CN210805721U - Substrate cleaning equipment integrating cleaning and drying - Google Patents
Substrate cleaning equipment integrating cleaning and drying Download PDFInfo
- Publication number
- CN210805721U CN210805721U CN201922466667.1U CN201922466667U CN210805721U CN 210805721 U CN210805721 U CN 210805721U CN 201922466667 U CN201922466667 U CN 201922466667U CN 210805721 U CN210805721 U CN 210805721U
- Authority
- CN
- China
- Prior art keywords
- cleaning
- rinsing
- pool
- shell
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Images
Landscapes
- Cleaning By Liquid Or Steam (AREA)
Abstract
The utility model provides a collect and wash and dry in substrate cleaning equipment of an organic whole, include: the washing and rinsing device comprises a shell, a washing area and a rinsing area are arranged in the shell, a washing sealing door is connected with the shell, and a rinsing sealing door is connected with the shell; the cleaning pool is connected with a cleaning liquid inlet pipe and a cleaning liquid outlet pipe; the rinsing pool is connected with a rinsing liquid inlet pipe and a rinsing liquid outlet pipe; the ultrasonic generator is positioned at the bottoms of the cleaning pool and the rinsing pool; the longitudinal lifting columns are positioned on two sides of the cleaning pool and the rinsing pool and connected to the top of the shell; the linear guide rail is transversely arranged above the cleaning pool and the rinsing pool, is connected with the longitudinal lifting column, and is connected with two sliding blocks; the substrate clamp is connected with the sliding block; the static electricity removing device is connected with the inner wall of the shell; and the drying device is connected with the inner wall of the shell. The utility model discloses can realize that the batchization washs and dries to can effectively get rid of the static on the substrate.
Description
Technical Field
The utility model relates to a collect and wash and dry in substrate cleaning equipment of an organic whole.
Background
In a semiconductor manufacturing process, the cleanliness of the surface of a substrate is an important factor influencing the reliability of a semiconductor device, and in a common semiconductor manufacturing process, deposition, plasma etching, spin-on photoresist, photoetching, electroplating and the like can introduce pollution or particles on the surface of the substrate, so that the cleanliness of the surface of the substrate is reduced, and the qualified rate of the manufactured semiconductor device is low. Therefore, how to remove the contamination and foreign particles on the substrate surface has been the focus of research in the field of semiconductor technology.
Disclosure of Invention
The utility model discloses to foretell technical problem, provide a collect and wash and dry in substrate cleaning equipment of an organic whole, this equipment can realize that the mass washs and dries to can effectively get rid of the static on the substrate.
In order to achieve the above object, the utility model discloses a technical scheme be:
a substrate cleaning apparatus integrating cleaning and drying, comprising:
the washing device comprises a shell, wherein a washing area and a rinsing area are arranged in the shell, a washing sealing door is connected with the shell in the washing area, and a rinsing sealing door is connected with the shell in the rinsing area;
the cleaning pool is positioned in the cleaning area, is connected with the shell and is connected with a cleaning liquid inlet pipe and a cleaning liquid outlet pipe;
the rinsing pool is positioned in the rinsing area, is connected with the shell and is connected with a rinsing liquid inlet pipe and a rinsing liquid outlet pipe;
the ultrasonic generator is positioned at the bottoms of the cleaning pool and the rinsing pool;
the longitudinal lifting columns are positioned on two sides of the cleaning pool and the rinsing pool and can vertically extend and retract towards the bottom end of the shell, and the longitudinal lifting columns are connected to the top of the shell;
the linear guide rail is transversely arranged above the cleaning pool and the rinsing pool, the linear guide rail is connected with the longitudinal lifting column, two sliding blocks which can slide are connected onto the guide rail, and the sliding blocks can transversely move above the cleaning pool and the rinsing pool;
the substrate clamp is connected with the sliding block and used for clamping a substrate;
the drying device is positioned in the rinsing area and above the rinsing pool and is used for drying the rinsed substrate, and the drying device is connected with the inner wall of the shell;
and the static electricity removing device is positioned in the cleaning area and above the cleaning pool and is used for removing static electricity from the dried substrate, and the static electricity removing device is connected with the inner wall of the shell.
Preferably, the cleaning apparatus further comprises a controller, and the controller is electrically connected to the ultrasonic generator, the longitudinal lifting column, the slider, the static electricity removing device, and the drying device.
Preferably, the top of the shell is connected with a fan, an air inlet of the fan is connected with a filter screen, and the fan is electrically connected with the controller.
Preferably, the inner wall of the shell is provided with a proximity switch for limiting the lifting position of the longitudinal lifting column, and two ends of the linear guide rail are provided with limit switches for limiting the movement stroke of the sliding block.
Preferably, the substrate holder comprises a holding column connected with the slider and a plurality of elastic holders for fixing the edge of the substrate, and the elastic holders are uniformly arranged on the holding column.
Preferably, the static electricity removing device is an ion fan.
Preferably, the drying device includes a blower and a heater located at an air outlet of the blower.
Preferably, a cleaning pool sealing cover is arranged above the cleaning pool, the cleaning pool sealing cover is connected with the shell in a sliding mode and opens or closes the mouth of the cleaning pool through a telescopic rod A, a rinsing pool sealing cover is arranged above the rinsing pool, the rinsing pool sealing cover is connected with the shell in a sliding mode and opens or closes the mouth of the rinsing pool through a telescopic rod B.
Preferably, a cleaning liquid inlet valve and a cleaning liquid digital display flow control valve are connected to the cleaning liquid inlet pipe, a cleaning liquid outlet valve is connected to the cleaning liquid outlet pipe, a rinsing liquid inlet valve and a rinsing liquid digital display flow control valve are connected to the rinsing liquid inlet pipe, a rinsing liquid outlet valve is connected to the rinsing liquid outlet pipe, and waste liquid recycling tanks are respectively arranged at a liquid outlet of the cleaning liquid outlet pipe and a liquid outlet of the rinsing liquid outlet pipe.
Preferably, the bottom of the shell is provided with a moving wheel and a foot cup.
Compared with the prior art, the utility model discloses an advantage lies in with positive effect:
the substrate cleaning device has the advantages that substrates in various shapes can be cleaned and dried in batches at one time, ultrasonic cleaning is adopted, the cleaning effect is good, inherent particle pollutants on the surfaces of the substrates can be removed, after cleaning is completed, cleaning liquid residues on the substrates are further rinsed, the substrates are dried in the shell, a large amount of air flows with positive and negative charges are generated through the static removing device, the charges on objects are cleaned, static electricity is effectively removed, the substrates are prevented from causing static pollution due to the fact that the particles in the air are adsorbed by the static electricity, and the substrates are enabled to achieve a pollution-free state.
Drawings
In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings used in the description of the embodiments or the prior art will be briefly described below, it is obvious that the drawings in the following description are only some embodiments of the present invention, and for those skilled in the art, other drawings can be obtained according to these drawings without creative efforts.
Fig. 1 is a first working state diagram of the present invention;
FIG. 2 is a second working state diagram of the present invention;
FIG. 3 is a third diagram of the working state of the present invention;
FIG. 4 is a fourth diagram illustrating the working state of the present invention;
FIG. 5 is a front view of the present invention;
fig. 6 is a top view of the present invention;
FIG. 7 is a schematic view showing the connection of the sealing cover of the cleaning tank and the sealing cover of the rinsing tank to the housing.
Detailed Description
The present invention is specifically described below by way of exemplary embodiments. It should be understood, however, that elements, structures and features of one embodiment may be beneficially incorporated in other embodiments without further recitation.
A substrate cleaning apparatus integrating cleaning and drying, as shown in fig. 1-7, comprising:
the device comprises a shell 1, wherein a supporting plate 11 is connected in the shell 1, a cleaning area 12 and a rinsing area 13 are arranged above the supporting plate 11 in the shell 1, a cleaning sealing door 14 is connected with the shell 1 in the cleaning area 12, a rinsing sealing door 15 is connected with the shell 1 in the rinsing area 13, a moving wheel 16 and a foot cup 17 are arranged at the bottom of the shell 1, a waste liquid recovery area 20 is arranged below the supporting plate 11, and a sealing door 201 is connected with the shell in the waste liquid recovery area 20;
the cleaning pool 2 is positioned in the cleaning area 12 and connected with the supporting plate 11 in the shell 1, the cleaning pool 2 is connected with a cleaning liquid inlet pipe 21 and a cleaning liquid outlet pipe 22, the cleaning liquid inlet pipe 21 is positioned at the upper end of the cleaning pool 2 and close to the opening of the cleaning pool 2, and the cleaning liquid outlet pipe 22 is positioned below the cleaning pool 2 and extends into a waste liquid recovery area 20 below the supporting plate 11;
the rinsing pool 3 is positioned in the rinsing area 13 and connected with the support plate 11 in the shell 1, a rinsing liquid inlet pipe 31 and a rinsing liquid outlet pipe 32 are connected with the rinsing pool, the rinsing liquid inlet pipe 31 is positioned at the upper end of the rinsing pool 3 and close to the mouth of the rinsing pool 3, and the rinsing liquid outlet pipe 32 is positioned below the rinsing pool 3 and extends into the waste liquid recovery area 20 below the support plate 11;
the ultrasonic generator 4 is positioned at the bottom of the cleaning pool 2 and the rinsing pool 3, and the ultrasonic generator 4 is the prior art and is not described again;
the longitudinal lifting columns 5 are positioned at the positions, facing the support plates 11, of the two sides of the cleaning pool 2 and the rinsing pool 3 and can vertically extend and retract towards the positions of the support plates 11 at the bottom end of the shell 1, and the longitudinal lifting columns 5 are connected to the top of the shell 5; four longitudinal lifting columns 5 are arranged, the longitudinal lifting columns 5 can be lifted synchronously, two longitudinal lifting columns 51 and 52 are positioned on the left side of the cleaning pool 2, the other two longitudinal lifting columns 53 and 54 are positioned on the right side of the rinsing pool 3, and proximity switches 55 and 56 for limiting the lifting positions of the longitudinal lifting columns 5 are arranged on the inner wall of the shell 1;
the substrate clamp 7 is connected with the sliding blocks 63 and 64 and used for clamping the substrate 8, the substrate clamp 7 comprises clamping columns 71 and 72 connected with the sliding blocks 63 and 64 and a plurality of elastic clamps 73 used for fixing the edge of the substrate 8, and the elastic clamps 73 are uniformly and symmetrically arranged on the clamping columns 71 and 72;
the drying device 10 is positioned in the rinsing area 3 and above the rinsing pool 3 and is used for drying the rinsed substrate 8, and the drying device 10 is connected with the inner wall of the shell 1; the drying device 10 comprises a blower 101 and a heater 102 positioned at an air outlet of the blower 101;
the static electricity removing device 9 is positioned in the cleaning area 2 and above the cleaning pool 2 and is used for removing static electricity from the dried substrate 8, the static electricity removing device 9 is connected with the inner wall of the shell 1, and the static electricity removing device 9 is an ion fan;
the substrate 8 of various shapes can be cleaned and dried in batch at one time, ultrasonic cleaning is adopted, the cleaning effect is good, inherent particle pollutants on the surface of the substrate 8 can be removed, after cleaning is completed, the substrate 8 is further rinsed to remove cleaning liquid residues on the substrate, then a large amount of air flows with positive and negative charges are generated through an electrostatic removing device, the charges on an object are cleaned, static electricity is effectively removed, the substrate 8 is prevented from causing electrostatic pollution due to the fact that the particles pollutants in the air are adsorbed by the static electricity, and the substrate 8 is dried in the shell 1, so that the substrate 8 is in a pollution-free state.
The cleaning equipment further comprises a controller, the controller is electrically connected with the ultrasonic generator 4, the longitudinal lifting column 5, the sliding blocks 63 and 64, the static electricity removing device 9 and the drying device 10, and the controller is a programmable controller.
The top of the shell 1 is connected with a fan 18, an air inlet of the fan 18 is connected with a filter screen 19, and the fan 18 is electrically connected with the controller.
A cleaning liquid inlet valve 25 and a cleaning liquid digital display flow control valve 26 are connected on the cleaning liquid inlet pipe 21, a cleaning liquid outlet valve 27 is connected on the cleaning liquid outlet pipe 22, a rinsing liquid inlet valve 35 and a rinsing liquid digital display flow control valve 36 are connected on the rinsing liquid inlet pipe 31, a rinsing liquid outlet valve 37 is connected on the rinsing liquid outlet pipe 32, the cleaning liquid inlet valve 25, the cleaning liquid digital display flow control valve 26, the cleaning liquid outlet valve 27, the rinsing liquid inlet valve 35, the rinsing liquid digital display flow control valve 36 and the rinsing liquid outlet valve 37 are all electrically connected with the controller,
in the waste liquid recovery area 20, a waste liquid recovery barrel 28 is arranged at the liquid outlet of the cleaning liquid outlet pipe 22, and a waste liquid recovery barrel 38 is arranged at the liquid outlet of the rinsing liquid outlet pipe 32.
In the description of the present invention, it is to be understood that the terms "center", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", and the like indicate orientations or positional relationships based on those shown in the drawings, and are merely for convenience of description and simplicity of description, and do not indicate or imply that the device or element referred to must have a particular orientation, be constructed and operated in a particular orientation, and therefore, are not to be construed as limiting the present invention.
In the description of the present invention, it is to be noted that, unless otherwise explicitly specified or limited, the terms "mounted," "connected," and "connected" are to be construed broadly, and may be, for example, fixedly connected, detachably connected, or integrally connected; they may be connected directly or indirectly through intervening media, or they may be interconnected between two elements. The specific meaning of the above terms in the present invention can be understood in specific cases to those skilled in the art.
The above description is only for the specific embodiments of the present invention, but the protection scope of the present invention is not limited thereto, and any person skilled in the art can easily think of the changes or substitutions within the technical scope of the present invention, and all should be covered within the protection scope of the present invention. Therefore, the protection scope of the present invention shall be subject to the protection scope of the claims.
Claims (10)
1. The utility model provides a collect and wash and dry in substrate cleaning equipment of an organic whole which characterized in that includes:
the washing device comprises a shell, wherein a washing area and a rinsing area are arranged in the shell, a washing sealing door is connected with the shell in the washing area, and a rinsing sealing door is connected with the shell in the rinsing area;
the cleaning pool is positioned in the cleaning area, is connected with the shell and is connected with a cleaning liquid inlet pipe and a cleaning liquid outlet pipe;
the rinsing pool is positioned in the rinsing area, is connected with the shell and is connected with a rinsing liquid inlet pipe and a rinsing liquid outlet pipe;
the ultrasonic generator is positioned at the bottoms of the cleaning pool and the rinsing pool;
the longitudinal lifting columns are positioned on two sides of the cleaning pool and the rinsing pool and can vertically extend and retract towards the bottom end of the shell, and the longitudinal lifting columns are connected to the top of the shell;
the linear guide rail is transversely arranged above the cleaning pool and the rinsing pool, the linear guide rail is connected with the longitudinal lifting column, two sliding blocks which can slide are connected onto the guide rail, and the sliding blocks can transversely move above the cleaning pool and the rinsing pool;
the substrate clamp is connected with the sliding block and used for clamping a substrate;
the drying device is positioned in the rinsing area and above the rinsing pool and is used for drying the rinsed substrate, and the drying device is connected with the inner wall of the shell;
and the static electricity removing device is positioned in the cleaning area and above the cleaning pool and is used for removing static electricity from the dried substrate, and the static electricity removing device is connected with the inner wall of the shell.
2. The substrate cleaning apparatus integrating cleaning and drying according to claim 1, wherein: the cleaning equipment further comprises a controller, and the controller is electrically connected with the ultrasonic generator, the longitudinal lifting column, the sliding block, the static electricity removing device and the drying device.
3. The substrate cleaning apparatus integrated with cleaning and drying according to claim 2, wherein: the shell top is connected with the fan, the air intake department of fan is connected with the filter screen, the fan with controller electric connection.
4. The substrate cleaning apparatus integrating cleaning and drying according to claim 1, wherein: the inner wall of the shell is provided with a proximity switch for limiting the lifting position of the longitudinal lifting column, and the two ends of the linear guide rail are provided with limit switches for limiting the movement stroke of the sliding block.
5. The substrate cleaning apparatus integrating cleaning and drying according to claim 1, wherein: the substrate clamp comprises a clamping column connected with the sliding block and a plurality of elastic clamps for fixing the edge of the substrate, and the elastic clamps are uniformly distributed on the clamping column.
6. The substrate cleaning apparatus integrating cleaning and drying according to claim 1, wherein: the static electricity removing device is an ion fan.
7. The substrate cleaning apparatus integrating cleaning and drying according to claim 1, wherein: the drying device comprises an air blower and a heater positioned at an air outlet of the air blower.
8. The substrate cleaning apparatus integrating cleaning and drying according to claim 1, wherein: the cleaning device is characterized in that a cleaning pool sealing cover is arranged above the cleaning pool, the cleaning pool sealing cover is in sliding connection with the shell and opens or closes the mouth of the cleaning pool through a telescopic rod A, a rinsing pool sealing cover is arranged above the rinsing pool and is in sliding connection with the shell and opens or closes the mouth of the rinsing pool through a telescopic rod B.
9. The substrate cleaning apparatus integrating cleaning and drying according to claim 1, wherein: the cleaning liquid inlet pipe is connected with a cleaning liquid inlet valve and a cleaning liquid digital display flow control valve, the cleaning liquid outlet pipe is connected with a cleaning liquid outlet valve, the rinsing liquid inlet pipe is connected with a rinsing liquid inlet valve and a rinsing liquid digital display flow control valve, the rinsing liquid outlet pipe is connected with a rinsing liquid outlet valve, and a waste liquid recovery barrel is respectively arranged at a cleaning liquid outlet and a rinsing liquid outlet.
10. The substrate cleaning apparatus integrating cleaning and drying according to claim 1, wherein: the bottom of the shell is provided with a movable wheel and a foot cup.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201922466667.1U CN210805721U (en) | 2019-12-31 | 2019-12-31 | Substrate cleaning equipment integrating cleaning and drying |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201922466667.1U CN210805721U (en) | 2019-12-31 | 2019-12-31 | Substrate cleaning equipment integrating cleaning and drying |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN210805721U true CN210805721U (en) | 2020-06-19 |
Family
ID=71226872
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201922466667.1U Active CN210805721U (en) | 2019-12-31 | 2019-12-31 | Substrate cleaning equipment integrating cleaning and drying |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN210805721U (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111774373A (en) * | 2020-07-17 | 2020-10-16 | 山东商业职业技术学院 | Intelligent automobile parts processing equipment |
| CN112893287A (en) * | 2021-01-18 | 2021-06-04 | 艾利合(南京)机电设备有限公司 | Rinsing robot and rinsing method for electroplating processing of metal plate |
| CN113020107A (en) * | 2021-04-08 | 2021-06-25 | 黄亚辉 | Ultrasonic cleaning equipment for mechanical parts |
| CN113967631A (en) * | 2021-10-14 | 2022-01-25 | 芜湖雅葆轩电子科技股份有限公司 | Circuit board cleaning device |
-
2019
- 2019-12-31 CN CN201922466667.1U patent/CN210805721U/en active Active
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111774373A (en) * | 2020-07-17 | 2020-10-16 | 山东商业职业技术学院 | Intelligent automobile parts processing equipment |
| CN112893287A (en) * | 2021-01-18 | 2021-06-04 | 艾利合(南京)机电设备有限公司 | Rinsing robot and rinsing method for electroplating processing of metal plate |
| CN113020107A (en) * | 2021-04-08 | 2021-06-25 | 黄亚辉 | Ultrasonic cleaning equipment for mechanical parts |
| CN113967631A (en) * | 2021-10-14 | 2022-01-25 | 芜湖雅葆轩电子科技股份有限公司 | Circuit board cleaning device |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN210805721U (en) | Substrate cleaning equipment integrating cleaning and drying | |
| CN111029277B (en) | Semiconductor wafer surface impurity removing equipment and operation method thereof | |
| CN105652588B (en) | Mask plate cleaning system | |
| CN110047788B (en) | Wafer cleaning device and wafer cleaning system | |
| CN213728407U (en) | Cosmetic bottle belt cleaning device | |
| CN107398126A (en) | A kind of dedusting dust-collecting equipment of bitumen flue gas processing | |
| CN210474309U (en) | Self-cleaning electrostatic dust collector | |
| CN217017741U (en) | Cleaning device for pole piece surface foreign matter removes dust | |
| CN209736187U (en) | Special cleaning device for gas filter | |
| CN117102129A (en) | Cleaning device for wafer | |
| KR20130111150A (en) | Apparatus for processing substrate | |
| CN219425193U (en) | Glassware cleaning device | |
| CN214918702U (en) | Lens cleaning device | |
| CN213665059U (en) | Industrial dust collector with cleaning function | |
| CN210425793U (en) | Silicon wafer drying device | |
| CN219003373U (en) | Semiconductor material electrostatic dust collector | |
| CN218835408U (en) | Silicon wafer cleaning equipment | |
| CN216757466U (en) | Mobile phone surface cleaning device | |
| CN218444643U (en) | Sampling system for FOUP pollutant detection | |
| CN210497417U (en) | Cleaning tank and dresser cleaning system | |
| CN219112364U (en) | Silicon wafer cleaning device | |
| CN215142826U (en) | Ultrasonic cleaning device | |
| CN115870265B (en) | Cleaning device and method for silicon wafer box | |
| CN111001639B (en) | Method for preventing dust cross contamination of anode and cathode in baking process | |
| CN214862260U (en) | Waste gas treatment is with dust removal environmental protection equipment |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| GR01 | Patent grant | ||
| GR01 | Patent grant |