CN211771524U - Film forming apparatus - Google Patents
Film forming apparatus Download PDFInfo
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- CN211771524U CN211771524U CN201922370400.2U CN201922370400U CN211771524U CN 211771524 U CN211771524 U CN 211771524U CN 201922370400 U CN201922370400 U CN 201922370400U CN 211771524 U CN211771524 U CN 211771524U
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- film forming
- yoke plate
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- forming apparatus
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Abstract
The utility model provides a film forming device, this film forming device pass through the magnet adsorption mask and fix the mask on the base plate, via the mask is right the base plate carries out the film forming, a serial communication port, film forming device possesses magnetic force application mechanism, magnetic force application mechanism includes: a yoke plate; a magnet attached to a first surface of the yoke plate facing an evaporation source side, the magnet applying a magnetic force to the mask through the substrate; and a frame provided on a second surface of the yoke plate on a side opposite to the first surface, the frame being provided with a tilt adjustment mechanism for adjusting a tilt of the yoke plate with respect to the substrate.
Description
Technical Field
The present invention relates to a film forming apparatus, and more particularly to a film forming apparatus which can easily adjust the inclination of a yoke plate at low cost.
Background
Recently, organic EL display devices have attracted attention as flat panel display devices. An element of an organic EL display device has a basic structure in which an organic material layer for generating light emission is formed between two electrodes (cathode and anode) facing each other. The organic layer and the electrode layer of the organic EL display device element are formed in the following manner: an evaporation material evaporated by heating an evaporation source provided in a lower portion of a chamber of a film forming apparatus is evaporated on a lower surface of a substrate placed in an upper portion of the chamber through a mask having a pixel pattern formed thereon.
In the chamber of such a deposition apparatus of the vapor deposition upward method, the substrate is held by the substrate holder, the electrostatic chuck is provided above the substrate, and the upper surface of the substrate is attracted to the electrostatic chuck by applying a voltage to the electrostatic chuck. The alignment step of adjusting the relative position of the substrate and the mask is performed by relatively moving the substrate attracted by the electrostatic chuck in the horizontal direction with respect to the mask.
In a state where the substrate subjected to the alignment is placed on the upper surface of the mask, the magnetic plate is lowered from the upper portion of the substrate and is brought into contact with the upper surface of the substrate via the electrostatic chuck. Before the magnetic plate is brought into close contact with the mask by applying a magnetic force to the mask through the substrate, the horizontal relative position between the magnetic plate and the mask is adjusted by an alignment stage that moves the magnetic plate or the like in the horizontal direction. However, this adjustment is only to adjust the relative position of the magnetic plate and the mask in the horizontal direction, and does not take into account the inclination of the magnetic plate with respect to the substrate or the mask.
In recent years, as the organic EL display device has been increased in area, the areas of the substrate, the mask, and the magnetic plate for applying a magnetic force to the mask have also increased. This causes the yoke plate to which the magnetic plate is attached to be easily deformed by itself such as bending undulation. In order to obtain a good adhesion accuracy between the substrate and the mask by uniformly applying a magnetic force to the mask by the magnetic plate, the entire surface of the magnetic plate needs to be flat and parallel to the substrate.
In order to solve this problem, the following solutions are proposed: the mounting plate is arranged on the side opposite to the side of the yoke plate where the magnet is arranged for mounting the yoke plate, the rib structure is arranged above the mounting plate to strengthen the strength of the mounting plate, the mounting plate and the yoke plate are respectively provided with corresponding screw holes, and the mounting plate and the yoke plate are fixed with each other through screws. In addition, a yoke plate inclination adjusting screw is arranged between the mounting plate and the yoke plate. The mounting plate is provided with a threaded hole for mounting the yoke plate inclination adjusting screw. The screw is screwed into the screw hole of the mounting plate and protrudes to abut against the yoke plate, thereby adjusting the gap between the yoke plate and the mounting plate, and further adjusting the inclination of the yoke plate relative to the base plate.
With the above arrangement, the inclination, the bending undulation, and the like of the yoke plate can be corrected by the yoke plate inclination adjusting screw based on the rigidity of the attachment plate and the rib.
However, since the fixing screws are provided, the gap between the yoke plate and the mounting plate where the fixing screws are provided cannot be adjusted, and thus, the effect of adjusting the inclination and bending undulation of the yoke plate by this structure is limited.
SUMMERY OF THE UTILITY MODEL
The present invention has been made to solve the above problems, and a main object of the present invention is to provide a film forming apparatus which is inexpensive and can easily adjust the inclination of a yoke plate.
In order to realize the purpose, the utility model discloses a technical scheme as follows:
a film deposition apparatus for fixing a mask to a substrate by attracting the mask with a magnet and depositing a film on the substrate through the mask,
the film forming apparatus includes a magnetic force applying mechanism including:
a yoke plate;
a magnet attached to a first surface of the yoke plate facing an evaporation source side, the magnet applying a magnetic force to the mask through the substrate;
and a frame provided on a second surface of the yoke plate on a side opposite to the first surface, and provided with a tilt adjusting mechanism for adjusting a tilt of the yoke plate with respect to the substrate.
Preferably, the frame comprises a plurality of connected ribs.
Preferably, the rib is an angle structure including a first plate perpendicular to the yoke plate and a second plate parallel to the yoke plate.
Preferably, the rib includes an external rib constituting an outer frame of the frame.
Preferably, the rib further includes:
a plurality of first main inner rib portions perpendicular to a long side direction of the frame, both ends of the first main inner rib portions being connected to the outer rib portions;
a plurality of second main inner rib portions parallel to a long side direction of the frame, both ends of the second main inner rib portions being connected to the outer rib portions; and
and the connecting part is perpendicular to the long side direction of the frame, and two ends of the connecting part are respectively connected with the outer rib part and the second main inner rib part which are parallel and close to each other.
Preferably, the rib further includes:
a plurality of first sub inner rib portions perpendicular to a longitudinal direction of the frame, both ends of the first sub inner rib portions being connected to the second main inner rib portions, respectively;
and the second auxiliary inner rib parts are parallel to the long side direction of the frame, and two ends of the second auxiliary inner rib parts are respectively connected with the first main inner rib parts.
Preferably, the tilt adjusting mechanism includes:
a fixing block fixed to the frame, at least a portion of the fixing block protruding toward the yoke plate with respect to the frame, the fixing block being provided with a screw hole perpendicular to the yoke plate;
the outer diameter of the adjusting column is provided with threads so as to be jointed with the threaded hole of the fixed block, and a stepped hole perpendicular to the magnetic yoke plate is formed;
a nut having an inner diameter formed with threads to engage the outer threads of the adjustment post; and
a screw including a head and a shaft, at least a portion of an outer diameter of the shaft of the screw being threaded, the screw passing through the stepped bore of the adjustment post to engage the threaded bore in the yoke plate.
Preferably, the large hole portion of the stepped hole of the adjustment column is provided as a torque transmission portion.
Preferably, the tilt adjusting mechanism is provided at least at four corners of the outer rib.
Preferably, the tilt adjusting mechanism is provided at an intersection of the first main inner rib and the outer rib.
Preferably, the tilt adjusting mechanism is provided between the first sub inner rib and the outer rib.
Preferably, the tilt adjusting mechanism is provided between the first sub inner rib and the first main inner rib.
Preferably, the film formation apparatus includes a chamber, and the yoke plate is suspended in the chamber by the connecting portion.
Technical effects
Through the above structure of the utility model, only utilize the frame that has the rib portion can effectively and the intensity of reinforcing yoke plate with balancing, consequently, can save the mounting panel that strengthens yoke plate intensity to can reduce the part quantity of magnetic force applying mechanism, can reduce cost.
In addition, through the above structure of the present invention, the yoke plate and the frame can be integrated with the tilt adjusting structure, and the gap between the yoke plate and the frame can be adjusted, so that the yoke plate can be more easily made parallel to the substrate. As a result, the magnet attached to the first surface of the yoke plate on the evaporation source side becomes parallel to the substrate, and as a result, the magnetic field generated by the magnet with respect to the mask becomes uniform and stable, the magnetic force applied to the mask by the magnet becomes uniform and stable, and the mask can be uniformly attracted to the substrate, thereby improving the film formation accuracy.
Drawings
Fig. 1 is a schematic diagram of a part of a production line of an organic EL display device.
FIG. 2 is a schematic view of a film forming apparatus.
Fig. 3 is a perspective view of the magnetic force applying mechanism of the present invention.
Fig. 4 is a sectional perspective view of a tilt adjusting mechanism in the magnetic force applying mechanism of the present invention.
Fig. 5 is a front sectional view of the tilt adjusting mechanism in the magnetic force applying mechanism of the present invention.
Description of the reference numerals
10 base plate
20 chamber
21 substrate holding table
22 mask holding stage
221: mask and method for manufacturing the same
23 substrate adsorption mechanism
24 magnetic force applying mechanism
241: magnetic yoke plate
242: magnet
243: frame structure
243A: first plate
243B: second plate
2431: outer rib part
2432: first main inner rib
2433: second main inner rib
2434: connecting part
2435: first sub inner rib
2436: second pair of inner ribs
244: tilt adjustment mechanism
2441: fixed block
2442: adjusting column
2443: nut
2444: screw nail
25: evaporation source
Detailed Description
Hereinafter, preferred embodiments of the present invention will be described with reference to the drawings. However, the following embodiments are merely exemplary of preferred configurations of the present invention, and the scope of the present invention is not limited to these configurations.
Fig. 1 is a plan view schematically showing a part of the structure of a production line of a display panel of an organic EL display device. As shown in fig. 1, a production line of electronic equipment generally has a plurality of film forming chambers 11, 12 and a transfer chamber 13. A transfer robot 14 that holds and transfers the substrate 10 is provided in the transfer chamber 13. The transfer robot 14 is, for example, a robot having a structure in which a robot hand for holding a substrate is attached to an articulated arm, and performs input/output of the substrate 10 to/from each film forming chamber. Each of the film forming chambers 11 and 12 is provided with a film forming device. A series of film formation steps, such as transfer of the substrate 10 to the transfer robot 14, alignment of the substrate 10 with the mask, fixing of the substrate 10 to the mask, and film formation, are automatically performed by the film formation apparatus.
Hereinafter, the structure of the film forming apparatus in the film forming chamber will be briefly described.
Fig. 2 is a sectional view schematically showing the structure of the film formation apparatus 2. The film formation apparatus 2 includes a chamber 20. The inside of the chamber 20 is maintained in a vacuum atmosphere or an inert gas atmosphere such as nitrogen gas. A substrate holding table 21 for holding a substrate, a mask holding table 22 for holding a mask, a substrate suction mechanism 23 for sucking the substrate, a magnetic force applying mechanism 24 for applying a magnetic force to a metal mask, and the like are provided in an upper portion in the chamber 20 of the film forming apparatus 2. A vapor deposition source 25 for storing a vapor deposition material, and the like, are provided in a lower portion of the chamber 20 of the film forming apparatus.
The substrate holding base 21 is a frame-shaped mechanism on which the substrate 10 received from the transfer robot 14 of the transfer chamber 13 is placed. A frame-shaped mask holding table 22 fixed to the chamber 20 is provided below the substrate holding table 21, and a mask 221 having an opening pattern corresponding to the thin film pattern formed on the substrate 10 is placed on the mask holding table 22. A substrate suction mechanism 23 for sucking and fixing the substrate is provided above the support portion of the substrate holding table 21. A magnetic force applying mechanism 24 is provided above the substrate adsorbing mechanism 23, and the magnetic force applying mechanism 24 applies a magnetic force to the metal mask 221 to bring the mask 221 into close contact with the substrate 10. The vapor deposition source 25 includes a crucible (not shown) for containing a vapor deposition material to be deposited on a substrate, a heater (not shown) for heating the crucible, a shutter (not shown) for preventing the vapor deposition material from being scattered toward the substrate until the evaporation rate from the vapor deposition source becomes constant, and the like. An elevating mechanism for vertically elevating the substrate adsorption mechanism 23, the magnetic force application mechanism 24, and the like, and an alignment stage for horizontally moving the substrate adsorption mechanism 23, the magnetic force application mechanism 24, and the like are provided on an outer upper surface of the chamber 20 of the film formation apparatus 2.
Although not shown in the drawings, a cooling plate (not shown) for cooling the substrate may be provided between the substrate adsorption mechanism 23 and the magnetic force application mechanism 24. The cooling plate may be formed integrally with the substrate adsorption mechanism 23 or the magnetic force application mechanism 24.
The magnetic force applying mechanism 24 according to the present invention will be described in detail below with reference to fig. 3 to 5.
In the present invention, as shown in fig. 3 and 4, the magnetic force applying mechanism 24 includes: a yoke plate 241; a magnet 242 attached to a first surface of the yoke plate 241 facing the evaporation source 25 side for applying a magnetic force to the mask 221 through the substrate 10; and a frame 243 provided on a second surface of the yoke plate 241 opposite to the first surface, and provided with a tilt adjusting mechanism 244 for adjusting a tilt of the yoke plate 241 with respect to the substrate 10.
As shown in fig. 3, in the present invention, the outer frame of the frame 243 has a closed rectangular structure, but the present invention is not limited thereto, and the shape of the frame 243 may be appropriately changed according to the shape of the yoke plate. The frame 243 includes a plurality of connected ribs. As can be seen from the drawings, the rib has an angle structure including a first plate 243A perpendicular to the yoke plate 241 and a second plate 243B parallel to the yoke plate 241.
Specifically, the rib includes: an outer rib 2431 constituting an outer frame of the frame 243; a plurality of first main inner ribs 2432 perpendicular to the longitudinal direction of the frame 243 and having both ends connected to the outer ribs 2431; a plurality of second main inner ribs 2433 parallel to the longitudinal direction of the frame 243 and having both ends connected to the outer ribs 2431; and a connection part 2434 perpendicular to the longitudinal direction of the frame 243 and having both ends connected to the outer rib 2431 and the second main inner rib 2433, which are parallel and close to each other, respectively. As shown in fig. 3, a screw hole is provided in the connecting portion 2434, and the connecting portion 2434 is connected to a lifting mechanism that vertically lifts the magnetic force applying mechanism 24 by a bolt, thereby suspending the yoke plate 241 in the chamber 20.
As shown in fig. 3, the rib further includes: a plurality of first sub inner ribs 2435 perpendicular to the longitudinal direction of the frame 243 and having both ends connected to the second main inner ribs 2433; and a plurality of second sub inner ribs 2436 parallel to the longitudinal direction of the frame 243 and having both ends connected to the first main inner ribs 2432.
In the present embodiment, as shown in fig. 3, three first main inner ribs 2432 are provided, and the three first main inner ribs 2432 equally divide the longitudinal direction of the frame 243 into four portions. Further, two second main inner ribs 2433 are provided, and the two second main inner ribs 2433 divide the short side direction of the frame 243 into three parts. Further, three first sub inner ribs 2435 are provided between the two second main inner ribs 2433, two first sub inner ribs 2435 being close to the outer rib 2431 in the short side direction of the frame 243, and the remaining one first sub inner rib 2435 being close to the middle first main inner rib 2432. Two second sub inner ribs 2436 are provided between the first main inner ribs 2432, and specifically, the two second sub inner ribs 2436 are provided at positions close to the outer ribs 2431 of the frame 243 in the longitudinal direction.
According to the above configuration, the ribs are uniformly distributed in the frame 243, so that the strength of the yoke plate 241 can be uniformly reinforced. With the above configuration, the strength of the yoke plate 241 can be effectively and uniformly increased only by the frame having the rib, and therefore, the mounting plate for increasing the strength of the yoke plate can be omitted, the number of parts of the magnetic force applying mechanism can be reduced, and the cost can be reduced.
The number of ribs in the above embodiment is only an example of the present invention, and the present invention is not limited thereto, and is not particularly limited as long as the ribs can be evenly distributed in the frame 243.
In the embodiment shown in fig. 3, the tilt adjusting mechanisms 244 are provided at four corners of the outer rib 2431. Further, a tilt adjusting mechanism 244 is also provided at the intersection of the first main inner rib 2432 and the outer rib 2431. Further, a tilt adjusting mechanism 244 is also provided between the first sub inner rib 2435 and the outer rib 2431. A tilt adjustment mechanism 244 is also provided between the first sub inner rib 2435 and the first main inner rib 2432.
The tilt adjustment mechanisms 244 are evenly distributed across the frame 243 when viewed as a whole. Thereby enabling to efficiently adjust the inclination of the yoke plate 241.
The structure of the tilt adjusting mechanism 244 will be described in detail below with reference to fig. 4 and 5.
Fig. 4 is a sectional perspective view of the tilt adjusting mechanism 244 in the magnetic force applying mechanism of the present invention. Fig. 5 is a front sectional view of the tilt adjusting mechanism 244 in the magnetic force applying mechanism of the present invention.
As shown in fig. 4 and 5, the tilt adjustment mechanism 244 includes a fixed block 2441, an adjustment post 2442, a nut 2443, and a screw 2444. The fixing block 2441 is fixed to the frame 243, and specifically, a part of an upper surface of the fixing block 2441 is fixed to a lower surface of the second plate 243B of the angle iron structure of the frame 243 by welding or the like, and therefore, the fixing block 2441 protrudes toward the yoke plate 241 with respect to the frame 243. The fixing block 2441 is provided with a screw hole perpendicular to the yoke plate 241. A screw thread is provided at an outer diameter of the adjustment column 2442 to engage a screw hole of the fixing block 2441, and a stepped hole perpendicular to the yoke plate 241 is formed, a large hole portion of which is provided as a torque transmission portion, for example, formed as a hexagon socket, a square hole, or the like. The inner diameter of the nut 2443 is threaded to engage the external threads of the adjustment post. The screw 2444 includes a head and a shank, at least a portion of the outer diameter of the shank of the screw being threaded, the screw 2444 passing through the stepped bore of the adjustment post 2442 to engage a threaded bore in the yoke plate 241.
When the tilt of the yoke plate 241 is to be adjusted, the tilt of the yoke plate 241 with respect to the substrate 10 is first determined, and which tilt adjustment mechanisms 244 are adjusted is determined according to the tilt. The process of adjusting the tilt adjustment mechanism 244 is as follows: the screw 2444 is loosened, and the nut 2443 is then loosened, and a torque is applied to the adjustment post 2442 using a tool having a profile corresponding to the shape of the large hole of the stepped hole of the adjustment post 2442 to rotate the adjustment post 2442 to move it up and down relative to the fixed block 2441, thereby varying the height at which its lower surface protrudes above the lower surface of the fixed block 2441. After the adjustment is in place, the adjusting column 2442 is locked relative to the fixing block 2441 by locking the nut 2443, and when the adjusting column is locked, the nut 2443 presses the upper surface of the fixing block 2441 tightly. Then, the screw 2441 is tightened so that the lower surface of the adjustment column 2442 is pressed against the upper surface of the yoke plate 241 and the head of the screw 2444 is pressed against the stepped surface of the stepped hole.
In this way, while the yoke plate 241 is fixed to the frame 243, a gap distance of the yoke plate 241 to the lower surface of the fixing block 2441 at that position is also ensured. The inclination adjustment of the yoke plate 241 with respect to the substrate 10 is realized by making the gap distances different at the plurality of inclination adjustment mechanisms 244.
Through the above structure of the present invention, the fixing structure of the yoke plate 241 and the frame 243 can be integrated with the tilt adjusting structure, and the gap between the yoke plate 241 and the frame 243 can be adjusted, so that the yoke plate 241 can be more easily made parallel to the substrate 10. Accordingly, the magnet 242 mounted on the first surface of the yoke plate 241 on the evaporation source side is also parallel to the substrate 10, and as a result, the magnetic field generated by the magnet 242 with respect to the mask 221 is uniform and stable, the magnetic force applied to the mask 221 by the magnet 242 is uniform and stable, and the mask 221 can be uniformly attracted to the substrate 10, thereby improving the film formation accuracy.
The above embodiment shows a preferred embodiment of the present invention, but the present invention is not limited to this. It should be understood that the above-described embodiments are illustrative only and not restrictive, and that various obvious or equivalent modifications and substitutions may be made in the details herein before described by those skilled in the art without departing from the basic principles of the invention.
Claims (13)
1. A film deposition apparatus for fixing a mask to a substrate by attracting the mask with a magnet and depositing a film on the substrate through the mask,
the film forming apparatus includes a magnetic force applying mechanism including:
a yoke plate;
a magnet attached to a first surface of the yoke plate facing an evaporation source side, the magnet applying a magnetic force to the mask through the substrate;
and a frame provided on a second surface of the yoke plate on a side opposite to the first surface, the frame being provided with a tilt adjustment mechanism for adjusting a tilt of the yoke plate with respect to the substrate.
2. The film forming apparatus according to claim 1, wherein:
the frame includes a plurality of connected ribs.
3. The film forming apparatus according to claim 2, wherein:
the rib part is of an angle steel structure,
the angle steel structure includes a first plate perpendicular to the yoke plate and a second plate parallel to the yoke plate.
4. The film forming apparatus according to claim 3, wherein:
the rib includes an outer rib constituting an outer frame of the frame.
5. The film forming apparatus according to claim 4, wherein:
the rib further includes:
a plurality of first main inner rib portions perpendicular to a long side direction of the frame, both ends of the first main inner rib portions being connected to the outer rib portions;
a plurality of second main inner rib portions parallel to a long side direction of the frame, both ends of the second main inner rib portions being connected to the outer rib portions; and
and the connecting part is perpendicular to the long side direction of the frame, and two ends of the connecting part are respectively connected to the outer rib part and the second main inner rib part which are parallel and close to each other.
6. The film forming apparatus according to claim 5, wherein:
the rib further includes:
a plurality of first sub inner rib portions perpendicular to a longitudinal direction of the frame, both ends of the first sub inner rib portions being connected to the second main inner rib portions, respectively;
and the second auxiliary inner rib parts are parallel to the long side direction of the frame, and two ends of the second auxiliary inner rib parts are respectively connected with the first main inner rib parts.
7. The film forming apparatus according to any one of claims 1 to 6, wherein:
the tilt adjustment mechanism includes:
a fixing block fixed to the frame, at least a portion of the fixing block protruding toward the yoke plate with respect to the frame, the fixing block being provided with a screw hole perpendicular to the yoke plate;
the outer diameter of the adjusting column is provided with threads so as to be jointed with the threaded hole of the fixed block, and a stepped hole perpendicular to the magnetic yoke plate is formed;
a nut having an inner diameter formed with threads to engage the outer threads of the adjustment post; and
a screw including a head and a shaft, at least a portion of an outer diameter of the shaft of the screw being threaded, the screw passing through the stepped bore of the adjustment post to engage the threaded bore in the yoke plate.
8. The film forming apparatus according to claim 7, wherein:
the large hole portion of the stepped hole of the adjustment column is provided as a torque transmission portion.
9. The film forming apparatus according to any one of claims 4 to 6, wherein:
the tilt adjusting mechanism is provided at least at four corners of the outer rib portion.
10. The film forming apparatus according to claim 5 or 6, wherein:
the inclination adjustment mechanism is provided at an intersection of the first main inner rib and the outer rib.
11. The film forming apparatus according to claim 6, wherein:
the tilt adjustment mechanism is provided between the first sub inner rib and the outer rib.
12. The film forming apparatus according to claim 6, wherein:
the tilt adjustment mechanism is provided between the first sub inner rib and the first main inner rib.
13. The film forming apparatus according to claim 5, wherein:
the film forming apparatus includes a chamber, and the yoke plate is suspended in the chamber by the connecting portion.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201922370400.2U CN211771524U (en) | 2019-12-24 | 2019-12-24 | Film forming apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201922370400.2U CN211771524U (en) | 2019-12-24 | 2019-12-24 | Film forming apparatus |
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| Publication Number | Publication Date |
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| CN211771524U true CN211771524U (en) | 2020-10-27 |
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| CN201922370400.2U Active CN211771524U (en) | 2019-12-24 | 2019-12-24 | Film forming apparatus |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115369358A (en) * | 2021-09-08 | 2022-11-22 | 广东聚华印刷显示技术有限公司 | Vapor deposition apparatus and vapor deposition substrate separation method |
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2019
- 2019-12-24 CN CN201922370400.2U patent/CN211771524U/en active Active
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115369358A (en) * | 2021-09-08 | 2022-11-22 | 广东聚华印刷显示技术有限公司 | Vapor deposition apparatus and vapor deposition substrate separation method |
| CN115369358B (en) * | 2021-09-08 | 2023-12-05 | 广东聚华印刷显示技术有限公司 | Vapor deposition device and vapor deposition substrate separation method |
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