CN215027405U - Drying auxiliary device for textured silicon wafer - Google Patents
Drying auxiliary device for textured silicon wafer Download PDFInfo
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- CN215027405U CN215027405U CN202023029374.6U CN202023029374U CN215027405U CN 215027405 U CN215027405 U CN 215027405U CN 202023029374 U CN202023029374 U CN 202023029374U CN 215027405 U CN215027405 U CN 215027405U
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Abstract
The utility model discloses a dry auxiliary device of system fine hair silicon chip installs on clean roof, dry auxiliary device includes that fan, F4-F7 well effect filters, the filter supports, chemical filtration, filter housing, high efficiency filter, fan housing are constituteed, and the new trend gets into from the fan, loops through F4-F7 well effect filters, filter supports, chemical filtration, filter housing, high efficiency filter, fan housing, F4-F7 well effect filters and installs on the filter supports, in the chemical filtration installation filter housing, filter housing installs at clean roof surface, high efficiency filter installs in filter housing and clean roof, the fan housing is installed at clean roof internal surface. This practicality meets drying blower and outer new trend system, lets in ambient gas, effectively reduces the stoving cost, and design air adsorption filtration purifies the layer in the filter, adsorbs harmful gas, and high efficiency filters and makes clean atmosphere, further reduces gaseous oxidation and the pollution to the silicon chip surface.
Description
Technical Field
The utility model relates to a silicon chip processing equipment technical field especially relates to a dry auxiliary device of system fine hair silicon chip.
Background
The solar cell texturing and cleaning is a wet chemical treatment process and is completed through surface drying treatment, so that a corresponding drying system is required for treatment, and the silicon wafer surface texturing is prevented from secondary pollution during drying. However, atmosphere composition in the atmosphere is complex, and particularly in industrial parks, the atmosphere composition not only has traffic tail gas brought by transportation operation, but also has pollution waste gas emission generated by industrial production and product manufacturing in more times. It contains carbon monoxide, carbon dioxide, sulfur dioxide, oversulfide, hydrogen sulfide, fluoride, nitrogen oxide, hydrogen chloride, chlorine, carbon monoxide, acid mist, beryllium compound, smoke dust and productive dust, and is discharged into the atmosphere, and other air pollutants.
The flocking cleaning process comprises a plurality of chemical treatment processes, wherein chemicals used in the flocking cleaning process, such as HNO3, HCl, H2O2, NH3.H2O, KOH, HF, O3 and the like, are volatilized to generate a plurality of byproducts, such as NO, NO2, O3, HCl, HCIO, NH3, KOH, H2O2 and the like; the environmental waste gas is widely dissipated around a factory and is easily absorbed by a drying fan of the cleaning and texturing equipment to be drying gas, so that the environmental waste gas is adsorbed and reacted with the clean surface of the silicon wafer after texturing and cleaning, and the silicon wafer is polluted;
and during the texturing cleaning, nitrogen is largely used for drying the surface of the silicon wafer, the cost is too high, the reduction of the production cost is not facilitated, and therefore a stable fresh air system solution with high cleanliness is needed, the silicon wafer surface is ensured to be more clean and stable after the texturing cleaning, the comprehensive yield of the manufacturing process is favorably improved, and the light conversion efficiency is stabilized.
SUMMERY OF THE UTILITY MODEL
To the above problem, the utility model provides a dry auxiliary device of making herbs into wool silicon chip solves at present and makes herbs into wool and washs back silicon chip drying process, and the silicon chip very easily receives the atmosphere influence, leads to silicon chip surface oxidation and pollution, and then influences the problem of solar cell efficiency and yield.
In order to solve the technical problem, the utility model discloses the technical scheme who adopts is: the utility model provides a dry auxiliary device of system fine hair silicon chip installs on clean roof, dry auxiliary device includes fan, F4-F7 well effect filtration, filter support, chemical filtration, filter housing, high efficiency filter, fan housing are constituteed, and the new trend gets into from the fan, loops through F4-F7 well effect filtration, filter support, chemical filtration, filter housing, high efficiency filter, fan housing, F4-F7 well effect filter installs on the filter supports, in the chemical filtration installation filter housing, filter housing installs at clean roof surface, high efficiency filter installs in filter housing and clean roof, the fan housing is installed at clean roof internal surface.
Furthermore, the fan is connected with an external fresh air system, and the fan adopts an FFU fan.
Furthermore, the F4-F7 medium-effect filtration, chemical filtration and high-effect filtration can filter solid particles and water vapor and can adsorb ozone molecules and SO2And an air adsorption, filtration and purification layer for organic gas.
From the above description of the structure of the present invention, compared with the prior art, the present invention has the following advantages:
the drying fan is connected with an external fresh air system, the environment gas is introduced, the drying cost is effectively reduced, an air adsorption filtration purification layer is designed in the filter, harmful gas is adsorbed, clean atmosphere is prepared by high-efficiency filtration, and the oxidation and pollution of the gas to the surface of the silicon wafer are further reduced; the device mainly filters solid particles, water vapor and partial chemical molecules contained in the air input from the outside, eliminates the risk of secondary pollution caused by drying after the silicon wafer is subjected to texturing and cleaning, improves the surface cleanliness and improves the light conversion efficiency.
Drawings
The accompanying drawings, which are incorporated in and constitute a part of this application, are included to provide a further understanding of the invention, and are incorporated in and constitute a part of this specification. In the drawings:
fig. 1 is an exploded schematic view of an auxiliary drying device for textured silicon wafers according to the present invention;
fig. 2 is the overall structure schematic diagram of the drying auxiliary device for the texturing silicon wafer of the present invention.
Detailed Description
In order to make the objects, technical solutions and advantages of the present invention more clearly understood, the present invention is further described in detail below with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are merely illustrative of the invention and are not intended to limit the invention.
Examples
Referring to fig. 1 and 2, a drying auxiliary device for a textured silicon wafer is installed on a clean roof 8, the drying auxiliary device comprises an FFU fan 1, an F4-F7 middle-effect filter 2, a filter support 3, a chemical filter 4, a filter shell 5, a high-effect filter 6 and a fan cover 7, the FFU fan 1 is connected with an external fresh air system, fresh air enters from the fan 1 and sequentially passes through an F4-F7 medium-efficiency filter 2, a filter support 3, a chemical filter 4, a filter shell 5, a high-efficiency filter 6 and a fan cover 7, the F4-F7 middle effect filter 2 is arranged on the filter support 3, the chemical filter 4 is arranged in the filter shell 5, the filter shell 5 is arranged on the outer surface of the clean roof 8, high efficiency filter 6 installs in filter housing 5 and clean roof 8, fan housing 7 installs at clean roof 8 internal surface. The F4-F7 medium-effect filtration, the chemical filtration and the high-effect filtration can filter solid particles and water vapor and can adsorb ozone molecules and SO2And an air adsorption, filtration and purification layer for organic gas.
Fresh air (air and nitrogen mixed air source) is connected to an air inlet grid of an FFU fan through a pipeline to filter most dust solid particles, then is subjected to middle-effect filtration and filter supporting/casing through F4-F7 to improve the air cleanliness, then passes through a chemical filtering device to adsorb chemical micromolecules such as sulfur dioxide and the like, finally is subjected to final fine treatment (filtration of byproducts generated by a residual atmosphere and chemical adsorption and the like) on the mixed gas through a high-efficiency filtering module, and finally is connected to an air inlet of a texturing cleaning and drying device through a fan cover and subjected to heating treatment through a pipeline to perform surface drying on the silicon wafer.
Auxiliary device is not introduced, and its PL luminance is low, and the whole blacking in silicon chip surface, uses this practical dry auxiliary device of system fine hair after, stoving ejection of compact silicon chip surface is more homogeneous, and PL (photoluminescence detection) luminance is higher.
The drying fan is connected with an external fresh air system, the environment gas is introduced, the drying cost is effectively reduced, an air adsorption filtration purification layer is designed in the filter, harmful gas is adsorbed, clean atmosphere is prepared by high-efficiency filtration, and the oxidation and pollution of the gas to the surface of the silicon wafer are further reduced; the device mainly filters solid particles, water vapor and partial chemical molecules contained in the air input from the outside, eliminates the risk of secondary pollution caused by drying after the silicon wafer is subjected to texturing and cleaning, improves the surface cleanliness and improves the light conversion efficiency.
The above description is only exemplary of the present invention and should not be taken as limiting the scope of the present invention, as any modifications, equivalents, improvements and the like made within the spirit and principles of the present invention are intended to be included within the scope of the present invention.
Claims (2)
1. The utility model provides a dry auxiliary device of system fine hair silicon chip installs on clean roof, its characterized in that: drying auxiliary device imitates filtration, filter support, chemical filtration, filter shell, high efficiency filtration, fan housing including fan, F4-F7 and constitutes, and the new trend gets into from the fan, loops through F4-F7 and imitates filtration, filter support, chemical filtration, filter shell, high efficiency filtration, fan housing in proper order, F4-F7 is imitated the filtration and is installed on the filter supports, in chemical filtration installation filter shell, filter shell installs at clean roof surface, high efficiency filtration installs in filter shell and clean roof, the fan housing is installed at clean roof internal surface.
2. The drying auxiliary device for the textured silicon wafer as claimed in claim 1, wherein: the fan is connected with an external fresh air system, and the fan adopts an FFU fan.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202023029374.6U CN215027405U (en) | 2020-12-16 | 2020-12-16 | Drying auxiliary device for textured silicon wafer |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202023029374.6U CN215027405U (en) | 2020-12-16 | 2020-12-16 | Drying auxiliary device for textured silicon wafer |
Publications (1)
| Publication Number | Publication Date |
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| CN215027405U true CN215027405U (en) | 2021-12-07 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN202023029374.6U Active CN215027405U (en) | 2020-12-16 | 2020-12-16 | Drying auxiliary device for textured silicon wafer |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114993028A (en) * | 2022-06-17 | 2022-09-02 | 广东高景太阳能科技有限公司 | Silicon wafer drying treatment method and system |
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2020
- 2020-12-16 CN CN202023029374.6U patent/CN215027405U/en active Active
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114993028A (en) * | 2022-06-17 | 2022-09-02 | 广东高景太阳能科技有限公司 | Silicon wafer drying treatment method and system |
| CN114993028B (en) * | 2022-06-17 | 2023-05-30 | 高景太阳能股份有限公司 | Silicon wafer drying treatment method and system |
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