CN213366605U - 耐击穿mosfet器件 - Google Patents
耐击穿mosfet器件 Download PDFInfo
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- CN213366605U CN213366605U CN202022826936.3U CN202022826936U CN213366605U CN 213366605 U CN213366605 U CN 213366605U CN 202022826936 U CN202022826936 U CN 202022826936U CN 213366605 U CN213366605 U CN 213366605U
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- 230000015556 catabolic process Effects 0.000 title claims abstract description 11
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 38
- 229910052814 silicon oxide Inorganic materials 0.000 claims abstract description 24
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 10
- 229910052710 silicon Inorganic materials 0.000 claims description 10
- 239000010703 silicon Substances 0.000 claims description 10
- 239000000377 silicon dioxide Substances 0.000 claims description 7
- 235000012239 silicon dioxide Nutrition 0.000 claims description 6
- 230000005684 electric field Effects 0.000 abstract description 4
- 239000000969 carrier Substances 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 238000010586 diagram Methods 0.000 description 1
- 230000005669 field effect Effects 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
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CN202022826936.3U CN213366605U (zh) | 2020-11-30 | 2020-11-30 | 耐击穿mosfet器件 |
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CN202022826936.3U CN213366605U (zh) | 2020-11-30 | 2020-11-30 | 耐击穿mosfet器件 |
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CN213366605U true CN213366605U (zh) | 2021-06-04 |
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
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CN116190432A (zh) * | 2023-04-20 | 2023-05-30 | 湖北九峰山实验室 | SiC功率器件及其制备方法 |
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
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CN116190432A (zh) * | 2023-04-20 | 2023-05-30 | 湖北九峰山实验室 | SiC功率器件及其制备方法 |
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GR01 | Patent grant | ||
GR01 | Patent grant | ||
TR01 | Transfer of patent right | ||
TR01 | Transfer of patent right |
Effective date of registration: 20240206 Address after: 518000 Room 201, building A, 1 front Bay Road, Shenzhen Qianhai cooperation zone, Shenzhen, Guangdong Patentee after: Shenzhen Hemeiyuan Technology Co.,Ltd. Country or region after: China Address before: Room 501, building nw20, Suzhou nano City, 99 Jinjihu Avenue, Suzhou Industrial Park, Suzhou, Jiangsu, 215011 Patentee before: SUZHOU SILIKRON SEMICONDUCTOR TECHNOLOGY CO.,LTD. Country or region before: China |
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TR01 | Transfer of patent right | ||
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Effective date of registration: 20240322 Address after: Room 306, Building 2, No.1 Qingshan Road, High tech Zone, Suzhou City, Jiangsu Province, 215100 Patentee after: New Silicon Microelectronics (Suzhou) Co.,Ltd. Country or region after: China Address before: 518000 Room 201, building A, 1 front Bay Road, Shenzhen Qianhai cooperation zone, Shenzhen, Guangdong Patentee before: Shenzhen Hemeiyuan Technology Co.,Ltd. Country or region before: China |