CN212418875U - Cleaning device - Google Patents
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- CN212418875U CN212418875U CN202020362014.9U CN202020362014U CN212418875U CN 212418875 U CN212418875 U CN 212418875U CN 202020362014 U CN202020362014 U CN 202020362014U CN 212418875 U CN212418875 U CN 212418875U
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Abstract
The application discloses a cleaning device for cleaning an object to be cleaned in a semiconductor device. This belt cleaning device includes cavity, first technology groove, second technology groove, third technology groove, first material loading position, second material loading position, first material part of getting and getting the material part, wherein: the first material loading position and the second material loading position are respectively arranged on the opposite side walls of the cavity; the first process tank, the second process tank and the third process tank are arranged in the cavity and are sequentially arranged between the first material loading position and the second material loading position; the first material taking part is used for carrying the object to be cleaned among the first material loading position, the first process tank and the second process tank, and the second material taking part is used for carrying the object to be cleaned among the second process tank, the third process tank and the second material loading position. Adopt the disclosed scheme of this application, can greatly promote cleaning efficiency, be particularly useful for wasing quartz capsule and quartz boat.
Description
Technical Field
The application relates to the technical field of semiconductors, in particular to a cleaning device for cleaning objects to be cleaned in semiconductor equipment.
Background
Quartz tubes are commonly used in silicon wafer diffusion processes. Generally, a quartz boat carrying silicon wafers is placed in a quartz tube, and a certain amount of gas containing a diffusion source is introduced into the tail of the quartz tube in a high-temperature diffusion furnace. Under the condition of high temperature, the diffusion process is completed through the chemical reaction of the diffusion source gas and the silicon wafer. Because the quartz boat is directly contacted with the quartz tube, a certain amount of diffused particles can remain on the surface of the quartz tube after each diffusion process.
The requirement of the diffusion process on the cleanliness of the quartz tube is very strict, the tube wall of the quartz tube is not allowed to have other metal impurities or ions, and the cleanliness of the surface of the quartz tube directly influences the yield of silicon wafers, so that the quartz tube and the quartz boat need to be cleaned regularly. The mechanical arm can directly carry the quartz tube to carry out unhooking-free cleaning. For the quartz boat, the flower basket can be loaded firstly, and then the flower basket is carried by the mechanical arm to be cleaned without unhooking.
FIG. 1 shows a schematic system diagram of a prior art quartz tube cleaning station. As shown in the figure, it discloses an ultrapure water recovery pipeline system of a quartz tube cleaning station, the quartz tube cleaning station C1-2 comprises: an ultrapure water process tank C1-21, a first chemical process tank C1-22, a second chemical process tank C1-23, and a water discharge recovery line configuration system C1-24. The quartz tube is carried to different process tanks by a robot for cleaning, wherein the ultrapure water process tank C1-21 supplies clean ultrapure water to clean the quartz tube, and the first chemical process tank C1-22 and the second chemical process tank C1-23 supply required process chemicals (e.g. acid such as hydrofluoric acid) to chemically clean the quartz tube. When a certain process tank executes a cleaning process, other process tanks are idle, and particularly, only one chemical process tank can be used for cleaning at a time, so that the cleaning efficiency is low.
Fig. 2(a) and 2(b) show another horizontal quartz boat cleaning machine in the prior art. As shown, the quartz boat cleaning machine comprises: an ultrapure water process tank C2-2, a chemical process tank C2-3, a manipulator C2-4, a flower basket C2-6, a quartz boat C2-7 and the like. During the process, the manipulator C2-4 can extend into the process area, the flower basket C2-6 is hung on the manipulator C2-4, the manipulator can drive the flower basket C2-6 and the quartz tube C2-7 in the flower basket C2-6 to repeatedly lift or horizontally move in the ultrapure water process tank C2-2 and the chemical process tank C2-3 to stir the cleaning liquid so that the cleaning liquid generates vibration, and thus the quartz boat C2-7 can be cleaned in the ultrapure water process tank C2-2 and the chemical process tank C2-3 in a vibration mode respectively. The cleaning machine only has one chemical process tank and also has the problem of low cleaning efficiency.
In conclusion, the cleaning efficiency of the existing automatic cleaning equipment is difficult to satisfy.
SUMMERY OF THE UTILITY MODEL
An object of the present application is to provide a cleaning apparatus that improves cleaning efficiency, and is particularly suitable for cleaning objects to be cleaned, such as quartz tubes and quartz boats.
The application provides a belt cleaning device for treat the cleaning object in the semiconductor equipment and wash, its characterized in that, belt cleaning device includes cavity, first technology groove, second technology groove, third technology groove, first material loading level, second material loading level, first material piece and the second of getting gets the material piece, wherein:
the first feeding level and the second feeding level are respectively arranged on the opposite side walls of the cavity;
the first process tank, the second process tank and the third process tank are arranged in the cavity and are sequentially arranged between the first feeding level and the second feeding level;
the first material taking part is used for carrying the object to be cleaned among the first material loading position, the first process tank and the second process tank, and the second material taking part is used for carrying the object to be cleaned among the second process tank, the third process tank and the second material loading position.
Optionally, the first process tank and the third process tank are used for containing process liquid medicine, and the second process tank is used for containing cleaning water.
Optionally, the cleaning device further comprises a tank cover covering the first process tank and the third process tank.
Optionally, the slot cover is of a two-half structure, and the top surface of each slot cover is an inclined surface inclined towards the middle.
Optionally, the first material of getting with the second material of getting all includes manipulator and lifting hook, the lifting hook is located the manipulator is terminal, the first material of getting the lifting hook opening orientation first material loading level, the second material of getting the lifting hook opening orientation the second material loading level.
Optionally, the cleaning device further comprises an exhaust partition plate, a plurality of exhaust holes are formed in the exhaust partition plate, and the exhaust partition plate is arranged in the cavity and above the three process tanks and used for isolating an exhaust channel in the cavity.
Optionally, the exhaust hole is adjustable in size.
Optionally, the exhaust partition has a slope portion, and a part of the plurality of exhaust holes is disposed in the slope portion.
Optionally, the cleaning device further comprises a control zone and a chemical zone, wherein:
the chemical area is positioned at one side of the cavity and used for conveying and discharging liquid;
the control area is located above the chemical area, is separated from the chemical area, and is used for controlling an electric circuit and an air circuit of the cleaning device.
Optionally, the first material taking part and the second material taking part are configured to, when the material to be cleaned is carried into the second process tank, if the second process tank is in a non-idle state, wait for the second process tank to be in an idle state, and then carry the material to be cleaned into the second process tank.
The beneficial effect of this application lies in:
the two material taking parts, the two upper and lower material positions and the relative positions of the three parallel process tanks are ingeniously arranged by combining the process characteristics, so that the two parallel cleaning processes are possible to be parallel, and the two parallel cleaning processes can reuse the second process tank, so that when the process of cleaning objects such as quartz tubes or quartz boats waiting for cleaning without hooking is carried out, each process tank can be fully utilized, the problem of vacant process tanks is greatly improved, and the cleaning efficiency of a machine table is remarkably improved.
Drawings
The foregoing and other objects, features and advantages of the application will be apparent from the following more particular descriptions of exemplary embodiments of the application, as illustrated in the accompanying drawings wherein like reference numbers generally represent like parts throughout the exemplary embodiments of the application.
FIG. 1 shows a schematic system diagram of a prior art quartz tube cleaning station;
FIG. 2(a) shows a schematic diagram of another prior art horizontal quartz boat cleaning machine, and FIG. 2(b) shows a system schematic thereof;
FIG. 3 is a schematic diagram of a cleaning apparatus according to an embodiment of the present application;
FIG. 4 is a schematic side view of a cleaning apparatus according to an embodiment of the present disclosure.
Description of reference numerals:
1. a cavity; 2. a first manipulator; 3. a second manipulator; 4. a first hook; 5. a second hook; 6. a first process tank; 7. a second process tank; 8. a third process tank; 9. a first loading level; 10. a second loading position; 11. a quartz tube; 12. a slot cover; 13. a control area; 14. a chemical area; 15. an exhaust duct; 16. an air exhaust channel; 17. a chamber partition.
Detailed Description
The present application will be described in more detail below with reference to the accompanying drawings. While the preferred embodiments of the present application are shown in the drawings, it should be understood that the present application may be embodied in various forms and should not be limited to the embodiments set forth herein. Rather, these embodiments are provided so that this disclosure will be thorough and complete, and will fully convey the scope of the disclosure to those skilled in the art.
The application provides a belt cleaning device for treat the cleaning object in the semiconductor equipment and wash, belt cleaning device includes cavity, first technology groove, second technology groove, third technology groove, first material loading level, second material loading level, first material piece and the second of getting gets the material piece, wherein: the first material loading position and the second material loading position are respectively arranged on the opposite side walls of the cavity; the first process tank, the second process tank and the third process tank are arranged in the cavity and are sequentially arranged between the first material loading position and the second material loading position; the first material taking part is used for carrying the object to be cleaned among the first material loading position, the first process tank and the second process tank, and the second material taking part is used for carrying the object to be cleaned among the second process tank, the third process tank and the second material loading position.
In this application, combine technology characteristics ingenious setting two to get material spare, two upper and lower material levels and the relative position of three process tank side by side for two wash the flow and parallelly become probably. According to the method and the device, the second process tank can be reused by two parallel cleaning processes, so that each process tank can be fully utilized when processes such as cleaning a quartz tube or a quartz boat without unhooking are carried out, the problem of vacant process tanks is greatly improved, and the cleaning efficiency of a machine table is remarkably improved.
Particularly, the inventor analyzes the cleaning process of the quartz tube/quartz boat, and finds that the cleaning time in the ultrapure water is much shorter than the cleaning time in the chemical cleaning liquid, so that the process flow can be designed by combining the cleaning process of the quartz tube/quartz boat on the basis of the structural characteristics of the cleaning device, and the use efficiency of each cleaning tank can be improved to the maximum extent. The cleaning device is particularly suitable for cleaning quartz tubes/quartz boats and the like.
In one example, the first process tank and the third process tank are used for containing process liquid medicine, and the second process tank is used for containing cleaning water. This arrangement is particularly suitable for quartz tubes/boats etc.
Particularly, the cleaning device also comprises a groove cover which covers the first process groove and the third process groove. Because the technology and pharmacy industry often has certain volatility and even corrosivity, when the technology groove is in an idle state, the groove cover can be closed, and the volatilization of liquid medicine is reduced.
Preferably, the slot cover is of a two-half structure, and the top surface of each slot cover is an inclined surface inclined towards the middle. When the manipulator moves the material to be cleaned from the process tank to the upper part of the process tank, the liquid taken out of the process tank can drip, and by adopting the tank cover disclosed by the preferred embodiment, the liquid dripping on the tank cover can flow to the middle seam along the inclined plane and then drip back to the process tank, so that the process and the pharmaceutical industry can be saved, and the pollution to equipment can be avoided.
Specifically, the first material of getting all includes manipulator and lifting hook with the second material of getting, and the lifting hook is located the manipulator end, and the first lifting hook opening of getting the material piece is towards first material loading level, and the second is got the lifting hook opening of material piece and is towards the second material loading level. This arrangement is very convenient for the loading and unloading operations. The first lifting hook and the second lifting hook can comprise two lifting hooks which are arranged in parallel so as to stably bear the object to be cleaned. When the quartz tube is cleaned, the quartz tube frame can be directly arranged on two lifting hooks which are arranged in parallel; when the quartz boat is cleaned, the quartz boat can be firstly placed in the flower basket, and then the flower basket is hooked on the two lifting hooks which are arranged in parallel.
Specifically, the cleaning device further comprises an air exhaust partition plate, a plurality of air exhaust holes are formed in the air exhaust partition plate, and the air exhaust partition plate is arranged in the cavity and located above the three process tanks and used for isolating air exhaust channels in the cavity. The air exhaust channels can be distributed on the periphery and the upper part in the cavity, and also can be distributed on the two sides and the upper part in the cavity. Volatile acid mist and/or water vapor and the like generated by the cleaning agent can be discharged in time through the air exhaust holes and the air exhaust channel, so that the corrosion to equipment is reduced. The cleaning device can be externally connected with an exhaust pipe, the exhaust pipe can be communicated with an exhaust channel, acid mist, water vapor and the like in the exhaust channel are pumped out, and the acid mist and/or the water vapor are discharged.
In one example, the vent holes are adjustable in size. The size of the air exhaust hole can be adjusted by the person skilled in the art according to the needs and the process conditions.
In one example, the exhaust partition has a slope portion, and a part of the plurality of exhaust holes is disposed at the slope portion. The hole is arranged on the slope, so that the area of the hole can be larger.
In one example, the cleaning apparatus further comprises a control zone and a chemical zone, wherein: the chemical area is positioned at one side of the cavity and used for conveying and discharging liquid; the control area is arranged above the chemical area and is separated from the chemical area and used for controlling a circuit and a gas circuit of the cleaning device. The chemical zone is adjacent to the process chamber to facilitate the delivery and drainage of liquids. The control area is far away from the process chamber and is separated from the chemical area, so that the control area is not easily polluted by cleaning agents.
In one example, the first material taking part and the second material taking part are both configured to carry the material to be cleaned into the second process tank after waiting for the second process tank to be in the idle state if the second process tank is in the non-idle state when the material to be cleaned is carried into the second process tank. This is particularly suitable for the process flows with long cleaning time in the first and third process tanks and much cleaning time in the second process tank, such as the cleaning flow of the quartz tube/quartz boat.
The inventor analyzes the cleaning process of the quartz boat/quartz tube and finds that the time for cleaning the material in the ultrapure water is greatly shorter than the time for cleaning the material in the process liquid medicine, so that the two parallel cleaning processes can stagger the use of the second process tank, the characteristics of parallel arrangement of the three process tanks are fully utilized, and the cleaning efficiency is obviously improved.
Examples
Fig. 3 shows a schematic structural diagram of a cleaning apparatus according to an embodiment of the present application. FIG. 4 is a schematic side view of a cleaning apparatus according to an embodiment of the present disclosure.
The cleaning device comprises a chamber 1. This belt cleaning device still includes that the first material piece of getting is got with the second and is got the material piece, and the first material piece of getting includes first manipulator 2 and sets up at the terminal first lifting hook 4 of this first manipulator 2, and the second is got the material piece and is included second manipulator 3 and set up at the terminal second lifting hook 5 of this first manipulator 3. The cleaning device also comprises a first process tank 6, a second process tank 7, a third process tank 8, a first feeding position 9, a second feeding position 10, a tank cover 12, a control area 13, a chemical area 14, an exhaust partition 17 and the like. Wherein the exhaust partition 17 also encloses the exhaust channel 16. The material to be cleaned is shown as a quartz tube 11. In cleaning the quartz boat, the quartz boat may be first placed in the basket and then the basket is hooked on one of the first and second hooks 4 and 5.
In fig. 3, a first process tank 6, a second process tank 7, a third process tank 8, a discharge air duct 16, a discharge air partition 17, and the like are located in a chamber 1. The first robot 2 and the second robot 3 are fixed above the top surface of the chamber 1 and extend from above the chamber 1, and the first robot 2 and the second robot 3 are configured to be capable of elevation and horizontal movement.
The first hook 4 is fixed on the first manipulator 2, and the second hook 5 is fixed on the second manipulator 3 and the manipulator 2 and used for bearing the quartz tube 11.
The first process tank 6 and the third process tank 8 are chemical process tanks for containing process liquid medicine. The process tank 7 is an ultrapure water process tank and is used for containing cleaning water. The three process tanks are arranged side by side, with the second process tank 7 being arranged between the first process tank 6 and the third process tank 8. A first loading level 9 and a second loading level 10 are arranged on opposite side walls of the cavity.
And a groove cover 12 is arranged above the first process groove 6 and the second process groove 8. The slot cover 12 is of a two-half structure, and the rotating shafts are arranged on the left side and the right side of the corresponding process slot. And the top surface of each door of the tank cover 12 is an inclined surface and inclines towards the middle, so that the process liquid medicine is prevented from volatilizing and splashing after the process, the process liquid medicine can be saved, and the equipment is prevented from being polluted.
And the exhaust partition plate 17 is arranged in the cavity and positioned above the first process tank 6, the second process tank 7 and the third process tank 8, and is used for isolating an exhaust channel 16 in the cavity. The exhaust duct 16 is disposed around the upper portion of the chamber (i.e., the exhaust duct 16 is located at the top of the chamber and surrounds the inner sidewall of the chamber). The air exhaust partition 17 is provided with a plurality of air exhaust holes with adjustable sizes. The process liquid medicine volatilized from the first process tank 6 and the third process tank 8, the water vapor volatilized from the second process tank 7 and the like can be discharged to the exhaust passage 16 through the exhaust holes and then discharged through the exhaust pipe 15 arranged outside the cavity body. The exhaust partition 17 has a slope portion at which at least part of the exhaust holes are located.
The chemical area 14 is located on one side of the chamber for transporting and discharging liquid.
The control section 13 is located above the chemical section 14, spaced from the chemical section 14, and is used to control the electrical and pneumatic circuits of the cleaning apparatus.
The flow of cleaning the quartz tube using the above-described cleaning apparatus will be briefly described below. If the quartz boat is cleaned, the quartz boat needs to be placed in the flower basket.
Step 1: injecting process liquid medicine into the first process tank 6 and the third process tank 8, injecting ultrapure water into the second process tank 7, and uniformly injecting the ultrapure water to a set liquid level;
step 2: the first manipulator 2 moves to a first loading position 9, the first loading position 9 is opened, and a quartz tube is loaded:
and step 3: the first manipulator 2 carries the quartz tube to move to the second process tank 7, and the quartz tube is cleaned for the first time, namely, cleaned for the first time;
and 4, step 4: after the first cleaning is finished, the tank cover 12 corresponding to the first process tank 6 is opened, and the first manipulator 2 carries the quartz tube to the first process tank 6 for second cleaning;
and 5: the second manipulator 3 moves to a second loading position 10, the second loading position 10 is opened, and a quartz tube is loaded:
step 6: the second manipulator 3 carries the quartz tube to move to a second process tank 7, and the quartz tube is cleaned for the first time;
and 8: after the cleaning process in the first process tank 6 is completed, if no process exists in the second process tank 7, namely the second process tank is in an idle state, the first manipulator 2 carries the quartz tube to perform a third cleaning in the second process tank 7, and a tank cover above the first process tank 6 is closed; if the second process tank 7 is in the process, the first mechanical arm 2 waits in the first process tank 6, when the second process tank 7 enters an idle state, the first mechanical arm 2 carries a quartz tube to perform third cleaning in the second process tank 7, and after the third cleaning is finished, the first mechanical arm 2 carries the quartz tube to a first feeding position 9 to inform an operator of taking materials;
step 9: after the cleaning process in the third process tank 8 is completed, if no process exists in the second process tank 7, namely the second process tank is in an idle state, the second manipulator 3 carries the quartz tube to perform third cleaning in the second process tank 7, and a tank cover above the third process tank 8 is closed; if the second process tank 7 is in the process, the second manipulator 3 waits in the third process tank 8, and when the second process tank 7 enters an idle state, the second manipulator 3 carries the quartz tube to perform third cleaning in the second process tank 7, and after the third cleaning is finished, the second manipulator 3 carries the quartz tube to a second loading position 10 to inform an operator of taking materials.
Having described embodiments of the present application, the foregoing description is intended to be exemplary, not exhaustive, and not limited to the disclosed embodiments. Many modifications and variations will be apparent to those of ordinary skill in the art without departing from the scope and spirit of the described embodiments.
Claims (10)
1. The utility model provides a cleaning device for treat the cleaning object in the semiconductor equipment and wash, its characterized in that, cleaning device includes cavity, first technology groove, second technology groove, third technology groove, first material loading level, second material loading level, first material spare and the second material spare of getting, wherein:
the first feeding level and the second feeding level are respectively arranged on the opposite side walls of the cavity;
the first process tank, the second process tank and the third process tank are arranged in the cavity and are sequentially arranged between the first feeding level and the second feeding level;
the first material taking part is used for carrying the object to be cleaned among the first material loading position, the first process tank and the second process tank, and the second material taking part is used for carrying the object to be cleaned among the second process tank, the third process tank and the second material loading position.
2. The cleaning apparatus as claimed in claim 1, wherein the first and third process tanks are used for containing process chemicals, and the second process tank is used for containing cleaning water.
3. The cleaning apparatus of claim 2, further comprising a tank cover covering the first process tank and the third process tank.
4. The cleaning device of claim 3, wherein the trough cover is a two-piece structure, and the top surface of each trough cover is a slope inclined towards the middle.
5. The cleaning device of claim 1, wherein the first material taking part and the second material taking part each comprise a manipulator and a hook, the hook is located at the tail end of the manipulator, the hook opening of the first material taking part faces the first material loading position, and the hook opening of the second material taking part faces the second material loading position.
6. The cleaning device of claim 1, further comprising an exhaust partition plate, wherein a plurality of exhaust holes are formed in the exhaust partition plate, and the exhaust partition plate is disposed in the cavity and above the three process tanks for isolating an exhaust channel in the cavity.
7. The cleaning apparatus defined in claim 6, wherein the exhaust aperture is adjustable in size.
8. The cleaning device in accordance with claim 6, wherein said exhaust partition has a sloped portion, and some of said plurality of exhaust holes are provided in said sloped portion.
9. The cleaning device of claim 1, further comprising a control zone and a chemical zone, wherein:
the chemical area is positioned at one side of the cavity and used for conveying and discharging liquid;
the control area is located above the chemical area, is separated from the chemical area, and is used for controlling an electric circuit and an air circuit of the cleaning device.
10. The cleaning apparatus defined in claim 1, wherein the first and second take off members are each configured to, while the material to be cleaned is being conveyed into the second process tank, wait for the second process tank to be idle if the second process tank is not idle, and then convey the material to be cleaned into the second process tank.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202020362014.9U CN212418875U (en) | 2020-03-20 | 2020-03-20 | Cleaning device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202020362014.9U CN212418875U (en) | 2020-03-20 | 2020-03-20 | Cleaning device |
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| Publication Number | Publication Date |
|---|---|
| CN212418875U true CN212418875U (en) | 2021-01-29 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN202020362014.9U Active CN212418875U (en) | 2020-03-20 | 2020-03-20 | Cleaning device |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113560265A (en) * | 2021-06-24 | 2021-10-29 | 安徽万维克林精密装备有限公司 | Horizontal quartz boat cleaning equipment |
-
2020
- 2020-03-20 CN CN202020362014.9U patent/CN212418875U/en active Active
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113560265A (en) * | 2021-06-24 | 2021-10-29 | 安徽万维克林精密装备有限公司 | Horizontal quartz boat cleaning equipment |
| CN113560265B (en) * | 2021-06-24 | 2022-11-01 | 安徽万维克林精密装备有限公司 | Horizontal quartz boat cleaning equipment |
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