CN215404651U - Calibration assembly for crystal growth furnace and crystal growth furnace assembly - Google Patents
Calibration assembly for crystal growth furnace and crystal growth furnace assembly Download PDFInfo
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- CN215404651U CN215404651U CN202120276771.9U CN202120276771U CN215404651U CN 215404651 U CN215404651 U CN 215404651U CN 202120276771 U CN202120276771 U CN 202120276771U CN 215404651 U CN215404651 U CN 215404651U
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Abstract
The utility model discloses a calibration assembly for a crystal growth furnace and a crystal growth furnace assembly, wherein the calibration assembly comprises: the body, the body includes base and calibration ring, the base is suitable for to be installed epaxial of crucible, the calibration ring is a plurality of and all establishes keeping away from of base one side of crucible axle is a plurality of the cooperation is established to the coaxial setting of calibration ring and interior overcoat, and every the axis of calibration ring be suitable for with the axis of crucible axle is parallel. The calibration assembly for the crystal growth furnace is simple in structure, convenient to use, capable of conveniently and accurately calibrating the monitoring device and accurate in calibration.
Description
Technical Field
The utility model relates to the technical field of crystal growth furnaces, in particular to a calibration assembly for a crystal growth furnace and a crystal growth furnace assembly.
Background
The silicon single crystal is a vital raw material in the semiconductor industry, the main production method of the existing single crystal silicon is a Czochralski method, firstly, polycrystalline silicon which is a raw material is put into a quartz crucible to be heated and melted, then, seed crystals with the diameter of about 10mm are immersed on the liquid level, the seed crystals and the melt reach thermal equilibrium at a proper temperature, the liquid level can be adsorbed below the seed crystals under the action of surface tension, then, the seed crystals are rotated and lifted upwards, the adsorbed liquid can also move upwards along with the seed crystals, so that a supercooled state is formed, silicon atoms with the supercooled state can form regular crystals on a solid-liquid interface along the arrangement structure of the seed crystals, and a cylindrical silicon single crystal is formed in a repeated way.
In order to obtain a stable and qualified product, in the crystal growth process, diameter measurement and seed crystal centering are strictly monitored, but in the prior art, no standard tool exists for installation, calibration and the like of a CCD for measuring the diameter, a plastic plate is generally adopted as a reference surface in a graphite crucible, the distance between the reference surface and the CCD is measured by a caliper, and the calibration is carried out by manually observing the result, so that the error is large.
SUMMERY OF THE UTILITY MODEL
The present invention is directed to solving at least one of the problems of the prior art.
Therefore, the calibration assembly for the crystal growth furnace is simple in structure, convenient to use, capable of achieving calibration of the monitoring device, accurate in calibration and beneficial to improvement of crystal quality.
The utility model also provides a crystal growth furnace assembly with the calibration assembly.
According to the calibration assembly for the crystal growth furnace, the crystal growth furnace comprises a crucible shaft and a crucible, the crucible shaft is used for driving the crucible to move along the axial direction of the crucible shaft and rotate around the axis of the crucible shaft, and the calibration assembly comprises: the body, the body includes base and calibration ring, the base is suitable for to be installed epaxial of crucible, the calibration ring is a plurality of and all establishes keeping away from of base one side of crucible axle is a plurality of the coaxial setting of calibration ring sets up at the inside and outside interval, and every the axis of calibration ring be suitable for with the axis of crucible axle is parallel.
According to the calibration assembly for the crystal growth furnace, provided by the embodiment of the utility model, the plurality of calibration rings are arranged, and the monitoring device is used for measuring the diameters of the plurality of calibration rings so as to realize multiple calibration, so that the calibration assembly is simple in structure, convenient to use and accurate in calibration, and is beneficial to improving the quality of crystals produced by the crystal growth furnace.
Further, the calibration assembly further comprises: the light source is arranged on the body.
Further, the light source includes: the light source group, the light source group is established on the base, and at least adjacent two be equipped with between the calibration ring the light source group, the light source group includes the edge a plurality of light source spare that the circumference interval of calibration ring set up.
In some embodiments, the calibration ring is a piece of non-metallic material.
In some embodiments, the calibration assembly further comprises: the distance measuring device is arranged on the body and is used for measuring the distance between the distance measuring device and the guide cylinder of the crystal growth furnace in the moving direction of the crucible shaft. In some embodiments, the calibration assembly further comprises: the revolution counting device is used for measuring the revolution of the body and comprises a transmitter and a receiver, the receiver is matched with the transmitter to receive a signal sent by the transmitter, one of the transmitter and the receiver is arranged on the body, and the other of the transmitter and the receiver is suitable for being arranged on a furnace body of the crystal growth furnace.
In some embodiments, at least one centering calibration ring is arranged on the surface of one side of the base far away from the crucible shaft, each centering calibration ring is coaxially arranged with the calibration circular ring, and the centering calibration ring is suitable for being matched with a seed crystal of the crystal growth furnace to calibrate the coaxiality of the centering calibration ring and the seed crystal; optionally, the number of the centering calibration rings is one, or the number of the centering calibration rings is multiple, and the plurality of the centering calibration rings are arranged at intervals inside and outside the centering calibration ring.
Further, the diameter d of the innermost centering calibration ring satisfies: d is more than or equal to 1mm and less than or equal to 3 mm.
In some embodiments, the base is formed as a plate-like structure, the body further comprising: the support ring is arranged on the body and is positioned on the outer side of the plurality of calibration circular rings.
The crystal growth furnace assembly according to the embodiment of the second aspect of the utility model comprises: the crystal growth furnace comprises a furnace body and a monitoring device arranged on the furnace body, wherein the monitoring device is used for acquiring the diameter of a crystal; the calibration assembly is used for the crystal growth furnace according to the embodiment and at least used for calibrating the monitoring device.
According to the crystal growth furnace assembly disclosed by the embodiment of the second aspect of the utility model, the calibration assembly is adopted, so that the monitoring device can be calibrated for many times, the structure is simple, the use is convenient, the calibration is accurate, and the improvement of the quality of crystals produced by the crystal growth furnace is facilitated.
Additional aspects and advantages of the utility model will be set forth in part in the description which follows and, in part, will be obvious from the description, or may be learned by practice of the utility model.
Drawings
The above and/or additional aspects and advantages of the present invention will become apparent and readily appreciated from the following description of the embodiments, taken in conjunction with the accompanying drawings of which:
FIG. 1 is a front view of a calibration assembly according to one embodiment of the present invention.
FIG. 2 is a cross-sectional view of a calibration assembly according to one embodiment of the present invention.
Fig. 3 is a cross-sectional view of a crystal growth furnace and alignment assembly according to one embodiment of the present invention.
Reference numerals:
a calibration assembly 100, a crystal growth furnace 200,
A body 1, a base 11, a calibration ring 12,
A distance measuring device 2, a support ring 3,
Revolution counter 4, transmitter 41, receiver 42,
A centering calibration ring 5,
A light source 6, a light source group 61, a light source unit 611,
Furnace body 20, crucible shaft 21, seed crystal 22, monitoring device 23, observation window 24, draft tube 25.
Detailed Description
Reference will now be made in detail to embodiments of the present invention, examples of which are illustrated in the accompanying drawings, wherein like or similar reference numerals refer to the same or similar elements or elements having the same or similar function throughout. The embodiments described below with reference to the accompanying drawings are illustrative only for the purpose of explaining the present invention, and are not to be construed as limiting the present invention.
In the description of the present invention, it should be noted that, unless otherwise explicitly specified or limited, the terms "mounted," "connected," and "connected" are to be construed broadly, e.g., as meaning either a fixed connection, a removable connection, or an integral connection; can be mechanically or electrically connected; they may be connected directly or indirectly through intervening media, or they may be interconnected between two elements. The specific meanings of the above terms in the present invention can be understood in specific cases to those skilled in the art.
The calibration assembly 100 and the crystal growth furnace assembly for the crystal growth furnace 200 according to the embodiment of the utility model are described below with reference to fig. 1 to 3.
As shown in fig. 1-3, according to the calibration assembly 100 for the crystal growth furnace 200 of the embodiment of the utility model, the crystal growth furnace 200 comprises a crucible shaft 21 and a crucible, the crucible shaft 21 is used for driving the crucible to move along the axial direction of the crucible shaft 21 and rotate around the axis of the crucible shaft 21, and the calibration assembly 100 comprises a body 1 and a distance measuring device 2. The body 1 comprises a base 11 and a calibration ring 12, the base 11 is suitable for being installed on a crucible shaft 21, the calibration ring 12 is a plurality of and a plurality of calibration rings 12 are all arranged on one side of the base 11 far away from the crucible shaft 21, the calibration rings 12 are coaxially arranged, the calibration rings 12 are arranged at intervals, the axis of each calibration ring 12 is suitable for being parallel to the axis of the crucible shaft 21, and the diameters of the calibration rings 12 are different.
In the description of the present application, the term "plurality" means two or more. For example, in the example of fig. 1, there are three calibration rings 12; of course, the calibration ring 12 may be provided in two, or more than three. From this, through setting up calibration ring 12 to a plurality ofly, can realize the many times calibration to monitoring devices 23 of monitoring crystal growth condition in the calibration process of once, be favorable to promoting the calibration precision to monitoring devices 23.
Specifically, when the crystal growth furnace 200 works, the crucible shaft 21 is used for driving the crucible to move along the axial direction of the crucible shaft 21 and rotate around the axis of the crucible shaft 21, when the crystal growth furnace 200 is calibrated, the crucible is not installed at the moment, the calibration assembly 100 is installed on the crucible shaft 21, and the installation modes of the calibration assembly 100 and the crucible shaft 21 can adopt various modes such as threaded connection, insertion connection and the like. Have the monitoring devices 23 that carry out monitoring to crystal growth on crystal growing furnace 200 such as CCD camera, monitoring devices 23 measures the diameter of a plurality of calibration rings 12, carry out corresponding one-to-one comparison with a plurality of measured values and a plurality of actual diameter values of calibration rings 12, calibrate monitoring devices 23, thereby make monitoring devices 23 monitoring status when the calibration and the monitoring status when actual work be more close, be favorable to further promoting the calibration precision to monitoring devices 23, realize the accurate monitoring to crystal diameter, promote the crystal quality.
According to the calibration assembly 100 for the crystal growth furnace 200, provided by the embodiment of the utility model, the plurality of calibration rings 12 are arranged, and the monitoring device 23 measures the diameters of the plurality of calibration rings 12, so that multiple calibration is realized, the structure is simple, the use is convenient, the calibration is accurate, and the improvement of the quality of crystals produced by the crystal growth furnace 200 is facilitated.
It will be understood that the diameters of the calibration rings 12 may be set according to the actual application, for example, the diameters of the calibration rings 12 may be determined according to the parameter diameter set by the monitoring device 23, for example, in the example of fig. 1, the diameters of the three calibration rings 12 are 50mm, 200mm, and 300mm, respectively. Alternatively, in the example of fig. 2, in the axial direction of the calibration ring 12, the ends of the plurality of calibration rings 12 far from the base 11 are flush with each other, that is, the end faces of the ends of the plurality of calibration rings 12 far from the base 11 may be located on the same plane, so as to ensure that the plurality of calibration rings 12 calibrate the monitoring device 23 under the same condition.
According to a further embodiment of the present invention, as shown in fig. 1, the calibration assembly 100 for the crystal growth furnace 200 further comprises: a light source 6, the light source 6 is arranged on the body 1. For example, the light source 6 can be arranged on the base 11 or the calibration ring 12, the light source 6 can provide a better view field for the calibration process, and the light source 6 can simulate the brightness of the solution in the crucible in the crystal growth process to ensure the calibration accuracy. For example, the alignment of the seed crystal 22 can be performed by visual inspection, and the light source 6 is disposed on the body 1 to provide a better visual field and improve the alignment accuracy.
According to a further embodiment of the utility model, as shown in fig. 1, the light source 6 comprises: light source group 61, light source group 61 establish on base 11, and are equipped with light source group 61 between two adjacent calibration rings 12 at least, and light source group 61 includes a plurality of light source parts 611 that set up along calibration ring 12's circumference interval, is favorable to guaranteeing the luminance in the whole field of vision scope. Specifically, the light source unit 611 may be various, preferably, an LED, which has advantages of high brightness, uniform brightness, low power consumption, etc., and is convenient to form the light source group 61. It is understood that the light source 611 is not limited to the illustrated embodiment.
Wherein, the phrase that the light source group 61 is arranged between at least two adjacent calibration rings 12 can be understood as follows: when there are two calibration rings 12, there is a light source group 61 between the two calibration rings 12; when the number of the calibration rings 12 is three or more, the light source group 61 is disposed between every two adjacent calibration rings 12, or the light source group 61 is disposed between a part of two adjacent calibration rings 12, and the light source group 61 is not disposed between another part of two adjacent calibration rings 12.
Optionally, in the example of fig. 1, the plurality of light source devices 611 of the light source group 61 are uniformly spaced along the circumferential direction of the calibration ring 12, which is beneficial to ensure that the brightness in the field of view is uniform.
According to some embodiments of the utility model, the calibration ring 12 is a piece of non-metallic material. Preferably, the calibration ring 12 is a nylon member, which has the advantages of high mechanical strength and fatigue resistance, and the calibration ring 12 is made of black nylon material, so that the light of the light source 6 is not easy to dissipate.
It will be appreciated that the attachment of the calibration ring 12 to the base 11 is of various types, for example, a slotted snap fit on the base 11 may be used.
According to some embodiments of the present invention, the calibration assembly 100 for the crystal growth furnace 200 further comprises: the distance measuring device 2 is arranged on the body 1, and the distance measuring device 2 is used for measuring the distance between the distance measuring device 2 and the guide cylinder 25 of the crystal growth furnace 200 in the moving direction of the crucible shaft 21. For example, the distance measuring device 2 may directly measure the distance between the distance measuring device 2 and the guide cylinder 25 in the moving direction of the crucible shaft 21, or indirectly measure the distance between the distance measuring device 2 and the guide cylinder 25 in the moving direction of the crucible shaft 21, so as to obtain the distance between the body 1 and the guide cylinder 21 in the moving direction of the crucible shaft 21. Specifically, the distance measuring device 2 can measure the distance between the draft tube 25 and the body 1, so that the calibration assembly 100 simulates the position of the crucible when the crystal growth furnace 200 works, in other words, the calibration assembly 100 can be in the seeding crucible position, and then the monitoring device 23 is calibrated, so that the calibration is more accurate. According to some embodiments of the present invention, as shown in fig. 3, the crucible shaft 21 drives the body 1 to rotate synchronously, and the calibration assembly 100 further includes: revolution counting assembly 4, revolution counting assembly 4 are used for measuring the revolution of body 1, because crucible shaft 21 drives body 1 synchronous rotation to can realize the calibration to crucible shaft 21 rotational speed, richened calibration subassembly 100's function. The revolution counting device 4 comprises a transmitter 41 and a receiver 42, the receiver 42 is matched with the transmitter 41 to receive the signal sent by the transmitter 41, one of the transmitter 41 and the receiver 42 is arranged on the body 1, the other one of the transmitter 41 and the receiver 42 is suitable for being arranged on the furnace body 20 of the crystal growth furnace 200, and the revolution counting device 4 is formed into a non-contact sensing device, so that high calibration accuracy of the rotating speed of the crucible shaft 21 is realized.
Specifically, the transmitter 41 may be provided on the main body 1 and the receiver 42 may be provided on the furnace body 20 of the crystal growth furnace 200, or the transmitter 41 may be provided on the furnace body 20 of the crystal growth furnace 200 and the receiver 42 may be provided on the main body 1. Of course, the present application is not limited to this, and the emitter 41 and the receiver 42 may be provided on the calibration module 100, and the reflector may be provided on the furnace body 20 of the crystal growth furnace 200, and similarly, the emitter 41 and the receiver 42 may be provided on the crystal growth furnace 200, and the reflector may be provided on the calibration module 100.
As shown in fig. 3, the emitter 41 is disposed on the calibration ring 12, but it should be understood that the emitter 41 is not limited thereto, for example, the emitter 41 may be disposed on the support ring 3, or the emitter 41 may be disposed on the furnace body 20 of the crystal growth furnace 200. By the cooperation of the transmitter 41 and the receiver 42, the number of rotations per unit time of the calibration assembly 100, or the time taken for a fixed number of rotations, can be calculated for calibrating the rotation speed of the crucible shaft 21. In addition, the measurement result of revolution counting assembly 4 can also be through modes such as network with information transmission to the display screen of controller, and the display screen can show above-mentioned measurement result with digital form, conveniently looks over.
Alternatively, in the example of fig. 2 and 3, a groove is formed in the center of the base 11, and a protrusion is formed on the crucible shaft 21, and the protrusion is inserted into the groove, so that the crucible shaft 21 can drive the body 1 to rotate synchronously. Of course, the manner of installation between the body 1 and the crucible shaft 21 is not limited thereto.
As shown in fig. 3, in some embodiments of the present invention, at least one centering calibration ring 5 is disposed on the surface of the side of the base 11 away from the crucible axis 21, such that the centering calibration ring 5 and the calibration ring 12 are disposed on the same side of the base 11, each centering calibration ring 5 is disposed coaxially with the calibration ring 12, and the centering calibration ring 5 is disposed inside the innermost calibration ring 12, the centering calibration ring 5 being adapted to cooperate with the seed crystal 22 of the crystal growth furnace 200 to calibrate the coaxiality of the centering calibration ring 5 and the seed crystal 22. Specifically, the centering and calibrating ring 5 is suitable for being arranged coaxially with the crucible shaft 21, the central axis of the centering and calibrating ring 5 can represent the central axis of the crucible shaft 21, and the centering and calibrating ring 5 and the seed crystal 22 are centered and calibrated visually through the observation window 24, so that the coaxial rotating shafts of the crucible shaft 21 and the seed crystal 22 are ensured, and the quality of crystals is ensured. Wherein, the centering calibration ring 5 can be formed into a circular ring structure, and during the process of calibrating the seed crystal 22, the seed crystal 22 can be downward close to the centering calibration ring 5, for example, the lower end of the seed crystal 22 can be extended into the centering calibration ring 5, which is beneficial to improving the calibration precision of the seed crystal 22.
It will be understood that the axial height of the centering calibration ring 5 may be specifically set according to actual requirements, for example, the centering calibration ring 5 may be flush with the surface of the base 11, or the centering calibration ring 5 protrudes from the surface of the base 11, only to ensure that the centering calibration ring 5 can be identified in the calibration process.
Alternatively, there is one centering calibration ring 5, which facilitates simplifying the structure of the calibration assembly 100.
Of course, the present application is not so limited; in other embodiments of the present invention, a plurality of centering calibration rings 5 are provided, the plurality of centering calibration rings 5 are arranged at intervals, at this time, the plurality of centering calibration rings 5 may form a target disc structure, and the distance between any two adjacent centering calibration rings 5 may be equal, so that during the centering calibration of the seed crystal 22, the distance and the deviation direction of the seed crystal 22 from the center of the target disc structure are conveniently determined to obtain the deviation position of the seed crystal 22, which is convenient for accurately positioning the position of the seed crystal 22, thereby improving the positioning accuracy and the calibration convenience of the seed crystal 22, and facilitating the improvement of the calibration efficiency. It will of course be appreciated that the distance between any adjacent two of the alignment rings 5 in the plurality of pairs may be unequal, for example, the target disk structure described above may be arranged such that the distance between adjacent pairs of alignment rings 5 increases from the inside to the outside, such that the seed chuck may be adjusted coarsely when the seed crystal 22 is positioned away from the center of the target disk structure, and finely when the seed crystal 22 is positioned closer to the center of the target disk structure.
It should be noted here that the seed crystal holder is a part of the crystal growth furnace 200, and the seed crystal holder holds the seed crystal 22 and drives the seed crystal 22 to move in six directions, i.e., up, down, front, back, left and right, so as to realize the centering and calibration of the seed crystal 22.
Further, the diameter d of the innermost centering calibration ring 5 satisfies: d is more than or equal to 1mm and less than or equal to 3mm, when the centering calibration ring 5 is one, the diameter of the centering calibration ring 5 is d, and when the centering calibration rings 5 are multiple, the diameter of the innermost centering calibration ring 5 is d. Specifically, the centering calibration adopts visual calibration, the diameter of the centering calibration ring 5 is not easy to be too large, and the accuracy of the centering calibration is affected by the too large diameter, so that the visual calibration accuracy is ensured.
It is understood that when the base 11 is provided with the centering calibration ring 5, the light source group 61 may be provided between the centering calibration ring 5 and the adjacent calibration ring 12, or the light source group 61 may not be provided.
According to some embodiments of the present invention, as shown in fig. 1 and 2, the base 11 is formed in a plate-like structure, and the body 1 further includes: and the support ring 3 is arranged on the body 1 and is positioned outside the calibration circular rings 12. Particularly, the arrangement of the support ring 3 can increase the structural strength, facilitate holding, and avoid touching the calibration ring 12, thereby affecting the precision. The support ring 3 and the seat 11 are preferably in a single piece, with better structural strength; it will of course be appreciated that the manner of connection of the support ring 3 and the base 11 is not limited thereto, for example by bolting.
Alternatively, in the example of fig. 2, in the axial direction of the calibration rings 12, one end of the support ring 3 away from the base 11 may be flush with the corresponding ends of the plurality of calibration rings 12, or may be offset from the corresponding ends of the plurality of calibration rings 12, so as to achieve flexible arrangement of the support ring 3.
The crystal growth furnace assembly according to the embodiment of the second aspect of the utility model comprises: the crystal growth furnace 200 comprises a furnace body 20 and a monitoring device 23 arranged on the furnace body 20, the monitoring device 23 is used for acquiring the diameter of the crystal, the calibration assembly 100 is the calibration assembly 100 for the crystal growth furnace 200 according to the first aspect of the utility model, and the calibration assembly 100 is at least used for calibrating the monitoring device 23.
According to the crystal growth furnace assembly provided by the embodiment of the utility model, the monitoring device 23 can be calibrated for multiple times by adopting the calibration assembly 100, the structure is simple, the use is convenient, the calibration is accurate, and the improvement of the quality of crystals produced by the crystal growth furnace 200 is facilitated.
It should be noted that "the calibration assembly 100 is at least used for calibrating the monitoring device 23", it is understood that the calibration assembly 100 may be only used for calibrating the monitoring device 23, or the calibration assembly 100 may be used for not only calibrating the monitoring device 23 but also having other functions; for example, the calibration assembly 100 may also be used to calibrate the rotational speed of the crucible shaft 21 and/or to achieve a centered calibration of the seed crystal 22.
A control method of the calibration assembly 100 according to an embodiment of the present invention is described below, the control method including the steps of:
s1: the alignment assembly 100 is mounted on the crucible shaft 21 of the crystal growth furnace 200.
S2: the crucible shaft 21 is driven to move to a predetermined position in the axial direction of the crucible shaft 21.
S3: the monitoring device 23 of the crystal growth furnace 200 measures the diameters of the plurality of calibration rings 12 to calibrate the monitoring device 23. It will be appreciated that the monitoring device 23 may be of many types, for example a camera, which uses image sensor detection techniques, with the advantage of high accuracy.
It can be understood that, when the calibration assembly 100 includes the distance measuring device 2, the distance measuring device 2 is used for measuring the distance between the distance measuring device 2 and the guide cylinder 25 in the moving direction of the crucible shaft 21, the distance measuring device 2 can simulate the liquid level position in the crystal growth process, and then the calibration assembly 100 can simulate the crucible position when the crystal growth furnace 200 works by measuring the distance between the distance measuring device 2 and the guide cylinder of the crystal growth furnace 200 and enabling the distance to meet the preset condition, so that the calibration assembly 100 can be located at the seeding crucible position; in other words, at the predetermined position, the distance between the distance measuring device 2 and the guide cylinder 25 of the crystal growth furnace 200 measured by the distance measuring device 2 reaches the predetermined condition.
From this, when monitoring devices 23 measured, calibration subassembly 100 can be in seeding crucible position for monitoring devices 23 is more close at the monitoring state of calibration with the monitoring state when actual work, and the diameter of a plurality of calibration rings 12 that measure through monitoring devices 23 in addition carries out corresponding contrast one by one with the actual diameter value of a plurality of calibration rings 12, comes a lot of calibration monitoring devices 23, has effectively promoted the calibration accuracy to monitoring devices 23.
Alternatively, the distance measuring device 2 may be a laser distance measuring device, and the distance between the distance measuring device 2 and the backflow cylinder of the crystal growth furnace 200 is measured by laser; but is not limited thereto.
It will be appreciated that when the calibration assembly 100 further comprises revolution counting means 4 and/or centering calibration ring 5, the revolution counting means 4 is used to measure the number of revolutions of the body 1, thereby enabling calibration of the rotation speed of the crucible shaft 21, the centering calibration ring 5 being adapted to cooperate with the seed crystal 22 of the crystal growth furnace 200 to calibrate the coaxiality of the centering calibration ring 5 with the seed crystal 22.
Step S3 further includes: the crucible shaft 21 is driven to rotate along the axis of the crucible shaft 21, and the revolution counting device 4 measures the revolution of the body 1; and/or lowering the seed crystal 22 into engagement with the centering alignment ring 5 to align the concentricity of the centering alignment ring 5 and the seed crystal 22.
For example, when the calibration assembly 100 includes the revolution counting device 4, the step S3 includes: the crucible shaft 21 is driven to rotate along the axis of the crucible shaft 21, and the revolution counting device 4 measures the number of revolutions of the body 1. Specifically, the number of rotations of the calibration member 100 per unit time or the time taken for a fixed number of rotations can be calculated by the revolution counting means 4 to calibrate the rotation speed of the crucible shaft 21. For example, it may be set whether or not there is an angular deviation by comparing whether or not the number of turns of the crucible is 10 turns after one minute by rotating the crucible 10 turns within 1 minute; or counting whether the crucible rotates for 10 circles for 1 minute, and comparing errors of time and the like.
When the calibration assembly 100 includes the centering calibration ring 5, step S3 includes: the seed crystal 22 is lowered into engagement with the centering alignment ring 5 to align the concentricity of the centering alignment ring 5 and the seed crystal 22. Specifically, the centering and calibrating ring 5 and the seed crystal 22 are centered and calibrated visually through the observation window 24, so that the crucible shaft 21 and the rotating shaft of the seed crystal 22 are coaxial, and the quality of the crystal is ensured. Wherein, the "lowering the seed crystal 22 to fit the centering calibration ring 5" can be understood as lowering the seed crystal 22 to a height position where the seed crystal 22 can be calibrated by the centering calibration ring 5, and at this time, the seed crystal 22 can be in contact fit with the centering calibration ring 5 or be separated from the centering calibration ring 5 by a certain distance; for example, during alignment of the seed crystal 22, the seed crystal 22 may be brought down close to the centering alignment ring 5 such that the lower end of the seed crystal 22 extends into the centering alignment ring 5.
When the calibration assembly 100 includes the revolution counting device 4 and the centering calibration ring 5, step S3 includes: the crucible shaft 21 is driven to rotate along the axis of the crucible shaft 21, and the revolution counting device 4 measures the revolution of the body 1; the seed crystal 22 is lowered into engagement with the centering alignment ring 5 to align the concentricity of the centering alignment ring 5 and the seed crystal 22. In step S3, the sequence of operations is not fixed, that is, the sequence of "the monitoring device 23 of the crystal growth furnace 200 measures the diameters of the plurality of calibration rings 12 to calibrate the monitoring device 23", "the crucible shaft 21 is driven to rotate along the axis of the crucible shaft 21, the rotation number counting device 4 measures the number of rotations of the body 1" and "the seed crystal 22 is lowered to fit the centering calibration ring 5 to calibrate the coaxiality of the centering calibration ring 5 and the seed crystal 22" is not fixed, and in short, the sequence of "the calibration of the monitoring device 23", "the calibration of the rotation speed of the crucible shaft 21" and "the centering calibration of the seed crystal 22" is not fixed, and for example, the sequence of the calibration of the monitoring device 23, the calibration of the rotation speed of the crucible shaft 21, the centering calibration of the seed crystal 22, the calibration of the monitoring device 23, the centering of the seed crystal 22, and the calibration of the seed crystal 22, And finally calibrating the rotation speed of the crucible shaft 21, or calibrating the rotation speed of the crucible shaft 21, then calibrating the monitoring device 23, and finally calibrating the centering of the seed crystal 22, but not limited thereto.
From this, through setting up revolution counting assembly 4 and centering calibration ring 5, can realize the calibration to crucible shaft 21 rotational speed and to the calibration of seed crystal 22 and crucible shaft 21 axiality, richened calibration subassembly 100's function, promoted calibration subassembly 100's practicality.
It can be understood that in the production process of silicon single crystal, the mutual reverse rotation movement of crystal and crucible can make the central zone and peripheral zone of melt produce relative movement, and the melt can be stirred to make solid-liquid interface be downward placed and formed into a relatively stable zone, so that it is favourable for stable growth of crystal, at the same time the crystal rotation and crucible rotation can directly affect impurity segregation in the melt, and the crystal rotation and crucible rotation also are important means for regulating impurity uniformity in whole crystal. Therefore, the calibration assembly 100 in the present application can perform centering calibration on the seed crystal 22 and perform calibration on the rotation speed of the crucible shaft 21, which is beneficial to ensuring the quality of the silicon single crystal.
In the description of the present invention, it is to be understood that the terms "central," "longitudinal," "lateral," "length," "width," "thickness," "upper," "lower," "front," "rear," "left," "right," "vertical," "horizontal," "top," "bottom," "inner," "outer," "clockwise," "counterclockwise," "axial," "radial," "circumferential," and the like are used in the orientations and positional relationships indicated in the drawings for convenience in describing the utility model and to simplify the description, and are not intended to indicate or imply that the referenced devices or elements must have a particular orientation, be constructed and operated in a particular orientation, and are therefore not to be considered limiting of the utility model. Furthermore, a feature defined as "first" or "second" may explicitly or implicitly include one or more of that feature. In the description of the present invention, "a plurality" means two or more unless otherwise specified.
In the description herein, references to the description of the term "one embodiment," "some embodiments," "an illustrative embodiment," "an example," "a specific example," or "some examples" or the like mean that a particular feature, structure, material, or characteristic described in connection with the embodiment or example is included in at least one embodiment or example of the utility model. In this specification, the schematic representations of the terms used above do not necessarily refer to the same embodiment or example. Furthermore, the particular features, structures, materials, or characteristics described may be combined in any suitable manner in any one or more embodiments or examples.
While embodiments of the utility model have been shown and described, it will be understood by those of ordinary skill in the art that: various changes, modifications, substitutions and alterations can be made to the embodiments without departing from the principles and spirit of the utility model, the scope of which is defined by the claims and their equivalents.
Claims (10)
1. A calibration assembly for a crystal growth furnace, wherein the crystal growth furnace (200) comprises a crucible shaft (21) and a crucible, the crucible shaft (21) is used for driving the crucible to move along the axial direction of the crucible shaft (21) and rotate around the axis of the crucible shaft (21), and the calibration assembly (100) comprises:
body (1), body (1) includes base (11) and calibration ring (12), base (11) are suitable for to be installed on crucible axle (21), calibration ring (12) are a plurality of and all establish keeping away from of base (11) one side of crucible axle (21) is a plurality of calibration ring (12) coaxial setting and inside and outside interval set up, and every the axis of calibration ring (12) be suitable for with the axis of crucible axle (21) is parallel.
2. The calibration assembly for a crystal growth furnace according to claim 1, further comprising:
a light source (6), the light source (6) being provided on the body (1).
3. Calibration assembly for crystal growth furnaces according to claim 2, characterized in that the light source (6) comprises:
light source group (61), light source group (61) establish on base (11), and at least adjacent two be equipped with between calibration ring (12) light source group (61), light source group (61) include along a plurality of light source spare (611) that the circumference interval of calibration ring (12) set up.
4. Calibration assembly for a crystal growth furnace according to claim 2, characterized in that said calibration ring (12) is a non-metallic piece of material.
5. The calibration assembly for a crystal growth furnace according to claim 1, further comprising:
the distance measuring device (2) is arranged on the body (1) and is used for measuring the distance between the distance measuring device (2) and the guide cylinder (25) of the crystal growth furnace (200) in the moving direction of the crucible shaft (21).
6. The calibration assembly for a crystal growth furnace according to claim 1, further comprising:
revolution counting device (4), revolution counting device (4) is used for measuring the revolution of body (1), and includes transmitter (41) and receiver (42), receiver (42) with transmitter (41) cooperation is in order to receive the signal of sending of transmitter (41), one of them is established on body (1) transmitter (41) and receiver (42), the other one in transmitter (41) and receiver (42) is suitable for establishing on furnace body (20) of crystal growth stove (200).
7. The calibration assembly for a crystal growth furnace according to claim 1, wherein at least one centering calibration ring (5) is provided on a side surface of the base (11) away from the crucible shaft (21), each centering calibration ring (5) is coaxially arranged with the calibration ring (12), and the centering calibration ring (5) is adapted to cooperate with a seed crystal (22) of the crystal growth furnace (200) to calibrate the coaxiality of the centering calibration ring (5) and the seed crystal (22);
optionally, there is one centering calibration ring (5), or there are a plurality of centering calibration rings (5), and a plurality of centering calibration rings (5) are arranged at intervals inside and outside.
8. Calibration assembly for a crystal growth furnace according to claim 7, characterized in that the diameter d of the innermost centering calibration ring (5) satisfies: d is more than or equal to 1mm and less than or equal to 3 mm.
9. The calibration assembly for a crystal growth furnace according to any one of claims 1 to 8, wherein the base (11) is formed as a plate-like structure, the body (1) further comprising:
a support ring (3), the support ring (3) being provided on the body (1) and being located outside the plurality of calibration rings (12).
10. A crystal growth furnace assembly, comprising:
the crystal growth furnace (200), the crystal growth furnace (200) comprises a furnace body (20) and a monitoring device (23) arranged on the furnace body (20), and the monitoring device (23) is used for acquiring the diameter of a crystal;
calibration assembly (100), the calibration assembly (100) being a calibration assembly for a crystal growth furnace according to any one of claims 1-9 and being at least used for calibrating the monitoring device (23).
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| Application Number | Priority Date | Filing Date | Title |
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| CN202120276771.9U CN215404651U (en) | 2021-01-29 | 2021-01-29 | Calibration assembly for crystal growth furnace and crystal growth furnace assembly |
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| Application Number | Priority Date | Filing Date | Title |
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| CN202120276771.9U CN215404651U (en) | 2021-01-29 | 2021-01-29 | Calibration assembly for crystal growth furnace and crystal growth furnace assembly |
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115354389A (en) * | 2022-08-29 | 2022-11-18 | 中能兴盛(香河)机电设备有限公司 | Pre-centering device for crucible driving shaft of crystal growth furnace and control method thereof |
| CN115574796A (en) * | 2022-11-18 | 2023-01-06 | 浙江晶盛机电股份有限公司 | Centering calibration device and centering calibration method |
| CN115574744A (en) * | 2022-11-18 | 2023-01-06 | 浙江晶盛机电股份有限公司 | Centering calibration device and centering calibration method |
-
2021
- 2021-01-29 CN CN202120276771.9U patent/CN215404651U/en active Active
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115354389A (en) * | 2022-08-29 | 2022-11-18 | 中能兴盛(香河)机电设备有限公司 | Pre-centering device for crucible driving shaft of crystal growth furnace and control method thereof |
| CN115574796A (en) * | 2022-11-18 | 2023-01-06 | 浙江晶盛机电股份有限公司 | Centering calibration device and centering calibration method |
| CN115574744A (en) * | 2022-11-18 | 2023-01-06 | 浙江晶盛机电股份有限公司 | Centering calibration device and centering calibration method |
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