CN212476866U - Evaporation plating mechanism - Google Patents
Evaporation plating mechanism Download PDFInfo
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- CN212476866U CN212476866U CN202020783969.1U CN202020783969U CN212476866U CN 212476866 U CN212476866 U CN 212476866U CN 202020783969 U CN202020783969 U CN 202020783969U CN 212476866 U CN212476866 U CN 212476866U
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Abstract
The utility model discloses an evaporation mechanism, which comprises a feeding chamber, an evaporation chamber and a coating cavity; the feeding chamber comprises a heating device, a feeding chamber channel, a container and an electron gun, wherein the heating device is used for heating the evaporation material to form steam, the container is arranged in the feeding chamber channel and used for containing the evaporation material, the electron gun is arranged at the container and connected with the feeding chamber channel and used for shooting out charges onto the steam of the evaporation material, the feeding chamber is communicated with an evaporation port of the evaporation chamber through the feeding chamber channel, and the opening direction of the evaporation port faces the film coating cavity and is used for enabling the steam of the evaporation material to be deposited downwards onto the film coating cavity; the coating cavity is arranged at the evaporation chamber and comprises a carrying platform and an electrode plate, the electrode plate is horizontally arranged on the carrying platform, and the electrode plate is used for attracting steam with electric charge evaporation materials. According to the technical scheme, the uniformity of the evaporation material in the evaporation process is improved, and the productivity of the evaporation mechanism is improved.
Description
Technical Field
The utility model relates to a OLED technical field especially relates to an evaporation coating mechanism.
Background
The evaporation is a link for preparing OLED devices, and the traditional thermal evaporation method adopts a bottom-up evaporation process. The metal mask plate of the traditional thermal evaporation process can droop and deform due to the influence of gravity, so that color mixing is caused. Therefore, with the development of the evaporation process, the evaporation process from top to bottom is gradually used. From top to bottom among the coating by vaporization technology, metal mask board and glass substrate can be inseparable laminating, and metal mask board can not take place deformation because of expend with heat and contract with cold moreover and influence the counterpoint, and then takes place colour mixture scheduling problem.
No matter the evaporation process from bottom to top or from bottom to top, the utilization ratio of the evaporation material is especially needed to be noticed, and the evaporation material is often deposited on the inner wall of the cavity and has the phenomenon of uneven evaporation. And the change of coating by vaporization material is comparatively complicated, and the maintenance and the cleanness of coating by vaporization cavity can consume a large amount of manpower and material resources.
SUMMERY OF THE UTILITY MODEL
Therefore, an evaporation mechanism needs to be provided to solve the problem of low efficiency of the evaporation mechanism in the evaporation process.
In order to achieve the aim, the inventor provides an evaporation mechanism, which comprises a feeding chamber, an evaporation chamber and a coating cavity;
the feeding chamber comprises a heating device, a feeding chamber channel, a container and an electron gun, wherein the heating device is used for heating the evaporation material to form steam, the container is arranged in the feeding chamber channel and used for containing the evaporation material, the electron gun is arranged at the container and connected with the feeding chamber channel and used for shooting out charges onto the steam of the evaporation material, the feeding chamber is communicated with an evaporation port of the evaporation chamber through the feeding chamber channel, and the opening direction of the evaporation port faces the film coating cavity and is used for enabling the steam of the evaporation material to be deposited downwards onto the film coating cavity;
the coating cavity is arranged below the evaporation chamber and comprises a carrying platform and an electrode plate, the electrode plate is horizontally arranged on the carrying platform, and the electrode plate is used for attracting steam with electric charge evaporation materials.
Further, the coating cavity also comprises a collecting plate, the collecting plate is arranged at the evaporation port, and the collecting plate is used for collecting the steam of the charged evaporation material.
Further, the feed chamber still includes first valve, and first valve setting is at the bottom surface of feed chamber.
Further, the loading chamber still includes the subassembly of reloading, the subassembly of reloading includes lifting unit, rotary part and mesa, lifting unit, rotary part and mesa setting are under first valve, lifting unit with rotary part respectively with the mesa is connected, lifting unit is used for making the mesa rise or descend, rotary part is used for making the mesa rotatory.
Furthermore, the feed chamber also comprises a second valve, and the second valve is arranged on the feed chamber channel and is used for communicating the feed chamber with the evaporation chamber.
Furthermore, the feed chamber is a plurality of, and a plurality of the feed chamber sets up respectively one side of evaporating chamber.
Further, the film coating cavity further comprises a supporting sheet and a supporting column;
the support pieces are arranged on two sides of the upper surface of the electrode plate and are fixedly connected with the carrying platform, and the support pieces are used for supporting the glass substrate;
the support columns are arranged on the outer sides of the support sheets and are used for supporting the metal mask plate above the glass substrate.
Furthermore, the support columns are of telescopic structures and used for adjusting the height of the metal mask plate.
Further, the coating cavity further comprises a rotating shaft, the rotating shaft is arranged at the center of the carrying platform and connected with the carrying platform, and the rotating shaft is used for rotating the carrying platform.
Further, the heating device is a heating plate.
Different from the prior art, on the one hand, the technical scheme adjusts the electric charges bombarded by the electron gun to the steam of the evaporation material, the steam of the evaporation material with the electric charges moves to the evaporation chamber and is evaporated downwards through the evaporation port, and the horizontally arranged electrode plate can stably attract the steam of the evaporation material with the electric charges, thereby improving the uniformity of the evaporation material in the evaporation process and improving the production rate of the evaporation mechanism. On the other hand, the electron gun is beneficial to realizing low-concentration doping of different evaporation materials.
Drawings
Fig. 1 is a schematic structural view of an evaporation mechanism according to this embodiment;
fig. 2 is a schematic structural diagram of the evaporation mechanism and the material changing assembly in this embodiment.
Description of reference numerals:
1. a charging chamber;
11. an electron gun;
12. a container;
13. a refueling assembly;
14. a first valve;
15. a second valve;
16. a charging chamber channel;
2. an evaporation chamber;
21. an evaporation port;
22. a collector plate;
3. coating a film cavity;
31. a stage;
32. an electrode plate;
33. a support sheet;
34. a support pillar;
35. a rotating shaft;
36. a glass substrate;
37. a metal mask plate.
Detailed Description
To explain technical contents, structural features, and objects and effects of the technical solutions in detail, the following detailed description is given with reference to the accompanying drawings in conjunction with the embodiments.
Referring to fig. 1 to 2, the present embodiment provides an evaporation mechanism, which includes a material feeding chamber 1, an evaporation chamber 2, and a film coating chamber 3. The loading chamber 1 comprises a heating device, a loading chamber channel 16, a container 12 and an electron gun 11. The heating device is used for heating the evaporation material to form steam, the container 12 is arranged in the feed chamber channel 16, and the container 12 is used for containing the evaporation material. The electron gun 11 is disposed at the container 12 and connected to a chamber channel 16 for ejecting electric charges to vapor of the evaporation material. The loading chamber 1 is communicated with the evaporation port 21 of the evaporation chamber 2 through a loading chamber channel 16, and the opening direction of the evaporation port 21 faces the coating cavity 3 and is used for enabling the steam of the evaporation material to be deposited on the coating cavity downwards. The coating cavity 3 is arranged at the evaporation chamber 2, and the coating cavity 3 comprises a carrier 31 and an electrode plate 32. The electrode plate 32 is horizontally disposed on the stage 31, and is configured to attract the vapor of the charged evaporation material. The coating cavity 3 is also used for carrying a glass substrate 36 and a metal mask plate 37, and vapor of the evaporation material penetrates through the metal mask plate 37 and reaches the glass substrate 36. According to the technical scheme, on one hand, the electric charges bombarded by the electron gun are adjusted to the steam of the evaporation material, the steam of the evaporation material with the electric charges moves to the evaporation chamber and is evaporated downwards through the evaporation port, and the horizontally arranged electrode plate can stably attract the steam of the evaporation material with the electric charges, so that the uniformity of the evaporation material in the evaporation process is improved, and the production rate of the evaporation mechanism is improved. On the other hand, the electron gun is beneficial to realizing low-concentration doping of different evaporation materials (generally organic materials).
In a further embodiment, in order to increase the uniformity of the vapor of the charged evaporation material, the vapor of the charged evaporation material may be collected on the collecting plate 22 before leaving the evaporation openings. The collecting plate 22 is disposed above the evaporation opening 21, and the collecting plate 22 is used for collecting vapor of the charged evaporation material. After the vapor of the charged evaporation material on the collecting plate 22 reaches a predetermined amount, the predetermined amount can be adjusted according to different evaporation processes, and then the vapor is deposited downward through the evaporation openings 21, and finally the vapor of the charged evaporation material can be uniformly attracted by the lower electrode plate 32, so as to be uniformly deposited on the glass substrate 36 above the electrode plate 32.
In this embodiment, the electrode plate is further connected to an electrode plate controller, and the electrode plate controller can adjust the polarity of the electrode plate to achieve different degrees of attraction on the steam of the charged evaporation material, thereby achieving adjustment of the evaporation rate.
In this embodiment, the heating device is a heating plate, and heats the container containing the vapor deposition material in a form of heating rod, infrared heating, high-frequency electromagnetic heating, or the like, for example, to heat the vapor deposition material to form steam. The heating plate can be arranged below, on the side or above the container, and can heat the container in different directions.
In this embodiment, the electron gun uses the high-density energy of the electron beam to treat the evaporation material, such as to charge the vapor of the evaporation material with an electric charge. The electron gun also comprises an electron gun control system, a power supply and the like. The electron gun is electrically connected with an electron gun control system, the electron gun control system is convenient for an operator to control the electron gun, and the operator controls the amount of the evaporation material by adjusting the number of charged particles of the electron gun.
In this embodiment, in order to realize replacement of the evaporation material, a first valve 14 is provided on the chamber, the first valve is provided on the bottom surface of the chamber, and the first valve 14 is used as a passage for replacing the container.
Further, the charging chamber further comprises a material changing assembly 13 and a fixing frame arranged on the channel of the charging chamber, and the fixing frame is used for fixing the container. The first valve 14 is arranged at the feed channel 16 below the holder (container placement position). The material changing assembly 13 is used for placing the container on the fixed frame after the first valve 14 is opened and the material changing assembly 13 rotates for a certain angle (such as 90 degrees, 45 degrees or other degrees), and then the container leaves the feeding chamber through rotating for a certain angle to realize the material changing function. The reloading assembly 13 comprises a lifting component, a rotating component and a table top, wherein the lifting component, the rotating component and the table top are arranged under the first valve 14, the lifting component and the rotating component are respectively connected with the table top, the lifting component is used for enabling the table top to ascend or descend, and the rotating component is used for enabling the table top to rotate.
Specifically, the lifting component is of a telescopic cylinder structure. The telescopic cylinder structurally comprises a cylinder body, a piston and a piston rod, wherein the piston is connected in the cylinder body in a sliding mode and divides the cylinder body into two chambers, the piston rod is fixedly connected onto the piston, a lifting rod is fixed to the end portion of the piston rod, and the lifting rod achieves the lifting function in the vertical direction through the piston and the piston rod. The top of the lifting rod is fixed with a table top which is used for placing a container. The rotating part comprises a motor and a rotating base, and a rotating shaft of the motor is fixed in the middle of the rotating base and used for enabling the rotating base to rotate. The rotating base is fixed with a lifting component. The rotation of the rotary base is controlled by the motor to drive the table top to rotate. The container that will be equipped with vapor deposition material places on the feeding chamber subassembly, and the first valve of feeding chamber is opened the back, and the feeding chamber is risen to the feeding chamber subassembly, through rotatory certain angle with the mesa, places the container on the mount, and the subassembly that reloads descends after rotatory back of mesa, accomplishes the change of container or reinforced. Or the structure of the telescopic cylinder can also be the structure of a telescopic hydraulic cylinder. Of course, the structure of the telescopic cylinder can be used as a structure for realizing telescopic functions of other parts, such as a support column for fixing a metal mask plate.
In some embodiments, the first valve is disposed on a sidewall of the end of the loading chamber passageway, and the refueling assembly includes a pulley, a base, a first connector, a second connector, a fastener, and a refueling assembly controller. The pulley setting is on the base for make the subassembly of reloading remove. Be provided with vertical first connecting piece on the base, first connecting piece is flexible structure for first connecting piece reciprocates and carries out the change of container. The second connecting piece is connected horizontally at the top of first connecting piece, and the second connecting piece can be flexible structure for on putting into the suitable position of charging chamber passageway with the container through first valve, the second connecting piece can not be flexible structure, calculate in advance promptly the container position on the charging chamber passageway and the distance between the first valve alright.
In other embodiments, the first valve is disposed on a sidewall of the end of the loading chamber passageway and the refueling assembly can be a robotic arm that can be rotated and moved up and down through a plurality of angles to move the container into the loading chamber passageway. The mechanical arm can be fixed at a certain position (a feeding chamber, the ground and the like), and the bottom of the mechanical arm can also be provided with a pulley.
In this embodiment, a second valve 15 is provided between the loading chamber and the evaporation chamber in order to maintain the chamber cleanliness of the loading chamber and the evaporation chamber. The second valve 15 is disposed on the loading chamber passage 16 for communicating the loading chamber 1 with the evaporation chamber 2. The second valve 15 is opened so that the vapor of the charged evaporation material can move from the charging chamber 1 to the evaporation chamber 2; second valve 15 closes for charge chamber 1 and evaporation chamber 2 keep independent respectively, and after charge chamber 1 kept independent, can change evaporation coating material or when reinforced, avoid disturbing the dust of charge chamber 1, influence the clean and tidy degree of evaporation chamber 2's cavity.
Above-mentioned technical scheme makes the loading chamber form independent space through closing the second valve, recycles first valve and the subassembly of reloading and cooperates, carries out reinforced and the change to the container of storing the coating by vaporization material, reduces down time, improves production efficiency. Meanwhile, the independent feeding chamber can reduce the maintenance and cleaning of the cavity, and the labor cost and the financial cost are saved.
In this embodiment, the first valve or the second valve is a DV valve. Or the valve can be replaced by an opening and closing valve to realize the communication and the sealing of the feeding chamber and the evaporation chamber.
In this embodiment, the loading chamber is a plurality of, and a plurality of the loading chamber sets up respectively one side of evaporating chamber, and a plurality of loading chambers's structure is the same. The plurality of feeding chambers can be uniformly distributed outside the evaporation chamber, and the positions of the plurality of feeding chambers can be randomly arranged. As shown in fig. 1, two feeding chambers are connected to the evaporation chamber through feeding chamber passages, one feeding chamber is disposed on one side of the evaporation chamber, the other feeding chamber is disposed on the other side of the evaporation chamber, and the two feeding chambers are disposed opposite to each other.
In the present embodiment, the coating chamber 3 is used for carrying the glass substrate 36 and the metal mask 37, and allows vapor of the evaporation material to permeate through the metal mask 37 onto the glass substrate 36. The coating cavity further comprises a supporting sheet 33 and a supporting column 34. The support sheets 33 are disposed on two sides of the upper surface of the electrode plate and are fixedly connected to the stage, and the support sheets 33 are used for supporting the glass substrate 36. The supporting columns 34 are disposed outside the supporting sheet 33, and the supporting columns 34 are used for supporting a metal mask plate 37 above a glass substrate 36.
Specifically, the electrode plate can be arranged in the carrying platform, a slot is formed above the carrying platform, and the slot is communicated with the surface of the carrying platform. The support sheet is arranged above the slot, and the support sheet can be outward and supports the glass substrate. The support column is of a telescopic structure and is used for adjusting the height of the metal mask plate. If the support columns are adjusted to be telescopic up and down, when the metal mask plate is placed on the support columns, the evaporation chamber, the metal mask plate and the glass substrate can be formed in sequence.
In this embodiment, in order to enable the evaporation material to be deposited more uniformly on the stage (the metal mask plate and the glass substrate), a rotation shaft for rotating the stage is provided. The rotating shaft is arranged at the center of the carrying platform and connected with the carrying platform, the rotating shaft is electrically connected with an output shaft of a motor, the output shaft of the motor can drive the rotating shaft to rotate, and the rotating shaft is used for rotating the carrying platform. Preferably, the electrode plate, the support sheet and the support column are symmetrically distributed at the center of the carrier. The structure can optimize the film forming uniformity, so that vapor of the evaporation material from top to bottom is more uniformly attached to the glass substrate. Of course these components may not be symmetrically distributed about the centre of the carrier.
The coating chamber, the evaporation chamber and the charging chamber are independent respectively, so that the temperature of the coating chamber can be controlled at room temperature, and the coating chamber can be provided with a temperature adjusting device (such as an air conditioner for adjusting temperature). Therefore, the metal mask plate cannot deform due to expansion with heat and contraction with cold to influence alignment, and the problems of color mixing and the like can be solved.
It should be noted that, although the above embodiments have been described herein, the scope of the present invention is not limited thereby. Therefore, based on the innovative concept of the present invention, the changes and modifications of the embodiments described herein, or the equivalent structure or equivalent process changes made by the contents of the specification and the drawings of the present invention, directly or indirectly apply the above technical solutions to other related technical fields, all included in the protection scope of the present invention.
Claims (10)
1. An evaporation mechanism is characterized by comprising a feeding chamber, an evaporation chamber and a coating cavity;
the feeding chamber comprises a heating device, a feeding chamber channel, a container and an electron gun, wherein the heating device is used for heating the evaporation material to form steam, the container is arranged in the feeding chamber channel and used for containing the evaporation material, the electron gun is arranged at the container and connected with the feeding chamber channel and used for shooting out charges onto the steam of the evaporation material, the feeding chamber is communicated with an evaporation port of the evaporation chamber through the feeding chamber channel, and the opening direction of the evaporation port faces the film coating cavity and is used for enabling the steam of the evaporation material to be deposited downwards onto the film coating cavity;
the coating cavity is arranged below the evaporation chamber and comprises a carrying platform and an electrode plate, the electrode plate is horizontally arranged on the carrying platform, and the electrode plate is used for attracting steam with electric charge evaporation materials.
2. An evaporation mechanism according to claim 1, wherein the coating chamber further comprises a collecting plate disposed at the evaporation port, the collecting plate being configured to collect vapor of the charged evaporation material.
3. A deposition mechanism according to claim 1, wherein the chamber further comprises a first valve disposed at a bottom surface of the chamber.
4. The evaporation mechanism according to claim 3, wherein the charging chamber further comprises a material changing assembly, the material changing assembly comprises a lifting member, a rotating member and a table top, the lifting member, the rotating member and the table top are arranged right below the first valve, the lifting member and the rotating member are respectively connected with the table top, the lifting member is used for lifting or lowering the table top, and the rotating member is used for rotating the table top.
5. A deposition mechanism according to claim 3, wherein said chamber further comprises a second valve, said second valve is disposed on said chamber channel for communicating said chamber with said evaporation chamber.
6. A deposition mechanism according to any of claims 1 to 5, wherein the number of loading chambers is multiple, and multiple loading chambers are respectively arranged at one side of the evaporation chamber.
7. An evaporation mechanism according to claim 1, wherein the coating chamber further comprises a support sheet and a support column;
the support pieces are arranged on two sides of the upper surface of the electrode plate and are fixedly connected with the carrying platform, and the support pieces are used for supporting the glass substrate;
the support columns are arranged on the outer sides of the support sheets and are used for supporting the metal mask plate above the glass substrate.
8. An evaporation mechanism according to claim 7, wherein the support columns are of a telescopic structure and used for adjusting the height of the metal mask plate.
9. The evaporation mechanism according to claim 1, wherein the coating chamber further comprises a rotating shaft, the rotating shaft is disposed at the center of the stage and connected to the stage, and the rotating shaft is used for rotating the stage.
10. A deposition mechanism according to claim 1, wherein the heating device is a heating plate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202020783969.1U CN212476866U (en) | 2020-05-13 | 2020-05-13 | Evaporation plating mechanism |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202020783969.1U CN212476866U (en) | 2020-05-13 | 2020-05-13 | Evaporation plating mechanism |
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| Publication Number | Publication Date |
|---|---|
| CN212476866U true CN212476866U (en) | 2021-02-05 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202020783969.1U Active CN212476866U (en) | 2020-05-13 | 2020-05-13 | Evaporation plating mechanism |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113930740A (en) * | 2021-09-22 | 2022-01-14 | 铜陵市超越电子有限公司 | Metallized film evaporation device based on adjustable space |
-
2020
- 2020-05-13 CN CN202020783969.1U patent/CN212476866U/en active Active
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113930740A (en) * | 2021-09-22 | 2022-01-14 | 铜陵市超越电子有限公司 | Metallized film evaporation device based on adjustable space |
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