CN211528307U - 一种三氟化氮粗气色谱快速分析系统 - Google Patents
一种三氟化氮粗气色谱快速分析系统 Download PDFInfo
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- CN211528307U CN211528307U CN201922202288.1U CN201922202288U CN211528307U CN 211528307 U CN211528307 U CN 211528307U CN 201922202288 U CN201922202288 U CN 201922202288U CN 211528307 U CN211528307 U CN 211528307U
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- nitrogen trifluoride
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- 238000004458 analytical method Methods 0.000 title claims abstract description 30
- QKCGXXHCELUCKW-UHFFFAOYSA-N n-[4-[4-(dinaphthalen-2-ylamino)phenyl]phenyl]-n-naphthalen-2-ylnaphthalen-2-amine Chemical compound C1=CC=CC2=CC(N(C=3C=CC(=CC=3)C=3C=CC(=CC=3)N(C=3C=C4C=CC=CC4=CC=3)C=3C=C4C=CC=CC4=CC=3)C3=CC4=CC=CC=C4C=C3)=CC=C21 QKCGXXHCELUCKW-UHFFFAOYSA-N 0.000 title claims abstract description 27
- 238000004817 gas chromatography Methods 0.000 title claims abstract description 16
- 239000007789 gas Substances 0.000 claims abstract description 59
- 239000003513 alkali Substances 0.000 claims abstract description 12
- 238000010521 absorption reaction Methods 0.000 claims abstract description 11
- 239000002808 molecular sieve Substances 0.000 claims abstract description 11
- URGAHOPLAPQHLN-UHFFFAOYSA-N sodium aluminosilicate Chemical compound [Na+].[Al+3].[O-][Si]([O-])=O.[O-][Si]([O-])=O URGAHOPLAPQHLN-UHFFFAOYSA-N 0.000 claims abstract description 11
- 238000001035 drying Methods 0.000 claims description 25
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 10
- 239000000741 silica gel Substances 0.000 claims description 10
- 229910002027 silica gel Inorganic materials 0.000 claims description 10
- 238000011084 recovery Methods 0.000 claims description 8
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 claims description 6
- 238000011161 development Methods 0.000 claims description 5
- 239000002245 particle Substances 0.000 claims description 5
- 238000004587 chromatography analysis Methods 0.000 claims description 4
- 239000007864 aqueous solution Substances 0.000 claims description 2
- 239000000243 solution Substances 0.000 claims description 2
- 238000002347 injection Methods 0.000 abstract description 2
- 239000007924 injection Substances 0.000 abstract description 2
- 238000000034 method Methods 0.000 description 10
- 230000000694 effects Effects 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 238000010926 purge Methods 0.000 description 4
- TXEYQDLBPFQVAA-UHFFFAOYSA-N tetrafluoromethane Chemical compound FC(F)(F)F TXEYQDLBPFQVAA-UHFFFAOYSA-N 0.000 description 4
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 3
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 2
- 229910052731 fluorine Inorganic materials 0.000 description 2
- 239000011737 fluorine Substances 0.000 description 2
- 229910000040 hydrogen fluoride Inorganic materials 0.000 description 2
- 230000009897 systematic effect Effects 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- 238000000692 Student's t-test Methods 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 239000012459 cleaning agent Substances 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000009699 differential effect Effects 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 238000005868 electrolysis reaction Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 238000004868 gas analysis Methods 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 231100000053 low toxicity Toxicity 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000004377 microelectronic Methods 0.000 description 1
- GVGCUCJTUSOZKP-UHFFFAOYSA-N nitrogen trifluoride Chemical compound FN(F)F GVGCUCJTUSOZKP-UHFFFAOYSA-N 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 238000001020 plasma etching Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 238000005070 sampling Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 238000012353 t test Methods 0.000 description 1
- 230000009967 tasteless effect Effects 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
Images
Abstract
Description
组分 | 一次进样 | 二次进样 | 三次进样 | 四次进样 | 平均值 | 标准偏差 |
H<sub>2</sub> | 1994.23 | 1997.74 | 1990.50 | 1998.87 | 1997.01 | 1.91 |
N<sub>2</sub> | 38.62 | 38.5 | 39.71 | 39.5 | 39.08 | 0.61 |
CF<sub>4</sub> | 16.78 | 17.05 | 16.93 | 16.52 | 16.82 | 0.23 |
NF<sub>3</sub> | 59.36 | 58.81 | 58.79 | 58.34 | 58.83 | 0.42 |
Claims (7)
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN113702532A (zh) * | 2021-08-30 | 2021-11-26 | 中船重工(邯郸)派瑞特种气体有限公司 | 一种测量含氟混合气体中氟气含量的装置 |
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Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN113702532A (zh) * | 2021-08-30 | 2021-11-26 | 中船重工(邯郸)派瑞特种气体有限公司 | 一种测量含氟混合气体中氟气含量的装置 |
CN113702532B (zh) * | 2021-08-30 | 2022-04-08 | 中船(邯郸)派瑞特种气体股份有限公司 | 一种测量含氟混合气体中氟气含量的装置 |
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Effective date of registration: 20210629 Address after: 471012 room 103, office building, Geely Industrial Park, liming research and Design Institute of chemical industry, South Road, Geely science and Technology Park, Geely District, Luoyang City, Henan Province Patentee after: LUOYANG DAWN DACHENG FLUORINE CHEMICAL Co.,Ltd. Patentee after: Haohua Gas Co.,Ltd. Address before: 471012 room 103, office building, Geely Industrial Park, liming research and Design Institute of chemical industry, South Road, Geely science and Technology Park, Geely District, Luoyang City, Henan Province Patentee before: LUOYANG DAWN DACHENG FLUORINE CHEMICAL Co.,Ltd. Patentee before: LIMING Research Institute OF CHEMICAL INDUSTRY |
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Address after: 471012 room 103, office building, Geely Industrial Park, liming research and Design Institute of chemical industry, South Road, Geely science and Technology Park, Geely District, Luoyang City, Henan Province Patentee after: Luoyang Haohua Gas Technology Co.,Ltd. Patentee after: Haohua Gas Co.,Ltd. Address before: 471012 room 103, office building, Geely Industrial Park, liming research and Design Institute of chemical industry, South Road, Geely science and Technology Park, Geely District, Luoyang City, Henan Province Patentee before: LUOYANG DAWN DACHENG FLUORINE CHEMICAL Co.,Ltd. Patentee before: Haohua Gas Co.,Ltd. |
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Effective date of registration: 20230803 Address after: 471012 No. 12, South Road, Geely Science Park, Mengjin District, Luoyang City, Henan Province Patentee after: Haohua Gas Co.,Ltd. Address before: 471012 room 103, office building, Geely Industrial Park, liming research and Design Institute of chemical industry, South Road, Geely science and Technology Park, Geely District, Luoyang City, Henan Province Patentee before: Luoyang Haohua Gas Technology Co.,Ltd. Patentee before: Haohua Gas Co.,Ltd. |