CN216420554U

CN216420554U - Germanium wafer cleaning water tank

Info

Publication number: CN216420554U
Application number: CN202123342641.XU
Authority: CN
Inventors: 杨春柳; 刘汉保; 赵磊; 郭建新; 吕欣泽
Original assignee: Yunnan Xinyao Semiconductor Material Co ltd; Yunnan Zhongke Xinyuan Crystalline Material Co ltd
Current assignee: Yunnan Xinyao Semiconductor Material Co ltd; Yunnan Zhongke Xinyuan Crystalline Material Co ltd
Priority date: 2021-12-28
Filing date: 2021-12-28
Publication date: 2022-05-03
Anticipated expiration: 2031-12-28

Abstract

The utility model relates to a germanium wafer washs basin belongs to single wafer processing technology field, including water jacket and inside groove, the inside groove is arranged in the water jacket inside, the inside groove includes inside groove body and inside groove support, and the inside groove body is rabbeted on inside groove support, apopore has been seted up to inside groove body bottom, and the top is provided with the shower, and water injection pipe and trachea are connected respectively to several holes of side lower part, be provided with the elevating platform in the inside groove support, the utility model discloses a set up the apopore and cooperate with the elevating platform including groove body bottom, realize the quick drainage function of inside groove, this device will spray, tympanic bulla, water injection drainage function collection an organic whole, but each function both exclusive use also multiple function mutually supports the use, can wash remaining medicine in germanium wafer surface more the efficient, can maximum using water wisely.

Description

Germanium wafer cleaning water tank

Technical Field

The utility model relates to a abluent basin after germanium wafer polishing belongs to single crystal plate processing technology field.

Background

The conventional wafer cleaning mainly comprises one-by-one manual cleaning or one-by-one mechanical cleaning of single wafers, the cleaning process is complex and tedious, a large amount of manpower and material resources are needed, the cleaning efficiency is low, and the stability is poor. Therefore, it is very urgent and important to find a method capable of improving the washing efficiency and stability, and the appearance of the washing line has made a hope for solving the problem. The utility model relates to a germanium wafer polishing back washs basin is an important device and the link of washing line, whether qualified decisive effect of playing to wasing the back wafer.

Disclosure of Invention

The utility model mainly aims at providing a germanium wafer polishing back washs basin for spray, tympanic bulla, quick water injection drainage scheduling problem in solving germanium wafer cleaning process.

In order to achieve the above purpose, the utility model provides the following technical scheme:

the utility model provides a germanium wafer washs basin, includes water jacket and inside groove, the inside groove is arranged in the water jacket inside, the inside groove includes inside groove body and inside groove support, and the inside groove body is rabbeted on the inside groove support, the apopore has been seted up to inside groove body bottom, and the top is provided with the shower, and several holes are opened to the side lower part connect water injection pipe and trachea respectively, be provided with the elevating platform in the inside groove support.

The lifting platform comprises a pneumatic lifting cover plate, and a plurality of pneumatic valves are fixedly connected below the pneumatic lifting cover plate.

Preferably, the outer groove is rectangular, and a drain hole is formed in the lower portion of one side face of the outer groove.

Preferably, the lower part of the inner side surface of the inner groove body is provided with a flange, and a porous cover plate is additionally arranged on the flange.

Preferably, the inner groove body is rectangular, the top of the inner groove body is provided with a stepped frame, and the two spraying pipes penetrate through the frame and are symmetrically arranged on two sides of the inner groove body.

The utility model discloses a set up apopore and elevating platform including groove body bottom and cooperate, realize the quick drainage function of inside groove, this device will spray, tympanic bulla, water injection drainage function collection in an organic whole, but each function both exclusive use also multiple function mutually supports the use, can wash remaining medicine in germanium wafer surface more efficient, but maximum using water wisely.

Through the installation porous apron, the wafer is placed in the card stopper and is arranged in porous apron again on, and the bubble is too big when preventing the tympanic bulla makes the wafer rock by a wide margin even collision between the wafer causes the damage and the water flow when water injection pipe water injection suddenly leads to the fact the unnecessary damage to the wafer, and water evenly overflows the wafer when guaranteeing the water injection simultaneously.

Water is injected from bottom to top, so that the continuous update of water in the cleaning process can be realized, and a better cleaning effect is achieved.

Drawings

FIG. 1 is a schematic view of the overall structure of the present invention;

FIG. 2 is a schematic view of the structure of the internal groove portion of the present invention;

FIG. 3 is a schematic view of the bottom structure of the inner tank body of the present invention;

FIG. 4 is a schematic view of the structure of the internal groove bracket of the present invention;

FIG. 5 is a schematic view of the elevating platform of the present invention;

FIG. 6 is a schematic view of the structure of the porous cover plate of the present invention;

FIG. 7 is a sectional view of the inner groove structure of the present invention;

wherein: 100. an outer tank; 101. a drain hole; 200. an inner groove body; 201. a shower pipe; 202. a water injection pipe; 203. an air tube; 204. a frame; 205. a flange; 206. a water outlet hole; 207. an inner groove support; 208. a pneumatic lifting cover plate; 209. a pneumatic valve; 210. a porous cover plate.

Detailed Description

The present invention will be further described with reference to the accompanying drawings and specific embodiments.

Example 1

As shown in figures 1-4, a germanium wafer cleaning water tank comprises an outer tank 100 and an inner tank, the actual shape of the outer tank and the actual shape of the inner tank are not limited, in the invention, the inner tank is arranged in the outer tank 100, the inner tank comprises an inner tank body 200 and an inner tank support 207, the inner tank body 200 is embedded on the inner tank support 207, the bottom of the inner tank body 200 is provided with a water outlet 206, the top is provided with a shower pipe 202, the lower part of the side surface is provided with a plurality of holes respectively connected with a water injection pipe 203 and a gas pipe 204, the inner tank support 207 is internally provided with a lifting platform which is a pneumatic lifting platform, or the lifting platform comprises a pneumatic lifting cover plate 208, four pneumatic valves 209 are fixedly connected at the lower four corners of the pneumatic lifting cover plate 208, and the pneumatic valves 209 can also be replaced by pneumatic rods.

As an embodiment, a lower portion of one side of the outer tank 100 is provided with a drain hole 101 for receiving the drain pipe to drain the waste water for centralized treatment, and the drain hole, the size of the drain pipe and the drain speed can be adjusted according to requirements. A certain gap is left between the outer groove and the inner groove, so that the size of the inner groove can be conveniently changed, and the air pipe and the water injection pipe of the inner groove can be conveniently placed.

As another embodiment, referring to fig. 6 and 7, a flange 205 is disposed at a lower portion of an inner side surface of the inner tank body 200, a porous cover plate 210 is additionally disposed on the flange 205, and the wafer is placed in the chuck and then placed on the porous cover plate 210, so as to prevent the wafer from being damaged by a large amount of shaking due to an excessively large bubble during bubbling and even by collision between the wafers, and prevent unnecessary damage to the wafer due to an excessively fast water flow during water injection from the water injection pipe, and to ensure that the water uniformly overflows the wafer during water injection.

As another embodiment, the top of the inner tank body 200 is provided with a stepped frame 205, and two spray pipes 202 penetrate through the frame 205 and are symmetrically arranged on two sides of the inner tank body 200 to form cross spray, the spray range covers all the wafers and the jam boxes in the tank, the spray angle and range can be adjusted according to requirements, and the inner tank body is suitable for wafers with different sizes. The high-pressure water spraying wafer can wash dirt on the surface of the wafer to the maximum extent, and the pressure and the water spraying amount of water can be adjusted according to requirements, so that water is saved to the maximum extent.

The utility model discloses an use is, at first pack several wafers into a bayonet socket, and the bayonet socket can be installed the device of several wafers like patent 2020221691142, and abluent preceding step is the liquid medicine washing, has the liquid medicine to remain on the washing back wafer, consequently puts into this inside groove, and the shower begins to start, is equivalent to a process of washing the wafer, and the pneumatic valve of the control elevating platform at this moment is opened, and spray water flows away on one side, sprays after the certain time. And (3) closing the spray pipe, closing a drainage valve (the pneumatic valve is lifted to close the valve), starting to inject water through the water injection pipe at the moment, stopping injecting water after the water injection time meets the requirement, starting bubbling through the air pipe, stopping bubbling after bubbling for a certain time and quickly draining. After the water leaves the wafer, the wafer is taken out to enter the next link. The functions can be used independently or in combination.

Specifically, referring to fig. 5 and 7, the elevating platform is composed of four small pneumatic valves 209 and a pneumatic lifting cover plate 208, four small pneumatic valves are installed at four corners of the inner groove support 207 and are measured, the cover plate vertically moves up and down, the water outlet hole at the bottom of the inner groove body is matched to realize a quick water discharging function, the cover plate blocks the water outlet hole at the bottom of the inner groove for cleaning when cleaning the wafer, the cover plate moves downwards by controlling the pneumatic lifting cover plate 208 during water discharging, the formed air pressure difference enables waste water to flow down quickly, quick water discharging is realized, time is saved, and meanwhile, the medicine residues in the waste water are reduced and remained on the inner wall of the inner groove.

Specifically, the gas pipe 203 is connected with pure nitrogen gas to realize the bubbling function. The air pipe is connected with the air pump, nitrogen bubbles are generated from bottom to top, and the bubbles pass through the porous cover plate, so that the wafers are prevented from greatly shaking due to overlarge bubbles, and even from being damaged due to collision between the wafers. The bubbles drive water flow, so that the scouring force of water is increased, the wafer can be better cleaned, and in addition, the inner tank body also has a cleaning effect.

Specifically, the water injection pipe 202 injects water from bottom to top, and the water overflows from the top of the inner tank, so that the water can be continuously refreshed, and the water is matched with the upper spray pipe to clean the wafer. Moreover, water is injected from bottom to top through the water injection pipe, so that water flow is prevented from directly impacting the wafer to damage the wafer, and the timeliness of water injection is guaranteed by the two water injection pipes. The porous cover plate slows down the water flow rate so as to avoid the damage of the wafer caused by the impact of the water.

While the present invention has been described in detail with reference to the embodiments shown in the drawings, the present invention is not limited to the embodiments, and various changes and applications can be made without departing from the spirit and scope of the present invention.

Claims

1. The germanium wafer cleaning water tank is characterized by comprising an outer tank and an inner tank, wherein the inner tank is arranged inside the outer tank, the inner tank comprises an inner tank body and an inner tank support, the inner tank body is embedded in the inner tank support, a water outlet hole is formed in the bottom of the inner tank body, a spray pipe is arranged at the top of the inner tank body, a plurality of holes formed in the lower portion of the side face of the inner tank body are respectively connected with a water injection pipe and a gas pipe, and a lifting table is arranged in the inner tank support.

2. The germanium wafer cleaning bath according to claim 1, wherein the lift table comprises a pneumatic lift cover plate, and a plurality of pneumatic valves are fixedly connected to a lower portion of the pneumatic lift cover plate.

3. The germanium wafer cleaning bath according to claim 1, wherein the outer bath is rectangular and has a drain hole at a lower portion of one side.

4. The germanium wafer cleaning sink as claimed in claim 1, wherein a flange is provided at a lower portion of an inner side surface of the inner tank body, and a porous cover plate is attached to the flange.

5. The germanium wafer cleaning water tank as claimed in claim 1, wherein the inner tank body is rectangular, a stepped rim is provided at a top portion, and two shower pipes are provided to penetrate through the rim and symmetrically provided at both sides of the inner tank body.