CN213845292U - Double-layer reaction cavity structure - Google Patents
Double-layer reaction cavity structure Download PDFInfo
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- CN213845292U CN213845292U CN202022645565.9U CN202022645565U CN213845292U CN 213845292 U CN213845292 U CN 213845292U CN 202022645565 U CN202022645565 U CN 202022645565U CN 213845292 U CN213845292 U CN 213845292U
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Abstract
The utility model relates to a double-layer reaction cavity structure, which comprises a furnace mouth, a cavity and a furnace tail; the cavity is arranged between the furnace mouth and the furnace tail; the cavity comprises an inner cavity and an outer cavity, and the inner cavity is arranged inside the outer cavity; the outer layer cavity is respectively and fixedly connected with the furnace mouth and the furnace tail; the inner cavity is detachably connected with the furnace mouth and is also connected with the furnace tail; through the structure that sets up inlayer cavity and outer cavity, form the membrane on the inlayer cavity, bear vacuum pressure by outer cavity, realize the separation of membrane stress and vacuum pressure, and then strengthen the bearing capacity of cavity.
Description
Technical Field
The utility model relates to a semiconductor and solar photovoltaic cell make the field, especially relate to a double-deck reaction cavity structures.
Background
Diffusion equipment is one of the important equipment in semiconductor device technology, and is widely applied to industries such as integrated circuits, power electronics, solar cell production and the like. In the photovoltaic industry, a high-temperature diffusion furnace is mainly used for doping monocrystalline silicon wafers and polycrystalline silicon wafers to form PN junctions; the annealing equipment mainly performs the functions of annealing, activation and the like; the low-pressure chemical vapor deposition (LPCVD) equipment is mainly used for film growth and can be used for film growth of intrinsic amorphous silicon, doped amorphous silicon, silicon oxide and the like; the Plasma Enhanced Chemical Vapor Deposition (PECVD) equipment mainly plays a role in the process flow of the solar photovoltaic cell and can be used for growing films of silicon nitride, aluminum oxide, intrinsic silicon, doped amorphous silicon and the like. One of the common characteristics of the diffusion equipment, the annealing equipment, the LPCVD equipment and the PECVD equipment is that a cavity is formed to enable the silicon wafer to be processed in the cavity. At present, the conventional furnace tubes are all single-layer and are mostly made of quartz materials. The furnace tube wall of the furnace tube can be gradually plated with a thick film along with the operation process, and for example, LPCVD equipment can be gradually plated with a layer of amorphous silicon in the process due to the fact that the film material is different from quartz in property. The thicker film can generate stress with the wall of the quartz furnace tube, the pressure born by the furnace tube is larger under the vacuum degree of dozens of millitorr, and the stress generated by the film can more easily cause the furnace tube to break, thereby causing the process failure, the reworking and even the crushing of a process silicon wafer, and the damage to a quartz boat, a thermocouple, an air inlet pipe and the like in the furnace tube. In addition, equipment is shut down for maintenance, and the cracked furnace tube wall made of quartz material can damage a thermal field to cause secondary damage. Therefore, a double-layer reaction cavity structure is needed to enhance the bearing capacity of the furnace body.
Disclosure of Invention
The utility model aims at solving the defects of the prior art, providing a double-layer reaction cavity structure with simple structure and convenient use.
A double-layer reaction cavity structure comprises a furnace mouth, a cavity and a furnace tail; the cavity is arranged between the furnace mouth and the furnace tail; the cavity comprises an inner cavity and an outer cavity, and the inner cavity is arranged inside the outer cavity; the outer layer cavity is respectively and fixedly connected with the furnace mouth and the furnace tail; the inner cavity is detachably connected with the furnace mouth and is also connected with the furnace tail.
Further, the furnace mouth comprises a furnace mouth outer flange, a furnace mouth inner flange, a water cooling pipeline and a gas pipeline; the furnace mouth outer flange is arranged at one end of the cavity, the furnace mouth inner flange is sleeved on the periphery of the cavity, and the furnace mouth inner flange and the furnace mouth outer flange are arranged in a clinging manner; the water cooling pipelines are arranged on the furnace mouth outer flange and the furnace mouth inner flange; the gas pipeline is arranged on a flange outside the furnace mouth.
Further, a first sealing ring is arranged between the furnace opening inner flange and the furnace opening outer flange; and a second sealing ring is arranged between the outer flange of the furnace opening and the inner-layer cavity.
Further, the outer flange of the furnace mouth is detachably connected with the inner-layer cavity; and a buffer block is arranged between the furnace mouth outer flange and the end surface of the outer layer cavity.
Further, the water-cooling pipeline comprises a water inlet, a water outlet, a connecting pipe and a water-cooling inner pipe; the water-cooling inner pipe is arranged on the furnace mouth inner flange and the furnace mouth outer flange respectively, and the water-cooling inner pipe is arranged close to the first sealing ring; the water inlet is arranged on the furnace mouth outer flange, and the water outlet is arranged on the furnace mouth inner flange; and a connecting pipe is arranged between the water-cooling inner pipe of the flange in the furnace mouth and the water-cooling inner pipe of the flange outside the furnace mouth.
Further, the furnace tail comprises a furnace tail outer flange, a furnace tail inner flange, a furnace tail cover, a support ring, a heat insulation plate and a tail discharge port; the furnace tail cover is arranged at one end of the cavity far away from the furnace opening; the support ring, the heat insulation plate and the tail discharge port are all arranged on the furnace tail cover; the furnace tail outer flange is arranged at one end, far away from the furnace opening, of the cavity, the furnace tail inner flange is sleeved on the periphery of the cavity, and the furnace tail inner flange and the furnace tail outer flange are arranged in a clinging mode.
Further, a third sealing ring is arranged between the furnace tail inner flange and the furnace tail outer flange; and a fourth sealing ring is arranged between the furnace tail outer flange and the furnace tail cover.
Furthermore, the support ring is annular, and one end of the support ring is fixedly connected with the furnace tail cover; the outer diameter of the support ring is smaller than the inner diameter of the inner-layer cavity, and the inner-layer cavity is sleeved on the periphery of the support ring.
Further, the furnace tail cover is also provided with a heat insulation plate, and the heat insulation plate is arranged in parallel with the furnace tail cover; and a support column is arranged between the heat insulation plate and the furnace tail cover.
Further, the heat insulation plate and the support ring are arranged on the same side of the furnace tail cover; the tail discharge port and the heat insulation plate are respectively positioned at two sides of the furnace tail cover; the tail discharge port comprises a nitrogen pipeline and a furnace tail pipeline; and a buffer block is arranged between the furnace tail outer flange and the end surface of the outer layer cavity.
The utility model has the advantages that:
the inner layer cavity and the outer layer cavity are arranged to form a film on the inner layer cavity, and the outer layer cavity bears vacuum pressure, so that the separation of film stress and the vacuum pressure is realized, and the bearing capacity of the cavity is further enhanced;
a first sealing ring is arranged between the furnace opening inner flange and the furnace opening outer flange, a third sealing ring is arranged between the furnace tail inner flange and the furnace tail outer flange, and a fourth sealing ring is arranged between the furnace tail outer flange and the furnace tail cover, so that the inside and the outside of the cavity are sealed and isolated;
the buffer blocks are arranged on the furnace tail outer flange and the furnace opening outer flange, so that the furnace tail outer flange is prevented from colliding with the outer layer cavity, or the furnace opening outer flange is prevented from colliding with the outer layer cavity;
by arranging the second sealing ring between the outer flange of the furnace mouth and the inner cavity and arranging the nitrogen channel to ventilate the interlayer between the inner cavity and the outer cavity, the gas in the inner cavity is prevented from entering the interlayer between the inner cavity and the outer cavity, and a coating film is prevented from being formed on the inner wall of the outer cavity.
Drawings
Fig. 1 is an overall structure diagram of a first embodiment of the present invention;
FIG. 2 is a structural diagram of a combined oven door according to an embodiment of the present invention;
FIG. 3 is a cross-sectional view of an embodiment of the present invention;
FIG. 4 is an enlarged view of portion A of FIG. 3;
FIG. 5 is a schematic view of a furnace mouth according to an embodiment of the present invention;
fig. 6 is an enlarged schematic view of part B of fig. 3.
The attached drawings indicate the following: the furnace mouth comprises a furnace mouth 1, a furnace mouth outer flange 11, a sealing ring II 12, a buffer block 13, a furnace mouth inner flange 14, a sealing ring I15, a water-cooling pipeline 16, a water inlet 161, a water outlet 162, a connecting pipe 163, a water-cooling inner pipe 164, a gas pipeline 17, a cavity 2, an inner layer cavity 21, an outer layer cavity 22, a furnace tail 3, a furnace tail outer flange 31, a sealing ring III 32, a furnace tail inner flange 33, a furnace tail cover 34, a sealing ring IV 35, a supporting ring 36, a heat insulation plate 37, a tail gate 38, a nitrogen pipeline 381 and a furnace tail pipeline 382.
Detailed Description
The following description of the embodiments of the present invention is provided for illustrative purposes, and other advantages and effects of the present invention will be readily apparent to those skilled in the art from the disclosure herein. The present invention can also be implemented or applied through other different specific embodiments, and various details in the present specification can be modified or changed based on different viewpoints and applications without departing from the spirit of the present invention. It is to be noted that the features in the following embodiments and examples may be combined with each other without conflict.
It should be noted that the drawings provided in the following embodiments are only for illustrating the basic concept of the present invention, and the components related to the present invention are only shown in the drawings rather than drawn according to the number, shape and size of the components in actual implementation, and the form, amount and ratio of the components in actual implementation may be changed at will, and the layout of the components may be more complicated.
The first embodiment is as follows:
as shown in fig. 1-3, a double-layer reaction cavity 2 structure comprises a furnace mouth 1, a cavity 2 and a furnace tail 3; the cavity 2 is arranged between the furnace mouth 1 and the furnace tail 3. The cavity 2 comprises an inner cavity 21 and an outer cavity 22, and the inner cavity 21 is arranged inside the outer cavity 22; the outer layer cavity 22 is respectively fixedly connected with the furnace mouth 1 and the furnace tail 3; the inner cavity 21 is detachably connected with the furnace mouth 1, and the inner cavity 21 is also connected with the furnace tail 3.
As shown in fig. 4, the furnace mouth 1 includes a furnace mouth outer flange 11, a furnace mouth inner flange 14, a water cooling pipe 16, and a gas pipe 17. The furnace mouth outer flange 11 is arranged at one end of the cavity 2, the furnace mouth inner flange 14 is sleeved at the periphery of the cavity 2, and the furnace mouth inner flange 14 and the furnace mouth outer flange 11 are arranged in a clinging manner. The water cooling pipeline 16 is arranged on the furnace mouth outer flange 11 and the furnace mouth inner flange 14, and the temperature of the furnace mouth outer flange 11 and the furnace mouth inner flange 14 is reduced through the water cooling pipeline 16. The gas pipeline 17 is arranged on the furnace mouth outer flange 11, and gas is introduced into the cavity 2 through the gas pipeline 17. The furnace mouth inner flange 14 is fixedly sleeved on the periphery of the outer layer cavity 22, and the furnace mouth outer flange 11 is arranged at one end of the outer layer cavity 22. A first sealing ring 15 is arranged between the furnace opening inner flange 14 and the furnace opening outer flange 11, and the furnace opening outer flange 11 and the furnace opening inner flange 14 seal the outer layer cavity 22 through extruding the first sealing ring 15. A second sealing ring 12 is further arranged between the furnace mouth outer flange 11 and the inner cavity 21, the second sealing ring 12 is used for reducing gas circulation between the inner cavity 21 and the outer cavity 22, and it should be noted that the inner cavity 21 and the outer cavity 22 are not isolated. The water-cooled duct 16 includes a water inlet 161, a water outlet 162, a connection pipe 163, and a water-cooled inner pipe 164. The water-cooling inner pipe 164 is respectively arranged on the furnace mouth inner flange 14 and the furnace mouth outer flange 11, and the water-cooling inner pipe 164 is arranged close to the first sealing ring 15; the water inlet 161 is arranged on the furnace mouth outer flange 11, and the water outlet 162 is arranged on the furnace mouth inner flange 14; a connecting pipe 163 is also provided between the water-cooled inner pipe 164 of the furnace port inner flange 14 and the water-cooled inner pipe 164 of the furnace port outer flange 11. The external furnace mouth flange 11 is also detachably connected, in this embodiment by a screw thread, to the inner chamber 21. A buffer block 13 is arranged between the end faces of the furnace mouth outer flange 11 and the outer layer cavity 22, so that one end, close to the furnace mouth 1, of the outer layer cavity 22 is prevented from directly colliding with the furnace mouth outer flange 11.
As shown in fig. 5 and 6, the furnace tail 3 comprises a furnace tail outer flange 31, a furnace tail inner flange 33, a furnace tail cover 34, a support ring 36, a heat insulation plate 37 and a tail discharge port 38. The furnace tail cover 34 is arranged at one end of the cavity 2 far away from the furnace mouth 1; the support ring 36, the heat shield 37, and the exhaust outlet 38 are disposed on the furnace tail cover 34. The furnace tail outer flange 31 is arranged at one end of the cavity 2 far away from the furnace opening 1, the furnace tail inner flange 33 is sleeved on the periphery of the cavity 2, and the furnace tail inner flange 33 and the furnace tail outer flange 31 are arranged in a clinging mode. Similar to the furnace mouth 1, a third sealing ring 32 is arranged between the furnace tail inner flange 33 and the furnace tail outer flange 31, and the furnace tail outer flange 31 and the furnace tail inner flange 33 seal the outer-layer cavity 22 by extruding the third sealing ring 32. A fourth sealing ring 35 is further arranged between the furnace tail outer flange 31 and the furnace tail cover 34, and the inside of the cavity 2 is sealed through the fourth sealing ring 35. The support ring 36 is annular, one end of the support ring 36 is fixedly connected with the furnace tail cover 34, and when the furnace tail cover 34 is combined with the cavity 2, the support ring 36 is positioned in the cavity 2. The outer diameter of the support ring 36 is smaller than the inner diameter of the inner cavity 21, and the inner cavity 21 is sleeved on the periphery of the support ring 36, so that the inner cavity 21 of the furnace tail 3 is supported. The furnace tail cover 34 is also provided with a heat insulation plate 37, the heat insulation plate 37 is arranged in parallel with the furnace tail cover 34, and a support column is arranged between the heat insulation plate 37 and the furnace tail cover 34. The heat shield 37 and the support ring 36 are disposed on the same side of the furnace tail cover 34; the exhaust port 38 and the heat shield 37 are respectively located at both sides of the furnace tail cover 34, and the exhaust port 38 includes a nitrogen pipe 381 and a furnace tail pipe 382. The nitrogen pipe 381 is used for ventilating the space between the outer cavity 22 and the inner cavity 21, and reducing the reaction gas of the inner cavity 21 from entering the interlayer between the inner cavity 21 and the outer cavity 22. A buffer block 13 is arranged between the furnace tail outer flange 31 and the end face of the outer cavity 22, so that one end of the outer cavity 22 close to the furnace tail 3 is prevented from directly colliding with the furnace tail outer flange 31.
The furnace tail outer flange 31 and the furnace tail inner flange 33 are also provided with water cooling pipes 16.
In the implementation process, the furnace mouth 1 is used for leading in the paddle and is connected with a furnace door; through setting up inlayer cavity 21 and outer cavity 22, and with inlayer cavity 21 and furnace mouth flange 11 threaded connection, inlayer cavity 21 still cup joints on support ring 36 simultaneously, realize the fixed of inlayer cavity 21, through the structure that sets up inlayer cavity 21 and outer cavity 22, because in the course of the technology, inlayer cavity 21 is located between outer cavity 22 and the silicon chip, make inlayer cavity 21 form the coating film in the course of the technology and form on inlayer cavity 21, in addition because the inlayer cavity 21 is not totally enclosed between outer cavity 22, therefore the vacuum pressure is born by outer cavity 22, separate the stress and the vacuum pressure of membrane, strengthen the bearing capacity of cavity 2.
The above description is only one specific example of the present invention and does not constitute any limitation to the present invention. It will be apparent to those skilled in the art that various modifications and variations in form and detail may be made without departing from the principles and structures of the invention without departing from the spirit and scope of the invention, but such modifications and variations are within the purview of the appended claims.
Claims (10)
1. A double-layer reaction cavity structure is characterized by comprising a furnace mouth, a cavity and a furnace tail; the cavity is arranged between the furnace mouth and the furnace tail; the cavity comprises an inner cavity and an outer cavity, and the inner cavity is arranged inside the outer cavity; the outer layer cavity is respectively and fixedly connected with the furnace mouth and the furnace tail; the inner cavity is detachably connected with the furnace mouth and is also connected with the furnace tail.
2. The double-layer reaction chamber structure as claimed in claim 1, wherein the furnace mouth comprises a furnace mouth outer flange, a furnace mouth inner flange, a water cooling pipeline and a gas pipeline; the furnace mouth outer flange is arranged at one end of the cavity, the furnace mouth inner flange is sleeved on the periphery of the cavity, and the furnace mouth inner flange and the furnace mouth outer flange are arranged in a clinging manner; the water cooling pipelines are arranged on the furnace mouth outer flange and the furnace mouth inner flange; the gas pipeline is arranged on a flange outside the furnace mouth.
3. The double-layer reaction cavity structure as claimed in claim 2, wherein a first sealing ring is arranged between the furnace mouth inner flange and the furnace mouth outer flange; and a second sealing ring is arranged between the outer flange of the furnace opening and the inner-layer cavity.
4. The double-layer reaction cavity structure of claim 2, wherein the outer furnace mouth flange is detachably connected with the inner cavity; and a buffer block is arranged between the furnace mouth outer flange and the end surface of the outer layer cavity.
5. The double-layer reaction chamber structure as claimed in claim 2, wherein the water-cooling pipeline comprises a water inlet, a water outlet, a connecting pipe and a water-cooling inner pipe; the water-cooling inner pipe is arranged on the furnace mouth inner flange and the furnace mouth outer flange respectively, and the water-cooling inner pipe is arranged close to the first sealing ring; the water inlet is arranged on the furnace mouth outer flange, and the water outlet is arranged on the furnace mouth inner flange; and a connecting pipe is arranged between the water-cooling inner pipe of the flange in the furnace mouth and the water-cooling inner pipe of the flange outside the furnace mouth.
6. The double-layer reaction cavity structure of claim 1, wherein the furnace tail comprises a furnace tail outer flange, a furnace tail inner flange, a furnace tail cover, a support ring, a heat insulation plate and a tail discharge port; the furnace tail cover is arranged at one end of the cavity far away from the furnace opening; the support ring, the heat insulation plate and the tail discharge port are all arranged on the furnace tail cover; the furnace tail outer flange is arranged at one end, far away from the furnace opening, of the cavity, the furnace tail inner flange is sleeved on the periphery of the cavity, and the furnace tail inner flange and the furnace tail outer flange are arranged in a clinging mode.
7. The double-layer reaction cavity structure as claimed in claim 6, wherein a third sealing ring is arranged between the furnace tail inner flange and the furnace tail outer flange; and a fourth sealing ring is arranged between the furnace tail outer flange and the furnace tail cover.
8. The double-layer reaction cavity structure of claim 6, wherein the support ring is annular, and one end of the support ring is fixedly connected with the furnace tail cover; the outer diameter of the support ring is smaller than the inner diameter of the inner-layer cavity, and the inner-layer cavity is sleeved on the periphery of the support ring.
9. The double-layer reaction cavity structure of claim 8, wherein the furnace tail cover is further provided with a heat insulation plate, and the heat insulation plate is arranged in parallel with the furnace tail cover; and a support column is arranged between the heat insulation plate and the furnace tail cover.
10. The double-layered reaction chamber structure of claim 9, wherein the heat insulating plate and the support ring are disposed on the same side of the furnace tail cover; the tail discharge port and the heat insulation plate are respectively positioned at two sides of the furnace tail cover; the tail discharge port comprises a nitrogen pipeline and a furnace tail pipeline; and a buffer block is arranged between the furnace tail outer flange and the end surface of the outer layer cavity.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202022645565.9U CN213845292U (en) | 2020-11-16 | 2020-11-16 | Double-layer reaction cavity structure |
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| CN202022645565.9U CN213845292U (en) | 2020-11-16 | 2020-11-16 | Double-layer reaction cavity structure |
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| CN213845292U true CN213845292U (en) | 2021-07-30 |
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| CN202022645565.9U Active CN213845292U (en) | 2020-11-16 | 2020-11-16 | Double-layer reaction cavity structure |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112382553A (en) * | 2020-11-16 | 2021-02-19 | 拉普拉斯(无锡)半导体科技有限公司 | Double-layer reaction cavity structure |
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2020
- 2020-11-16 CN CN202022645565.9U patent/CN213845292U/en active Active
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112382553A (en) * | 2020-11-16 | 2021-02-19 | 拉普拉斯(无锡)半导体科技有限公司 | Double-layer reaction cavity structure |
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