfy the condition that the number of the cavity doors 61 disposed on the side adjacent to the reference line C is not greater than n +1.

Further, the inlet chamber 201 and the outlet chamber 305 of the first embodiment are each provided with a low vacuum pump 601 such as, but not limited to, a low vacuum dry vacuum pump or an oil vacuum pump, and each of the other vacuum chambers is provided with a vacuum pumping system 63 on the opposite side of the respective chamber door 61, 62, which includes a high vacuum pump such as, but not limited to, a turbo molecular pump, a freeze pump (cryogenic pump), a cryogenic water pump (water vapor pump), and a low vacuum pump such as, but not limited to, a dry pump as a backing pump for the high vacuum pump. Specifically, the chamber doors 62 of the preliminary chamber 202, the first vacuum chamber 203, the third vacuum chamber 205, the fourth vacuum chamber 301, the fifth vacuum chamber 302, and the buffer chamber 304 are disposed on a side away from the reference line C, and the evacuation system 63 thereof is disposed on a side close to the passage 31. Only the chamber doors 61 of the second vacuum chamber 204 and the sixth vacuum chamber 303 are disposed at a side adjacent to the reference line C, and since the chamber doors 61 of the second vacuum chamber 204 and the sixth vacuum chamber 303 are diagonally disposed and can be shifted from each other, they do not interfere with each other even when they are simultaneously opened.

The chamber door 62 of the first vacuum chamber 203 and the chamber door 61 of the sixth vacuum chamber 303 of the first embodiment are arranged in the same direction in the transverse direction W, and both are open rearward. The chamber door 61 of the second vacuum chamber 204 is arranged in the same direction as the chamber door 62 of the fifth vacuum chamber 302 in the transverse direction W, and both are open forward. The chamber door 62 of the third vacuum chamber 205 is disposed opposite to the chamber door 62 of the fourth vacuum chamber 301 in the lateral direction W, that is, the third vacuum chamber 205 is opened backward and the fourth vacuum chamber 301 is opened forward.

The transfer vacuum chamber 4 is a high vacuum chamber and is connected to the right ends of the first vacuum chamber 200 and the second vacuum chamber 300 along the transverse direction W, and is configured with at least one low-temperature water air pump 602, such as but not limited to a commercially available Polycold refrigerator, and at least one vacuum pumping element of the turbo molecular pump 603 to maintain a high vacuum environment, as shown in fig. 4, there are two low-temperature water air pumps 602 and two turbo molecular pumps 603, and the configuration of the vacuum pumping element has an advantage of extremely high pumping rate, and is very suitable for being used in the field of panel-level (panel level) coating. It can be understood that the transfer vacuum chamber 4 can also employ only one or more large-sized cryopumps (cryo pumps) as the vacuum pumping means. The vacuum valve G is also provided between the transfer vacuum chamber 4 and the first and second rows of vacuum chambers 200 and 300 to maintain a high vacuum therein. The transfer vacuum chamber 4 has two conveying devices 41 adjacent to the first row of vacuum chambers 200 and the second row of vacuum chambers 300, respectively, for moving the carriers 91 in the longitudinal direction L, and a transfer device 42 for moving the carriers 91 in the lateral direction W, the transfer device 42 being capable of moving the carriers 91 from the conveying devices 41 adjacent to the first row of vacuum chambers 200 to the conveying devices 41 adjacent to the second row of vacuum chambers 300 in the lateral direction W. By the design of the transfer vacuum chamber 4, the carrier 91 can be transferred from the third vacuum chamber 205 of the first row of vacuum chambers 200 to the fourth vacuum chamber 301 of the second row of vacuum chambers 300 under a vacuum environment, so as to ensure the cleanliness of the object to be plated 92 and avoid the problems of metal pad (metal pad) oxidation or poor adhesion of subsequent plating films.

In some variations, the transfer vacuum chamber 4 may be configured as two circular rotary chambers respectively connected to the first row of vacuum chambers 200 and the second row of vacuum chambers 300 and an elongated channel connecting the two rotary chambers, and the carrier 91 is transported by a transport manner in which the carrier 91 is rotated 90 degrees in the forward direction in the first rotary chamber and then passes through the elongated channel in a straight line, and the carrier 91 is returned 90 degrees in the reverse direction in the second rotary chamber and then enters the second row of vacuum chambers 300.

The return area 5 is connected to the left ends of the first row of vacuum chambers 200 and the second row of vacuum chambers 300 in the transverse direction W. The reflow zone 5 is an atmospheric environment and has two conveyors 51 adjacent to the first row of vacuum chambers 200 and the second row of vacuum chambers 300, respectively, for moving the carriers 91 in the longitudinal direction L, and a transfer device 52 for moving the carriers 91 in the lateral direction W, the transfer device 52 being capable of moving the carriers 91 from the conveyors 51 adjacent to the second row of vacuum chambers 300 to the conveyors 51 adjacent to the first row of vacuum chambers 200 in the lateral direction W. Through the design of the reflow zone 5, the carrier 91 can be returned from the discharge chamber 305 of the second row of vacuum chambers 300 to the feed chamber 201 of the first row of vacuum chambers 200.

When the first embodiment is used to sputter a ti-cu double-layer film on both sides of the objects to be plated 92 as a redistribution layer (RDL) or metallization layer of a dielectric and build-up material (such as ABF, BT, etc.), the carriers 91 can move along a circulation path formed by the first row of vacuum chambers 200, the transfer vacuum chambers 4, the second row of vacuum chambers 300, and the reflow region 5 without breaking vacuum flip-chip plating, so as to achieve high-throughput automatic continuous double-side plating operation, and the plated product has the advantages of excellent plating uniformity and adhesion, low-resistance film layer, and contact resistance. The utility model discloses a backward flow district 5 with it connects to shift 4 series of vacuum cavity first row of vacuum cavity 200 reaches the circulation path design of second row vacuum cavity 300 can shorten the backward flow stroke of carrier 91, consequently can reduce the quantity of carrier 91, reduction in production cost.

Referring to fig. 5, the second embodiment of the present invention is similar to the first embodiment, and is also used to sputter two layers of multilayer film on both sides of the object to be plated 92, and the difference lies in:

the first vacuum chamber 203 pretreats the second surface 922 of the object 92 to be plated, the second vacuum chamber 204 pretreats the first surface 921 of the object 92 to be plated, and the fifth vacuum chamber 302 performs a second plating (copper plating) on the first surface 921 of the object 92 to be plated. The sixth vacuum chamber 303 performs a second plating (copper plating) on the second surface 922 of the object 92 to be plated. In accordance with the exchange of the plating surface order, the position of the vacuum pumping system 63 is adjusted so that the doors 61 of the first vacuum chamber 203 and the fifth vacuum chamber 302 are disposed on the side adjacent to the reference line C, the door 61 of the first vacuum chamber 203 and the door 62 of the sixth vacuum chamber 303 are changed to open forward, and the door 62 of the second vacuum chamber 204 and the door 61 of the fifth vacuum chamber 302 are changed to open backward, thereby achieving the same effect as the first embodiment.

Referring to fig. 6, the third embodiment of the present invention is similar to the first embodiment, and is also used to sputter two layers of multi-layer films on both sides of the object to be plated 92, and the difference lies in:

the position of the buffer chamber 202a is changed to the first row of vacuum chambers 200a, the first vacuum chamber 203a is used as a preparation chamber, the second vacuum chamber 204a and the third vacuum chamber 205a are pretreated, the fourth vacuum chamber 301a and the fifth vacuum chamber 302a of the second row of vacuum chambers 300a are subjected to the first coating, and the sixth vacuum chamber 303a and the vacuum chamber 304a are subjected to the second coating, namely, the coating operation of double-sided double layers is moved to the second row of vacuum chambers 300. Therefore, the vacuum chambers of the first row of vacuum chambers 200a are, in order from left to right, the feeding chamber 201, the buffer chamber 202a, the first vacuum chamber 2023a as a preparation chamber, and the second vacuum chamber 204a and the third vacuum chamber 205a for respectively pre-treating the first surface 921 and the second surface 922 of the object to be plated 92. In some variations, the positions of the buffer chamber 202a and the first vacuum chamber 203a as a spare chamber can also be interchanged according to the characteristics of the object 92 and the carrier 91, such as oxygen release rate (oxygen release rate). The fourth vacuum chamber 301a, the fifth vacuum chamber 302a, the sixth vacuum chamber 303a, the vacuum chamber 304a and the discharging chamber 305 are disposed in sequence from right to left in the second row of vacuum chambers 300 a.

Similarly to the third vacuum chamber 205a, the second vacuum chamber 204a first pretreats the first surface 921 and the second surface 922 of the object to be plated 92. Then, the fourth vacuum container 301a performs a first film coating on the second surface 922 of the object 92, and the fifth vacuum container 302a performs a first film coating on the first surface 921 of the object 92. Finally, the sixth vacuum chamber 303a performs a second plating process on the second surface 922 and the first surface 921 of the object to be plated 92, respectively, as the vacuum chamber 304 a. And the cavity doors 61 of the third vacuum cavity 205a, the fifth vacuum cavity 302a and the vacuum cavity 304a are arranged at one side adjacent to the reference line C and are staggered with each other in accordance with the position change of the action of each vacuum cavity and the exchange of the sequence of the film coating surfaces, and since the number of the cavity doors 61 at one side adjacent to the reference line C is 3, the design condition that the number of the cavity doors 61 at one side adjacent to the reference line C is not more than n +1 is just satisfied.

In addition, in the third embodiment, the transfer vacuum chamber 4 is just used as a buffer chamber between the third vacuum chamber 205a and the fourth vacuum chamber 301a, which can reduce the contamination of the plating module (not shown) in the fourth vacuum chamber 301a by-products of the previous processing module (not shown) in the third vacuum chamber 205a, so that such a chamber configuration can reduce the adverse effect on the Rc (contact resistance) characteristics of the plated layer.

Referring to fig. 7, the fourth embodiment of the present invention is similar to the third embodiment, and is also used to sputter two layers of multi-layer films on both sides of the object to be plated 92, and the difference lies in:

the second vacuum chamber 204b pretreats the second surface 922 of the object 92, and the third vacuum chamber 205b pretreats the first surface 921 of the object 92. The fourth vacuum container 301b performs a first coating on the first surface 921 of the object 92, and the fifth vacuum container 302b performs a first coating on the second surface 922 of the object 92. The sixth vacuum chamber 303b performs a second plating on the first surface 921 of the object 92, and the vacuum chamber 304b performs a second plating on the second surface 922 of the object 92. The cavity doors 61 of the second vacuum cavity 204b, the fourth vacuum cavity 301b and the sixth vacuum cavity 303b are adjusted to be arranged at one side adjacent to the reference line C and staggered with each other in coordination with the exchange of the coating surface sequence, and since the number of the cavity doors 61 at one side adjacent to the reference line C is 3, the design condition that the number of the cavity doors 61 arranged at one side adjacent to the reference line C is not more than n +1 is also satisfied.

In some variations, the number of the chamber gates 61 adjacent to the side of the reference line C may be greater than n +1, for example, if the chamber gates 62 of the discharging chamber 305 or the buffer chamber 304, which are not associated with the coating surface sequence, are disposed adjacent to the side of the reference line C, the consumable parts can be repaired or replaced.

It is understood that the first coating film may be TiW, cr, niCr, ni, ta, cuN, ti/TiN, ta/TaN in some variations in addition to Ti. Besides copper plating, in some variations, the second plating film may also be plated with copper alloy. The type and number of layers of the coating film are not limited by the present invention, and the user can select the target material and configure the number of the vacuum chambers according to the actual coating requirement.

It should be particularly noted that in the above embodiments, a high-efficiency cooling module, such as a cooling pipeline, can be disposed in each vacuum chamber, or a cooling gas can be introduced into the chamber, so as to effectively control the temperature of the object to be plated 92 and improve the yield of the product.

To sum up, the utility model discloses terminal two-sided vertical filming equipment of recoverable formula, through first row vacuum cavity 200 with the double design of second row vacuum cavity 300 can reduce the utility model discloses long direction L's length effectively reduces equipment area and reduces the equipment height. Through the design of the circulation path connecting the first row of vacuum chambers 200 and the second row of vacuum chambers 300 in series with the transfer vacuum chamber 4 through the reflow zone 5, vacuum breaking and turnover coating are not needed, high productivity is realized, the reflow stroke of the carriers 91 can be shortened, the number of the carriers 91 is reduced, and the production cost is reduced. The utility model discloses still set up the chamber door 61 of partly aforementioned vacuum cavity simultaneously and be close to one side of datum line C, the chamber door 62 setting of another part aforementioned vacuum cavity is keeping away from one side of datum line C makes the chamber door 61 of each vacuum cavity, 62 stagger each other, can not interfere, consequently convenient maintenance and troubleshooting, so can reach cost utility model's mesh really.

The above description is only an example of the present invention, and the scope of the present invention should not be limited thereto, and the present invention is also within the scope of the present invention by simple equivalent changes and modifications according to the claims and the contents of the specification.

Claims (10)

1. An end-returning type double-sided vertical plating apparatus adapted to plate a multilayer film on both sides of at least one object to be plated carried by a carrier, the object to be plated extending in an up-down direction and having a first surface and a second surface extending in a longitudinal direction, the first surface and the second surface being disposed opposite to each other in a lateral direction, the up-down direction and the longitudinal direction being substantially perpendicular to each other, the apparatus comprising: the terminal returning type double-sided vertical coating equipment comprises:

the first row of vacuum chambers are arranged on one side of a reference line parallel to the long direction, are used for the carrier to enter and comprise a first vacuum chamber, a second vacuum chamber and a third vacuum chamber which are sequentially connected along the long direction;

a second row of vacuum chambers disposed on the other side of the reference line and separated from the first row by a channel, the second row of vacuum chambers being used for the carrier to enter and including a fourth vacuum chamber, a fifth vacuum chamber and a sixth vacuum chamber connected in sequence, the fourth vacuum chamber and the third vacuum chamber being spaced and opposed in the transverse direction, the sixth vacuum chamber and the first vacuum chamber being spaced and opposed in the transverse direction, a part of the chamber doors of the vacuum chambers being disposed on a side adjacent to the reference line, the other part of the chamber doors of the vacuum chambers being disposed on a side away from the reference line, the chamber doors of the first row of vacuum chambers and the second row of vacuum chambers being disposed on a side adjacent to the reference line being staggered with each other, the chamber doors of the second vacuum chambers being disposed in the same direction as the chamber doors of the fifth vacuum chambers;

the transfer vacuum cavity is connected to one end of the first row of vacuum cavities and one end of the second row of vacuum cavities along the transverse direction; and

and a reflow region connected to the other ends of the first row of vacuum chambers and the second row of vacuum chambers in the transverse direction, thereby enabling the carrier to move along a circulation path formed by the first row of vacuum chambers, the transfer vacuum chambers, the second row of vacuum chambers, and the reflow region.

2. The end-return type double-sided vertical plating apparatus according to claim 1, wherein: the transfer vacuum cavity is provided with two conveying devices which are respectively adjacent to the first row of vacuum cavities and the second row of vacuum cavities and are used for enabling the carriers to move along the long direction, and a transferring device which is used for enabling the carriers to move along the transverse direction.

3. The end-return type double-sided vertical plating apparatus according to claim 1, wherein: the reflow zone is in an atmospheric environment and is provided with two conveying devices which are respectively adjacent to the first row of vacuum cavities and the second row of vacuum cavities and are used for enabling the carriers to move along the long direction, and a transferring device which is used for enabling the carriers to move along the transverse direction.

4. The end-return type double-sided vertical plating apparatus of claim 1, wherein: the first row of vacuum cavities further comprises a feeding cavity positioned between the backflow area and the first vacuum cavities, and the second row of vacuum cavities further comprises a discharging cavity positioned between the backflow area and the sixth vacuum cavities and opposite to the feeding cavity at intervals.

5. The end-return type double-sided vertical plating equipment as claimed in claim 4, wherein: the first row of vacuum cavities further comprises a preparation cavity which is connected with the first vacuum cavity and the feeding cavity and used for heating the object to be plated to remove gas, the second row of vacuum cavities further comprises a buffer cavity which is connected with the sixth vacuum cavity and the discharging cavity, and the preparation cavity is opposite to the buffer cavity at intervals.

6. The end-return type double-sided vertical plating apparatus according to claim 1, wherein: the gate of the first vacuum chamber is disposed opposite to the gate of the second vacuum chamber in the lateral direction, the gate of the third vacuum chamber is disposed on a side away from the reference line, the gate of the fourth vacuum chamber is disposed on a side away from the reference line, and the gate of the fifth vacuum chamber is disposed opposite to the gate of the sixth vacuum chamber in the lateral direction.

7. The end-return type double-sided vertical plating apparatus of claim 1, wherein: the first vacuum chamber is used for preprocessing a first surface of the object to be plated, the second vacuum chamber is used for preprocessing a second surface of the object to be plated, the third vacuum chamber is used for performing first film coating on one of the first surface and the second surface of the object to be plated, the fourth vacuum chamber is used for performing first film coating on the other of the first surface and the second surface of the object to be plated, the fifth vacuum chamber is used for performing second film coating on one of the first surface and the second surface of the object to be plated, and the sixth vacuum chamber is used for performing second film coating on the other of the first surface and the second surface of the object to be plated.

8. The end-return type double-sided vertical plating apparatus as claimed in claim 7, wherein: the third vacuum chamber is used for performing first film coating on the first surface of the object to be coated, the fourth vacuum chamber is used for performing first film coating on the second surface of the object to be coated, the fifth vacuum chamber is used for performing second film coating on the second surface of the object to be coated, and the sixth vacuum chamber is used for performing second film coating on the first surface of the object to be coated.

9. The end-return type double-sided vertical plating apparatus as claimed in claim 7, wherein: the third vacuum chamber and the fourth vacuum chamber are used for titanium plating, and the fifth vacuum chamber and the sixth vacuum chamber are used for copper plating.

10. The end-return type double-sided vertical plating apparatus according to claim 1, wherein: the number of film layers of the multilayer film of the object to be plated is n, and the number of the cavity doors arranged on one side adjacent to the datum line is not more than n +1.

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