CN215545785U - Optical system and laser processing equipment - Google Patents
Optical system and laser processing equipment Download PDFInfo
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- CN215545785U CN215545785U CN202120247650.1U CN202120247650U CN215545785U CN 215545785 U CN215545785 U CN 215545785U CN 202120247650 U CN202120247650 U CN 202120247650U CN 215545785 U CN215545785 U CN 215545785U
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/064—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms
- B23K26/0643—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms comprising mirrors
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Abstract
The embodiment of the utility model relates to the technical field of laser processing, in particular to an optical system and laser processing equipment. The utility model provides an optical system and laser processing equipment, wherein the optical system comprises a reflector, a first lens group and a second lens group which are sequentially arranged along an optical axis from an object side to an image side, the first lens group has negative focal power, the second lens group has positive focal power, a reverse telephoto structure is formed, the back intercept is enlarged while the short focal length is ensured during processing of the laser processing equipment using the optical system, namely, the distance between a processed workpiece and the optical system is increased, the reflector has a swinging shaft parallel to the reflector, and the reflector swings by taking the swinging shaft as a center according to a preset angle, so that the scanning position of the focus of a laser beam in a view field range is changed, and large-area processing of the processed workpiece is facilitated.
Description
Technical Field
The embodiment of the utility model relates to the technical field of laser processing, in particular to an optical system and laser processing equipment.
Background
In the laser processing process, a laser beam has high energy density in order to rapidly melt a workpiece, and a general unit area beam has high energy density, but because a focused light spot is small and a conventional processing area is large, a contradiction exists between the two, and the mode of motion is needed to compensate for the contradiction. One compensation mode is that the laser focusing beam does not move, and the processing workpiece moves, namely the processing workpiece moves to a position required to be processed; another form of compensation is that the workpiece to be machined does not move, and the laser focused beam moves, i.e., the focused beam of laser is scanned to the position where machining is required.
The latter is often adopted in the two motion forms because the latter has higher processing efficiency, namely, the scanning of the laser focusing spot can be carried out, and simultaneously, the edge spot can be ensured not to be distorted, thereby realizing the requirements of fast processing and large processing range. However, in this form, the focal length of the laser is often short, but in the conventional theory, the focal length and the back intercept are in direct proportion, so that the back intercepts of the processed workpiece and the optical lens are also short, namely the optical lens is close to the processing heat source and is easy to damage.
SUMMERY OF THE UTILITY MODEL
In view of the foregoing defects in the prior art, an embodiment of the present invention mainly solves the technical problem of providing an optical system and a laser processing apparatus, which achieve the purposes of short focal length and long back intercept and increase the distance between the processed workpiece and the optical system.
The purpose of the novel embodiment is realized by the following technical scheme:
in order to solve the above technical problem, according to a first aspect, an embodiment of the present invention provides an optical system, including a mirror, a first lens group, and a second lens group, which are sequentially disposed along an optical axis from an object side to an image side: the first lens group has negative focal power; the second lens group has positive focal power; the reflector is provided with a swinging shaft parallel to the reflector, and the reflector swings by taking the swinging shaft as a center according to a preset angle.
In some embodiments, the mirror oscillates back and forth by a preset angle ± 10 °.
In some embodiments, the lens further includes a planar lens disposed on an image side of the second lens group along an optical axis.
In some embodiments, the distance from the center of the mirror to the center of the planar lens is 90-130 mm.
In some embodiments, the first lens group comprises a first lens, the second lens group comprises a second lens and a third lens;
the first lens is a biconcave lens or a plano-concave lens, wherein a plane of the plano-concave lens is close to the object side, and a concave surface of the plano-concave lens is close to the image side;
the second lens has positive focal power, and is a first meniscus lens or a double convex lens, wherein the concave surface of the first meniscus lens is close to the object side, and the convex surface of the first meniscus lens is close to the image side;
the third lens has positive focal power, and is a biconvex lens or a second meniscus lens, wherein a concave surface of the second meniscus lens is close to the object side, and a convex surface of the second meniscus lens is close to the image side.
In some embodiments, the optical system satisfies the following relationship:
5mm＜d1＜30mm，
5mm＜d2＜30mm，
0.5mm＜d3＜2mm；
wherein d is1Is the distance from the center of the reflector to the optical center of the first lens, d2Is the distance from the optical center of the first lens to the optical center of the second lens, d3The distance between the optical center of the second lens and the optical center of the third lens is obtained.
In some embodiments, the effective focal length of the optical system is 30-60mm, the full field angle of the optical system is 0-10 °, and the entrance pupil diameter of the optical system is 2-15 mm.
In some embodiments, the optical system further includes a collimating lens group disposed on a side of the reflector facing the object side.
In some embodiments, the multi-wavelength device further includes a multi-wavelength component disposed on an object side of the collimating lens group, and the multi-wavelength component includes at least one positive lens and one negative lens.
In some embodiments, the laser machining apparatus comprises the optical system of any one of the above.
The beneficial effects of the embodiment of the utility model are as follows: in contrast to the prior art, an embodiment of the present invention provides an optical system and a laser processing apparatus, where the optical system includes a reflector, a first lens group, and a second lens group sequentially arranged along a first optical axis from an object side to an image side, where the first lens group has negative focal power, and the second lens group has positive focal power, so as to form a telephoto structure, so that a back focal length of the optical system is ensured, and a back focal length is increased, that is, a distance between a processed workpiece and the optical system is increased, the reflector has a swing axis parallel to the reflector, and the reflector swings around the swing axis by a preset angle, so as to change a scanning position of a focus of a laser beam within a field of view, thereby facilitating processing of the processed workpiece in a large area.
Drawings
One or more embodiments are illustrated by the accompanying figures in the drawings that correspond thereto and are not to be construed as limiting the embodiments, wherein elements/modules and steps having the same reference numerals are represented by like elements/modules and steps, unless otherwise specified, and the drawings are not to scale.
Fig. 1 is a schematic structural diagram of an optical system according to an embodiment of the present invention;
FIG. 2 is a schematic diagram of an optical system according to another embodiment of the present invention;
FIG. 3 is a schematic diagram of an optical system according to another embodiment of the present invention;
FIG. 4 is a graph of field curvature and distortion for the optical system of FIG. 1;
fig. 5 is a dot diagram of the optical system of fig. 4.
Detailed Description
The present invention will be described in detail with reference to specific examples. The following examples will assist those skilled in the art in further understanding the utility model, but are not intended to limit the utility model in any way. It should be noted that variations and modifications can be made by persons skilled in the art without departing from the spirit of the utility model. All falling within the scope of the present invention.
In order to facilitate an understanding of the present application, the present application is described in more detail below with reference to the accompanying drawings and specific embodiments. Unless defined otherwise, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this application belongs. The terminology used in the description of the present application is for the purpose of describing particular embodiments only and is not intended to be limiting of the application. As used herein, the term "and/or" includes any and all combinations of one or more of the associated listed items.
It should be noted that, if not conflicted, the various features of the embodiments of the utility model may be combined with each other within the scope of protection of the present application. In addition, although the functional blocks are divided in the device diagram, in some cases, the blocks may be divided differently from those in the device. Further, the terms "first," "second," and the like, as used herein, do not limit the data and the execution order, but merely distinguish the same items or similar items having substantially the same functions and actions.
The optical system provided by the utility model can be an optical system for laser welding, an optical system for laser cutting, an optical system for laser cladding or an optical system for laser engraving, and is not limited in practical use.
Referring to fig. 1, an optical system 100 includes a reflector 10, a first lens group 20, a second lens group 30, and a planar lens 40, wherein the reflector 10, the first lens group 20, and the second lens group 30 are sequentially disposed along a first optical axis from an object side to an image side, the planar lens 40 is disposed along the first optical axis at the image side of the second lens group 30, the first lens group 20 has negative power, and the second lens group 30 has positive power.
When the optical system 100 works, the laser source emits a laser beam to the reflector 10, the reflector 10 reflects the laser beam to the first lens group 20, the reflected laser beam sequentially passes through the first lens group 20, the second lens group 30 and the plane lens 40 to be transmitted to a workpiece to be machined, the laser beam forms a focus on the workpiece to be machined, and therefore the workpiece to be machined is machined, and in order to ensure balance between the total length and aberration of the optical system 100, in some embodiments, the distance from the center of the reflector 10 to the center of the plane lens 40 is 90-130 mm.
For example, when welding a workpiece to be machined, a laser beam forms a focus at a gap position of the workpiece to be machined, the surface of the workpiece to be machined is heated, surface heat is guided to the inside of the workpiece to be machined through heat conduction and diffused, and a part of the workpiece to be machined at the gap position is melted so as to weld a corresponding gap of the workpiece to be machined.
For another example, when cutting the workpiece to be processed, the laser beam forms a focus at the cutting position of the workpiece to be processed, the surface of the workpiece to be processed is heated in a specific range by using the high energy density of the laser beam, the surface heat is diffused into the workpiece to be processed through heat conduction, so that the workpiece to be processed is melted, and the workpiece to be processed is cut.
It will be appreciated that the laser source may be a laser source produced by various types of lasers.
In the present embodiment, since the first lens group 20 has negative focal power and the second lens group 30 has positive focal power, both of which constitute a reverse telephoto structure, the optical system 100 can relatively ensure a short focal length while improving the back intercept, i.e., increasing the distance between the processing workpiece and the optical system, and therefore, since the distance between the optical system 100 and the workpiece to be processed is relatively long, the optical system 100 is relatively far away from the heat source, thereby preventing the heat source from damaging the optical system 100, and improving the service life, the operational reliability, the damage tolerance and the safety factor of the optical system 100.
It is understood that in the present embodiment, the mirror 10 is rotatably installed in the optical system 100.
In some embodiments, the mirror 10 has a swing axis parallel to the mirror 10, i.e. the axis of the swing axis is parallel to the plane of the mirror 10, as shown in fig. 1, the mirror 10 can swing around the swing axis by a predetermined angle, for example, the mirror 10 swings counterclockwise around the swing axis or swings clockwise around the swing axis, thereby changing the scanning position of the focal point of the laser beam within the field of view.
In some embodiments, the mirror 10 swings at any suitable predetermined angle, and the laser beam is reflected by the mirror 10 and then scanned within the field of view formed by the first lens group 20, the second lens group 30 and the plane lens 40. Because the first lens group 20, the second lens group 30 and the plane lens 40 form the flat field lens group, the focused light spots formed at different scanning positions within the field range are within the rayleigh light spot range, that is, the focused light spots formed at different scanning positions within the field range are uniform under the condition that the image surface is uniform. For example, the preset angle is ± 10 °, and when the reflector 10 swings back and forth according to the preset angle ± 10 °, a plurality of focused light spots can be formed at different scanning positions within the field of view, and the focused light spots at different scanning positions have the same diameter. The optical system adopting the structure and the characteristics has important significance for various laser processing scenes. For example, in a laser welding scene, because the diameters of focusing light spots at different scanning positions are consistent, the energy of the light spots at different scanning positions is uniform, and the final welding plane is relatively flat. For another example, in a laser cutting scene, as mentioned above, the energy of the light spots at different scanning positions is uniform, and the burr of the cutting plane is less.
It is understood that the swing angle of the mirror 10 can be set as required, and is not limited to the embodiment of the present invention.
Generally, a user can adjust the magnification of the optical system according to different laser processing scenes, and the smaller the magnification is, the smaller the focal diameter is. Under the condition of the same output energy, the smaller the diameter of the focused light spot is, the higher the energy density of the light spot is, and the easier the laser beam is to weld or cut or mark a workpiece. In some embodiments, the optical system 100 may control a moving track of a focused spot of a laser beam on a workpiece to be processed to meet the requirements of related laser processing scenes, where the moving track includes a straight line shape, a sine shape, a cosine shape, an arc shape, or the like, and the like, in order to reliably and effectively implement laser operation when the welding gap, the cutting width, or the marking width is large and the focused spot is small.
In some embodiments, referring to fig. 1, the first lens group 20 is a first lens, the first lens is a plano-concave lens, the plano-concave lens has negative power, a plane of the plano-concave lens is close to the object side, and a concave surface of the plano-concave lens is close to the image side.
The second lens group 30 includes a second lens 31 and a third lens 32, wherein the second lens 31 is a biconvex lens and has positive focal power, and the third lens 32 is a biconvex lens and also has positive focal power, so that the optical system 100 has fewer lens structures, simple structure, easy adjustment and reduced cost.
Moreover, compared with the single-lens focusing, in the optical system 100, the focusing is performed through the second lens 31 and the third lens 32 under the condition of the same focal length, and the focusing capability of the lens center and the lens edge can be enhanced through the double-lens focusing, so that the imaging quality is better, and the focused light spot is smaller.
Meanwhile, in order to realize an image plane field, that is, to meet the purpose of consistent focusing light spots when the reflecting mirror 10 has different swing amplitudes, a single lens is used for focusing, if the swing amplitudes of the laser beams are the same, the focusing effect can be better by adopting the second lens 31 and the third lens 32 for focusing, and the swing angle required by the reflecting mirror 10 is smaller.
Finally, the first lens 20, the second lens 31 and the third lens 32 are combined to realize a structure of reverse telephoto, the first lens is a negative lens, the laser beam reflected by the reflector is diverged to form an incident beam with a certain divergence angle, the divergence angle of the light incident to the second lens 31 and the spot size to the second lens 31 are increased, and the focal length of an object point is increased. Under the condition of different incident divergence angles, different back intercepts can be formed, so that the back intercepts are prolonged, and the effect of reverse telephoto is achieved.
Meanwhile, according to the ABCD transmission matrix, after the first lens 20 is added, the light beam passes through the second lens 31 and the third lens 32 and needs to be focused at a longer distance, so that the back intercept of the optical system 100 is increased, the distance between the workpiece to be machined and the optical system 100 is longer, and the optical system 100 can be better protected from being damaged by laser returned from the welding operation.
In some embodiments, the first lens 20 may be a biconcave lens having a negative optical power and the second lens having a positive optical power.
The second lens element 31 may be a first meniscus lens element, in which the concave surface of the first meniscus lens element is closer to the object side and the convex surface of the first meniscus lens element is closer to the image side.
The third lens element 32 may be a second meniscus lens element with a positive power, wherein the concave surface of the second meniscus lens element is closer to the object side and the convex surface of the second meniscus lens element is closer to the image side.
In practical applications, the lens types of the first lens 20, the second lens 31 and the third lens 32 can be selected according to practical needs, and need not be limited by the embodiments of the present invention.
In order to further reduce the processing difficulty, in some embodiments, the first lens 20, the second lens 31, and the third lens 32 are all spherical lenses.
In some embodiments, in order to better correct aberrations, aspheric lenses may be used for the first lens 20, the second lens 31, and the third lens 32. In practical applications, the number of spherical lenses in the optical system 100 for laser welding may be set according to needs, and is not limited by the embodiment of the present invention.
In order to ensure that the light beam reflected by the mirror 10 can be taken into the first lens, and be diverged by the first lens 20 and then be focused by the second lens 31 and the third lens 32, in some embodiments, the optical system 100 for laser welding satisfies the following relationship:
5mm＜d1＜30mm，
5mm＜d2＜30mm，
0.5mm＜d3＜2mm；
wherein d1 is the distance from the center of the reflector 10 to the optical center of the first lens 20, d2 is the distance from the optical center of the first lens 20 to the optical center of the second lens 31, and d3 is the distance from the optical center of the second lens 31 to the optical center of the third lens 32.
In practical applications, the total length, the effective focal length, and the full field angle of the optical system 100 can be set according to actual needs, and need not be limited by the embodiments of the present invention.
In order to ensure that the optical system 100 can better receive the input light beam, in some embodiments, the entrance pupil diameter of the optical system 100 is 2-15mm, and since the focal length of the optical system for laser processing and the object space jointly determines the entrance pupil diameter, in practical applications, the entrance pupil diameter of the optical system 100 can be set according to different processing application scenarios, and need not be limited by the embodiments of the present invention.
In some embodiments, the effective focal length of the optical system 100 is 30-60mm, the full field angle is 0 ° -10 °, and the entrance pupil diameter is 2-15 mm.
Because the effective focal length and the entrance pupil diameter of the optical system 100 are small, not only can the short-focus condition and the high energy density per unit area required during operation be ensured, but also the optical system 100 can easily receive the laser beam output by the laser. Meanwhile, the full field angle of the optical system 100 is 0-10 degrees, the required range of laser scanning can be achieved, for example, in the machining process, focusing light spot scanning can be performed through rotation of the reflector, and meanwhile, the machining speed can be adjusted through controlling the swinging frequency, so that the requirement of rapid machining is met.
In some embodiments, referring to fig. 2, the optical system 100 further includes a collimating lens group 50 and a quartz rod 60, the collimating lens group 50 is disposed on a side of the reflector 10 facing the object side, and the quartz rod 60 is disposed on the object side of the collimating lens group 50, wherein the collimating lens group 50 is configured to collimate the laser light emitted by the laser, and the quartz rod 60 is configured to transmit the laser light generated by the laser to the optical system 100.
In an actual processing process, lasers with different wavelengths are often used, and since the refractive index of the lens changes along with the change of the wavelength, the lights with different wavelengths form different focusing points in the direction of the optical axis, that is, axial chromatic aberration is generated, so that the energy density of the lights on a processing surface is reduced. In order to make the optical system 100 have better processing effect on light with different wavelengths and reduce axial chromatic aberration, referring to fig. 3, the optical system 100 further includes a multi-wavelength component 70, the multi-wavelength component 70 is disposed on the object side of the collimating lens group 50, and the multi-wavelength component 70 at least includes a positive lens and a negative lens, and the multi-wavelength component 70 is used for correcting axial chromatic aberration of the multi-wavelength light beam. The positive lens may be a meniscus lens or a biconvex lens, wherein a concave surface of the meniscus lens is close to the image side, and a convex surface of the meniscus lens is close to the object side. The negative lens is a biconcave lens or a plano-concave lens, wherein the plane of the plano-concave lens is close to the object side, the concave surface of the plano-concave lens is close to the image side, the image side is the side close to the workpiece to be machined, and the object side is the side close to the laser source. By adopting the multi-wavelength component 70, the chromatic aberration can be corrected, and the focused light spot resolution ratio is effectively improved.
In some embodiments, referring to FIG. 3, the multi-wavelength device 70 includes a first multi-wavelength lens 71, the first multi-wavelength lens 71 is a negative lens, and the first multi-wavelength lens 71 is disposed between the collimating lens assembly 50 and the quartz rod 60, and both sides of the first multi-wavelength lens are concave.
In some embodiments, referring to fig. 3, the multi-wavelength device 70 includes a second multi-wavelength lens 72, the second multi-wavelength lens 72 is a positive lens, the second multi-wavelength lens 72 is disposed between the collimating lens group 50 and the first multi-wavelength lens 71 and is a meniscus lens, wherein a concave surface of the meniscus lens is close to the image side, and a convex surface of the meniscus lens is close to the object side.
In this embodiment, by the action of the first multi-wavelength lens 71, the second multi-wavelength lens 72 and the collimating lens group 50, divergence angles of the collimated lasers with different wavelengths are greatly compressed, so that the lasers with the same magnification can be amplified without adjustment, and the problem that the subsequent amplification magnifications are inconsistent due to the overlarge divergence angles is avoided. Moreover, the optical system 100 can be compatible with the input of the multi-wavelength laser through the first multi-wavelength lens 71 and the second multi-wavelength lens 72, and meets the processing scenes of various types of multi-wavelength lasers.
In order to illustrate the imaging quality of the optical system provided by the embodiment of the present invention in detail, the following description is made with reference to fig. 4 and 5:
the optical system provided by the embodiment can be compatible with laser with the wavelengths of 915nm, 975nm and 1080 nm. Referring to fig. 4, under the condition of the same energy output, the laser beams with the wavelengths of 915nm, 975nm and 1080nm are respectively input into the optical system to obtain the dot sequence chart as shown in fig. 5, the dot sequence chart reflects the imaging geometry of the optical system, in the image quality evaluation, the density degree of the dot sequence chart can be used for more intuitively reflecting and measuring the imaging quality of the system, and the smaller the RMS radius of the dot sequence chart is, the smaller the aberration is, the better the imaging quality of the system is.
As shown in fig. 4, the RMS radius is controlled to be 11.85 micrometers, that is, each field of view of the optical system for laser welding has a small spot, aberration correction is good, and the focusing quality of the optical system for laser welding is good, so that the requirement of the size of the laser spot in the welding process can be met.
As shown in fig. 5, the left side of fig. 5 is a field curvature curve, the right side is a distortion curve, the field curvature is an aberration of the object plane forming a curved surface image, and is characterized by a tangential field curvature and a sagittal field curvature, which are too large to seriously affect the off-axis light imaging quality of the optical system. As shown in fig. 5, the field curvature is less than 20 μm, and the distortion is less than 5%, so that the field distortion of the optical system in this embodiment is small, the focusing effect is good, and the requirement of laser focusing spots can be met.
From the above data, the optical system 100 has a simple structure, a good focusing effect and can satisfy the requirement of a long back intercept.
An embodiment of the present invention further provides a laser processing apparatus, where the laser processing apparatus includes the optical system according to any of the above embodiments.
It should be noted that the above-described device embodiments are merely illustrative, where the units described as separate parts may or may not be physically separate, and the parts displayed as units may or may not be physical units, may be located in one place, or may be distributed on multiple network units. Some or all of the modules may be selected according to actual needs to achieve the purpose of the solution of the present embodiment.
Finally, it should be noted that: the above examples are only intended to illustrate the technical solution of the present invention, but not to limit it; within the idea of the utility model, also technical features in the above embodiments or in different embodiments may be combined, steps may be implemented in any order, and there are many other variations of the different aspects of the utility model as described above, which are not provided in detail for the sake of brevity; although the present invention has been described in detail with reference to the foregoing embodiments, it will be understood by those of ordinary skill in the art that: the technical solutions described in the foregoing embodiments may still be modified, or some technical features may be equivalently replaced; and the modifications or the substitutions do not make the essence of the corresponding technical solutions depart from the scope of the technical solutions of the embodiments of the present invention.
Claims (10)
1. An optical system includes a mirror, a first lens group, and a second lens group, which are arranged in this order along an optical axis from an object side to an image side:
the first lens group has negative focal power;
the second lens group has positive focal power;
the reflector is provided with a swinging shaft parallel to the reflector, and the reflector swings by taking the swinging shaft as a center according to a preset angle.
2. The optical system of claim 1, wherein the mirror oscillates back and forth by a preset angle ± 10 °.
3. The optical system according to claim 1, further comprising a planar lens disposed on an image side of the second lens group along an optical axis.
4. The optical system of claim 3, wherein the distance from the center of the mirror to the center of the planar lens is 90-130 mm.
5. The optical system according to claim 1, wherein the first lens group includes a first lens, and the second lens group includes a second lens and a third lens;
the first lens is a biconcave lens or a plano-concave lens, wherein a plane of the plano-concave lens is close to the object side, and a concave surface of the plano-concave lens is close to the image side;
the second lens has positive focal power, and is a first meniscus lens or a double convex lens, wherein the concave surface of the first meniscus lens is close to the object side, and the convex surface of the first meniscus lens is close to the image side;
the third lens has positive focal power, and is a biconvex lens or a second meniscus lens, wherein a concave surface of the second meniscus lens is close to the object side, and a convex surface of the second meniscus lens is close to the image side.
6. The optical system according to claim 5, wherein the optical system satisfies the following relationship:
5mm＜d1＜30mm，
5mm＜d2＜30mm，
0.5mm＜d3＜2mm;
wherein d is1Is the distance from the center of the reflector to the optical center of the first lens, d2Is the distance from the optical center of the first lens to the optical center of the second lens, d3The distance between the optical center of the second lens and the optical center of the third lens is obtained.
7. The optical system of claim 1, wherein the effective focal length of the optical system is 30-60mm, the full field angle of the optical system is 0-10 °, and the entrance pupil diameter of the optical system is 2-15 mm.
8. The optical system of claim 1, further comprising a collimating lens group disposed on an object-side of the mirror.
9. The optical system of claim 8, further comprising a multi-wavelength component disposed on an object side of the collimating lens group, wherein the multi-wavelength component comprises at least one positive lens and one negative lens.
10. A laser machining apparatus comprising an optical system according to any one of claims 1 to 9.
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| CN101762878B (en) * | 2010-01-25 | 2012-10-03 | 深圳市大族激光科技股份有限公司 | Laser beam expanding system |
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