CN215628252U - Linear evaporation source - Google Patents

Linear evaporation source Download PDF

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Publication number
CN215628252U
CN215628252U CN202121094817.1U CN202121094817U CN215628252U CN 215628252 U CN215628252 U CN 215628252U CN 202121094817 U CN202121094817 U CN 202121094817U CN 215628252 U CN215628252 U CN 215628252U
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crucible
stage
film thickness
wire feeding
evaporation source
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CN202121094817.1U
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李成林
郝明
杜雪峰
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Bosuye Technology Shenyang Co ltd
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Bosuye Technology Shenyang Co ltd
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Abstract

The utility model discloses a linear evaporation source, which mainly comprises a secondary crucible, a wire feeding mechanism and a primary crucible; the second-stage crucible is a long-strip trough body, and the length direction of the second-stage crucible is consistent with the width direction of the coating film; more than 2 wire feeding mechanisms are arranged side by side along the width direction of the coating film, and 1 primary crucible is arranged below each wire feeding mechanism; the second-stage crucible is positioned below the first-stage crucible; the bottom of the first-stage crucible is provided with a melt flow pipe, the other end of the melt flow pipe is communicated with the side wall of the second-stage crucible, and the melt flow pipe is provided with a flow control valve; more than 2 groups of electrodes are arranged on the secondary crucible, and the heating of different sections on the secondary crucible can be controlled in a segmented manner. The first-stage crucible melts the wire material conveyed by the wire feeding mechanism into melt, and the melt is injected into the second-stage crucible through a melt flow pipe; the melt is heated and evaporated in a secondary crucible to realize evaporation coating.

Description

Linear evaporation source
Technical Field
The utility model belongs to the technical field of vacuum coating, and particularly relates to a linear evaporation source used in vacuum evaporation coating.
Background
In recent years, the rapid development of optical technology, energy storage technology, and flat panel display technology has made higher demands on the uniformity and stability of the properties of thin film products. As one of the important process technologies for thin film preparation, vacuum evaporation coating is widely used in the industrial production of thin film products in the above fields. The wire feeder can continuously supplement the film material in the evaporation coating process, so that the wire feeder is more applied to evaporation coating.
The evaporation mode of the wire feeding mechanism is point source evaporation, so that the wire feeding mechanism is not suitable for film preparation of wide substrates in continuous or semi-continuous evaporation coating. Even if a plurality of wire feeding mechanisms with consistent wire feeding speed are arranged in the width direction of the coating film, the problem of discontinuous film thickness distribution between the adjacent wire feeding mechanisms is easy to exist, more importantly, in the process of evaporation coating, the film thickness distribution of the middle part and the two sides of the substrate in the width direction can be in an uneven state due to the influence of the cosine law of the evaporation source, and the use requirements of optics, energy storage, panel display and the like on strict product performance requirements can not be met.
On the other hand, because the temperature of the wires is easily high when the wires are baked at the outlet of the guide pipe due to the high evaporation temperature in the crucible, the wires in the guide pipe and even in the transmission roller are easily softened and bent and deformed by heat conduction, the wires are clamped and cannot be conveyed, and the evaporation coating process cannot be normally carried out.
SUMMERY OF THE UTILITY MODEL
In order to solve the problems, the utility model provides a linear evaporation source which mainly comprises a secondary crucible, a wire feeding mechanism and a primary crucible; the second-stage crucible is a long-strip trough body, and the length direction of the second-stage crucible is consistent with the width direction of the coating film; more than 2 wire feeding mechanisms are arranged side by side along the width direction of the coating film, and 1 primary crucible is arranged below each wire feeding mechanism; the number of the secondary crucibles is 1, and the secondary crucibles are positioned below the primary crucibles; the bottom of the first-stage crucible is provided with a melt flow pipe, the other end of the melt flow pipe is communicated with the side wall of the second-stage crucible, and the melt flow pipe is provided with a flow control valve; more than 2 groups of electrodes are arranged on the secondary crucible, and the heating of different sections on the secondary crucible can be controlled in a segmented manner. The heating temperature in the secondary crucible is 100-400 ℃ higher than that in the primary crucible.
The first-stage crucible melts the wire material conveyed by the wire feeding mechanism into melt, and the melt is injected into the second-stage crucible through a melt flow pipe; the melt is heated and evaporated in a secondary crucible to realize evaporation coating. A water-cooling baffle is arranged between the second-stage crucible and the first-stage crucible, and a heat insulation layer is arranged on one side of the first-stage crucible by the water-cooling baffle. The outer surface of the melt flow pipe is wrapped with a heat insulation layer.
The secondary crucible used as an evaporation crucible is designed into a long-strip trough body, and the wire material melt is converged together and then is heated and evaporated, so that 1 linear evaporation coating film source with stable and continuous evaporation is formed, and the preparation of a stable film layer on a wide substrate in continuous or semi-continuous evaporation coating is facilitated.
The evaporation coating machine where the linear evaporation source is located is provided with a film thickness detection device at the downstream of the coating path, and can detect the film thickness of the film deposited on the substrate; the evaporation coating machine is also provided with a control system, the control system can acquire film thickness detection data in real time and intelligently regulate and control the linear evaporation source according to the film thickness detection data; the film thickness detection data includes film thickness data of each portion in the width direction of the plating film.
The wire feeding mechanism is provided with a speed regulating motor, and the rotating speed of the speed regulating motor is regulated and controlled by a control system. The wire feeding speed of each wire feeding mechanism is independently regulated and controlled by the control system according to the film thickness detection data; when the film thickness of a certain part in the width direction of the coating film is thin, the control system can control the wire feeding speed of the wire feeding mechanism corresponding to the part to be accelerated; when the film thickness of a certain part in the width direction of the coating film is thicker, the control system can control the wire feeding speed of the wire feeding mechanism corresponding to the part to be reduced.
Heating of different sections on the secondary crucible is independently regulated and controlled by the control system according to the film thickness detection data; when the film thickness of a certain part in the width direction of the coating film is thinner, the control system can control the heating temperature of the section of the secondary crucible corresponding to the part to be increased; when the film thickness of a certain part in the width direction of the coating film is thicker, the control system can control the heating temperature of the section of the secondary crucible corresponding to the part to be reduced.
The flow control valve on the melt flow pipe communicated between each first-stage crucible and each second-stage crucible is independently regulated and controlled by a control system according to the film thickness detection data; when the film thickness of a certain part in the width direction of the coating film is thin, the control system can control the flow in the melt flow pipe corresponding to the part to be increased; when the film thickness of a certain part in the width direction of the coating film is thicker, the control system controls the flow rate of the molten liquid flow pipe corresponding to the part to be reduced.
Target distribution data of film thickness and an evaporation material database are preset in the control system; the control system calculates the evaporation rate adjustment quantity of each section of the secondary crucible according to the difference between the film thickness detection data and the target distribution data acquired in real time and the physical property parameters of the evaporation materials; then the control system regulates and controls the heating temperature of different sections on the secondary crucible, the wire feeding speed of each wire feeding mechanism and the flow control valve of the melt flow pipe based on the evaporation rate regulating quantity, thereby realizing the closed-loop intelligent control of the linear evaporation source.
And the control system performs standard deviation analysis on the film thickness detection data and the target distribution data acquired in real time, and gives the evaporation rate adjustment amount of a certain section of the secondary crucible corresponding to a certain part according to the standard deviation degree of the certain part in the width direction of the coating film.
The evaporation coating machine where the linear evaporation source is located can be a roll-to-roll coating device, and the substrate is a flexible base film. The evaporation coating machine can also be a linear multi-chamber continuous vacuum coating device, and the substrate can be glass, organic glass, a metal sheet, acrylic or other forms conveyed linearly.
The utility model has the beneficial effects that:
(1) the linear evaporation source adopts a completely new idea of originating regulation and control, does not adopt a means of setting a correction baffle plate or a shielding plate based on a large amount of empirical data, and carries out closed-loop intelligent real-time regulation and control on the film thickness distribution in the film coating width direction based on the film coating principle and numerical calculation simulation, so that research and development personnel can be free from the constraint of long-term film coating experience and a large amount of empirical data, film products with various film thickness distribution characteristics of various film layer materials are quickly researched and produced, and the research and development period of new products is greatly shortened; on the other hand, the equipment does not need to be opened to reset and adjust the correction baffle plate and the like, and the evaporation material can be deposited on the substrate without being shielded, so that the equipment efficiency and the production efficiency are improved, and a large amount of evaporation material and energy consumed during evaporation are saved.
(2) The arrangement of the first-stage crucible with lower heating temperature greatly weakens the temperature rise effect of the wires conveyed in the wire feeding mechanism, and the problem of wire clamping failure caused by softening, bending and deformation of the wires is remarkably solved.
(3) According to the linear evaporation source and the evaporation coating machine, an online closed-loop control chain is formed by the linear evaporation source, the control system and the film thickness detection device, the control system regulates and controls the heating temperature of different sections on the secondary crucible at any time according to film thickness detection data, and simultaneously regulates and controls the wire feeding speed of each wire feeding mechanism and the flow of the molten liquid flow pipe to be matched, so that the closed-loop intelligent regulation and control of the evaporation rate of each section of the linear evaporation source in the coating width direction are realized, the influence of the cosine law of the evaporation source on the film thickness distribution is overcome, and the film thickness distribution of a substrate in the coating width direction is uniform or reaches the preset target film thickness distribution.
(4) The secondary crucible serving as the evaporation crucible is designed into a long-strip trough body, and the wire material melt is converged together and then heated and evaporated, so that 1 linear evaporation coating film source with stable and continuous evaporation is formed, and the stable film preparation of a wide substrate in continuous or semi-continuous evaporation coating is facilitated.
Drawings
Fig. 1 is a schematic front view of a linear evaporation source according to an embodiment of the present invention.
Fig. 2 is a schematic plan view of a linear evaporation source according to an embodiment of the present invention.
FIG. 3 is a schematic view of an embodiment of an evaporation coater according to the present invention.
Detailed Description
The following further describes the embodiments of the present invention with reference to the drawings. It should be understood that the detailed description and specific examples, while indicating the present invention, are intended for purposes of illustration and explanation only and are not intended to limit the scope of the utility model.
Fig. 1 and fig. 2 are a schematic front view and a schematic top view of a linear evaporation source according to an embodiment of the present invention. FIG. 3 is a schematic view of an embodiment of an evaporation coater according to the present invention. As shown in fig. 1-3, the linear evaporation source of the present invention mainly comprises a secondary crucible 1, a wire feeding mechanism 2 and a primary crucible 3; the secondary crucible 1 is a long-strip groove-shaped body, and the length direction of the secondary crucible is consistent with the width direction of a coating film; more than 2 wire feeding mechanisms are arranged side by side along the width direction of the coating film, and 1 primary crucible is arranged below each wire feeding mechanism; the number of the secondary crucibles is 1, and the secondary crucibles are positioned below the primary crucibles; the bottom of the first-stage crucible 3 is provided with a melt flow pipe 4, the other end of the melt flow pipe 4 is communicated with the side wall of the second-stage crucible 1, and the melt flow pipe 4 is provided with a flow control valve 5; more than 2 groups of electrodes are arranged on the secondary crucible, and the heating of different sections on the secondary crucible can be controlled in a segmented manner; the heating temperature in the secondary crucible is 100-400 ℃ higher than that in the primary crucible.
The first-stage crucible melts the wire material conveyed by the wire feeding mechanism into melt, and the melt is injected into the second-stage crucible 1 through a melt flow pipe; the melt is heated and evaporated in the secondary crucible 1 to realize evaporation coating. A water-cooling baffle 6 is arranged between the second-stage crucible and the first-stage crucible, and a heat insulation layer is arranged on one side of the first-stage crucible of the water-cooling baffle 6. The outer surface of the melt flow pipe is wrapped with a heat insulation layer.
The evaporation coating machine of the linear evaporation source mainly comprises a coating chamber 11, the linear evaporation source 7, a control system 9, a film thickness detection device 8 and a vacuum system 12. No correction baffle or shield plate is provided between the linear evaporation source and the substrate. The film thickness detection device 8 is arranged at the downstream of the coating path of the evaporation coating machine where the linear evaporation source 7 is positioned, and can detect the film thickness of the film deposited on the substrate; the control system 9 can acquire film thickness detection data in real time and intelligently regulate and control the linear evaporation source 7 according to the film thickness detection data; the film thickness detection data includes film thickness data of each portion in the width direction of the plating film. Each wire feeding mechanism is provided with a speed regulating motor 10, and the rotating speed of the speed regulating motor is regulated and controlled by a control system.
The wire feeding speed of each wire feeding mechanism is independently regulated and controlled by the control system according to the film thickness detection data; when the film thickness of a certain part in the width direction of the coating film is thin, the control system can control the wire feeding speed of the wire feeding mechanism corresponding to the part to be accelerated; when the film thickness of a certain part in the width direction of the coating film is thicker, the control system can control the wire feeding speed of the wire feeding mechanism corresponding to the part to be reduced.
Heating of different sections on the secondary crucible is independently regulated and controlled by the control system according to the film thickness detection data; when the film thickness of a certain part in the width direction of the coating film is thinner, the control system can control the heating temperature of the section of the secondary crucible corresponding to the part to be increased; when the film thickness of a certain part in the width direction of the coating film is thicker, the control system can control the heating temperature of the section of the secondary crucible corresponding to the part to be reduced.
The flow control valve on the melt flow pipe communicated between each first-stage crucible and each second-stage crucible is independently regulated and controlled by a control system according to the film thickness detection data; when the film thickness of a certain part in the width direction of the coating film is thin, the control system can control the flow in the melt flow pipe corresponding to the part to be increased; when the film thickness of a certain part in the width direction of the coating film is thicker, the control system controls the flow rate of the molten liquid flow pipe corresponding to the part to be reduced.
Target distribution data of film thickness and an evaporation material database are preset in the control system; the control system calculates the evaporation rate adjustment quantity of each section of the secondary crucible according to the difference between the film thickness detection data and the target distribution data acquired in real time and the physical property parameters of the evaporation materials; then the control system regulates and controls the heating temperature of different sections on the secondary crucible, the wire feeding speed of each wire feeding mechanism and the flow control valve of the melt flow pipe based on the evaporation rate regulating quantity, thereby realizing the closed-loop intelligent control of the linear evaporation source.
In the embodiment shown in fig. 3, the evaporation coater where the linear evaporation source is located is a roll-to-roll type coating equipment, and the substrate is a flexible base film. The evaporation coating machine can also be a linear multi-chamber continuous vacuum coating device, and the substrate can be glass, organic glass, a metal sheet, acrylic or other forms conveyed linearly.
An online closed-loop control chain is formed by the linear evaporation source, the control system and the film thickness detection device, the control system regulates and controls the heating temperature of different sections on the secondary crucible at any time according to film thickness detection data, and simultaneously regulates and controls the wire feeding speed of each wire feeding mechanism and the flow of the molten liquid flow pipe to be matched, so that the closed-loop intelligent regulation and control of the evaporation rate of each section of the linear evaporation source in the width direction of the coating film are realized, the influence of the cosine law of the evaporation source on the film thickness distribution is overcome, and the film thickness distribution of the substrate in the width direction of the coating film is uniform or reaches the preset target film thickness distribution.

Claims (8)

1. A linear evaporation source mainly comprises a secondary crucible, a wire feeding mechanism and a primary crucible; the second-stage crucible is a long-strip trough body, and the length direction of the second-stage crucible is consistent with the width direction of the coating film; more than 2 wire feeding mechanisms are arranged side by side along the width direction of the coating film, and 1 primary crucible is arranged below each wire feeding mechanism; the second-stage crucible is positioned below the first-stage crucible; the bottom of the first-stage crucible is provided with a melt flow pipe, the other end of the melt flow pipe is communicated with the side wall of the second-stage crucible, and the melt flow pipe is provided with a flow control valve; a water-cooling baffle is arranged between the second-stage crucible and the first-stage crucible.
2. The linear evaporation source according to claim 1, wherein: the evaporation coating machine where the linear evaporation source is located is provided with a film thickness detection device at the downstream of the coating path, and can detect the film thickness of the film deposited on the substrate; the evaporation coating machine is also provided with a control system, and the control system can acquire film thickness detection data in real time and intelligently regulate and control the linear evaporation source according to the film thickness detection data.
3. The linear evaporation source according to claim 1, wherein: more than 2 groups of electrodes are arranged on the secondary crucible, and the heating of different sections on the secondary crucible can be controlled in a segmented manner.
4. The linear evaporation source according to claim 1, wherein: the first-stage crucible melts the wire material conveyed by the wire feeding mechanism into melt, and the melt is injected into the second-stage crucible through a melt flow pipe; the melt is heated and evaporated in a secondary crucible to realize evaporation coating.
5. The linear evaporation source according to claim 2, wherein: each wire feeding mechanism is provided with a speed regulating motor, and the rotating speed of the speed regulating motor is regulated and controlled by a control system.
6. The linear evaporation source according to claim 2, wherein: and the heating of different sections on the secondary crucible is independently regulated and controlled by the control system according to the film thickness detection data.
7. The linear evaporation source according to claim 2, wherein: and the flow control valve on the melt flow pipe communicated between each first-stage crucible and each second-stage crucible is independently regulated and controlled by a control system according to the film thickness detection data.
8. The linear evaporation source according to claim 2, wherein: target distribution data of film thickness and an evaporation material database are preset in the control system; the control system calculates the evaporation rate adjustment quantity of each section of the secondary crucible according to the difference between the film thickness detection data and the target distribution data acquired in real time and the physical property parameters of the evaporation materials; and then the control system regulates and controls the heating temperature of different sections on the secondary crucible, the wire feeding speed of each wire feeding mechanism and the flow control valve of the melt flow pipe based on the evaporation rate regulating quantity, so that the closed-loop intelligent controllability of the linear evaporation source is realized.
CN202121094817.1U 2021-05-21 2021-05-21 Linear evaporation source Active CN215628252U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202121094817.1U CN215628252U (en) 2021-05-21 2021-05-21 Linear evaporation source

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202121094817.1U CN215628252U (en) 2021-05-21 2021-05-21 Linear evaporation source

Publications (1)

Publication Number Publication Date
CN215628252U true CN215628252U (en) 2022-01-25

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Application Number Title Priority Date Filing Date
CN202121094817.1U Active CN215628252U (en) 2021-05-21 2021-05-21 Linear evaporation source

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Address after: No. C5-1, No. 158 Puhe Road, Shenbei New District, Shenyang City, Liaoning Province, 110142

Patentee after: Bosuye Technology (Shenyang) Co.,Ltd.

Address before: 110142 No. 37-1, Kaifa 23rd Road, Shenyang Economic and Technological Development Zone, Liaoning Province

Patentee before: Bosuye Technology (Shenyang) Co.,Ltd.