CN110952134B - Horizontal centering calibration fixture, crystal pulling furnace and horizontal centering calibration method - Google Patents
Horizontal centering calibration fixture, crystal pulling furnace and horizontal centering calibration method Download PDFInfo
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- CN110952134B CN110952134B CN201911311540.0A CN201911311540A CN110952134B CN 110952134 B CN110952134 B CN 110952134B CN 201911311540 A CN201911311540 A CN 201911311540A CN 110952134 B CN110952134 B CN 110952134B
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- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
- C30B15/10—Crucibles or containers for supporting the melt
- C30B15/12—Double crucible methods
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- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
- C30B15/20—Controlling or regulating
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- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/02—Elements
- C30B29/06—Silicon
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- Crystals, And After-Treatments Of Crystals (AREA)
Abstract
The invention discloses a horizontal centering calibration fixture, which comprises: the measuring device comprises a plurality of supporting frames, a plurality of first balance pieces and a plurality of measuring components which can be in a vertical state or a horizontal state, wherein the first balance pieces are arranged on the supporting frames, the measuring components are movably arranged on the supporting frames, when the measuring components are in the vertical state, the measuring components measure a first state of a piece to be measured by taking a first calibration value as a reference, and when the measuring components are in the horizontal state, the measuring components measure a second state of the piece to be measured by taking a second calibration value as a reference. The horizontal centering calibration fixture provided by the invention can ensure that the to-be-measured piece is in a horizontal centering state, and lays a foundation for subsequent processing procedures.
Description
Technical Field
The invention belongs to the technical field of calibration, and particularly relates to a horizontal centering calibration fixture, a crystal pulling furnace and a horizontal centering calibration method.
Background
As a method for producing a silicon single crystal, there are a float zone method and a Czochralski method, and a Czochralski method (CZ) is generally used at present. The czochralski method comprises the steps of accommodating a polycrystalline silicon material in a quartz crucible arranged in a hearth of a crystal pulling furnace, heating and melting the polycrystalline silicon material by a heater, contacting a rod-shaped seed crystal (namely, seed crystal) with the molten liquid surface of the polycrystalline silicon material, forming regular crystallization on a solid-liquid interface along the arrangement structure of silicon atoms of the rod-shaped seed crystal at a proper temperature required by the process to form monocrystalline silicon, pulling the rod-shaped seed crystal while rotating the rod-shaped seed crystal, continuing the crystallization of the silicon atoms in the molten liquid on the previously formed monocrystalline silicon, continuing the regular atomic arrangement structure of the silicon atoms, and accelerating the pulling to produce the monocrystalline silicon rod with the target diameter.
In the manufacturing process of the silicon single crystal rod, the most basic operation is the centering of the quartz crucible and the graphite crucible, and the temperature contour of the thermal field can be ensured to be concentric with the silicon single crystal rod only when the quartz crucible and the graphite crucible are centered, so that the stability of the thermal field is ensured, the effective growth of the silicon single crystal rod can be promoted, and the defects of the silicon single crystal rod such as primary defects (COP) and the like can be reduced. Because graphite crucibles are heavy, they are currently hoisted mechanically in order to be able to place them on the crucible shaft.
However, since the graphite crucible is heavy, the graphite crucible is easily deviated or inclined due to inertia and operator proficiency when placed, and thus, manual correction is performed at a later stage, which is time-consuming and labor-consuming, and is prone to errors according to personal operation reasons; the weight of the quartz crucible is lighter compared with that of a graphite crucible, the quartz crucible is usually carried and placed by a plurality of manpower, the quartz crucible is inclined or eccentric due to uneven stress of the quartz crucible caused by manual operation, and the quartz crucible is mainly attached to the graphite crucible, if the graphite crucible is inclined, the horizontal centering of the quartz crucible is inevitably influenced, and the melt in the crystal pulling process is inclined and spilled in serious cases, and the liquid level is inclined, so that the crystal pulling failure is caused.
Disclosure of Invention
In order to solve the problems in the prior art, the invention provides a horizontal centering calibration fixture, a crystal pulling furnace and a horizontal centering calibration method. The technical problem to be solved by the invention is realized by the following technical scheme:
a horizontal centering calibration jig, comprising: a plurality of support frames, a plurality of first balance pieces and a measuring component which can be in a vertical state or a horizontal state, wherein,
the first balance piece is arranged on the support frame, the measuring assembly is movably arranged on the support frame, when the measuring assembly is in a vertical state, the measuring assembly measures a first state of the piece to be measured by taking a first calibration value as a reference, and when the measuring assembly is in a horizontal state, the measuring assembly measures a second state of the piece to be measured by taking a second calibration value as a reference.
In one embodiment of the present invention, the measuring assembly includes a measuring scale capable of performing horizontal movement, vertical movement and rotation on the support frame, and a measuring pointer capable of moving on the measuring scale, the measuring pointer moves to a position on the measuring scale corresponding to the first calibration value to determine the first state of the member to be measured, and the measuring pointer moves to a position on the measuring scale corresponding to the second calibration value to determine the second state of the member to be measured.
In an embodiment of the invention, the measuring ruler further comprises a plurality of round adjusting pieces, the adjusting pieces are movably arranged on the supporting frame, a plurality of first protruding parts used for meshing are arranged in the circumferential direction of the adjusting pieces, a plurality of second protruding parts used for meshing are arranged on the measuring ruler, and the measuring ruler is meshed with the first protruding parts through the second protruding parts so as to enable the measuring ruler to vertically move and rotate.
In one embodiment of the invention, a sliding groove in the horizontal direction is arranged on the supporting frame, and sliding rods are arranged on two side surfaces of the adjusting piece; the sliding rod of the adjusting piece is arranged in the sliding groove so that the adjusting piece drives the measuring scale to move horizontally when moving along the sliding groove.
In one embodiment of the invention, the measuring scale further comprises a second balancing member, the second balancing member being provided on the measuring scale.
In one embodiment of the invention, the first balancing member comprises a transparent carrier, a liquid and a bubble, wherein,
the liquid is disposed in the interior cavity of the transparent carrier, and the bubble is disposed in the liquid.
In one embodiment of the invention, the measuring components are symmetrically arranged at two ends of the supporting frame.
In one embodiment of the invention, the device further comprises a sling chain, a sling clasp and a soft suction cup, wherein,
one end of the sling chain is connected to the support frame, and the other end of the sling chain is connected to the soft sucker through the sling.
An embodiment of the invention also provides a crystal pulling furnace comprising the horizontal centering fixture of any of the embodiments described above.
An embodiment of the present invention further provides a horizontal centering calibration method, including:
placing the support frame on a main furnace chamber in a crystal pulling furnace;
determining that the support frame is in a horizontal state through a first balancing piece arranged on the support frame;
judging a first state of the to-be-measured piece by enabling the measuring assembly to be in a vertical state, and if the first state is that the to-be-measured piece is not in a horizontal state, adjusting the to-be-measured piece to be in a horizontal state;
and judging a second state of the piece to be measured by enabling the measuring assembly to be in a horizontal state, and if the second state is that the piece to be measured is not in a centering state, adjusting the piece to be measured to be in the centering state.
The invention has the beneficial effects that:
the horizontal centering and calibrating clamp provided by the invention firstly utilizes the first balance piece arranged on the support frame to determine that the support frame is in a horizontal state, then the measuring component arranged on the support frame can be adjusted to be in a vertical state to measure the first state of the to-be-measured piece, the to-be-measured piece can be horizontally adjusted according to the first state of the to-be-measured piece, so that the to-be-measured piece is in the horizontal state, and the measuring component on the support frame can be adjusted to be in the horizontal state to measure the second state of the to-be-measured piece, so that the to-be-measured piece can be centered and adjusted according to the second state of the to-be-measured piece, and the to-be-measured piece can be finally ensured to be in the horizontal centering state, thereby laying a foundation for subsequent processing procedures.
The present invention will be described in further detail with reference to the accompanying drawings and examples.
Drawings
FIG. 1 is a schematic structural diagram of a horizontal centering fixture according to an embodiment of the present invention;
FIG. 2 is a top plan view of a crystal pulling furnace provided by an embodiment of the present invention;
FIG. 3 is a schematic view of a crystal pulling furnace according to an embodiment of the present invention;
FIG. 4 is a schematic structural view of another crystal pulling furnace provided in accordance with an embodiment of the present invention.
Description of reference numerals:
horizontally centering the calibration jig-10; a main furnace chamber-20; graphite crucible-30; a quartz crucible-40; soft sucker-50; a hanging buckle-60; a hoist chain-70; a crucible shaft-80; a support frame-101; a first balance member-102; measurement component-103; an adjustment member-104; measuring a scale-1031; a measurement pointer-1032; a second balance member-1033.
Detailed Description
The present invention will be described in further detail with reference to specific examples, but the embodiments of the present invention are not limited thereto.
Example one
Referring to fig. 1 and fig. 2, fig. 1 is a schematic structural diagram of a horizontal centering calibration fixture according to an embodiment of the present invention, and fig. 2 is a top view of a crystal pulling furnace according to an embodiment of the present invention. The embodiment of the invention provides a horizontal centering calibration fixture 10, which comprises: the measuring device comprises a plurality of supporting frames 101, a plurality of first balance pieces 102 and a plurality of measuring assemblies 103 which can be in a vertical state or a horizontal state, wherein the first balance pieces 102 are arranged on the supporting frames 101, the measuring assemblies 103 are movably arranged on the supporting frames 101, when the measuring assemblies 103 are in the vertical state, the measuring assemblies 103 measure a first state of a piece to be measured by taking a first calibration value as a reference, and when the measuring assemblies 103 are in the horizontal state, the measuring assemblies 103 measure a second state of the piece to be measured by taking a second calibration value as a reference.
That is, the supporting frame 101 is used for determining that the supporting frame 101 is in a horizontal state through the first balance piece 102 disposed on the supporting frame 101, so that when the supporting frame 101 is in the horizontal state, the measurement assembly 103 is adjusted to be in a vertical state or a horizontal state; when the measuring assembly 103 is in the vertical state, the measuring assembly 103 is used for measuring a first state of the to-be-measured piece by taking the first calibration value as a reference, and adjusting the to-be-measured piece to be in a horizontal state according to the first state; and when the measuring component 103 is in the horizontal state, the measuring component 103 is used for measuring a second state of the piece to be measured by taking the second calibration value as a reference, and adjusting the piece to be measured to be in the centering state according to the second state.
The object to be measured in this embodiment may be any device that needs to be calibrated horizontally and centrally, which is not specifically limited in this embodiment, and for convenience of understanding, the object to be measured is illustrated as a graphite crucible in this embodiment.
Referring to fig. 2 and fig. 3, when the graphite crucible 30 is calibrated by using the horizontal centering calibration jig 10 of the present embodiment, the support frame 101 may be installed on a side wall of the main furnace chamber 20, in order to ensure that the support frame 101 maintains a horizontal state after being installed on the side wall of the main furnace chamber 20, whether the support frame 101 is in the horizontal state may be determined by the first balance member 102 of the present embodiment, if the support frame 101 is not in the horizontal state, the support frame 101 needs to be adjusted until the support frame is in the horizontal state, and the first balance member 102 may be any device capable of determining whether the support frame 101 is in the horizontal state, which is not specifically limited in the present embodiment.
After the support frame 101 is determined to be in the horizontal state, the horizontal state and the centering state of the graphite crucible 30 can be measured through the measuring assembly 103, when the horizontal state of the graphite crucible 30 needs to be measured, a first calibration value is set first, and the position of the first calibration value can be marked on the measuring assembly 103 correspondingly, so as to calibrate the horizontal state of the graphite crucible 30, the first calibration value is used for determining a measurement reference when the horizontal state of the graphite crucible 30 is measured, after the position of the first calibration value on the measuring assembly 103 is determined, the measuring assembly 103 can be adjusted to be in the vertical state, the position of the measuring assembly 103 corresponding to the first calibration value corresponds to the upper edge of the graphite crucible 30, the current state (namely, the first state) of the graphite crucible 30 can be measured by observing whether the upper edge of the graphite crucible 30 is aligned with the first calibration value marked on the measuring assembly 103, in order to determine whether the graphite crucible 30 is in a horizontal state, if the upper edge of the graphite crucible 30 is not aligned with the first calibration value, the graphite crucible 30 is adjusted until the upper edge of the graphite crucible 30 is aligned with the first calibration value on the measuring assembly 103, and the calibration of the horizontal state of the graphite crucible 30 can be completed.
The first calibration value may be determined by calibrating a graphite crucible 30 of the same model, specifically, when a certain model of graphite crucible 30 is calibrated for the first time, after the graphite crucible 30 is in the horizontal centering state, the position on the measuring assembly 103 corresponding to the upper edge of the graphite crucible 30 is marked, and then the value corresponding to the position may be determined as the first calibration value.
When the centering state of the graphite crucible 30 is to be measured, a second calibration value is set, and a position of the second calibration value is marked on the measuring element 103, so as to calibrate the centering state of the graphite crucible 30, the second calibration value is used to determine a measuring reference when the centering state of the graphite crucible 30 is to be measured, after the position of the second calibration value on the measuring element 103 is determined, the measuring element 103 can be adjusted to be in a horizontal state, the top end of the measuring element 103 is in contact with the inner wall of the main furnace chamber 20, and the measuring element 103 is disposed above the upper edge of the graphite crucible 30, so that the current state (i.e., the second state) of the graphite crucible 30 can be measured by observing whether the outer side wall of the graphite crucible 30 is aligned with the second calibration value on the measuring element 103, so as to determine whether the graphite crucible 30 is in the centering state, if the outer sidewall of the graphite crucible 30 is not aligned with the second calibration value, the graphite crucible 30 is adjusted until the outer sidewall of the graphite crucible 30 is aligned with the second calibration value on the measuring unit 103, and the calibration of the centering state of the graphite crucible 30 can be completed.
It should be appreciated that the second calibration value may be determined in a manner similar to the first calibration value and will not be described in detail herein.
The horizontal centering calibration fixture 10 of the present embodiment can simultaneously measure the horizontal state and the centering state of the graphite crucible 30, so as to calibrate the horizontal state and the centering state of the graphite crucible 30 according to the measurement result, and the horizontal centering calibration fixture 10 of the present embodiment can effectively solve the subsequent problems caused by the deviation of the graphite crucible 30 when the graphite crucible 30 is manually placed, can standardize the operation behavior of the operator, improve the basic capability of the crystal pulling preparation process of the operator, and can effectively save the labor.
In addition, the number of the support frames 101, the first balance members 102 and the measurement assemblies 103 is not specifically limited in this embodiment, as long as the measurement of the horizontal state and the centering state of the measurement object can be completed, and a person skilled in the art can set the measurement object according to specific requirements, please refer to fig. 2, for example, the embodiment may include two support frames 101, the two support frames 101 are arranged in a cross manner, a first balance member 102 is arranged on each support frame 101, and two ends of each support frame 101 are respectively and symmetrically provided with one measurement assembly 103.
In one embodiment, the measuring assembly 103 includes a measuring scale 1031 movable horizontally, vertically and rotationally on the support frame 101 and a measuring pointer 1032 movable on the measuring scale 1031, the measuring pointer 1032 moves to a position on the measuring scale 1031 corresponding to a first calibration value to determine a first state of the member to be measured, and the measuring pointer 1032 moves to a position on the measuring scale 1031 corresponding to a second calibration value to determine a second state of the member to be measured.
That is, the measuring scale 1031 can move horizontally, move vertically and rotate on the supporting frame 101, because a quartz crucible 40 is disposed in the graphite crucible 30 during actual measurement, so that the horizontal centering calibration jig 10 of the present embodiment can not only perform measurement calibration on the graphite crucible 30, but also perform measurement calibration on the quartz crucible 40, and then can perform measurement calibration on both the graphite crucible 30 and the quartz crucible 40 by moving the measuring scale 1031, and at the same time, in order to facilitate determination of the positions of the measuring scale 1031 corresponding to the first calibration value and the second calibration value, the present embodiment performs calibration by a measuring pointer 1032 capable of moving on the measuring scale 1031, and when the graphite crucible 30 needs to be calibrated in the horizontal state, first moves the measuring pointer 1032 to the position of the measuring scale 1031 corresponding to the first calibration value, and rotates the measuring scale 1031 to the vertical state, simultaneously moving the measuring scale 1031 to a position where the measuring pointer 1032 corresponds to the upper edge of the graphite crucible 30 for measurement to determine a first state of the graphite crucible 30, the first state being a current state of the graphite crucible 30 measured by the measuring scale 1031 and the measuring pointer 1032 when the measuring scale 1031 is in a vertical state, adjusting the graphite crucible 30 until it is in a horizontal state when the graphite crucible 30 is not in the first state, after completing the calibration of the horizontal state of the graphite crucible 30, moving the measuring pointer 1032 to a position of the measuring scale 1031 corresponding to a second calibration value, and rotating the measuring scale 1031 to the horizontal state, and simultaneously moving the measuring scale 1031 to a position where the measuring pointer 1032 corresponds to the outer sidewall of the graphite crucible 30 for measurement to determine a second state of the graphite crucible 30, the second state being a current state of the graphite crucible 30 measured by the measuring scale 1031 and the measuring pointer 1032 when the measuring scale 1031 is in the horizontal state, when the second state is that the graphite crucible 30 is not in the centering state, the graphite crucible 30 is adjusted until the graphite crucible 30 is in the centering state, after the calibration of the centering state of the graphite crucible 30 is completed, the measurement calibration of the horizontal state and the centering state of the quartz crucible 40 can be performed, which is similar to the manner of the graphite crucible 30, and details are not repeated herein, and it should be noted that, because the upper edge of the quartz crucible 40 is higher than the upper edge of the graphite crucible 30, before the calibration of the quartz crucible 40, for example, a spacer block may be additionally installed between the side wall of the main furnace chamber 20 and the support frame 101 to increase the distance between the support frame 101 and the quartz crucible 40, and may also be another manner capable of increasing the distance between the support frame 101 and the quartz crucible 40.
Further, in order to illustrate the moving and rotating manner of the measuring scale 1031 of the present embodiment, the horizontal centering calibration fixture 10 of the present embodiment may further include a plurality of circular adjusting members 104, the adjusting members 104 are movably disposed on the supporting frame 101, a plurality of first protruding portions for engagement are disposed on the circumferential direction of the adjusting members 104, a plurality of second protruding portions for engagement are disposed on the measuring scale 1031, and the measuring scale 1031 is engaged with the first protruding portions through the second protruding portions to vertically move and rotate the measuring scale 1031.
The quantity of regulating part 104 of this embodiment should suit with the quantity of dipperstick 1031, this embodiment can be through setting up a plurality of second bulge on one side at dipperstick 1031, regulating part 104 is provided with the first bulge of a plurality of on the circumferencial direction simultaneously, then when needs dipperstick 1031 carries out vertical movement, can be through rotating regulating part 104 in order to drive dipperstick 1031 and do vertical direction's removal, when needs dipperstick 1031 rotates, can rotate around regulating part 104 as the centre of a circle through the centre of a circle of dipperstick 1031 with regulating part 104.
Further, in order to describe the manner of the measuring scale 1031 of the present embodiment moving horizontally, the present embodiment is provided with a horizontal sliding slot on the supporting frame 101, and two side surfaces of the adjusting piece 104 are provided with sliding rods; wherein, the sliding rod of the adjusting member 104 is disposed in the sliding slot so that the measuring scale 1031 is driven to move horizontally when the adjusting member 104 moves along the sliding slot.
That is to say, in this embodiment, a sliding rod is respectively disposed on two side surfaces of the adjusting member 104, and a sliding slot capable of sliding the sliding rod is disposed at a corresponding position of the supporting frame 101, when the measuring scale 1031 needs to move in the horizontal direction, since the measuring scale 1031 and the adjusting member 104 are in a mutually engaged state, the measuring scale 1031 can be moved in the sliding slot by the sliding rod of the adjusting member 104 to drive the measuring scale 1031 to move in the horizontal direction.
In this embodiment, in order to improve the accuracy of measurement, a second balance 1033 may be disposed on the measuring tape 1031, so that the measuring tape 1031 can be ensured to be in a horizontal state.
The first balance member 102 and the second balance member 1033 of the present embodiment may each include a transparent carrier, a liquid and a bubble, wherein the liquid is disposed in an inner cavity of the transparent carrier, and the bubble is disposed in the liquid. The liquid may be water, for example, and the water is filled into the closed inner cavity of the transparent carrier, and a bubble is disposed in the liquid, so that the state of the bubble in the liquid can be observed to determine whether the support frame 101 and the measuring tape 1031 are in a horizontal state.
Further, the measuring components 103 of the present embodiment are symmetrically disposed at two ends of the supporting frame 101, that is, a measuring component 103 is symmetrically disposed at two ends of each supporting frame 101, and each pair of symmetrically disposed measuring components 103 can perform synchronous measurement on the symmetric position of the object to be measured, so that the measuring and calibrating process can be completed more accurately and quickly.
Referring to fig. 4, for an integrated object to be measured, such as a quartz crucible 40, the quartz crucible 40 can be sucked by the soft suction cup 50, the soft suction cup 50 is connected to one end of the sling chain 70 by a suspension buckle 60, the other end of the sling chain 70 is connected to the support frame 101, and when the quartz crucible 40 needs to be adjusted, the sling chain 70 can be slightly lifted by a tool, such as a screw, to adjust the position of the quartz crucible 40, thereby completing the calibration of the quartz crucible 40. The adjustment mode can effectively save labor force because the flexible hanging chain 70 is adopted to calibrate the quartz crucible 40, and can also effectively adsorb the quartz crucible 40 when the quartz crucible is placed in any shape. In addition, the soft suction cup 50 is adopted, so that the damage and the pollution to the quartz crucible 40 can be effectively avoided.
The horizontal centering calibration fixture 10 of the embodiment can simultaneously perform horizontal state measurement and centering state measurement on the graphite crucible 30 and the quartz crucible 40, so that the graphite crucible 30 and the quartz crucible 40 can be conveniently subjected to horizontal state calibration and centering state calibration, a melt level isotherm is concentric with a single crystal silicon rod when a single crystal is stably grown in a subsequent crystal pulling process, the melt level is ensured, the phenomenon that the quartz crucible 40 is softened to cause melt overflow due to overlong heating time is prevented, and the pollution to a thermal field is avoided.
It should be noted that, the present embodiment only illustrates one usage of the horizontal centering fixture 10, but the horizontal centering fixture 10 provided in the present embodiment may also use other usage to calibrate the object to be measured, so that the horizontal centering fixture 10 cannot be limited to be only applied to the exemplary manner of the present embodiment.
Example two
Referring to fig. 1, fig. 2, fig. 3 and fig. 4, the present embodiment provides a crystal pulling furnace based on the above embodiment, the crystal pulling furnace includes a main furnace chamber 20, a graphite crucible 30, a quartz crucible 40 and a horizontal centering fixture 10 provided in the first embodiment, the graphite crucible 30 is first installed on a crucible shaft 80, a support frame 101 of the horizontal centering fixture 10 is installed on the main furnace chamber 20, and then the horizontal centering fixture 10 is used to perform horizontal state calibration and centering state calibration on the graphite crucible 30; after the calibration of the graphite crucible 30 is completed, the quartz crucible 40 is installed in the graphite crucible 30, and the quartz crucible 40 is horizontally calibrated and centered by the horizontal centering calibration jig 10 to complete the calibration of the quartz crucible 40.
The horizontal centering calibration fixture 10 of the embodiment can simultaneously measure the graphite crucible 30 and the quartz crucible 40 in a horizontal state and measure the centering state, so that the graphite crucible 30 and the quartz crucible 40 can be calibrated in the horizontal state and the centering state, the isothermal line of the melt level can be stabilized to be concentric with the silicon single crystal rod during the growth of the single crystal in the subsequent crystal pulling process, the melt level is ensured to be horizontal, the phenomenon that the melt overflows due to the softening of the quartz crucible 40 caused by overlong heating time is prevented, and the pollution to a thermal field is avoided.
It should be understood that other devices required for the crystal pulling furnace are in the prior art, and the description of the embodiment is omitted.
The implementation principle and technical effect of the horizontal centering calibration fixture 10 provided by the embodiment of the invention are similar to those of the horizontal centering calibration fixture 10 of the above embodiment, and are not described herein again.
EXAMPLE III
Referring to fig. 1, fig. 2, fig. 3 and fig. 4, the present embodiment provides a horizontal centering calibration method based on the above embodiments, where the horizontal centering calibration method includes:
step 1, placing a support frame 101 on a main furnace chamber 20 in a crystal pulling furnace;
step 2, determining that the support frame 101 is in a horizontal state through a first balance piece 102 arranged on the support frame 101;
step 3, judging a first state of the to-be-measured piece by enabling the measuring assembly 103 to be in a vertical state, and if the first state is that the to-be-measured piece is not in a horizontal state, adjusting the to-be-measured piece to be in a horizontal state;
and 4, judging a second state of the to-be-measured piece by enabling the measuring assembly 103 to be in a horizontal state, and if the second state is that the to-be-measured piece is not in a centering state, adjusting the to-be-measured piece to be in the centering state.
According to the horizontal centering calibration method of the embodiment, the graphite crucible 30 and the quartz crucible 40 can be measured in a horizontal state and in a centering state by using the horizontal centering calibration fixture 10 provided by the embodiment, so that the graphite crucible 30 and the quartz crucible 40 can be calibrated in the horizontal state and in the centering state, a melt level isotherm can be stably concentric with a single crystal silicon rod during the growth of a single crystal in the subsequent crystal pulling process, the melt level is ensured, the phenomenon that the quartz crucible 40 is softened to overflow due to the overlong heating time is prevented, and the pollution of a thermal field by the melt is avoided.
The horizontal centering calibration method provided by the embodiment of the invention utilizes the horizontal centering calibration fixture 10 of the above embodiment to perform measurement and calibration, and the implementation principle and technical effect are similar to those of the horizontal centering calibration fixture 10 of the above embodiment, and are not described again here.
In the description of the present invention, it is to be understood that the terms "center", "longitudinal", "lateral", "length", "width", "height", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", "clockwise", "counterclockwise", and the like, indicate orientations and positional relationships based on those shown in the drawings, and are used only for convenience of description and simplicity of description, and do not indicate or imply that the device or element being referred to must have a particular orientation, be constructed and operated in a particular orientation, and thus, should not be considered as limiting the present invention.
In the present invention, unless otherwise expressly stated or limited, the terms "mounted," "connected," "secured," and the like are to be construed broadly and can, for example, be fixedly connected, detachably connected, or integrally formed; can be mechanically or electrically connected; either directly or indirectly through intervening media, either internally or in any other relationship. The specific meanings of the above terms in the present invention can be understood by those skilled in the art according to specific situations.
In the present invention, unless otherwise expressly stated or limited, "above" or "below" a first feature means that the first and second features are in direct contact, or that the first and second features are not in direct contact but are in contact with each other via another feature therebetween. Also, the first feature being "on," "above" and "over" the second feature includes the first feature being directly on and obliquely above the second feature, or merely indicating that the first feature is at a higher level than the second feature. A first feature being "under," "below," and "beneath" a second feature includes the first feature being directly under and obliquely below the second feature, or simply meaning that the first feature is at a lesser elevation than the second feature.
In the description herein, references to the description of the term "one embodiment," "some embodiments," "an example," "a specific example," or "some examples," etc., mean that a particular feature, structure, material, or characteristic described in connection with the embodiment or example is included in at least one embodiment or example of the invention. In this specification, the schematic representations of the terms used above are not necessarily intended to refer to the same embodiment or example. Furthermore, the particular features, structures, materials, or characteristics described may be combined in any suitable manner in any one or more embodiments or examples. Furthermore, various embodiments or examples described in this specification can be combined and combined by those skilled in the art. The foregoing is a more detailed description of the invention in connection with specific preferred embodiments and it is not intended that the invention be limited to these specific details. For those skilled in the art to which the invention pertains, several simple deductions or substitutions can be made without departing from the spirit of the invention, and all shall be considered as belonging to the protection scope of the invention.
Claims (7)
1. A horizontal centering calibration jig, comprising: a plurality of supporting frames, a plurality of first balance pieces and a plurality of measuring components which can be in a vertical state or a horizontal state, wherein,
the first balance piece is arranged on the support frame, the measuring component is movably arranged on the support frame, when the measuring component is in a vertical state, the measuring component measures a first state of the piece to be measured by taking a first calibration value as a reference, when the measuring component is in a horizontal state, the measuring component measures a second state of the piece to be measured by taking a second calibration value as a reference, the first calibration value is used for determining a measuring reference when the piece to be measured is measured in the horizontal state, the second calibration value is used for determining a measuring reference when the piece to be measured is measured in a centering state, and the piece to be measured is a graphite crucible or a quartz crucible;
the measuring assembly comprises a measuring scale capable of horizontally moving, vertically moving and rotating on the supporting frame and a measuring pointer capable of moving on the measuring scale, the measuring pointer moves to a position corresponding to the first calibration value on the measuring scale to determine a first state of the piece to be measured, and the measuring pointer moves to a position corresponding to the second calibration value on the measuring scale to determine a second state of the piece to be measured;
the horizontal centering calibration fixture further comprises a plurality of round adjusting pieces, the adjusting pieces are movably arranged on the supporting frame, a plurality of first protruding parts used for meshing are arranged in the circumferential direction of the adjusting pieces, a plurality of second protruding parts used for meshing are arranged on the measuring scale, and the measuring scale is meshed with the first protruding parts through the second protruding parts so as to enable the measuring scale to vertically move and rotate;
the horizontal centering calibration fixture also comprises a hanging chain, a hanging buckle and a soft sucker, wherein,
one end of the sling chain is connected to the support frame, and the other end of the sling chain is connected to the soft sucker through the sling.
2. The horizontal centering calibration fixture of claim 1, wherein a horizontal sliding groove is arranged on the supporting frame, and sliding rods are arranged on two side surfaces of the adjusting member; the sliding rod of the adjusting piece is arranged in the sliding groove so that the adjusting piece drives the measuring scale to move horizontally when moving along the sliding groove.
3. The horizontal centering alignment fixture of claim 2, wherein said measuring scale further comprises a second balance member, said second balance member being disposed on said measuring scale.
4. The horizontal centering calibration fixture of claim 1, wherein said first counterbalance comprises a transparent carrier, a liquid, and a bubble, wherein,
the liquid is disposed in the interior cavity of the transparent carrier, and the bubble is disposed in the liquid.
5. The horizontal centering calibration jig of any one of claims 1 to 4, wherein the measurement components are symmetrically disposed at both ends of the support frame.
6. A crystal pulling furnace comprising the horizontal centering fixture of any of claims 1 to 5.
7. A horizontal centering calibration method, characterized in that a measurement object to be measured is subjected to a measurement of a horizontal state and a measurement of a centering state by using the horizontal centering calibration jig of any one of 1 to 5, the horizontal centering calibration method comprising:
placing the support frame on a main furnace chamber in a crystal pulling furnace;
determining that the support frame is in a horizontal state through a first balancing piece arranged on the support frame;
judging a first state of the to-be-measured piece by enabling the measuring assembly to be in a vertical state, and if the first state is that the to-be-measured piece is not in a horizontal state, adjusting the to-be-measured piece to be in a horizontal state;
and judging a second state of the piece to be measured by enabling the measuring assembly to be in a horizontal state, and if the second state is that the piece to be measured is not in a centering state, adjusting the piece to be measured to be in the centering state.
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| CN201911311540.0A CN110952134B (en) | 2019-12-18 | 2019-12-18 | Horizontal centering calibration fixture, crystal pulling furnace and horizontal centering calibration method |
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| CN201911311540.0A CN110952134B (en) | 2019-12-18 | 2019-12-18 | Horizontal centering calibration fixture, crystal pulling furnace and horizontal centering calibration method |
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| CN110952134B true CN110952134B (en) | 2022-04-08 |
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| CN202329513U (en) * | 2011-10-08 | 2012-07-11 | 中国核工业二三建设有限公司 | Centering tool |
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| CN207936866U (en) * | 2018-02-26 | 2018-10-02 | 四川工程职业技术学院 | A kind of automatic centering screw-thread micrometer |
| WO2019224831A1 (en) * | 2018-05-20 | 2019-11-28 | Nammalwar Ramasamy | Device and method for measuring the misalignment of rotating equipment. |
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| CN202329513U (en) * | 2011-10-08 | 2012-07-11 | 中国核工业二三建设有限公司 | Centering tool |
| CN105136111A (en) * | 2015-08-25 | 2015-12-09 | 孙立民 | Horizontal difference and height difference meter for building construction |
| CN108330974A (en) * | 2018-01-31 | 2018-07-27 | 武汉大学 | A kind of pile extension alignment positioning device |
| CN207936866U (en) * | 2018-02-26 | 2018-10-02 | 四川工程职业技术学院 | A kind of automatic centering screw-thread micrometer |
| WO2019224831A1 (en) * | 2018-05-20 | 2019-11-28 | Nammalwar Ramasamy | Device and method for measuring the misalignment of rotating equipment. |
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