CN213996979U - Washing tank for large-size silicon wafers - Google Patents
Washing tank for large-size silicon wafers Download PDFInfo
- Publication number
- CN213996979U CN213996979U CN202022789264.3U CN202022789264U CN213996979U CN 213996979 U CN213996979 U CN 213996979U CN 202022789264 U CN202022789264 U CN 202022789264U CN 213996979 U CN213996979 U CN 213996979U
- Authority
- CN
- China
- Prior art keywords
- cleaning
- tank body
- silicon wafer
- tank
- silicon wafers
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 title claims abstract description 82
- 229910052710 silicon Inorganic materials 0.000 title claims abstract description 82
- 239000010703 silicon Substances 0.000 title claims abstract description 82
- 235000012431 wafers Nutrition 0.000 title claims description 73
- 238000005406 washing Methods 0.000 title abstract description 14
- 238000004140 cleaning Methods 0.000 claims abstract description 58
- 239000007788 liquid Substances 0.000 claims abstract description 16
- 239000003513 alkali Substances 0.000 claims abstract description 7
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 38
- 239000007921 spray Substances 0.000 claims description 7
- 239000003814 drug Substances 0.000 abstract description 2
- 210000005056 cell body Anatomy 0.000 abstract 7
- 230000008676 import Effects 0.000 abstract 2
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 9
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 9
- 238000000034 method Methods 0.000 description 8
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 6
- 239000000243 solution Substances 0.000 description 6
- 238000005507 spraying Methods 0.000 description 5
- 238000007599 discharging Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 3
- 235000011114 ammonium hydroxide Nutrition 0.000 description 3
- 239000002270 dispersing agent Substances 0.000 description 2
- 229910021645 metal ion Inorganic materials 0.000 description 2
- 239000011259 mixed solution Substances 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 2
- 238000001035 drying Methods 0.000 description 1
- 239000003344 environmental pollutant Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 231100000719 pollutant Toxicity 0.000 description 1
- 229940095676 wafer product Drugs 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
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- Cleaning Or Drying Semiconductors (AREA)
Abstract
The utility model relates to a washing tank of jumbo size silicon chip, including cell body (1), cell body (1) about both ends set up respectively and wash liquid medicine import (2), alkali lye import (3), the both sides of cell body (1) be provided with belt cleaning device, the bottom surface of cell body (1) on be provided with elevation structure, elevation structure include motor (7), lifter (8), silicon chip tray (9), the bottom and the motor (7) of lifter (8) be connected, the upper end and the silicon chip tray (9) of lifter (8) be connected, the motor pass through branch (701) and be connected with the lateral wall of cell body to fix the motor in the cell body, the bottom surface of cell body (1) on install two supersonic generator (10). The utility model provides a silicon chip abluent multiple step can be accomplished at an inslot to the washing tank to be provided with supersonic generator, be convenient for more thoroughly to the washing of silicon chip, be fit for using widely in the industry.
Description
Technical Field
The utility model relates to a polycrystal silicon chip cleaning equipment technical field, concretely relates to washing tank of jumbo size silicon chip.
Background
In the production process of the polycrystalline silicon wafer, the quality of cleaning quality determines the performance, reliability and stability of a silicon wafer product, even a solar cell module, and the requirement standard for cleaning the silicon wafer is higher along with the development of large-size and thin-slice of the polycrystalline silicon wafer. The larger the size of the silicon wafer is, the more the number of pollutants such as particles, organic matters, metal ions and the like attached to the surface of the silicon wafer is,
in the process of cleaning the silicon wafer, firstly, the mixed liquid of sodium hydroxide and potassium hydroxide is used for cleaning metal ions of the silicon wafer, then, the mixed liquid of hydrogen peroxide and ammonia water is used for cleaning particles and organic matters on the surface of the silicon wafer, a pure water tank is arranged behind each liquid medicine tank, and finally, the water on the surface of the silicon wafer is dried in a spin-drying mode. However, for large-size silicon wafers, the silicon wafers are not easy to move in the cleaning process, and the movement between different cleaning tanks is time-consuming and labor-consuming, and may cause damage to the silicon wafers. Therefore, the utility model designs a be fit for abluent washing tank of jumbo size silicon chip.
SUMMERY OF THE UTILITY MODEL
For solving the problem that exists among the prior art, the utility model provides a washing tank of jumbo size silicon chip, specific technical scheme is as follows:
a cleaning tank for large-size silicon wafers comprises a tank body 1, wherein a cleaning liquid inlet 2 and an alkali liquor inlet 3 are respectively arranged at the left end and the right end of the tank body 1, cleaning devices are arranged at the two sides of the tank body 1, each cleaning device comprises a spray head 4, a water pipe, a water tank 5 and a water pump 6, the spray heads 4 are connected with the water tank 5 through the water pipes, the water pumps 6 are installed in the water tanks 5, and the water pumps 6 are connected with the water pipes;
the bottom surface of the tank body 1 is provided with a lifting structure, the lifting structure comprises a motor 7, a lifting rod 8 and a silicon wafer supporting block 9, the bottom end of the lifting rod 8 is connected with the motor 7, the upper end of the lifting rod 8 is connected with the silicon wafer supporting block 9, the motor is connected with the side wall of the tank body through a supporting rod 701 so as to fix the motor in the tank body,
the bottom surface of the tank body 1 is provided with two ultrasonic generators 10, and the two ultrasonic generators 10 are respectively attached to the bottom surface 101 of the tank body and supported by a bracket 104.
Furthermore, a silicon wafer clamping groove 11 is formed in the side wall of the groove body 1, the side wall of the clamping groove 11 is of a net structure, and the cleaning of the edge of the silicon wafer is not hindered while the silicon wafer is clamped.
Furthermore, the bottom surface and the side wall of the silicon wafer support block 9 are both in a net shape, so that the cleaning of the edge of the bottom surface of the silicon wafer is not hindered while the silicon wafer is dragged.
Furthermore, two ends of the silicon wafer supporting block 9 extend into the silicon wafer clamping grooves 11 and can move up and down along the silicon wafer clamping grooves 11.
Furthermore, the bottom surface 101 of the tank body 1 is conical, the lowest end of the bottom surface 101 is provided with a liquid discharge pipe 102, and the liquid discharge pipe is provided with an automatic switch valve 103.
In the cleaning process, firstly, alkali liquor mixed by sodium hydroxide and potassium hydroxide is used for pre-cleaning: filling a cleaning solution in the tank body, putting the silicon wafer into the tank body, starting the ultrasonic generator to clean, then discharging the liquid in the tank body, spraying pure water to clean, and washing the surface of the silicon wafer from two sides to ensure the cleaning effect; and then cleaning with a mixed solution of hydrogen peroxide, ammonia water and a dispersing agent, filling a cleaning solution into the tank, starting the ultrasonic generator to clean the silicon wafer, discharging the cleaning solution after the cleaning is finished, cleaning with spraying pure water, and washing the surface of the silicon wafer from two sides to ensure the cleaning effect. In the pure water cleaning process, the up-down movement of the lifting rod can be adjusted, so that the silicon wafer is uniformly washed. The lifting rod can be adjusted to move up and down in the taking and placing process, so that the silicon wafer can be conveniently taken and placed.
The utility model has the advantages that: the silicon wafer clamping device is arranged to fix the silicon wafer conveniently, and the three layers of spraying devices are arranged on the left side and the right side of the silicon wafer; the bottom surface of the cleaning tank is provided with a lifting device, so that the silicon wafer can be conveniently cleaned and taken and placed, and the bottom surface of the cleaning tank is provided with a water outlet so that waste liquid after cleaning can be conveniently discharged. The utility model provides a silicon chip abluent multiple step can be accomplished at an inslot to the washing tank to be provided with supersonic generator, be convenient for more thoroughly to the washing of silicon chip, be fit for using widely in the industry.
Drawings
FIG. 1 is a side view of a cleaning tank for large-sized silicon wafers according to an embodiment of the present invention.
Fig. 2 is a front view of a cleaning tank for large-sized silicon wafers according to an embodiment of the present invention.
The device comprises a tank body 1, a bottom surface 101, a liquid discharge pipe 102, an automatic switch valve 103, a support 104, a cleaning liquid inlet 2, an alkali liquor inlet 3, a spray head 4, water 5, a water pump 6, a motor 7, a support rod 701, a lifting rod 8, a silicon wafer support block 9, an ultrasonic generator 10 and a clamping groove 11.
The specific implementation mode is as follows:
in order to deepen understanding of the present invention, the following detailed description is made on the embodiments of the present invention with reference to the accompanying drawings.
It should be understood that the structure, ratio, size and the like shown in the drawings attached to the present specification are only used for matching with the content disclosed in the specification, so as to be known and read by those skilled in the art, and are not used for limiting the limit conditions that the present invention can be implemented, so that the present invention has no technical essential meaning, and any structure modification, ratio relationship change or size adjustment should still fall within the scope that the technical content disclosed in the present invention can cover without affecting the function that the present invention can produce and the purpose that the present invention can achieve.
Examples
With reference to figures 1 to 2 of the drawings,
a cleaning tank for large-size silicon wafers comprises a tank body 1, wherein a cleaning liquid inlet 2 and an alkali liquor inlet 3 are respectively formed in the left end and the right end of the tank body 1, cleaning devices are arranged on two sides of the tank body 1 and comprise a spray head 4, a water pipe, a water tank 5 and a water pump 6, the spray head 4 is connected with the water tank 5 through the water pipe, the water pump 6 is installed in the water tank 5, and the water pump 6 is connected with the water pipe;
the bottom surface of the tank body 1 is provided with a lifting structure, the lifting structure comprises a motor 7, a lifting rod 8 and a silicon wafer support block 9, the bottom end of the lifting rod 8 is connected with the motor 7, the upper end of the lifting rod 8 is connected with the silicon wafer support block 9, the motor is connected with the side wall of the tank body through a support rod 701 so as to fix the motor in the tank body,
two ultrasonic generators 10 are arranged on the bottom surface of the tank body 1, and the two ultrasonic generators 10 are respectively and tightly attached to the bottom surface 101 of the tank body and supported by a bracket 104.
Furthermore, silicon wafer clamping grooves 11 are formed in the side wall of the groove body 1, the side wall of each clamping groove 11 is of a net structure, and when a silicon wafer is clamped, the cleaning of the edge of the silicon wafer is not hindered.
Furthermore, the bottom surface and the side wall of the silicon wafer support block 9 are both net-shaped, so that the cleaning of the bottom surface edge of the silicon wafer is not hindered while the silicon wafer is dragged.
Furthermore, two ends of the silicon wafer support block 9 extend into the silicon wafer clamping grooves 11 and can move up and down along the silicon wafer clamping grooves 11.
Further, the bottom surface 101 of the tank body 1 is conical, and a drain pipe 102 is provided at the lowest end of the bottom surface 101, and an automatic opening and closing valve 103 is provided on the drain pipe.
In the cleaning process, firstly, alkali liquor mixed by sodium hydroxide and potassium hydroxide is used for pre-cleaning: filling a cleaning solution in the tank body, putting the silicon wafer into the tank body, starting the ultrasonic generator to clean, then discharging the liquid in the tank body, spraying pure water to clean, and washing the surface of the silicon wafer from two sides to ensure the cleaning effect; and then cleaning with a mixed solution of hydrogen peroxide, ammonia water and a dispersing agent, filling a cleaning solution into the tank, starting the ultrasonic generator to clean the silicon wafer, discharging the cleaning solution after the cleaning is finished, cleaning with spraying pure water, and washing the surface of the silicon wafer from two sides to ensure the cleaning effect. In the pure water cleaning process, the up-down movement of the lifting rod can be adjusted, so that the silicon wafer is uniformly washed. The lifting rod can be adjusted to move up and down in the taking and placing process, so that the silicon wafer can be conveniently taken and placed.
The technical means disclosed by the scheme of the utility model is not limited to the technical means disclosed by the technical means, but also comprises the technical scheme consisting of the equivalent replacement of the technical features. The present invention is not to be considered as the best thing, and belongs to the common general knowledge of the technicians in the field.
Claims (5)
1. The cleaning tank for the large-size silicon wafers is characterized by comprising a tank body (1), wherein a cleaning liquid inlet (2) and an alkali liquor inlet (3) are respectively formed in the left end and the right end of the tank body (1), cleaning devices are arranged on two sides of the tank body (1), each cleaning device comprises a spray head (4), a water pipe, a water tank (5) and a water pump (6), the spray heads (4) are connected with the water tank (5) through the water pipes, the water pumps (6) are installed in the water tanks (5), and the water pumps (6) are connected with the water pipes;
the bottom surface of the tank body (1) is provided with a lifting structure, the lifting structure comprises a motor (7), a lifting rod (8) and a silicon wafer supporting block (9), the bottom end of the lifting rod (8) is connected with the motor (7), the upper end of the lifting rod (8) is connected with the silicon wafer supporting block (9), the motor is connected with the side wall of the tank body through a supporting rod (701), so that the motor is fixed in the tank body,
the ultrasonic wave generator is characterized in that two ultrasonic wave generators (10) are mounted on the bottom surface of the tank body (1), and the two ultrasonic wave generators (10) are respectively mounted close to the bottom surface (101) of the tank body and supported by a support (104).
2. The cleaning tank for the large-size silicon wafers as claimed in claim 1, wherein the front and rear side walls of the tank body (1) are provided with silicon wafer clamping grooves (11), and the side walls of the clamping grooves (11) are of a net-shaped structure, so that the cleaning of the edges of the silicon wafers is not hindered while the silicon wafers are clamped.
3. The cleaning tank for the large-size silicon wafers as claimed in claim 1, wherein the bottom surface and the side walls of the wafer support block (9) are net-shaped, and do not hinder the cleaning of the bottom surface edges of the silicon wafers while dragging the silicon wafers.
4. The cleaning tank for the large-size silicon wafers as claimed in claim 2, wherein both ends of the silicon wafer support block (9) extend into the silicon wafer clamping groove (11) and can move up and down along the silicon wafer clamping groove (11).
5. The cleaning tank for the large-size silicon wafers as claimed in claim 1, wherein the bottom surface (101) of the tank body (1) is conical, a liquid discharge pipe (102) is arranged at the lowest end of the bottom surface (101), and an automatic switch valve (103) is arranged on the liquid discharge pipe.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202022789264.3U CN213996979U (en) | 2020-11-26 | 2020-11-26 | Washing tank for large-size silicon wafers |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202022789264.3U CN213996979U (en) | 2020-11-26 | 2020-11-26 | Washing tank for large-size silicon wafers |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN213996979U true CN213996979U (en) | 2021-08-20 |
Family
ID=77307466
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202022789264.3U Expired - Fee Related CN213996979U (en) | 2020-11-26 | 2020-11-26 | Washing tank for large-size silicon wafers |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN213996979U (en) |
-
2020
- 2020-11-26 CN CN202022789264.3U patent/CN213996979U/en not_active Expired - Fee Related
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20210820 |
|
| CF01 | Termination of patent right due to non-payment of annual fee |