CN212253641U - Double-chamber quartz tube structure - Google Patents
Double-chamber quartz tube structure Download PDFInfo
- Publication number
- CN212253641U CN212253641U CN202020966201.8U CN202020966201U CN212253641U CN 212253641 U CN212253641 U CN 212253641U CN 202020966201 U CN202020966201 U CN 202020966201U CN 212253641 U CN212253641 U CN 212253641U
- Authority
- CN
- China
- Prior art keywords
- quartz
- chamber
- furnace gate
- quartzy
- tube
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Images
Landscapes
- Glass Compositions (AREA)
Abstract
The utility model discloses a double-chamber quartz capsule structure, including quartzy technology pipe, the quartzy cavity of furnace gate, ring flange, process gas intake pipe, tail calandria, furnace gate cavity intake pipe and inside and outside double-seal furnace gate, the left end of quartzy technology pipe is provided with the quartzy cavity of furnace gate, the left end of quartzy technology pipe is provided with ring flange, the inside fixed mounting of quartzy technology pipe has the process gas intake pipe, the right-hand member fixed mounting of quartzy technology pipe has the tail calandria, the top fixed mounting of the quartzy cavity of furnace gate has furnace gate cavity intake pipe, the left side of the quartzy cavity of furnace gate is provided with inside and outside double-seal. The utility model discloses a structure to the technology pipe commonly used improves and makes this quartz capsule guarantee that the gaseous reactant in the course of the technology does not persist in mouth of pipe department, and the fire door is clean, keeps well with the encapsulated situation of inside and outside double-seal furnace gate easily, and its simple structure, has wide development space and higher spreading value.
Description
Technical Field
The utility model relates to a semiconductor and photovoltaic trade do low pressure diffusion technology technical field to the wafer, specifically are a two-chamber quartz capsule structure.
Background
The semiconductor refers to a material having a conductivity between a conductor and an insulator at normal temperature. Semiconductors are used in the fields of integrated circuits, consumer electronics, communication systems, photovoltaic power generation, lighting applications, high-power conversion, and the like. Such as diodes, are devices fabricated using semiconductors. The importance of semiconductors is enormous, both from a technological and economic point of view. Most of today's electronic products, such as computers, mobile phones or digital audio recorders, have a core unit closely related to semiconductors. Common semiconductor materials are silicon, germanium, gallium arsenide, etc., and silicon is the most influential of various semiconductor materials in commercial applications.
The process tube conventionally used in the industry is a single-diameter process tube in a quartz process tube structure form, gas reactants in the process can be in a simple sealing mode due to a tube opening, meanwhile, the temperature at the position is high and other reasons, the sealing is often poor, the reactants are remained due to the reaction of oxygen in air leakage at the tube opening, so that the sealing effect of a furnace door and the tube opening is more influenced due to the adhesion of the reactants, the wafers are not smoothly fed and discharged due to the accumulation of a large amount of reactants at the lower part of the furnace opening, and the pollution to the process of subsequent wafers due to the excessive retention of the reactants at the furnace opening can be caused.
SUMMERY OF THE UTILITY MODEL
An object of the utility model is to provide a double-chamber quartz capsule structure to solve the problem that proposes among the above-mentioned background art.
In order to achieve the above object, the utility model provides a following technical scheme: the utility model provides a double-chamber quartz capsule structure, includes quartzy technology pipe, the quartzy cavity of furnace gate, ring flange, process gas intake pipe, tail calandria, furnace gate cavity intake pipe and inside and outside double-seal furnace gate, the left end of quartzy technology pipe is provided with the quartzy cavity of furnace gate, the left end of quartzy technology pipe is provided with ring flange, the inside fixed mounting of quartzy technology pipe has the process gas intake pipe, the right-hand member fixed mounting of quartzy technology pipe has the tail calandria, the top fixed mounting of the quartzy cavity of furnace gate has furnace gate cavity intake pipe, the left side of the quartzy cavity of furnace gate is provided with inside.
Preferably, the furnace door quartz chamber is fixedly installed with the outer diameter of the quartz process tube through welding by an annular flange.
Preferably, the annular port of the quartz chamber of the furnace door is subjected to grinding and processing and is parallel to the annular flange.
Preferably, the tail end of the quartz process tube is provided with a mounting hole matched with the process gas inlet tube and welded.
Preferably, the quartz process tube and the tail discharge tube are connected into a whole and are communicated with each other.
Preferably, the inner and outer double-sealed furnace doors provided with heat insulation materials and quartz bags are matched with the quartz chamber of the furnace door.
Compared with the prior art, the beneficial effects of the utility model are that: the structure of the double-chamber quartz tube is improved by a common process tube, inert gas is filled into a quartz chamber of a furnace door through the gas inlet tube 6 during use, the pressure is slightly higher than the pressure inside the process tube 1, the process gas inside the pressure difference process tube 1 cannot leak, and the existence of oxygen content in the process tube is avoided, so that the quartz tube ensures that gas reactants in the process do not remain at the position of a tube opening, the furnace opening is clean, the sealing state of the inner and outer double-sealing furnace doors is kept good easily, the structure is simple, the realization is easy, and the quartz tube has wide development space and higher popularization value.
Drawings
Fig. 1 is a schematic structural view of the present invention;
FIG. 2 is an enlarged view of the point A in FIG. 1 according to the present invention;
in the figure: 1. a quartz process tube; 2. a furnace door quartz chamber; 3. an annular flange; 4. a process gas inlet pipe; 5. a tail calandria; 6. a furnace door cavity air inlet pipe; 7. an inner and an outer double-sealed furnace doors.
Detailed Description
The technical solutions in the embodiments of the present invention will be described clearly and completely with reference to the accompanying drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only some embodiments of the present invention, not all embodiments. Based on the embodiments in the present invention, all other embodiments obtained by a person skilled in the art without creative work belong to the protection scope of the present invention.
Referring to fig. 1-2, the present invention provides an embodiment: a double-chamber quartz tube structure comprises a quartz process tube 1, a furnace door quartz chamber 2, an annular flange 3, a process gas inlet tube 4, a tail exhaust tube 5, a furnace door chamber inlet tube 6 and an inner and outer double-seal furnace door 7, wherein the left end of the quartz process tube 1 is provided with the furnace door quartz chamber 2, an inner and outer double-seal furnace door which is provided with a heat insulation material and a quartz bag is matched and used between the furnace door quartz chamber 2 and the quartz process tube 1, the annular port of the furnace door quartz chamber 2 is ground and processed to be parallel to the annular flange 3, the left end of the quartz process tube 1 is provided with the annular flange 3, the process gas inlet tube 4 is fixedly arranged inside the quartz process tube 1, the tail end of the quartz process tube 1 is provided with a mounting hole matched with the process gas inlet tube 4 and welded, the right end of the quartz process tube 1 is fixedly provided with the tail exhaust tube 5, and are communicated with each other, the top of the furnace door quartz chamber 2 is fixedly provided with a furnace door chamber air inlet pipe 6, the furnace door quartz chamber 2 is fixedly arranged with the outer diameter of the quartz process pipe 1 through a ring flange 3 by welding, the left side of the furnace door quartz chamber 2 is provided with an inner and an outer double-sealing furnace doors 7, the structure of the common process tube is improved, when in use, inert gas is filled into a quartz cavity of the furnace door through the gas inlet pipe 6, the pressure is slightly higher than the pressure in the process tube 1, because the process gas in the differential pressure process tube 1 can not leak and the oxygen content in the process gas can be avoided, the quartz tube ensures that gas reactant does not remain at the tube opening in the process, the furnace opening is clean and is easy to keep good with the sealing state of the inner and outer double-sealing furnace doors 7, and the structure is simple, the realization is easy, and the method has wide development space and higher popularization value.
The working principle is as follows: the sealing surface of the furnace mouth of the furnace door quartz chamber 2 and the sealing surface in the furnace door chamber of the annular flange 3 are respectively well jointed with the sealing surfaces of the inner and outer double-seal furnace doors 7, so that the furnace door quartz chamber 2 and the inner and outer double-seal furnace doors 7 form an independent furnace door quartz chamber 2, protective gas is introduced through a furnace door chamber gas inlet pipe 6 (with a valve) and has pressure slightly higher than the pressure of process gas in the quartz process tube 1, meanwhile, a tail exhaust pipe 5 (with a valve) is always connected with an air extraction system, waste gas moves backwards from the front and is exhausted from the quartz process tube chamber 1, because the pressure of the furnace door quartz chamber 2 is slightly higher than that of the quartz process tube 1, the gas in the furnace door quartz chamber 2 is allowed to slightly higher than the internal stress of the quartz process tube 1, and slightly leaks from the sealing surface in the furnace door chamber of the annular flange 3 to slightly overflow to the quartz process tube 1, reactants in the, the exhaust function of the tail calandria 5 can only move towards the furnace tail to be discharged, thereby keeping the furnace mouth clean and no reactant accumulation.
It will be evident to those skilled in the art that the invention is not limited to the details of the foregoing illustrative embodiments, and that the present invention may be embodied in other specific forms without departing from the spirit or scope of the present invention. Accordingly, the embodiments of the present invention are exemplary, and not limiting. The scope of the invention is indicated by the appended claims rather than by the foregoing description, and all changes that come within the meaning and range of equivalency of the claims are therefore intended to be embraced therein. Any reference sign in a claim should not be construed as limiting the claim concerned.
Claims (6)
1. The utility model provides a two-chamber quartz capsule structure, includes quartz process tube (1), furnace gate quartz chamber (2), ring flange (3), process gas intake pipe (4), tail calandria (5), furnace gate chamber intake pipe (6) and inside and outside double containment furnace gate (7), its characterized in that: the left end of quartzy technology pipe (1) is provided with furnace gate quartz chamber (2), the left end of quartzy technology pipe (1) is provided with annular flange (3), the inside fixed mounting of quartzy technology pipe (1) has process gas intake pipe (4), the right-hand member fixed mounting of quartzy technology pipe (1) has tail calandria (5), the top fixed mounting of furnace gate quartz chamber (2) has furnace gate chamber intake pipe (6), the left side of furnace gate quartz chamber (2) is provided with inside and outside double-seal furnace gate (7).
2. The twin chamber quartz tube structure of claim 1, wherein: the furnace door quartz chamber (2) is fixedly installed with the outer diameter of the quartz process tube (1) through an annular flange (3) by welding.
3. The twin chamber quartz tube structure of claim 1, wherein: and the annular port of the quartz chamber (2) of the furnace door is ground and processed and is parallel to the annular flange (3).
4. The twin chamber quartz tube structure of claim 1, wherein: the tail end of the quartz process tube (1) is provided with a mounting hole matched with the process gas inlet tube (4) and welded.
5. The twin chamber quartz tube structure of claim 1, wherein: the quartz process tube (1) and the tail discharge tube (5) are connected into a whole and are communicated with each other.
6. The twin chamber quartz tube structure of claim 1, wherein: an inner and outer double-sealed furnace door provided with a heat insulation material and a quartz bag is matched between the furnace door quartz chamber (2) and the quartz process tube (1).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202020966201.8U CN212253641U (en) | 2020-06-01 | 2020-06-01 | Double-chamber quartz tube structure |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202020966201.8U CN212253641U (en) | 2020-06-01 | 2020-06-01 | Double-chamber quartz tube structure |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN212253641U true CN212253641U (en) | 2020-12-29 |
Family
ID=73978985
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202020966201.8U Active CN212253641U (en) | 2020-06-01 | 2020-06-01 | Double-chamber quartz tube structure |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN212253641U (en) |
-
2020
- 2020-06-01 CN CN202020966201.8U patent/CN212253641U/en active Active
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN205011866U (en) | Low pressure diffusion furnace | |
| CN212253641U (en) | Double-chamber quartz tube structure | |
| CN204039548U (en) | A kind of decompression diffusion furnace furnace mouth seal device | |
| CN111504069A (en) | Double-chamber quartz tube structure | |
| CN205789919U (en) | A kind of hydrid integrated circuit aluminium silicon carbide integral packaging shell | |
| CN213845292U (en) | Double-layer reaction cavity structure | |
| CN214937965U (en) | Quartz reaction cavity for gallium nitride material growth | |
| CN212253665U (en) | Quartz double-furnace door structure | |
| CN206268660U (en) | Tongue and groove vacuum flange | |
| CN218146928U (en) | Gas inlet structure for low-pressure chemical vapor deposition and vapor deposition equipment | |
| CN112382553A (en) | Double-layer reaction cavity structure | |
| CN111486712A (en) | Quartz double-furnace door structure | |
| CN203386050U (en) | Wireless monitoring system of storage cabinet inflation system | |
| CN219476703U (en) | Cavity filling plate and loading/unloading cavity | |
| CN203339120U (en) | An air inflation purifying system of a wafer/ photomask sealing carrier | |
| CN2148954Y (en) | Oxidation resisting tungsten-rhenium thermocouple | |
| JP3063509B2 (en) | Manufacturing equipment for thin-film photoelectric conversion elements | |
| CN102332400A (en) | Forming method of semiconductor device | |
| CN217026070U (en) | Gas diffusion assembly, precursor feeding device and vapor deposition system | |
| CN2708499Y (en) | Ultra-high power high-vacuum ceramic cartridge | |
| CN217600917U (en) | Furnace mouth double-sealing device of boron diffusion furnace | |
| CN220935337U (en) | Inert gas box for ultra-high temperature electric heating element | |
| CN206040632U (en) | Ultra -thin surface -mounted diode | |
| JPS62209871A (en) | Manufacture of photovoltaic device | |
| CN217636703U (en) | Diffusion equipment |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| TR01 | Transfer of patent right |
Effective date of registration: 20211210 Address after: 214000 three comma maker spaces in the east of 1 / F, building 6, Ruiyun, No. 99, Furong Zhongsan Road, Xishan District, Wuxi City, Jiangsu Province Patentee after: Sairuida intelligent electronic equipment (Wuxi) Co.,Ltd. Address before: 266000 f / F, 1022 Beilao Road, Licang District, Qingdao City, Shandong Province Patentee before: QINGDAO SUNRED ELECTRONIC EQUIPMENT Co.,Ltd. |
|
| TR01 | Transfer of patent right | ||
| CP03 | Change of name, title or address |
Address after: 214000 workshop and office space on the south side of the first floor of Plant No. 4, precision machinery industrial park, Xishan District, Wuxi City, Jiangsu Province Patentee after: Sairuida Intelligent Electronic Equipment (Wuxi) Co.,Ltd. Address before: 214000 three comma maker spaces in the east of 1 / F, building 6, Ruiyun, No. 99, Furong Zhongsan Road, Xishan District, Wuxi City, Jiangsu Province Patentee before: Sairuida intelligent electronic equipment (Wuxi) Co.,Ltd. |
|
| CP03 | Change of name, title or address |