CN214600608U - Wafer degumming and cleaning device - Google Patents
Wafer degumming and cleaning device Download PDFInfo
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- CN214600608U CN214600608U CN202022865762.1U CN202022865762U CN214600608U CN 214600608 U CN214600608 U CN 214600608U CN 202022865762 U CN202022865762 U CN 202022865762U CN 214600608 U CN214600608 U CN 214600608U
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Abstract
The utility model relates to a wafer degumming and cleaning device, which comprises a box body, wherein a cavity is arranged in the box body, a workbench is arranged in the cavity, a support is arranged on the workbench, a vibrator is fixed on the support, a water storage tank is fixed above the box body and is connected with a spray head through a connecting pipe, an air blower is fixed on the side surface of the box body and is connected with the cavity through a vent hole, a controller is fixed on the front surface of the box body and is connected with the air blower, the controller is connected with the spray head and the vibrator, the wafer degumming and cleaning device is used for cleaning wafers, the wafers are placed in a sealed environment and are cleaned, the wafers are polluted, cleaning liquid on the surfaces of the wafers in the placing table drops from the wafers and flows out from a water draining hole through the vibration of the vibrator after the wafers are cleaned, and drying the wafer by using the blower and the heating sheet in a matching way.
Description
Technical Field
The utility model relates to a semiconductor manufacturing technical field specifically is a belt cleaning device that strips of wafer.
Background
As is well known, the existing wafer photoresist stripping and cleaning device is an auxiliary device for wafer cleaning, and is widely used in the field of advanced manufacturing technology.
For example, the patent publication "CN 209981177U" is named as: "wafer cleaning device"'s patent, the patent discloses "the utility model relates to a semiconductor manufacturing technical field especially relates to a wafer cleaning device. The wafer cleaning device comprises: the support table is used for bearing the wafer; the shielding plate is coaxially arranged with the support platform and is positioned above the support platform; the first spray hole is positioned in the center of the shielding plate and used for spraying cleaning liquid to the wafer; and the second spray holes are positioned on the shielding plate and used for spraying dry gas to the wafer. The utility model provides a wafer cleaning device, through the center of shield plate sets up the first orifice that is used for spraying the washing liquid to make at the in-process that uses dry gas drying wafer, even the shield plate is rotatory, can not make the washing liquid by being thrown away under the effect of centrifugal force yet, avoided causing secondary pollution to the wafer, improved wafer cleaning device's cleaning performance ".
The existing wafer cleaning device finds that cleaning liquid on a wafer is easy to form a liquid film to be attached to the wafer, so that the wafer is not cleaned completely, the device is not sealed, and the wafer is easy to be polluted by the outside during cleaning, so that the use limitation of the wafer cleaning device is high.
SUMMERY OF THE UTILITY MODEL
Technical problem to be solved
Not enough to prior art, the utility model provides a belt cleaning device strips of wafer.
(II) technical scheme
In order to achieve the above object, the utility model provides a following technical scheme: a degumming and cleaning device for wafers comprises a box body, wherein a cavity is arranged in the box body, a workbench is arranged in the cavity, a support is arranged on the workbench, a vibrator is fixedly arranged on the support, the upper part of the vibrator is connected with one end of a spring, the other end of the spring is connected with a placing table, support frames are arranged on two sides of the workbench, guide posts are arranged on the support frames, flanges are fixedly arranged on the placing table, guide holes are formed in the flanges, the guide posts are matched with the guide holes, a placing groove is formed in the placing table, water draining holes are formed in the peripheral side of the placing table, the water draining holes are connected with the placing groove, a spray head is fixedly arranged above the cavity, a water storage tank is fixedly arranged above the box body and is connected with the spray head through a connecting pipe, and an air blower is fixedly arranged on the side surface of the box body, the air blower is connected with the cavity through the vent hole, the controller is fixed on the front face of the box body and connected with the air blower, the controller is connected with the spray head, and the controller is connected with the vibrator.
For the convenience is dried to the wafer, the utility model discloses the improvement has, be fixed with the hot plate on the support frame, the hot plate with the controller is connected.
In order to make the stoving respond well, the utility model discloses the improvement has, the hot plate sets up to the multiunit.
In order to remove the cleaning liquid conveniently, the utility model discloses the improvement has, the waterlogging caused by excessive rainfall hole sets up to the even arrangement of multiunit place the bench.
In order to facilitate the gas discharge in the box body, the utility model discloses the improvement has, the box top is fixed with the exhaust pipe, the exhaust pipe runs through the box with the cavity is connected.
In order to facilitate the gas discharge in the control box, the utility model discloses the improvement has, the exhaust pipe top is fixed with the solenoid valve, the solenoid valve with the controller is connected.
In order to restrict the vibrations of placing the platform, the utility model discloses the improvement has, the guiding hole with the guide post sets up to the multiunit, the guiding hole internal fixation has the guard circle.
(III) advantageous effects
Compared with the prior art, the utility model provides a wafer remove and glue belt cleaning device possesses following beneficial effect:
this cleaning device that strips of wafer, wafer are placed and are washd in sealed environment, place the wafer and receive the pollution, shake through the electromagnetic shaker after wasing the wafer, make the washing liquid of placing the wafer surface in the platform drop from the wafer and flow out from the waterlogging caused by excessive rainfall hole, use through the cooperation of blower and heating plate and dry the wafer.
Drawings
FIG. 1 is a schematic structural view of the present invention;
FIG. 2 is a schematic view of the present invention, partially enlarged in FIG. 1;
fig. 3 is a front view of the structure of the present invention.
In the figure: 1. a box body; 2. a cavity; 3. a work table; 4. a support; 5. a vibrator; 6. a spring; 7. a placing table; 8. a support frame; 9. a guide post; 10. a flange; 11. a guide hole; 12. a placement groove; 13. draining holes; 14. a spray head; 15. a water storage tank; 16. a connecting pipe; 17. a blower; 18. a vent hole; 19. a controller; 20. heating plates; 21. an exhaust duct; 22. an electromagnetic valve; 23. a guard ring.
Detailed Description
The technical solutions in the embodiments of the present invention will be described clearly and completely with reference to the accompanying drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only some embodiments of the present invention, not all embodiments. Based on the embodiments in the present invention, all other embodiments obtained by a person skilled in the art without creative work belong to the protection scope of the present invention.
Referring to fig. 1-3, a wafer degumming and cleaning device comprises a box body 1, a cavity 2 is arranged in the box body 1, a worktable 3 is arranged in the cavity 2, a support 4 is arranged on the worktable 3, a vibrator 5 is fixed on the support 4, one end of a spring 6 is connected above the vibrator 5, the other end of the spring 6 is connected with a placing table 7, support frames 8 are arranged on two sides of the worktable 3, a guide post 9 is arranged on the support frame 8, a flange 10 is fixed on the placing table 7, a guide hole 11 is arranged on the flange 10, the guide post 9 is matched with the guide hole 11, a placing groove 12 is arranged in the placing table 7, a draining hole 13 is arranged on the peripheral side of the placing table 7, the draining hole 13 is connected with the placing groove 12, a spray head 14 is fixed above the cavity 2, a water storage tank 15 is fixed above the box body 1, the water storage tank 15 is connected with the spray head 14 through a connecting pipe 16, an air blower 17 is fixed on the side face of the box body 1, the air blower 17 is connected with the cavity 2 through a vent hole 18, a controller 19 is fixed on the front face of the box body 1, the controller 19 is connected with the air blower 17, the controller 19 is connected with the spray head 14, and the controller 19 is connected with the vibrator 5.
A heating plate 20 is fixed on the support frame 8, and the heating plate 20 is connected with the controller 19, so that the wafer is dried conveniently.
The heating plates 20 are provided in a plurality of groups to improve the drying effect.
The drainage holes 13 are uniformly arranged on the placing table 7 in a plurality of groups, so that the cleaning liquid can be conveniently removed.
An exhaust pipe 21 is fixed above the box body 1, the exhaust pipe 21 penetrates through the box body 1 and is connected with the cavity 2, and therefore gas in the box body 1 is conveniently exhausted.
An electromagnetic valve 22 is fixed above the exhaust pipe 21, and the electromagnetic valve 22 is connected with the controller 19 to facilitate the exhaust of the gas in the control box 1.
The guide holes 11 and the guide columns 9 are arranged into a plurality of groups, and a guard ring 23 is fixed in each guide hole 11 for limiting the vibration of the placing table 7.
In summary, the photoresist stripping and cleaning device for wafer, when in use, places the wafer in the placing groove 12 of the placing table 7, the cleaning liquid in the water tank 15 enters the spray head 14 through the connecting pipe 16, the controller 19 controls the spray head 14 to clean the wafer in the placing groove 12, the vibrator 5 drives the spring 6 to vibrate, the spring 6 further drives the placing table 7 to vibrate, the glue solution on the wafer is washed clean by the cleaning solution on the spray head 14 and flows out through the draining holes 13, the heating plate 20 on the supporting frame 8 carries out auxiliary preheating on the wafer to facilitate the cleaning of glue solution, and simultaneously, the guide posts 9 on the supporting frame 8 are matched with the guide holes 11 on the flange 10 of the placing table 7, so that the placing table 7 is limited during vibration to prevent the wafer in the placing groove 12 from being vibrated out, the wafer is dried by the blower 17 and the heating plate 20, and the gas is exhausted through the exhaust pipe 21 which opens the electromagnetic valve 22.
The electrical components presented in the document are all electrically connected with an external master controller and 220V mains, and the master controller can be a conventional known device controlled by a computer or the like.
Although embodiments of the present invention have been shown and described, it will be appreciated by those skilled in the art that changes, modifications, substitutions and alterations can be made in these embodiments without departing from the principles and spirit of the invention, the scope of which is defined in the appended claims and their equivalents.
Claims (7)
1. The utility model provides a wafer remove and glue belt cleaning device, includes box (1), its characterized in that: the novel multifunctional cabinet is characterized in that a cavity (2) is arranged in the box body (1), a workbench (3) is arranged in the cavity (2), a support (4) is arranged on the workbench (3), a vibrator (5) is fixedly arranged on the support (4), the upper portion of the vibrator (5) is connected with one end of a spring (6), the other end of the spring (6) is connected with a placing table (7), support frames (8) are arranged on two sides of the workbench (3), guide posts (9) are arranged on the support frames (8), flanges (10) are fixedly arranged on the placing table (7), guide holes (11) are arranged on the flanges (10), the guide posts (9) are matched with the guide holes (11), a placing groove (12) is arranged in the placing table (7), draining holes (13) are arranged on the peripheral side of the placing table (7), and the draining holes (13) are connected with the placing groove (12), cavity (2) top is fixed with shower nozzle (14), box (1) top is fixed with storage water tank (15), storage water tank (15) through connecting pipe (16) with shower nozzle (14) are connected, box (1) side is fixed with air-blower (17), air-blower (17) through ventilation hole (18) with cavity (2) are connected, box (1) openly is fixed with controller (19), controller (19) with air-blower (17) are connected, controller (19) with shower nozzle (14) are connected, controller (19) with electromagnetic shaker (5) are connected.
2. The device of claim 1, wherein: a heating plate (20) is fixed on the support frame (8), and the heating plate (20) is connected with the controller (19).
3. The device of claim 2, wherein: the heating plates (20) are arranged in a plurality of groups.
4. The device of claim 1, wherein: the water draining holes (13) are uniformly arranged on the placing table (7) in a plurality of groups.
5. The device of claim 1, wherein: an exhaust pipe (21) is fixed above the box body (1), and the exhaust pipe (21) penetrates through the box body (1) and the cavity (2) to be connected.
6. The device of claim 5, wherein: an electromagnetic valve (22) is fixed above the exhaust pipe (21), and the electromagnetic valve (22) is connected with the controller (19).
7. The device of claim 1, wherein: the guide holes (11) and the guide columns (9) are arranged into a plurality of groups, and a protection ring (23) is fixed in each guide hole (11).
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN202022865762.1U CN214600608U (en) | 2020-12-03 | 2020-12-03 | Wafer degumming and cleaning device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN202022865762.1U CN214600608U (en) | 2020-12-03 | 2020-12-03 | Wafer degumming and cleaning device |
Publications (1)
Publication Number | Publication Date |
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CN214600608U true CN214600608U (en) | 2021-11-05 |
Family
ID=78428859
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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CN202022865762.1U Active CN214600608U (en) | 2020-12-03 | 2020-12-03 | Wafer degumming and cleaning device |
Country Status (1)
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CN (1) | CN214600608U (en) |
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2020
- 2020-12-03 CN CN202022865762.1U patent/CN214600608U/en active Active
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